JPS6212180A - Semiconductor laser device - Google Patents

Semiconductor laser device

Info

Publication number
JPS6212180A
JPS6212180A JP15075285A JP15075285A JPS6212180A JP S6212180 A JPS6212180 A JP S6212180A JP 15075285 A JP15075285 A JP 15075285A JP 15075285 A JP15075285 A JP 15075285A JP S6212180 A JPS6212180 A JP S6212180A
Authority
JP
Japan
Prior art keywords
layer
blocking layer
laser
electrode
active layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15075285A
Other languages
Japanese (ja)
Inventor
Takashi Sugino
隆 杉野
Akio Yoshikawa
昭男 吉川
Masanori Hirose
広瀬 正則
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP15075285A priority Critical patent/JPS6212180A/en
Publication of JPS6212180A publication Critical patent/JPS6212180A/en
Pending legal-status Critical Current

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  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To use a P-N junction between a current blocking layer and a clad layer as a photodetector by forming an ohmic electrode to the blocking layer while being separated from an electrode for injecting currents to a laser. CONSTITUTION:An electrode 9 is connected to positive electricity and an electrode 8 to negative electricity, and a bias is applied. Currents flow through an active layer 3 just under a window section for a blocking layer 5, and a laser oscillates in the active layer 3. Beams in the active layer 3 in the lower section of the blocking layer 5 are absorbed to the blocking layer 5 at that time, thus oscillating the laser at a stable fundamental lateral mode in a section just under the window section for the blocking layer 5. One part of photons in the active layer 3 is absorbed by the blocking layer 5, thus leading out the signal of the absorbed photons between electrodes 8 and 10. That is, a reverse bias is applied to a P-N junction between the blocking layer 5 and a P-type clad layer 4 through a resistor, thus operating the P-N junction as a photodetector, then making the P-N junction to fill the same role as a photodetector which has been fitted to the rear of a laser diode.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は光通信用光源やコンパクトディスク用光源に用
いることができる半導体レーザ装置に関するものである
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a semiconductor laser device that can be used as a light source for optical communications or a light source for compact discs.

従来の技術 従来、半導体レーザを用いる際、一定光出力を得るため
には、レーザの後方より出射する光を受光素子で検知し
、その信号をレーザの駆動回路へフィードバックするい
わゆるムPC(ムutomlticPower Con
trol)動作を行なう方法がとられる。
Conventional Technology Conventionally, when using a semiconductor laser, in order to obtain a constant optical output, a so-called Mutomltic Power (PC) is used, which detects the light emitted from the rear of the laser with a light receiving element and feeds the signal back to the laser drive circuit. Con
trol) action is taken.

このためにはレーザテップの後方に受光素子をボンディ
ングし、レーザ光を検知するように配置しなければなら
ない。
For this purpose, a light receiving element must be bonded behind the laser tip and placed so as to detect the laser beam.

発明が解決しようとする問題点 上記のようにレーザと受光素子を配置するに当ってレー
ザ端面を高反射率にコーティングすると後方に取り出さ
れる光出力が減少するため、受光素子の検知電流が小さ
くなり人pc動作が困難となる。又、裏面高反射率コー
ティングによるレーザの高出力化ができなくなる。その
上、レーザ後方に受光素子を配置した場合、受光素子表
面からの反射光がレーザに戻ると発振光の縦モードを不
安定にするという問題点を有している。
Problems to be Solved by the Invention As mentioned above, when arranging the laser and the light receiving element, if the laser end face is coated with a high reflectance, the light output extracted to the rear will be reduced, and the detection current of the light receiving element will be reduced. It becomes difficult for people to operate their PC. Furthermore, it becomes impossible to increase the output of the laser by coating the back surface with high reflectance. Furthermore, when the light receiving element is placed behind the laser, there is a problem in that when the reflected light from the surface of the light receiving element returns to the laser, the longitudinal mode of the oscillated light becomes unstable.

本発明は上記問題点に鑑み、受光素子をレーザ後方に配
置することなくムPC動作を行なうことのできる半導体
レーザ装置を提供するものである。
In view of the above-mentioned problems, the present invention provides a semiconductor laser device that can perform a PC operation without disposing a light receiving element behind the laser.

