JPS62148569U - - Google Patents
Info
- Publication number
- JPS62148569U JPS62148569U JP3454886U JP3454886U JPS62148569U JP S62148569 U JPS62148569 U JP S62148569U JP 3454886 U JP3454886 U JP 3454886U JP 3454886 U JP3454886 U JP 3454886U JP S62148569 U JPS62148569 U JP S62148569U
- Authority
- JP
- Japan
- Prior art keywords
- etching
- end point
- reaction vessel
- quartz glass
- point detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 238000001020 plasma etching Methods 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3454886U JPS62148569U (enExample) | 1986-03-12 | 1986-03-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3454886U JPS62148569U (enExample) | 1986-03-12 | 1986-03-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62148569U true JPS62148569U (enExample) | 1987-09-19 |
Family
ID=30843206
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3454886U Pending JPS62148569U (enExample) | 1986-03-12 | 1986-03-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62148569U (enExample) |
-
1986
- 1986-03-12 JP JP3454886U patent/JPS62148569U/ja active Pending