JPS6216520B2 - - Google Patents

Info

Publication number
JPS6216520B2
JPS6216520B2 JP52154602A JP15460277A JPS6216520B2 JP S6216520 B2 JPS6216520 B2 JP S6216520B2 JP 52154602 A JP52154602 A JP 52154602A JP 15460277 A JP15460277 A JP 15460277A JP S6216520 B2 JPS6216520 B2 JP S6216520B2
Authority
JP
Japan
Prior art keywords
wave
plate
phase
wave beam
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52154602A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5382370A (en
Inventor
Robaato Pieerumarii Jooji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of JPS5382370A publication Critical patent/JPS5382370A/ja
Publication of JPS6216520B2 publication Critical patent/JPS6216520B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B1/00—Thermonuclear fusion reactors
    • G21B1/11—Details
    • G21B1/23—Optical systems, e.g. for irradiating targets, for heating plasma or for plasma diagnostics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/16—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using polarising devices, e.g. for obtaining a polarised beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma Technology (AREA)
  • Lasers (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP15460277A 1976-12-23 1977-12-23 Lazer beam guiding mode change and Granted JPS5382370A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7638960A FR2385241A1 (fr) 1976-12-23 1976-12-23 Convertisseurs de mode de polarisation pour faisceaux laser et generateurs de plasma les utilisant

Publications (2)

Publication Number Publication Date
JPS5382370A JPS5382370A (en) 1978-07-20
JPS6216520B2 true JPS6216520B2 (en:Method) 1987-04-13

Family

ID=9181485

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15460277A Granted JPS5382370A (en) 1976-12-23 1977-12-23 Lazer beam guiding mode change and

Country Status (5)

Country Link
US (1) US4175830A (en:Method)
JP (1) JPS5382370A (en:Method)
DE (1) DE2757263A1 (en:Method)
FR (1) FR2385241A1 (en:Method)
GB (1) GB1592690A (en:Method)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2413678A1 (fr) * 1977-12-28 1979-07-27 Marie G R P Convertisseurs de mode d'une onde non confinante en une onde confinante dans l'infrarouge lointain
FR2450518A1 (fr) * 1979-03-02 1980-09-26 Marie G R P Convertisseur de mode tmo-teo
FR2466119A2 (fr) * 1979-09-26 1981-03-27 France Etat Laser a rayons x a plasma
US4496518A (en) * 1980-02-27 1985-01-29 Marie G R P TMO and TEO cavity resonator for projecting plasma confining TEO mode components
US4440714A (en) * 1981-01-29 1984-04-03 The United States Of America As Represented By The United States Department Of Energy Inertial confinement fusion method producing line source radiation fluence
DE3532416A1 (de) * 1985-09-11 1987-03-12 Diehl Gmbh & Co Verfahren und einrichtung zur erhoehung der leistungsdichte in einem fokussierten hochenergie-laserstrahl
US4740983A (en) * 1987-08-28 1988-04-26 General Electric Company Laser apparatus for minimizing wavefront distortion
US4849761A (en) * 1988-05-23 1989-07-18 Datron Systems Inc. Multi-mode feed system for a monopulse antenna
JPH04502061A (ja) * 1988-12-05 1992-04-09 ユーロピーアン　アトミック　エナージー　コンミュニティ　（ユーラトム） ガウス形分布のミリ波ビームを生ずるアンテナ
FR2740898B1 (fr) 1995-11-06 1998-01-30 Marie G R P Dispositif provoquant et utilisant la "microfusion" thermonuclaire
WO2001048520A1 (en) * 1999-12-29 2001-07-05 Metrologic Instruments, Inc. Illumination apparatus with polarizing elements for beam shaping
WO2002068918A1 (en) * 2001-02-23 2002-09-06 Telefonaktiebolaget L.M. Ericsson Monochromator arrangement
DE10148167A1 (de) * 2001-09-28 2003-04-17 Zeiss Carl Jena Gmbh Beleuchtungsanordnung
KR101532824B1 (ko) 2003-04-09 2015-07-01 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI609409B (zh) 2003-10-28 2017-12-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI519819B (zh) 2003-11-20 2016-02-01 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
US8279524B2 (en) * 2004-01-16 2012-10-02 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
US8270077B2 (en) * 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
TWI609410B (zh) 2004-02-06 2017-12-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
US7324280B2 (en) * 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
US7196797B2 (en) * 2004-05-28 2007-03-27 Agilent Technologies, Inc. Differential interferometer with improved cyclic nonlinearity
US7760431B2 (en) * 2005-05-05 2010-07-20 Intel Corporation Method of and apparatus for modifying polarity of light
US20080137189A1 (en) * 2006-12-12 2008-06-12 Northrop Grumman Space & Mission Systems Corporation Conversion of the polarization of light via a composite half-wave plate
US9389519B2 (en) * 2010-02-25 2016-07-12 Nikon Corporation Measuring method and measuring apparatus of pupil transmittance distribution, exposure method and exposure apparatus, and device manufacturing method
US20110205519A1 (en) * 2010-02-25 2011-08-25 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
GB2497761A (en) * 2011-12-20 2013-06-26 Univ Antwerpen Generation of charged particle vortex waves
KR101915139B1 (ko) * 2012-05-08 2018-11-05 한국전자통신연구원 양성자 빔 발생장치
US9330878B2 (en) * 2014-06-18 2016-05-03 Los Alamos National Security, Llc. Electromechanical x-ray generator
EP3365721B1 (en) * 2015-10-19 2022-04-27 Deutsches Krebsforschungszentrum Chromatic phase plate

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3877789A (en) * 1972-11-08 1975-04-15 Marie G R P Mode transformer for light or millimeter electromagnetic waves
US3892470A (en) * 1974-02-01 1975-07-01 Hughes Aircraft Co Optical device for transforming monochromatic linearly polarized light to ring polarized light
US3892469A (en) * 1974-02-01 1975-07-01 Hughes Aircraft Co Electro-optical variable focal length lens using optical ring polarizer

Also Published As

Publication number Publication date
JPS5382370A (en) 1978-07-20
GB1592690A (en) 1981-07-08
DE2757263A1 (de) 1978-06-29
US4175830A (en) 1979-11-27
FR2385241B1 (en:Method) 1979-10-12
FR2385241A1 (fr) 1978-10-20

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