問題点を解決するための手段      、上記問題点
を解決するために、本発明の半導体レーザ装置は、−導
電型の半導体基板上に活性層を含むダブルヘテロ構造が
形成され、前記ダブルヘテロ構造の上に前記活性層の禁
止帯以下の禁止帯を有しストライプ状の窓をそなえた前
記基板と同一導電型の層が形成され、前記ストライプ状
窓より電流を注入するための電極と、前記ストライプ状
窓をそなえた層の上に設けられたオーミック電極とが設
けられて構成されている。
Means for Solving the Problems In order to solve the above problems, a semiconductor laser device of the present invention includes a double heterostructure including an active layer formed on a -conductivity type semiconductor substrate, and a double heterostructure including an active layer. A layer having the same conductivity type as the substrate and having a forbidden band equal to or less than the forbidden band of the active layer and having a striped window is formed thereon, and an electrode for injecting current through the striped window, and The structure includes an ohmic electrode provided on a layer provided with shaped windows.

作用 この構成によって、ストライプ状をそなえた層と、活性
層の上のクラッド層との間のpn接合に、逆バイアスを
印加することにより、活性層内で発生した光を検出する
ことができる。
Operation With this configuration, light generated within the active layer can be detected by applying a reverse bias to the pn junction between the striped layer and the cladding layer above the active layer.

実施例 以下に本発明の実施例について、図面を参照しながら説
明する。
Examples Examples of the present invention will be described below with reference to the drawings.

動因は本発明の一実施例における半導体レーザ装置を示
すものである。1はn型G&ムS基板、2はn聖人l 
X Ga1−1A sクラッド層、3はノンドープA%
Ga、 yAs活性層、4はp聖人l)(’cal−X
’AS層クラッド層であり、キャリアおよび光を活性層
3に閉じ込める働きをする。5は活性層への注入電流領
域を制限するn型GaAs電流ブロック層、6はクラッ
ド層4と同様のp聖人nx’Ga1z’ムSクラッド層
、7はオーミック電極形成用のp型GaAs層、8は基
板側に設けたオーミック電極、9は活性層3へ電流を注
入するためのオーミック電極、1oはブロッキング層5
にバイアスをかけるため′のオーミック電極である。
The driving factor shows a semiconductor laser device in one embodiment of the present invention. 1 is n-type G & M S board, 2 is n-sent l
X Ga1-1A s cladding layer, 3 is non-doped A%
Ga, yAs active layer, 4 is p Saint l) ('cal-X
'AS layer This is a cladding layer and functions to confine carriers and light in the active layer 3. Reference numeral 5 indicates an n-type GaAs current blocking layer that limits the region of current injected into the active layer, 6 indicates a p-type nx'Ga1z' S cladding layer similar to the cladding layer 4, and 7 indicates a p-type GaAs layer for forming an ohmic electrode. 8 is an ohmic electrode provided on the substrate side, 9 is an ohmic electrode for injecting current into the active layer 3, and 1o is a blocking layer 5
This is an ohmic electrode for applying a bias to.

クラッド層2の厚さは2μm、活性層3の厚さは0.1
μm、クラッド層4の厚さは0.3μm、クラッド層6
の厚さは2μm、ブロッキング層6の厚さは1.6μm
であり、その窓幅は上部、下部それぞれ6μm、  3
μmである。p型0&人S層7の厚さは0.5μmであ
る。
The thickness of the cladding layer 2 is 2 μm, and the thickness of the active layer 3 is 0.1 μm.
μm, the thickness of cladding layer 4 is 0.3μm, cladding layer 6
The thickness of the blocking layer 6 is 2 μm, and the thickness of the blocking layer 6 is 1.6 μm.
The window width is 6 μm at the top and bottom, respectively, 3
It is μm. The thickness of the p-type 0&S layer 7 is 0.5 μm.

以上のように構成された半導体レーザについて、その動
作を説明する。
The operation of the semiconductor laser configured as described above will be explained.

先ず、電極9を正、電極8を負に接続し、)(イアスな
かける。ブロッキング層6の窓部直下の活性層3に電流
が流n1活性層3でレーザ発振が起こる。この時、ブロ
ッキング層5の下方の活性層3内の光はブロッキング層
5に吸収されるため、発振はブロッキング層6窓部直下
において安定な基本横モードで行なわれる。
First, the electrode 9 is connected to the positive terminal, and the electrode 8 is connected to the negative terminal. Since the light in the active layer 3 below the layer 5 is absorbed by the blocking layer 5, oscillation occurs in a stable fundamental transverse mode directly under the window portion of the blocking layer 6.

活性層3内のフォトンの一部はブロッキング層5で吸収
されるため、電極8,10間で、この吸収されたフォト
ンの信号を取り出すことができる。
Since some of the photons in the active layer 3 are absorbed by the blocking layer 5, a signal of the absorbed photons can be extracted between the electrodes 8 and 10.

すなわち、ブロック層6とp型クラッド層40間のpn
接合に抵抗を介して逆バイアスを印加することにより、
上記pn接合を光検出器として動作させることができ、
従来、レーザダイオードの後方に付けられた光検知器と
同様の役をなすことになる。
That is, pn between the block layer 6 and the p-type cladding layer 40
By applying a reverse bias through a resistor to the junction,
The pn junction can be operated as a photodetector,
It serves the same purpose as a conventional photodetector attached to the rear of a laser diode.

