JPS62170473A - Vapor deposition device using laser - Google Patents

Abstract

PURPOSE:To prevent contamination of an optical system regulator by disposing an ion source to a suitable position in a reaction vessel and irradiating the ion beam thereof toward the optical system regulator. CONSTITUTION:The laser light arrives at a concave mirror 5c of the optical system regulator, by which the laser light is converged and changed in the optical path to irradiate a sample 2 to be irradiated. The evaporating material diffused from the sample 2 to be irradiated sticks onto the surface of a substrate 6 and forms a coating layer thereon. The ion beam irradiated from the ion source disposed in the reaction vessel 1 is made to collide against the concave mirror 5c to sputter and remove the evaporating material stuck thereto by which the optical system regulator is cleaned. The deterioration of the laser irradiation efficiency is prevented by the above-mentioned mechanism, by which the working efficiency is improved.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a member in which a coating layer with various functions is formed on the surface of a substrate made of various metal alloys and ceramics;
For example, it relates to a vapor deposition apparatus using a laser that is suitable for use in manufacturing tool parts such as cutting tools and wear-resistant tools, and electronic industrial parts such as semiconductor device substrates, and more specifically, it relates to a vapor deposition apparatus using a laser suitable for manufacturing tool parts such as cutting tools and wear-resistant tools, and electronic industry parts such as semiconductor element substrates. The present invention relates to a vapor deposition apparatus that uses a laser and has a structure that can prevent contamination of an optical system adjuster (to be described later) during formation, and thereby enable continuous operation to improve work efficiency.

[Prior Art] In general, vapor deposition apparatuses for forming coating layers with various functions on the surfaces of substrates made of metal alloys and ceramics are roughly divided into chemical vapor deposition apparatuses (CVD apparatuses) and physical vapor deposition apparatuses (PVD apparatuses). equipment).

The latter type of equipment can be further classified into ion plate ink equipment, sputtering equipment, and vacuum evaporation equipment. Among these, one type of vacuum evaporation equipment is a laser that uses laser light as a means of heating the irradiated sample. Vapor deposition apparatuses using

Laser-based vapor deposition equipment, which has been widely used in the past, irradiates the irradiated sample with a focused laser beam with a high energy density. A large amount evaporates compared to the previous one, creating irradiation marks, making continuous operation difficult. For this reason, the laser beams used in conventional laser-based vapor deposition apparatuses are mainly low-output laser beams whose irradiation energy is suppressed to 100 W or less.

However, when the irradiation energy of the laser beam is small, the amount of evaporated matter generated from the irradiated sample decreases, and the deposition rate of the coating layer formed on the substrate surface decreases. Furthermore, it has been pointed out that the mechanical strength of the coating layer formed on the substrate is low, and the adhesion to the substrate is also weak.

In order to solve these problems, the inventors of the present invention have developed a device with a new structure (see Japanese Patent Application Laid-open No. 116373/1983).

The device disclosed here makes it possible to irradiate an irradiated sample with a high-power laser beam. Specifically, the irradiated sample, which has been processed into a ring shape, is rotated around its axis within a vacuum container. The feature is that a high-output focused laser beam is irradiated from the tangential direction of the laser beam. By adopting such an embodiment, the activation of the evaporated substances evaporated from the irradiated sample is promoted, the adhesion between the coating layer made of this highly active evaporated substance and the substrate is significantly improved, and furthermore, the evaporation Objects can be continuously and stably supplied from the rotating ring-shaped irradiated sample to the substrate.

[Problems to be Solved by the Invention] However, in the case of this device, when the irradiated sample is evaporated for a long period of time or when evaporation is repeated several times intermittently, even if it is for a short period of time, the reaction vessel is In particular, evaporation on the inner surface of a window for introducing laser light arranged on the wall of the container or on an optical system adjuster such as a concave mirror or a parabolic mirror used to focus the laser light introduced into the container. This results in a situation where objects become more heavily attached and the efficiency of laser irradiation to the irradiated sample decreases.

When removing evaporated matter adhering to the interior of the reaction vessel, especially the optical system adjuster, the surface of the optical system adjuster is often scratched. Naturally, the laser irradiation efficiency of an optical system adjuster that has suffered surface damage decreases.

The present invention solves the above-mentioned problems in the laser vapor deposition apparatus disclosed in Japanese Patent Application Laid-Open No. 59-116373, and eliminates the problem within the reaction vessel, especially the optical base. The object of the present invention is to provide a vapor deposition apparatus using a laser with a new structure that can prevent contamination of a container, improve the strength characteristics of the coating layer, and improve the adhesion between the coating layer and the substrate.

[Means for Solving the Problems] After intensive research to achieve the above objective, the inventors discovered that while the irradiated sample was being evaporated, cleaning ions, which will be described later, were applied to the areas targeted for contamination prevention. It was discovered that sputtering deposits by beam irradiation is an effective means, and the apparatus of the present invention was developed.

