JPS62116795A - Production of nickel plated material - Google Patents
Production of nickel plated materialInfo
- Publication number
- JPS62116795A JPS62116795A JP25492885A JP25492885A JPS62116795A JP S62116795 A JPS62116795 A JP S62116795A JP 25492885 A JP25492885 A JP 25492885A JP 25492885 A JP25492885 A JP 25492885A JP S62116795 A JPS62116795 A JP S62116795A
- Authority
- JP
- Japan
- Prior art keywords
- bright
- nickel plating
- annealing
- nickel
- stainless steel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
(目 的)
本発明は、オーステナイト系ステンレス鋼上に光沢良好
でかつ加工性良好な半光沢ニッケルめっき又は光沢ニッ
ケルめっきを施すニッケルめっき材の製造方法に関する
。DETAILED DESCRIPTION OF THE INVENTION (Objective) The present invention relates to a method for producing a nickel-plated material in which semi-bright nickel plating or bright nickel plating with good gloss and workability is applied to austenitic stainless steel.
(従来技術)
ステンレス鋼は、それ自体耐食性に富んでいるので耐食
性を改善する目的のためにめっきを施す必要はほとんど
ないが9表面を美麗にする装飾の目的やはんだ付は性、
を改善したり、あるいは接触抵抗を改善したりする等の
ためにめっきを施す場合がある。(Prior art) Stainless steel itself is highly corrosion resistant, so there is almost no need to plate it to improve its corrosion resistance.
Plating may be applied to improve contact resistance or to improve contact resistance.
その例として、リチウム電池のケースや太陽電池基板が
ある。リチウム電池のケースは加呈性に富むことが要求
され、深絞り加工を受けた際にクラックや肌荒れが生じ
ないこと、接触抵抗が小さく光沢があって外観にも優れ
ていることが要求されている。また、太陽電池基板では
表面の平滑性及び光沢性が優れており、さらに微小な欠
陥やピット等が存在しないことが必要とされている。こ
のようなことから上記のようなリチウム電池のケースや
太陽電池の基板にニッケルめっきを施すことが提案され
ている。一方ニッケルめっきの適用を考慮すると、半光
沢あるいは光沢ニッケルめっきで析出したニッケルの結
晶は、一般的には光沢剤を含まない無光沢浴から析出し
た結晶とは異なり、微細で層状組織になっており平滑性
、かたさ。Examples include lithium battery cases and solar cell substrates. Lithium battery cases are required to have excellent additive properties, and are required to have no cracks or rough skin when subjected to deep drawing, low contact resistance, gloss, and an excellent appearance. There is. In addition, solar cell substrates are required to have excellent surface smoothness and gloss, and to be free from minute defects, pits, and the like. For this reason, it has been proposed to apply nickel plating to the cases of lithium batteries and substrates of solar cells as described above. On the other hand, considering the application of nickel plating, nickel crystals deposited in semi-bright or bright nickel plating generally have a fine, layered structure, unlike crystals deposited from a matte bath that does not contain brighteners. Smoothness and hardness.
伸び、内部応力のような物理的性質も異なっている。半
光沢又は光沢ニッケルめっきの結晶の微細化は、光沢剤
が品物(陰極)の表面に吸着されたり光沢剤自身の還元
あるいはさらに分解、共析によるものと考えられている
。このような役割を担う光沢剤としては通常第1次及び
第2次光沢剤が用いられ、それらの添加量の違いにより
半光沢ニッケルめっきあるいは光沢ニッケルめっきと称
される。第1次光沢剤としてはサッカリン、スルホンベ
ンズアルデヒド、ナフタレンスルホネート。Physical properties such as elongation and internal stress are also different. The refinement of crystals in semi-bright or bright nickel plating is thought to be due to adsorption of the brightener to the surface of the product (cathode), reduction of the brightener itself, or further decomposition or eutectoid. Primary and secondary brighteners are usually used as brighteners that play such a role, and are called semi-bright nickel plating or bright nickel plating depending on the amount of these added. Primary brighteners include saccharin, sulfonebenzaldehyde, and naphthalene sulfonate.