さらに、レーザキャビティー後面をコーティングにより
、反射率を100%まで上げることにより、APC動作
可能な高出力レーザが得られる。
Furthermore, by increasing the reflectance to 100% by coating the rear surface of the laser cavity, a high-output laser capable of APC operation can be obtained.

なお、実施例ではGaAs −Ga人1AS系を材料と
したが、この材料に限定されるものではな(Inp−I
nGaAsPをはじめすべてのm−v、m−■族半導体
およびそれらの混晶で上記機能を有するものであればな
んでもよい。又、ブロック層5の電極部分はレーザ発振
部の片側でもよく、電極形状も任意に決めることができ
る。電極9と電極10の分離には電極間に絶縁膜を使う
こともできる。
In the examples, GaAs-Ga 1AS material was used, but the material is not limited to this material (Inp-I
Any m-v, m-■ group semiconductor, including nGaAsP, and their mixed crystals may be used as long as they have the above-mentioned functions. Further, the electrode portion of the block layer 5 may be provided on one side of the laser oscillation section, and the shape of the electrode may be arbitrarily determined. An insulating film can also be used between the electrodes to separate the electrodes 9 and 10.

発明の効果 以上のように本発明はレーザへの電流注入用電極と分離
して電流ブロッキング層にオーミック電極を設けること
により、ブロッキング層とクラッド層の間のpn接合を
光検知器とすることができ、その実用的効果は犬なるも
のがある。
Effects of the Invention As described above, the present invention provides an ohmic electrode in the current blocking layer separate from the electrode for current injection into the laser, thereby making it possible to use the pn junction between the blocking layer and the cladding layer as a photodetector. It is possible, and its practical effects are similar to that of a dog.

【図面の簡単な説明】[Brief explanation of the drawing]

転回は本発明の実施例における半導体レーザ装置の斜視
図である。 1−−−−・−n−GaAs基板、2”・”・n  A
JzGal−xA!i、3・・・・・・ノンドープ人1
7G& + yAs活性層、4・・・・・・P −11
1’ Ga 、  !’人s  、  6i−・−−−
n −GaAs  、6−−−−−−P−Alz’Ga
+  z’ムS17・・・・・・P−GaAS、8.1
0・・・・・・n型オーミック電極、9・・・・・・p
型オーミック電極。
Turning is a perspective view of a semiconductor laser device in an embodiment of the present invention. 1-----・-n-GaAs substrate, 2"・"・n A
JzGal-xA! i, 3...Non-dope person 1
7G&+yAs active layer, 4...P-11
1' Ga, ! 'person s, 6i---・---
n-GaAs, 6----P-Alz'Ga
+z'muS17...P-GaAS, 8.1
0...n-type ohmic electrode, 9...p
type ohmic electrode.

Claims (1)

【特許請求の範囲】[Claims] 一導電型の半導体基板上に活性層を含むダブルヘテロ構
造が形成され、前記ダブルヘテロ構造の上に前記活性層
の禁止帯幅以下の禁止帯幅を有しストライプ状の窓をそ
なえた前記基板と同一導電型の層が形成され、前記スト
ライプ状窓より電流を注入するための電極と、前記スト
ライプ状窓をそなえた層の上に設けられたオーミック電
極を有することを特徴とする半導体レーザ装置。
A double heterostructure including an active layer is formed on a semiconductor substrate of one conductivity type, and the substrate is provided with a striped window having a forbidden band width equal to or less than the forbidden band width of the active layer on the double heterostructure. A semiconductor laser device characterized in that a layer of the same conductivity type is formed, and has an electrode for injecting current from the striped window, and an ohmic electrode provided on the layer having the striped window. .
JP15075285A 1985-07-09 1985-07-09 Semiconductor laser device Pending JPS6212180A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15075285A JPS6212180A (en) 1985-07-09 1985-07-09 Semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15075285A JPS6212180A (en) 1985-07-09 1985-07-09 Semiconductor laser device

Publications (1)

Publication Number Publication Date
JPS6212180A true JPS6212180A (en) 1987-01-21

Family

ID=15503639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15075285A Pending JPS6212180A (en) 1985-07-09 1985-07-09 Semiconductor laser device

Country Status (1)

Country Link
JP (1) JPS6212180A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58114479A (en) * 1981-12-26 1983-07-07 Fujitsu Ltd Semiconductor light emitting device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58114479A (en) * 1981-12-26 1983-07-07 Fujitsu Ltd Semiconductor light emitting device

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