JPS6215082A - Base material of buff - Google Patents

Abstract

PURPOSE:To ensure the polishing property and the brightening property in the captioned base material, by specifying the single yarn denier of lints and staples in the regenerated cellulose fibers produced by the viscose method. CONSTITUTION:In the regenerated cellulose fibers of a buff base material, the single yarn denier of lints and staples is maintained from above 3d to below 40d so as to add the predetermined polishing property and brightening property to the buff base material. The thread thickness of this fibers is specified from above 100d (5.31s) to below 1,000d (5.3s) and, using said fibers, the buff base material are woven in the warp density of 45 pieces/inch - 80 pieces/inch and the weft density of 45 pieces/inch - 90 pieces/inch so that it is possible to reduce the end breakage in weaving so as to improve the dignity and the quality of the buff base material while reduce the fray in buff-polishing.

Description

[Detailed Description of the Invention] <Industrial Application Field> The present invention relates to a buff (separate cloth) used for buff polishing performed for polishing solid surfaces, mainly metal surfaces, and is applicable to the field of metal polishing. It is used in

<Prior art> Buff polishing uses a buff (separate cloth) made of a flexible material such as cloth or leather as a rotating body, which is rotated at high speed to reduce the pressure generated between the buff and the workpiece. This is a method of mechanically processing the surface of metal or non-metal. At this time, in order to increase the polishing efficiency, the abrasive material (abrasive grains) is fixed to the outer circumferential surface of the buff with T-glue, or the abrasive material (abrasive grains) is temporarily held on the outer circumferential surface of the buff by an appropriate medium. It is also sometimes used.

Buff polishing is different from precision machining and super finishing, and is generally performed not for the purpose of dimensional accuracy but mainly for obtaining a smooth or matte surface. Moreover, since these can easily and quickly achieve their objectives, their application fields are wide-ranging.

The buff used for buffing is axially symmetrical so that flexible materials such as cloth and leather can be rotated.

Various flexible materials are used as the base material for the body of the buff, but the most commonly used material is cotton, followed by sisal and felt.

They are used in the cleaning and buffing processes, in order of leather, etc.

Buffing usually involves two steps: rough polishing and finish polishing. Rough polishing requires polishing power, and finish polishing requires gloss development power.

<Problems to be solved by the invention> In these conventional buffing materials, sisal fibers are coarse and hard, so it is suitable for rough polishing that requires abrasive power, but it is suitable for rough polishing that requires high polishing power, but It is unsuitable for final polishing as it produces a lot of scratches. Also, although cotton, felt, and leather have the ability to develop luster, their abrasive power is low, and only the finishing abrasive trap can be used.

<Means for Solving the Problems> The present inventors have discovered that fibers made by the viscose method, unlike other cellulose fibers, have a dense layer called a skin layer on the surface, which causes less wear. If the single yarn denier becomes thick, the fiber becomes rigid, and when the centrifugal force from rotation is added to this, it becomes very hard and has good abrasive power. However, if the single yarn denier is small, the fiber becomes stiff. The hardness of the conventional product has been improved by taking into consideration physical properties such as the fact that the hardness of the filament is reduced and the surface is rubbed appropriately, resulting in good gloss development, and that the flatness ratio of the filament affects the abrasive force and gloss development. We achieved an effective improvement over conventional products by harmonizing the antinomic relationship between polishing power and gloss development.

That is, the present invention provides long and short fibers of recycled cellulose fibers made by the viscose method, with a single yarn denier of 3 d or more and 40 d or less, and a yarn thickness of 100 d (53's) or more and 1,000 d or more.
The defects of the conventional product were improved by using a fabric woven with yarns having a diameter of d (5,3's) or less at a warp of 45 to 80 yarns/inch and a weft of 45 to 90 yarns/inch.

<Example> The regenerated cellulose fiber made by the viscose method constituting the present invention has a skin layer on the surface and has appropriate hardness. Also, since the surface has irregularities, it can be used as an abrasive (abrasive grain).
is easy to hold or support.

