JPS62145325U - - Google Patents
Info
- Publication number
- JPS62145325U JPS62145325U JP3208386U JP3208386U JPS62145325U JP S62145325 U JPS62145325 U JP S62145325U JP 3208386 U JP3208386 U JP 3208386U JP 3208386 U JP3208386 U JP 3208386U JP S62145325 U JPS62145325 U JP S62145325U
- Authority
- JP
- Japan
- Prior art keywords
- side end
- reaction chamber
- exhaust side
- exhaust
- tip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3208386U JPH087625Y2 (ja) | 1986-03-05 | 1986-03-05 | 減圧ｃｖｄ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3208386U JPH087625Y2 (ja) | 1986-03-05 | 1986-03-05 | 減圧ｃｖｄ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62145325U true JPS62145325U (cs) | 1987-09-12 |
| JPH087625Y2 JPH087625Y2 (ja) | 1996-03-04 |
Family
ID=30838413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3208386U Expired - Lifetime JPH087625Y2 (ja) | 1986-03-05 | 1986-03-05 | 減圧ｃｖｄ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH087625Y2 (cs) |
-
1986
- 1986-03-05 JP JP3208386U patent/JPH087625Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH087625Y2 (ja) | 1996-03-04 |