JPS62158123A - Preparation of silica glass - Google Patents

Preparation of silica glass

Info

Publication number
JPS62158123A
JPS62158123A JP112886A JP112886A JPS62158123A JP S62158123 A JPS62158123 A JP S62158123A JP 112886 A JP112886 A JP 112886A JP 112886 A JP112886 A JP 112886A JP S62158123 A JPS62158123 A JP S62158123A
Authority
JP
Japan
Prior art keywords
gel
soln
contg
formamide
silicon alkoxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP112886A
Other languages
Japanese (ja)
Inventor
Akihito Iwai
明仁 岩井
Fusaji Hayashi
林 房司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP112886A priority Critical patent/JPS62158123A/en
Publication of JPS62158123A publication Critical patent/JPS62158123A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/12Other methods of shaping glass by liquid-phase reaction processes
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)

Abstract

PURPOSE:To prevent generation of crack or cleavage during drying of silica gel in the sol-gel process by carrying out hydrolysis of silicon alkoxide in aq. soln. contg. H3BO3, and dipping the gel prior to drying in aq. soln. of formamide. CONSTITUTION:Silicon alkoxide expressed by the general formula Si(OR)4 (where R is alkyl group) and/or a polycondensation product of the silicon alkoxide is hydrolyzed in aq. soln. contg. ca. 0.05-1mol/l H3BO3. Generated silica sol is transferred quickly to a vessel having smooth inside surface coated with Teflon(R), etc., and sealed tightly and gelled at ca. room temp. -80 deg.C. Then, the gel is discharged from the vessel and dipped in aq. soln. contg. >=ca. 10vol% formamide to replace alcohol in the gel with the aq. formamide soln. After finishing the replacement, the gel is discharged from the vessel and contracted and solidified in the air at ca. 50-60 deg.C to obtain dry gel. By this method, dry gel contg. no cracks nor cleavage is obtd. and monolithic large sized dry gel is prepd.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、光学用、半導体工業用、電子工業用。[Detailed description of the invention] (Industrial application field) The present invention is applicable to optics, semiconductor industry, and electronic industry.

理化学用等に使用される微量のB2O3を含むシリカガ
ラスの製法に関する。
This invention relates to a method for producing silica glass containing a trace amount of B2O3 used for physical and chemical purposes.

(従来の技術) シリカガラスは耐熱性、耐薬品性及びその優れた光学的
性質などから、最近特に半導体工業において有用性が認
められている。そのシリカガラスの新だな製造法として
最近注目をあびているのが。
(Prior Art) Silica glass has recently been recognized as useful especially in the semiconductor industry due to its heat resistance, chemical resistance, and excellent optical properties. A new method for producing silica glass has recently been attracting attention.

ゾルゲル法である。This is a sol-gel method.

ゾルゲル法によるシリカガラスの製造法の一例を説明す
ると次の通りである。
An example of a method for producing silica glass using the sol-gel method is as follows.

一般式Si (OR)4 (但しRはアルキル基)で示
されるクリコンアルコキシドおよび/ま廻はその重縮合
体2例えば(RO)s S i・(O8i (OR)2
 )。・08i(OR)s、(n=0〜8.Rはアルキ
ル基)に水(アルカリ、酸でpH調整してもよい)を加
え、加水分解し、シリカヒドロシルとする。この時クリ
コンアルコキシドと水が均一な系になる様に溶媒として
適当なアルコールを加えてもよい。シリカ超微粒子など
を加えてもよい。このシリカヒドロシルを所望の形状の
容器に入れ、静置、昇温あるいはゲル化剤添加などによ
りゲル化させる。さらにゲルを蒸発乾燥することによシ
シリ力乾燥ゲルとする。
Clicone alkoxide and/or polycondensate represented by the general formula Si (OR)4 (where R is an alkyl group) are polycondensates 2 thereof, such as (RO)s Si・(O8i (OR)2
). - Add water (pH may be adjusted with an alkali or acid) to 08i(OR)s (n = 0 to 8. R is an alkyl group) and hydrolyze it to obtain silica hydrosyl. At this time, a suitable alcohol may be added as a solvent so that the cricon alkoxide and water form a homogeneous system. Ultrafine silica particles or the like may be added. This silica hydrosil is placed in a container of a desired shape and gelled by standing, heating, or adding a gelling agent. Further, the gel is evaporated to dryness to obtain a dry gel.

この乾燥ゲルを適当な雰囲気で焼結することによシリカ
ガラスを得る。
Silica glass is obtained by sintering this dried gel in an appropriate atmosphere.