If the single filament denier of the regenerated filament long fibers and short fibers made by the viscose method that make up the fabric is large, abrasive power will be produced, but the ability to develop gloss will be poor. In other words, if the denier of the single filaments constituting the fibers is large, the polishing power will be high, but the gloss development power will be poor. On the other hand, if the single yarn denier is small, gloss development ability is achieved, but polishing ability is inferior.

Single yarn denier is 3 for both abrasive power and gloss development ability.
Denier or more and 40 denier or less, preferably between 6 denier and 15 denier, as shown in the table below.

Regarding the aspect ratio, it was experimentally found that the larger the aspect ratio (major axis/minor axis) is, the greater the machinability, so even thick and durable filaments have the ability to develop gloss. In addition, short fiber spun yarn is more flexible than multifilament yarn even when the same filament is used, so when the single yarn denier, yarn thickness, and flattening ratio are the same, short woven yarn has better luster development than multifilament yarn. However, in terms of durability, the short woven yarn was inferior to the mulch yarn due to fiber shedding due to its yarn structure. Fabric density is related to fraying during buffing and fabric quality. Thread thickness is 100 d (53'
g) ~ 1000d (5,3's) thread, warp,
If the weft density is less than 45 lines/inch, #1 wear during polishing will be large and it cannot be used. Longitudinal density: 80 lines/inch, latitudinal density: 90
When the number of yarns per inch exceeded, yarn breakage occurred frequently during weaving, knots increased, and the quality and quality of the fabric deteriorated significantly.

Example 1: Regenerated fibrin fiber long fiber 60 by viscose method
0 denier/100 filament (single yarn denier 6 denier, oblateness ratio, 1) as warp, 450 denier/30 filament (single yarn denier 15 denier, oblateness ratio, 20)
) was used as the weft and woven into a plain weave. The density at this time is 5
The number of threads was 5 per inch, and the number of wefts was 50 per inch. This fabric was made into a bias, cut into circles with a diameter of 350 mm, and 16 pieces were combined to make a buff.

Polishing was performed using this under the following conditions, and good results were obtained in both polishing power and gloss development power.

Polished object: Stainless steel (5US304) Rotation speed: 2000 rpm Load: 8 kg Abrasive material: Blue bar -1 (chromium oxide powder hardened with oil) No fraying occurred during polishing. Furthermore, the durability was good.

Example 2: 20 short fibers of regenerated cellulose fibers made by the piscose method
'5 (266d) (Single yarn denier 2 denier.

It was woven into a plain weave using 30'a (177d) (single yarn denier 1.5 denier-' - Ippei ratio 1) as the warp and the weft with an aspect ratio of 1). The density at this time was 74 warps/inch and 83 latitudes/inch. A buff was made using this fabric and polished under the same conditions as the previous example.

The gloss development ability was good, but the polishing ability was poor.

There was no fraying, but the durability was as good as before.

It was inferior to those using long fibers.

From the above disclosure, if the aspect ratio is appropriately selected (10 to 20), a product with both durability and glossiness can be obtained, and if short fiber spun yarn is used, a thick denier filament with high abrasion resistance can be obtained. It will be obvious to those skilled in the art that even if a relatively rigid filament with a small aspect ratio is used, high gloss development can be achieved.

<Operation and Effect of the Invention> Because of the single yarn denier of 3 d to 40 d, it has both abrasive power and gloss development ability, and also has the thread thickness and density of the present invention, so it does not impede weavability and can be easily buffed. This material has the necessary fraying prevention ability as a base material, and it has become possible to provide a buffing material that completely satisfies the requirements for polishing power and gloss development ability using the same material.

Claims (1)

[Claims] 1. The single yarn denier of the recycled cellulose fiber filament made by the viscose method is 3 deniers or more and 40 deniers or less, and the yarn thickness is 100 d (53's) or more and 1,000 d (5.
3's) or less, with a warp density of 45 threads/inch or more 8
0 lines/inch or less, latitude density 45 lines/inch or more 90 lines/
Buff base material woven with less than an inch. 2. The buffing base material according to claim 1, which uses flat cross-section filaments of recycled cellulose fibers.