JPS62128410A - Hot cathode parts - Google Patents
Hot cathode partsInfo
- Publication number
- JPS62128410A JPS62128410A JP60267843A JP26784385A JPS62128410A JP S62128410 A JPS62128410 A JP S62128410A JP 60267843 A JP60267843 A JP 60267843A JP 26784385 A JP26784385 A JP 26784385A JP S62128410 A JPS62128410 A JP S62128410A
- Authority
- JP
- Japan
- Prior art keywords
- group
- hot cathode
- carbide
- boride
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
- Solid Thermionic Cathode (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、真空蒸着に用いるイオン源の熱陰極部品に
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] This invention relates to a hot cathode component of an ion source used for vacuum evaporation.
この発明は、金属等の基材に金属化合物液Ｈを施し、長
時間動作を可能とした熱陰極に関するものである。The present invention relates to a hot cathode that can be operated for a long time by applying a metal compound liquid H to a base material such as metal.
従来、第２図に示すように、電子銃の熱電子発生源であ
る熱陰極は、タングステンを材料とし、フィラメント形
状の熱陰ｐｉｔが使用されていた。Conventionally, as shown in FIG. 2, a filament-shaped hot cathode pit made of tungsten has been used as a hot cathode, which is a source of thermionic electrons in an electron gun.
しかし、従来の電子ビーム型加熱源は、イオンブレーテ
ィングのように、プラズマ密度の高い状態で使用すると
、イオン衝撃を受けてフィラメント１が融解、切断され
て、その寿命が著しく短くなるという欠点があった。However, when conventional electron beam heating sources are used in a state of high plasma density, such as in ion blating, the filament 1 is melted and cut by ion bombardment, resulting in a significantly shortened lifetime. there were.
そこで、この発明は従来のこのような欠点を解決するた
め、イオン衝撃に対して、抵抗力の強い熱陰極を得るこ
とを目的としている。Therefore, in order to solve these conventional drawbacks, the present invention aims to provide a hot cathode that is highly resistant to ion bombardment.
上記問題点を解決するためにこの発明は、熱陰極に、■
１族、■、族又はり、の炭化物又はホウ化素被膜を施し
耐イオン衝撃性を高めるようにした。In order to solve the above problems, this invention provides a hot cathode with:
A carbide or boride coating of Group 1, ■, Group or Poly was applied to improve ion impact resistance.
上記のように構成された熱陰極を使用すると希ガスによ
るスパッタリング率が減少し、酸素との反応も起こりに
くくなるため、動作時間を増加することが出来るのであ
る。When a hot cathode configured as described above is used, the sputtering rate due to rare gas is reduced and reaction with oxygen becomes less likely to occur, so that the operating time can be increased.
以下にこの発明を実施例に基づいて説明する。 The present invention will be explained below based on examples.
実施例１
タングステンを熱陰極の第２図におけるフィラメントｌ
として加工し、イオンブレーティング装置に配置する。Example 1 Tungsten was used as the filament l of the hot cathode in Figure 2.
and placed in an ion blating device.
イオンブレーティング装置をＩ Ｘ １０−’Ｔｏｒｒ
に排気後アルゴンガスをＩ Ｘ ｌ Ｏ−”Ｔｏｒｒ導
入し、直流５００Ｖの電圧を印加してボンバードを行う
。Ion blating device at I x 10-'Torr
After exhausting, argon gas was introduced at IXlO-'' Torr, and bombardment was performed by applying a DC voltage of 500 V.
続いてＴｉを電子ビーム加熱で蒸発させ、さらにアセチ
レンガスを５ Ｘ １０−’Ｔｏｒｒ導入し、Ｔｉと反
応させフィラメント１の上に第１図における金属化合物
被膜２として、ＴｉＣを３μｍの厚みで形成する。上記
の方法で形成したフィラメントは、Ｎ２ガスＩ Ｘ １
０−”Ｔｏｒｒ、電子銃入力電圧ＩＱｋＶ、２００ｍＡ
のイオンブレーティング条件で、電子銃の陰極として使
用したところ２００時間使用可能であった。これに対し
、従来のタングステンフィラメントは３０時間で中央部
が融解した。Next, Ti was evaporated by electron beam heating, and acetylene gas was introduced at 5 x 10-'Torr to react with Ti, forming TiC with a thickness of 3 μm as metal compound coating 2 in FIG. 1 on filament 1. do. The filament formed by the above method is N2 gas I
0-”Torr, electron gun input voltage IQkV, 200mA
When used as an electron gun cathode under ion blating conditions, it could be used for 200 hours. In contrast, the center of the conventional tungsten filament melted in 30 hours.