このゾルゲル法には以下の特長がある。This sol-gel method has the following features.

(115iCl!4などを原料として酸水素炎でガラス
スートを堆積してい〈従来からのシリカガラスの製造法
よりも低温で製造できるため省エネルギーで低コストで
ある。
(Glass soot is deposited using an oxyhydrogen flame using 115iCl!4 as a raw material.) It can be manufactured at a lower temperature than the conventional manufacturing method of silica glass, so it is energy saving and low cost.

(2)原料が液体であるために、精製が容易であり、高
純度な製品が得られる。
(2) Since the raw material is liquid, purification is easy and a highly pure product can be obtained.

(3)室温で、液相で混合することができるため。(3) Because they can be mixed in a liquid phase at room temperature.

各種ドーパントを均一にドープしたシリカガラスが得ら
れる。
Silica glass uniformly doped with various dopants is obtained.

これらの大変有用な特長があるために、これまでにも多
くの研究がなされてきた。
Due to these very useful features, much research has been conducted to date.

(発明が解決しようとする問題点) しかしながらゾルゲル法には、ゲルを乾燥する工程でゲ
ルにクラックや割れが発生し易く、モノリシックな大形
の乾燥ゲルを歩留りよく製造することが難しいという問
題があり、ゲルの入った容器の蓋にピンホールをあけて
水やアルコールの蒸発速度を制御する方法がとられてい
るが不十分である。
(Problems to be Solved by the Invention) However, the sol-gel method has the problem that cracks and fractures tend to occur in the gel during the gel drying process, making it difficult to produce monolithic large-sized dried gels with a good yield. A method has been used to control the evaporation rate of water and alcohol by making a pinhole in the lid of the container containing the gel, but this method is insufficient.

本発明は、上記した問題を解消するシリカガラスの製法
を提供することを目的とする。
An object of the present invention is to provide a method for manufacturing silica glass that solves the above-mentioned problems.

(問題点を解決するための手段) 発明者等は、シリコンアルコキシドの加水分解で生成す
るアルコール、又は溶媒として加えるアルコールの蒸発
速度が大きいので、ゲルの乾燥収縮についていけずにク
ラックや割れの一因になるものと考え、このアルコール
溶液をホルムアミド水溶液に浸漬して置換すれば蒸発速
度を制御することができ、前記目的を達成し得ることを
見出し本発明を完成するに至った。
(Means for Solving the Problem) The inventors discovered that because the evaporation rate of alcohol produced by hydrolysis of silicon alkoxide or alcohol added as a solvent is high, it is difficult to keep up with the drying shrinkage of the gel, resulting in cracks and cracks. Considering that this may be a contributing factor, the inventors have found that the evaporation rate can be controlled by substituting the alcohol solution with an aqueous formamide solution, thereby achieving the above object, and have completed the present invention.

本発明は、一般式S r (OR)4  (但しRはア
ルキル基)で示されるシリコンアルコキシド及び/又は
その重縮合物を加水分解してシリカゾルとし。
In the present invention, a silica sol is obtained by hydrolyzing a silicon alkoxide and/or a polycondensate thereof represented by the general formula S r (OR) 4 (where R is an alkyl group).

次いで放置してゲル化し乾燥後焼結するシリカガラスの
製法において、前記加水分解をl−l3BO3を含む水
溶液中で行ない、前記乾燥前のゲルをホルムアミド水溶
液に浸漬後取出し乾燥するシリカガラスの製法に関する
A method for producing silica glass in which the hydrolysis is then carried out in an aqueous solution containing 1-1BO3, and the gel before drying is immersed in an aqueous formamide solution and then taken out and dried. .

本発明において用いるシリコンアルコキシド及び/又は
その重縮合物のアルキル基はメチル基又はエチル基が経
済的である上ホルムアミド水溶液との置換が容易であり
好ましい。シリコンアルコキシドの重縮金物としては2
例えば(C)(a O)3S i・(O8i (OCH
3)2 )。・O8i (OCHs)aをあげることが
できる。加水分解のために加える水溶液中のH3BO3
の量は0.05〜1モル/lが好ましい。
The alkyl group of the silicon alkoxide and/or its polycondensate used in the present invention is preferably a methyl group or an ethyl group because it is economical and can be easily replaced with an aqueous formamide solution. As a polycondensed metal of silicon alkoxide, 2
For example, (C) (a O)3S i・(O8i (OCH
3)2).・O8i (OCHs)a can be raised. H3BO3 in aqueous solution added for hydrolysis
The amount of is preferably 0.05 to 1 mol/l.