That is, the vapor deposition apparatus using the laser of the present invention includes: an irradiated sample whose axis rotates within a reaction container; an optical system adjuster that introduces and focuses laser light and irradiates the irradiated sample;
The optical system adjustment group is irradiated in a vapor deposition apparatus using a laser, which is equipped with a substrate disposed opposite to the irradiated sample, and on the surface of which a coating layer of evaporated matter of the irradiated sample is formed. It is characterized in that it is equipped with an ion source for an ion beam for cleaning i+.

The apparatus of the present invention will be explained in more detail below based on an example shown as a schematic diagram.

In the figure, 1 is a reaction vessel with a vacuum inside or a predetermined pressure of Ar,
A gas atmosphere such as He or N2 is maintained. Reference numeral 2 denotes an irradiated sample disposed in the container 1, which rotates around a rotation @2a that extends in a direction perpendicular to the plane of the paper, for example, along an axis in the force direction of arrow Pi.

The irradiated sample can be graphite, carbon, or metal depending on the type of coating layer to be formed on the surface of the substrate.

The material is made of at least one of alloys, metal compounds, and ceramic sintered bodies.

Specifically, graphite; carbon; Ti, Zr, Hf.

V, Nb, Ta, W, Mo,
Cr, B, Si metals or alloys containing these; alloys such as various cemented carbides and cermets; Ti
C.

TiN, TiC2, TiB2, Al2O3.

S ic , Si3 N4. hBN, cBN, Ti (
C.

Metal compounds such as N), (Ti, Ta)C; Al2O
Ceramic sintered bodies such as 3-based ceramics, ZrO2-based ceramics, SiC-based ceramics, Si3N4-based ceramics, clay, cBN-based sintered bodies, and diamond-based sintered bodies can be exemplified. In addition, the shape of the sample to be irradiated can be any shape as long as it can rotate in a well-balanced manner during axis rotation, such as a cylinder, a cylinder, a cone, a curved body, a ring, and a disk. good. These shaped objects may be made of only each of the materials listed above, but if two or more of the above materials are used to create a composite shape, a multi-layered coating layer will be formed on the surface of the substrate. It is useful to be able to form

Note that it is effective to allow the irradiated sample 2 to slide in the axial length direction of the rotating shaft 2a, since it is possible to expand the irradiated area of the irradiated sample during laser beam irradiation, which will be described later. .

In addition, when a laser beam is irradiated onto a sample to be irradiated, the sample is rapidly partially heated and often causes thermal cracking, but in order to prevent this, the irradiated sample is For the purpose of preheating the sample, it is preferable to dispose a heater 3 whose temperature can be controlled around the outer periphery of the sample to be irradiated.

The laser beam is oscillated by an oscillator 4, has its optical path changed by plane mirrors 4a and 4b made of Cu, for example, as shown by an arrow P2, is condensed by a condensing lens 5a, and is introduced into the container 1.

5b is a transmission window made of, for example, KCl, through which the laser beam is introduced. Then, the laser beam reaches the mirror surface of a concave mirror (or parabolic mirror) 5c made of Cu, for example, attached to the inner wall of the container 1, is focused there, has its optical path changed, and travels in the direction of arrow P3 to be exposed. The irradiated surface of the irradiated sample 2 is irradiated from the tangential direction.

In the device of the present invention, the above-mentioned transmission window 5b.

The concave mirror (or parabolic mirror) as a whole is called an optical system adjuster. Note that if the concave mirror or parabolic mirror 5c is configured to allow slight adjustment of the reflection angle of the laser beam that has advanced from the transmission window 5b, the irradiation of the laser beam onto the irradiated surface of the irradiated sample can be easily controlled. It is suitable.

In this way, evaporated matter is diffused from the irradiated surface of irradiated sample $42 in the direction of arrow P4.

A substrate 6 is disposed above and facing the irradiated sample #42. Substrates include glass, synthetic resin, and metal.

All kinds of materials can be used depending on the purpose, such as alloys and ceramic sintered bodies. Specifically, heat-resistant glass; thermosetting resin; Ti, Zr.

Hf, V, Nb, Ta, W, Mo, Cr, Al.

Metals such as Cu, Fe, Ni, Co, etc. - Alloys such as carbon steel, high speed steel, stainless steel, Hastelloy, Inconel, B hard alloy, cermet; Al2O3 ceramics, ZrO2 ceramics, Si3 N4
Ceramic sintered bodies such as ceramics, SiC ceramics, TiC ceramics, TfEz ceramics, B4C ceramics, cBN sintered bodies, and diamond sintered bodies can be exemplified.