実施例２
第３図に示す。 ｃ ｔ〕ｙｌ電ｒ銃のＴａパイプ３に
温度１ ０ ０ ０ ’Ｃ，Ｔｉｃｌ、 流星 １
０ ０ ｍｎ／ｍ１ｎＣ２１１２’ＬＡ’＄ １
００ ｍｌ！／ｍｉｎの条件下でＴ ｉ Ｃ＞ａ １２
をＣＶＤ法により１０μｍの厚みに形成する。Example 2 Shown in FIG. c t]yl Electric gun's Ta pipe 3 has a temperature of 1 0 0 0'C, Ticl, Meteor 1
0 0 mn/m1nC2112'LA'$ 1
00ml! /min T i C>a 12
is formed to a thickness of 10 μm using the CVD method.
（第４図に示ず）次にこの？ＡＦＳ２処理を作ったＴａ
パイプを、Ｎ２流１５００ ｍｌ／ｍｉｎ、 ＨＣＤ型
電子銃入力電圧３０Ｖ、電流２００Ａの条件下でイオン
ブレーティング用熱陰極として使用したところ、１５０
時間使用可能であった。これに対し、従来のＴａパイプ
は２０時間で先端部分が融解し、使用不能となった。(Not shown in Figure 4) Next, this? Ta who created AFS2 processing
When the pipe was used as a hot cathode for ion blating under the conditions of N2 flow of 1500 ml/min, HCD type electron gun input voltage of 30 V, and current of 200 A, 150
Time was available. In contrast, the tip of the conventional Ta pipe melted in 20 hours, making it unusable.
上記実施例の他にも、Ｎ１族、■□族及びり。In addition to the above examples, the N1 group, the ■□ group, and the like.
の炭化物、ホウ化物において同様な、長寿命化の効果が
見られた。A similar effect of longer life was observed in carbides and borides.
この発明は、以上説明したように、熱陰極の表面に金属
化合物の被膜処理を施すことにより、熱陰極の使用時間
を延長する効果がある。As explained above, the present invention has the effect of extending the usage time of the hot cathode by applying a coating treatment with a metal compound to the surface of the hot cathode.
第１図は、この発明にかかる電子ビーム加熱蒸発源の陰
極部品閲、第２図は、従来の電子ビーム加熱薄光源の陰
極部品図、第３図は、従来のＨＣＤ型電子ビーム加熱暴
発源の中空加熱陰極部品図、第４図は、この発明にかか
る陰極部品図である。
ｌ・・・フィラメント基材
２・・・金属化合物被膜
３・・・Ｔａパイプ
４・・・金属化合物被膜
以上Fig. 1 is a view of the cathode parts of the electron beam heating evaporation source according to the present invention, Fig. 2 is a view of the cathode parts of the conventional electron beam heating thin light source, and Fig. 3 is a view of the cathode parts of the conventional HCD type electron beam heating evaporation source. FIG. 4 is a diagram of a hollow heating cathode component according to the present invention. l...Filament base material 2...Metal compound coating 3...Ta pipe 4...Metal compound coating or more
Claims (1)
Ｌ＿ａの炭化物又はホウ化物からなる被膜層を形成した
ことを特徴とする熱陰極部品。A hot cathode component characterized in that a coating layer made of a carbide or boride of IV_a group, V_a group, or L_a group is formed on a metal or a heat-resistant conductive base material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60267843A JPS62128410A (en) | 1985-11-28 | 1985-11-28 | Hot cathode parts |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60267843A JPS62128410A (en) | 1985-11-28 | 1985-11-28 | Hot cathode parts |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62128410A true JPS62128410A (en) | 1987-06-10 |
Family
ID=17450394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60267843A Pending JPS62128410A (en) | 1985-11-28 | 1985-11-28 | Hot cathode parts |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62128410A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0422622A (en) * | 1990-05-17 | 1992-01-27 | Ngk Insulators Ltd | Composite material having boride coating layer |
| JPH0464311A (en) * | 1990-07-03 | 1992-02-28 | Kokuyo Co Ltd | Housing furniture |
-
1985
- 1985-11-28 JP JP60267843A patent/JPS62128410A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0422622A (en) * | 1990-05-17 | 1992-01-27 | Ngk Insulators Ltd | Composite material having boride coating layer |
| JPH0464311A (en) * | 1990-07-03 | 1992-02-28 | Kokuyo Co Ltd | Housing furniture |
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