JPS62124848U - - Google Patents
Info
- Publication number
- JPS62124848U JPS62124848U JP214786U JP214786U JPS62124848U JP S62124848 U JPS62124848 U JP S62124848U JP 214786 U JP214786 U JP 214786U JP 214786 U JP214786 U JP 214786U JP S62124848 U JPS62124848 U JP S62124848U
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- wafer carrier
- grooves
- rotation axis
- registration request
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 claims description 8
- 235000012431 wafers Nutrition 0.000 claims 2
- 239000004677 Nylon Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
Landscapes
- Cleaning In General (AREA)
Description
第１図Ａは本考案の洗浄ブラシの側面図である
。第１図Ｂは本考案の洗浄ブラシの断面図である
。第１図Ｃはウエハキヤリアにセツトされた本考
案の洗浄ブラシの上面図である。第１図Ｄは第１
図ＣのＤ―Ｄ′線の断面図である。第２図Ａは従
来の洗浄ブラシの側面図である。第２図Ｂは従来
の洗浄ブラシの断面図である。第２図Ｃは従来の
洗浄ブラシの使用後を示す図である。
１……ナイロン線、２……ベース、３……キヤ
リア、４……溝突端部、５……モータ部、６……
把手。
FIG. 1A is a side view of the cleaning brush of the present invention. FIG. 1B is a sectional view of the cleaning brush of the present invention. FIG. 1C is a top view of the cleaning brush of the present invention set in the wafer carrier. Figure 1 D is the first
FIG. 3 is a sectional view taken along line DD' in FIG. FIG. 2A is a side view of a conventional cleaning brush. FIG. 2B is a sectional view of a conventional cleaning brush. FIG. 2C is a diagram showing the conventional cleaning brush after use. 1... Nylon wire, 2... Base, 3... Carrier, 4... Groove tip, 5... Motor part, 6...
handle.
Claims (1)
キヤリアを洗浄する装置において、回転可能な円
筒の周辺に設けられたブラシが、回転軸の方向に
長い部分と短い部分とに交互に形成されているこ
とを特徴とする洗浄装置。 In an apparatus for cleaning a wafer carrier in which a plurality of grooves are formed to support wafers, a brush provided around a rotatable cylinder is formed into long parts and short parts alternately in the direction of the rotation axis. A cleaning device characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP214786U JPS62124848U (en) | 1986-01-11 | 1986-01-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP214786U JPS62124848U (en) | 1986-01-11 | 1986-01-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62124848U true JPS62124848U (en) | 1987-08-08 |
Family
ID=30780711
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP214786U Pending JPS62124848U (en) | 1986-01-11 | 1986-01-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62124848U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03156925A (en) * | 1989-11-15 | 1991-07-04 | Ebara Corp | Method and apparatus for precision cleaning of wafer carrier |
-
1986
- 1986-01-11 JP JP214786U patent/JPS62124848U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03156925A (en) * | 1989-11-15 | 1991-07-04 | Ebara Corp | Method and apparatus for precision cleaning of wafer carrier |