Evaporated matter from the irradiated sample 2 is deposited on the surface of the substrate 6 made of these materials to form a coating layer.
(In order to improve the adhesion between the plate 6 and the coating layer, it is preferable to provide a device for raising the temperature of the substrate, for example, a heater 6a that can control the temperature on the outer periphery of the substrate 6.7) Board 6
A movable shutter installed in front of the substrate 6 arbitrarily adjusts the deposition time of the evaporated material onto the substrate 6.

The device of the present invention further includes ion rA8, which will be described later.

The ion beam irradiated from this ion source 8 is
An ion beam that can hit the reflective surface of the reflector and sputter and remove the evaporated matter that has adhered to (or is about to adhere to) the reflective surface, and that does not cause damage such as chemical changes to the reflective surface. It can be anything. Specifically, Ar, H
Ion beams such as ion beams such as e and 82 can be used.

Therefore, this ion source 8 is arranged at a position that targets optical system adjusters such as the concave mirror 5c and the transmission window 5b shown in the figure. Further, it is preferable that the ion rA8 is provided with a mechanism that allows it to perform neck-digging motion at a predetermined angle corresponding to the position of the target.

Thus, when the optical system adjuster is irradiated with the ion beam, the evaporated matter that adheres to the inner surface of the transmission window 5b, the surface of the concave mirror or the parabolic mirror 5C is removed by the sputtering effect or bombardment effect of the ion beam. and these optical system adjusters are cleaned. Thus, in this case,
Contamination of the optical system adjuster due to evaporated matter can be removed at any time, the laser irradiation efficiency of the optical system adjuster can be maintained as per the design standard, and the device can be operated continuously. The energy of the ion beam required to obtain this effect may range from several tens of eV to several thousand eV.

[Effects of the Invention] As is clear from the above description, the vapor deposition apparatus using the laser of the present invention is equipped with an ion source that irradiates a beam of ion species that may be contained in the coating layer to be formed, and By irradiating the ion beam onto an optical system adjuster such as a transmission window, concave mirror, or parabolic mirror, it is possible to prevent deposits from adhering to the optical system adjuster, thereby reducing laser irradiation efficiency. It is possible to operate the device continuously for a long period of time, and the work efficiency is greatly improved, which is of great industrial value.

[Examples of the Invention] Examples will be specifically shown below to demonstrate the excellent effects of the device of the present invention.

Example I A concave mirror 5c made of Cu, made of TiC-TiN ceramics, and a cylindrical irradiated sample 2. A substrate 6 made of cemented carbide containing 5% by weight of WC was set in a container 1 to assemble an apparatus as shown in the figure.

The inside of the container 1 was evacuated to a higher vacuum than 1 x 10' Torr, and the sample 2 to be irradiated was preheated to 500'C by the heater 3 while rotating at 2 Orpm, and the substrate 6 was heated to 500'C by the heater 6a. Preheated to 500°C.

Next, a CWCO2 laser beam is oscillated from the laser beam oscillator 4, and introduced into the container 1 through the transmission window 5b (made of KCl).
This is condensed by concave mirror 5C to produce a condensing cwco of 2000W.
A TiC--TiN-based coating layer was formed on the surface of the substrate 6 by irradiating the irradiated sample 2 with laser light from the tangential direction thereof. At this time, when the concave mirror 5C was continuously irradiated with a nitrogen ion beam having an ion acceleration energy of 1000 eV from the ion source 8, the mirror surface of the concave mirror 5C was not contaminated and continuous weeding was possible. On the other hand, when the ion beam was not irradiated, the concave mirror became contaminated after 20 minutes of use, and the vapor deposition efficiency decreased significantly, making it unusable.

[Brief explanation of drawings]

The figure is a schematic diagram showing a preferred example of the laser evaporation device of the present invention. 1-Reaction container 2-Irradiated sample 2a-Rotation axis 3-Heater 4-Laser beam oscillator 4a, 4b-Mirror 5a-Condensing lens 5b-Transmission window 5C-Concave mirror (parabolic mirror) 6-Substrate 6a- Heater
7- Movable shutter 8- Ion source

Claims (1)

[Claims] 1. An irradiated sample that rotates around an axis within a reaction vessel, an optical system adjuster that introduces and focuses laser light and irradiates the irradiated sample, and an optical system adjuster that faces the irradiated sample. an ion source of a cleaning ion beam that irradiates the optical system adjuster in a vapor deposition apparatus using a laser, the substrate having a substrate on whose surface a coating layer of evaporated matter of the irradiated sample is formed; A vapor deposition device using a laser, characterized in that it is equipped with a. 2. A vapor deposition apparatus using a laser according to claim 1, wherein the ion source is either a nitrogen ion or an inert element ion source. 3. A vapor deposition apparatus using a laser according to claim 1, wherein the irradiated sample is provided with a heater capable of temperature control. 4. A vapor deposition apparatus using a laser according to claim 1, wherein the substrate is provided with a heater capable of controlling temperature.