H2PO4のほかに他の酸を加えてpHを調整してもよ
い。シリコンアルコキシド及び/又はその重縮合物と水
溶液とは生成するシリカゾルを均一なものとするために
、スターラー等を用いて混合する。
In addition to H2PO4, other acids may be added to adjust the pH. The silicon alkoxide and/or its polycondensate and the aqueous solution are mixed using a stirrer or the like in order to make the resulting silica sol uniform.

生成したシリカゾルは手早くテフロン等をコーティング
した内面の滑らかな容器に移してゲル化させる。ゲル化
時には生成したゲルからのアルコールの蒸発を防ぐため
に容器を密封することが好ましく、ゲル化時の温度は室
温〜80°Cが好ましい。
The generated silica sol is quickly transferred to a container with a smooth inner surface coated with Teflon or the like and allowed to gel. During gelation, it is preferable to seal the container in order to prevent evaporation of alcohol from the generated gel, and the temperature during gelation is preferably room temperature to 80°C.

次にこのゲルを容器から取出しホルムアミド水溶液中に
浸漬してゲル中のアルコールをホルムアミド水溶液で置
換する。このホルムアミド水溶液にはH3BOaを含ん
でいてもよい。又アルカリ金属及び/又はアルカリ土類
金属の水溶性塩を含有させればこれらの金属を含有した
シリカガラスを得ることができる。前記ゲルを容器から
取出す作業はゲルからのアルコールの蒸発を防ぐために
、水槽中又はホルムアミド水溶液中で行なうのが好まし
い。ホルムアミド水溶液はホルムアミドを10Vol 
4以上含むものが好ましい。10Vol!%未満では置
換の円滑な進行が不十分である。置換の終ったゲルはホ
ルムアミド水溶液から取出し1表面の滑らかな皿等の上
に載せ空気中で乾燥し収縮固化させて乾燥ゲルとする。
Next, this gel is taken out from the container and immersed in an aqueous formamide solution to replace the alcohol in the gel with the aqueous formamide solution. This formamide aqueous solution may contain H3BOa. Furthermore, by incorporating water-soluble salts of alkali metals and/or alkaline earth metals, silica glass containing these metals can be obtained. The operation of removing the gel from the container is preferably carried out in a water bath or in an aqueous formamide solution in order to prevent evaporation of alcohol from the gel. Formamide aqueous solution contains formamide at 10 Vol.
Those containing 4 or more are preferred. 10 Vol! If it is less than %, smooth progress of substitution is insufficient. After the substitution, the gel is taken out from the formamide aqueous solution, placed on a plate with a smooth surface, dried in air, and solidified by shrinkage to form a dry gel.

乾燥は50〜60℃で速やかに行なえばHs BOsの
析出を防止できて好ましい。
Drying is preferably carried out quickly at 50 to 60°C, since this can prevent the precipitation of HsBOs.

(作用) シリカヒドロシルの硬化したゲルをホルムアミド水溶液
中に浸漬すると、ゲル中に含まれる蒸発速度の大きいメ
タノールのようなアルコールは。
(Function) When a hardened gel of silica hydrosil is immersed in an aqueous formamide solution, alcohols such as methanol contained in the gel have a high evaporation rate.

アルコールより蒸発速度の小さいホルムアミド水溶液と
置換されるので乾燥ゲルとなる過程でのクラックや割れ
を防止できる。またゲルの乾燥においては蒸発速度が小
さくなるから従来のように容器の中に入れてふたをする
必要もなく、むき出しのまま乾燥しても不具合は生じな
い。
Since it is replaced with an aqueous formamide solution that has a lower evaporation rate than alcohol, it is possible to prevent cracks and cracks during the process of forming a dry gel. In addition, when drying gel, the evaporation rate is low, so there is no need to put it in a container and cover it with a lid, as in the conventional case, and there is no problem even if it is dried in an exposed state.

(実施例) 本発明を実施例により説明する。(Example) The present invention will be explained by examples.

実施例1 シリコンテトラメトキシド(Si (0CH3)4 )
にツ0、5 mol/lのH3B 03を含む希塩酸(
0,1mol/l )水溶液を容積比で2:1の割合で
加えマグネチックスター・ラーで攪拌し不混和の2液か
ら均一なシリカゾルを得た。ゾルを直径9001111
のテフロンをコーティングしたガラスシャーレに入れ密
封し。
Example 1 Silicon tetramethoxide (Si(0CH3)4)
Dilute hydrochloric acid containing 0.5 mol/l of H3B03 (
0.1 mol/l) aqueous solution was added at a volume ratio of 2:1 and stirred with a magnetic stirrer to obtain a homogeneous silica sol from the two immiscible liquids. The diameter of the sol is 9001111
Place in a Teflon-coated glass petri dish and seal.

