JPS62163933A - Intensity distribution measuring apparatus of laser beam flux - Google Patents
Intensity distribution measuring apparatus of laser beam fluxInfo
- Publication number
- JPS62163933A JPS62163933A JP609386A JP609386A JPS62163933A JP S62163933 A JPS62163933 A JP S62163933A JP 609386 A JP609386 A JP 609386A JP 609386 A JP609386 A JP 609386A JP S62163933 A JPS62163933 A JP S62163933A
- Authority
- JP
- Japan
- Prior art keywords
- light
- laser beam
- pinhole
- light shielding
- photoelectric conversion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000004907 flux Effects 0.000 title abstract 2
- 238000006243 chemical reaction Methods 0.000 claims abstract description 14
- 230000003287 optical effect Effects 0.000 claims abstract description 8
- 230000002238 attenuated effect Effects 0.000 claims description 3
- 238000009792 diffusion process Methods 0.000 abstract description 5
- 238000005259 measurement Methods 0.000 abstract description 2
- 239000010453 quartz Substances 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 2
- 230000000694 effects Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000001739 density measurement Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、レーザビームの断面元強度分布を測定する技
術分野に関するものである、
〔従来の技術〕
レーザビームを露元々源、元ＣＶＤ法の光源等に使用す
る試みが提案されており、この場合には元来断面が大き
く、かつ断面の光強度分布の均一なレーザビームが求め
られる。特に紫外領域のレーザビームを出力するエキシ
マレーザにおいて、そうである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to the technical field of measuring the cross-sectional original intensity distribution of a laser beam. [Prior Art] A laser beam is used as an exposure source, and the original CVD method is used. Attempts have been made to use the laser beam as a light source, etc., and in this case, a laser beam that originally has a large cross section and a uniform light intensity distribution in the cross section is required. This is especially true for excimer lasers that output laser beams in the ultraviolet region.
従来、断面元強度分布を測定てる場合、レーザビームを
感元紙又は印画紙に照射し、得られた写真の＃ｉを各位
置について測定する方法が採られていた＠
しかし、写真は濃度が光強度に比例するのは、極（限ら
れ九九強度範囲であるし、また現像及び濃ｉ測定という
工程があるので、断面大強度分布の測定は極めて繁雑で
あった。Conventionally, when measuring the cross-sectional original intensity distribution, a method was adopted in which a laser beam was irradiated onto photosensitive paper or photographic paper, and #i of the obtained photograph was measured at each position. Since the intensity range is limited to a very limited range and is proportional to the light intensity, and there are steps such as development and density measurement, measurement of the cross-sectional large intensity distribution is extremely complicated.
本発明は、上記の如き繁雑な夕１」定方性を解決するこ
とにある。The object of the present invention is to solve the above-mentioned complicated problems.
そのため、本発明は、ピンホールを有する遮光手段、該
ピンホールの前又は後に配置された光減衰手段、前記ピ
ンホールを透過し前記光減衰手段で減光されたレーザビ
ームを受光する光電変換手段、並びに前記遮光手段、光
減衰手段及び九１！変換手段をレーザビーム光軸に対し
て垂直平面内で移動させる移動手段からなることを特徴
とするレーザビーム断面元強度分布測定装置を提供する
。Therefore, the present invention provides a light shielding means having a pinhole, a light attenuation means disposed before or after the pinhole, and a photoelectric conversion means for receiving a laser beam transmitted through the pinhole and attenuated by the light attenuation means. , and the light blocking means, the light attenuating means, and 91! Provided is a laser beam cross-sectional original intensity distribution measuring device characterized by comprising a moving means for moving the converting means in a plane perpendicular to the laser beam optical axis.
本発明では、ピンホールな有する逍元手段で、レーザビ
ームの垂直断面方向の任意の点に於ける元のみを選別し
、それだけではまだ元強度が強すぎて正確に測定し難い
ので、前記遮光手段の前又は後に光減衰手段を配置して
波長特性を変えることなく元強度を減衰させ、次いで減
衰したレーザビームを光電変換手段で受光させて電気信
号に変換し、他方、これらの王者の手段をレーザビーム
光軸に対して垂直方向に移動させる移動手段で移動させ
る。In the present invention, the source means having a pinhole is used to select only the source at an arbitrary point in the vertical cross-sectional direction of the laser beam, and since the source intensity is still too strong and difficult to accurately measure, the source means is a pinhole. A light attenuation means is placed before or after the means to attenuate the original intensity without changing the wavelength characteristics, and then the attenuated laser beam is received by a photoelectric conversion means and converted into an electrical signal. is moved by a moving means that moves in a direction perpendicular to the laser beam optical axis.