50℃に保ってゲル化した。ゲルが容器から離れたら水
槽中で開封してゲルを取出した。取出したゲルを0.1
 mo l / lのH3B Osを含む50voJ%
のホルムアミド水溶液に1晩浸漬した。ゲルを取り出し
、テフロンでコーティングしたなめらかな表面の皿上に
おいて空気中50℃で乾燥させ乾燥ゲルを得た。乾燥ゲ
ルには割れ、クラックは全くなかった。
It was kept at 50°C to form a gel. When the gel separated from the container, it was opened in a water tank and the gel was taken out. The removed gel was 0.1
50voJ% containing mol/l H3B Os
It was immersed in an aqueous formamide solution overnight. The gel was removed and dried in air at 50° C. on a smooth Teflon-coated dish to obtain a dry gel. There were no breaks or cracks in the dried gel.

実施例2 シリコンテトラメトキシドの重縮合体(CH30)3S
r (O8+ (OC)(3)2)nosi (QC)
(sン31(’=3に中心をもつもの)を原料に用いた
以外は実施例1と同じ方法によ“り製造した。得られた
乾燥ゲルには割れ、クラックは全くなかった。
Example 2 Silicon tetramethoxide polycondensate (CH30)3S
r (O8+ (OC) (3) 2) nosi (QC)
The gel was produced in the same manner as in Example 1 except that 31 (centered at '=3) was used as the raw material.The dried gel obtained had no cracks at all.

(発明の効果) 本発明によれば、ゲルの乾燥過程でクランクや割れの発
生が防止でき、モノリンツクな大形の乾燥ゲルが得られ
る。更にゲルをむき出しのまま乾燥できるので作業が容
易になる利点があるほか。
(Effects of the Invention) According to the present invention, it is possible to prevent the occurrence of cracks and cracks during the gel drying process, and a large monolink dried gel can be obtained. Another advantage is that the gel can be dried with it exposed, making the work easier.

ガラス中に8203を含有しているのでシリカ単独のガ
ラスよりも低い温度での焼結が可能となる。
Since the glass contains 8203, it can be sintered at a lower temperature than glass containing silica alone.

代理人 弁理士 若 林 邦 彦 −゛Agent Patent Attorney Kunihiko Wakabayashi −゛

Claims (1)

【特許請求の範囲】[Claims] 1、一般式Si(OR)_4(但しRはアルキル基)で
示されるシリコンアルコキシド及び/又はその重縮合物
を加水分解してシリカゾルとし、次いで放置してゲル化
し乾燥後焼結するシリカガラスの製法において、前記加
水分解をH_3BO_3を含む水溶液中で行ない、前記
乾燥前のゲルをホルムアミド水溶液に浸漬後取出し乾燥
することを特徴とするシリカガラスの製法。
1. Silicon alkoxide and/or its polycondensate represented by the general formula Si(OR)_4 (where R is an alkyl group) is hydrolyzed to form a silica sol, then left to gel, dried, and then sintered to produce silica glass. A method for producing silica glass, characterized in that the hydrolysis is carried out in an aqueous solution containing H_3BO_3, and the gel before drying is immersed in an aqueous formamide solution and then taken out and dried.
JP112886A 1986-01-07 1986-01-07 Preparation of silica glass Pending JPS62158123A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP112886A JPS62158123A (en) 1986-01-07 1986-01-07 Preparation of silica glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP112886A JPS62158123A (en) 1986-01-07 1986-01-07 Preparation of silica glass

Publications (1)

Publication Number Publication Date
JPS62158123A true JPS62158123A (en) 1987-07-14

Family

ID=11492805

Family Applications (1)

Application Number Title Priority Date Filing Date
JP112886A Pending JPS62158123A (en) 1986-01-07 1986-01-07 Preparation of silica glass

Country Status (1)

Country Link
JP (1) JPS62158123A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01201034A (en) * 1988-02-04 1989-08-14 Nippon Sheet Glass Co Ltd Production of glass article

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01201034A (en) * 1988-02-04 1989-08-14 Nippon Sheet Glass Co Ltd Production of glass article

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