従って、移動手段の位置と電気信号を操作者が記録する
か、又は表示手段で表示させるか、又は記録手段で記録
することにより、レーザビームの断面元強度分布が簡便
に測定される。Therefore, the cross-sectional intensity distribution of the laser beam can be easily measured by recording the position of the moving means and the electric signal by the operator, displaying it on the display means, or recording it with the recording means.
なお、光減衰手段としては、散乱板又は拡散板が好まし
い。これらの散乱板又は拡散板はレーザビームが強くて
も飽和したり、波長特性（スペクトル）を変えたりする
ことがないので好ましい−散乱板又は拡散板に入射した
レーザビームは、散乱又は拡散にエリ減元されるが、九
に変換手段に受元させる元は、散乱板又は拡散板の反射
元でも透過九でもどちらでもよいつ
〔実施例〕
第１図は、本実施例の測定装置の全体構成を示す概念図
である。Note that as the light attenuation means, a scattering plate or a diffusion plate is preferable. These scattering plates or diffusers are preferable because they do not saturate or change the wavelength characteristics (spectrum) even when the laser beam is strong - the laser beam incident on the scattering plate or diffuser plate has no effect on scattering or diffusion. However, the source to be received by the conversion means may be either the reflection source of the scattering plate or the diffuser plate or the transmission source. [Example] Figure 1 shows the entire measuring device of this example. FIG. 2 is a conceptual diagram showing the configuration.
この装置は、レーザビームのＩｔ軸に垂直に置かれたピ
ンホールを有する第１の蓮元手段（１・と、その後に置
かれ７を光減衰手段（２）例えば表面を粗面化し比高純
度石英板からなる拡散板、更にその後に置かれ７を第２
の遮光手段（１）、第２の遮光手段（１）のピンホール
を透過した元を受光する光電変換手段（３）例えばＰＩ
Ｎフォトダイオード並びに前記手段（１）〜（３）を光
軸に対し垂直方向に移動させる移動手段（４）からなる
。This device includes a first light source means (1) having a pinhole placed perpendicularly to the It axis of the laser beam, and a light attenuation means (2) placed after it, for example, by roughening the surface and increasing the specific height. A diffusion plate made of a pure quartz plate, and a second diffuser plate 7 placed after it.
a light shielding means (1), a photoelectric conversion means (3) for receiving the light transmitted through the pinhole of the second light shielding means (1), for example, a PI
It consists of a moving means (4) for moving N photodiodes and the means (1) to (3) in a direction perpendicular to the optical axis.
図の上刃から入射し定レーザビームは、第１の遮光手段
（１）で絞りこまれ、光減衰手段（２）で拡散に１つ拡
げられ、ｉ２の！！元手段（１）で絞られ、そして光電
変換手段（３）に導かれる。A constant laser beam incident from the upper blade in the figure is narrowed down by the first light shielding means (1), diffused by one light attenuating means (2), and then i2! ! The light is narrowed down by the source means (1) and guided to the photoelectric conversion means (3).
この第１及び第２の趣元手段（１）と拡散板（２）によ
る減光率は次のように耐昇できる。第１．第２の逅元手
段（１）のピンホールの開口径をそれぞれ為。The light attenuation rate by the first and second source means (1) and the diffuser plate (2) can be increased as follows. 1st. Determine the opening diameter of the pinhole of the second source means (1).
φ家とし・拡散板（２）と第２の遮光手段（１）との距
離をｄ％また簡単のために拡散板（２）は完全拡散板と
仮定すると、ピンホールでの回折は無視できるので欠式
の関係が面立する。Assuming that the distance between the diffuser plate (2) and the second light shielding means (1) is d%, and for simplicity, assuming that the diffuser plate (2) is a perfect diffuser plate, the diffraction at the pinhole can be ignored. Therefore, the relationship of lack of expression stands out.
ここに於いて、Ｐ、（Ｗ／ｉ）は入射光の強度で。Here, P and (W/i) are the intensity of the incident light.
Ｐは光電変換手段（３）に入射てる元強度である。P is the original intensity incident on the photoelectric conversion means (3).
また、上式の左辺はｆｔ、′ｒｌＬ変換手段（３）に入
射するブＬ量（Ｗ）であり、例えばＰ、＝２０Ｗ／ｃｙ
Ｊ。Furthermore, the left side of the above equation is the amount of light (W) incident on the ft,'rlL conversion means (3), for example, P, = 20W/cy
J.
佑＝Ｑ、ｌＨ１φｔ＝ ０．５１１１ 、 ｄ ＝ ２
０１ｍノ（！：き、約２ Ｘ １０’Ｗとなり、十分Ｐ
ＩＮ７オトダイオード（３）の入力レベルまで減光する
ことが可能である。Yu = Q, lH1φt = 0.5111, d = 2
01m (!: about 2 x 10'W, enough P
It is possible to dim the light up to the input level of the IN7 otodiode (3).
この工うな構造であるから、この実施例では、ピンホー
ルの人後の組合せを変えることや、遮尤手段（１）と光
減衰手段（２）の距離を調整したりすることにエリ任意
の減光率を得ることができるので、広いエネルギー範囲
のレーザ元と種々の光電変換手段（３） Ｋ対して応用
できる。Because of this simple structure, in this embodiment, it is possible to freely change the combination of pinholes and adjust the distance between the shielding means (1) and the light attenuating means (2). Since it is possible to obtain a light attenuation rate, it can be applied to laser sources with a wide energy range and various photoelectric conversion means (3).
以上の通り、本発明によれば、どのような元強度のレー
ザビームであっても、極めて簡便に断面九強度分石を測
定することができる。As described above, according to the present invention, it is possible to extremely easily measure the nine-intensity section of a laser beam of any original intensity.
第１図は実施例の測定装置の全体構成を説明てる概念図
でろろ。
〔生皮部分の符号の説明〕
１・・ピンホールを育てる遮九手段。
２・・・光減衰手段又はその−例としての拡散板。
３・・・ｆｆ：、電変換手段。
４・・・移動手段、FIG. 1 is a conceptual diagram illustrating the overall configuration of the measuring device of the embodiment. [Explanation of codes for rawhide parts] 1. A shielding means for growing pinholes. 2... Light attenuation means or a diffusion plate as an example thereof. 3...ff: Electrical conversion means. 4... means of transportation,
Claims (1)
に配置された光減衰手段、前記ピンホールを透過し前記
光減衰手段で減光されたレーザビームを受光する光電変
換手段、並びに前記遮光手段、光減衰手段及び光電変換
手段をレーザビーム光軸に対して垂直平面内で移動させ
る移動手段からなることを特徴とするレーザビーム断面
光強度分布測定装置。A light shielding means having a pinhole, a light attenuation means disposed before or after the pinhole, a photoelectric conversion means for receiving a laser beam transmitted through the pinhole and attenuated by the light attenuation means, and the light shielding means, A laser beam cross-sectional light intensity distribution measuring device comprising a moving means for moving an optical attenuation means and a photoelectric conversion means in a plane perpendicular to the laser beam optical axis.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP609386A JPS62163933A (en) | 1986-01-14 | 1986-01-14 | Intensity distribution measuring apparatus of laser beam flux |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP609386A JPS62163933A (en) | 1986-01-14 | 1986-01-14 | Intensity distribution measuring apparatus of laser beam flux |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62163933A true JPS62163933A (en) | 1987-07-20 |
Family
ID=11628901
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP609386A Pending JPS62163933A (en) | 1986-01-14 | 1986-01-14 | Intensity distribution measuring apparatus of laser beam flux |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62163933A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0375097A2 (en) | 1988-04-18 | 1990-06-27 | 3D Systems, Inc. | Stereolithographic beam profiling |
| US5495328A (en) * | 1988-04-18 | 1996-02-27 | 3D Systems, Inc. | Apparatus and method for calibrating and normalizing a stereolithographic apparatus |
| EP0860267A2 (en) * | 1988-04-18 | 1998-08-26 | 3D Systems, Inc. | Stereolithographic beam profiling |
-
1986
- 1986-01-14 JP JP609386A patent/JPS62163933A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0375097A2 (en) | 1988-04-18 | 1990-06-27 | 3D Systems, Inc. | Stereolithographic beam profiling |
| US5495328A (en) * | 1988-04-18 | 1996-02-27 | 3D Systems, Inc. | Apparatus and method for calibrating and normalizing a stereolithographic apparatus |
| EP0860267A2 (en) * | 1988-04-18 | 1998-08-26 | 3D Systems, Inc. | Stereolithographic beam profiling |
| EP0860267A3 (en) * | 1988-04-18 | 1999-01-20 | 3D Systems, Inc. | Stereolithographic beam profiling |
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