アリールスルホネート、脂肪族及び芳香族脂肪酸。Aryl sulfonates, aliphatic and aromatic fatty acids.
スルホンアミド、スルホンイミドなどが使用される。ま
た第2次光沢剤としてはプロパギルアルコールや1.4
−ブチンジオールのようなアセチレンアルコールやジオ
ールと酸化エチレン及びエピクロルヒドリンとの縮合生
成物、ヘテロ環式窒素を含む第4級塩特にサルフエート
などが使用される。Sulfonamides, sulfonimides, etc. are used. In addition, as a secondary brightener, propargyl alcohol and 1.4
- Condensation products of acetylene alcohols and diols such as butyne diol with ethylene oxide and epichlorohydrin, quaternary salts containing heterocyclic nitrogen, especially sulfates, etc. are used.
ステンレス鋼上に半光沢ニッケルめっきあるいは光沢ニ
ッケルめっきを施す方法としては、一般的には公知の方
法でステンレス鋼の表面を脱脂。To apply semi-bright nickel plating or bright nickel plating on stainless steel, the surface of the stainless steel is generally degreased using a known method.
酸洗処理後ウッド浴を用いて活性化ストライクニッケル
めっき処理し、さらに前記第1次光沢剤及び第2次光沢
剤を適当量添加した半光沢ニッケルめっき浴あるいは光
沢ニッケルめっき浴を用いてめっきする方法がある。After pickling treatment, activated strike nickel plating is performed using a Wood bath, and further plating is performed using a semi-bright nickel plating bath or a bright nickel plating bath to which appropriate amounts of the primary brightener and secondary brightener are added. There is a way.
以上のように一般的なニッケルめっきの適用が考えられ
るが、実際には加工性に優れた再結晶組織を持つオース
テナイト系ステンレス鋼上では光沢良好なニッケルめっ
き皮膜を得ることはできず。As mentioned above, general nickel plating can be applied, but in reality, it is not possible to obtain a nickel plating film with good gloss on austenitic stainless steel, which has a recrystallized structure with excellent workability.
したがって上記の方法で高価なニッケルを厚くめっきし
た後にニッケル面を研摩して光沢面を得るというような
方法が行われている。Therefore, a method is used in which after plating a thick layer of expensive nickel using the above method, the nickel surface is polished to obtain a shiny surface.
(発明の構成)
本発明は、かかる現状に鑑み鋭意研究をおこなった結果
、1μ程度の薄めつきでも光沢が良好でかつ加工性に富
むニッケルめっき皮膜を得る方法を見出したものである
。(Structure of the Invention) The present invention has been made as a result of intensive research in view of the current situation, and has discovered a method for obtaining a nickel plating film that has good gloss and is highly workable even with a thinning of about 1 μm.
すなわち2本発明はオーステナイト系ステンレス鋼圧延
材に半光沢ニッケルめっき又は光沢ニッケルめっきを施
した後に光輝焼鈍又は真空焼鈍することを特徴とするニ
ッケルめっき材の製造方法に関するものである。That is, the present invention relates to a method for producing a nickel-plated material, which comprises applying semi-bright nickel plating or bright nickel plating to a rolled austenitic stainless steel material and then bright annealing or vacuum annealing.
なお、光輝焼鈍とは焼なましを不活性ガスの中で行うこ
とを言い、不活性ガスとしてはNH,の分解ガX、AX
ガX(H,ニア5%、N、:25%。Bright annealing refers to annealing performed in an inert gas, and the inert gas is NH, decomposition gas,
GaX (H, near 5%, N: 25%.
露点−40〜−60℃)や純H2が使用される。(dew point -40 to -60°C) or pure H2 is used.
また、真空焼鈍とは10″2Torr以上の真空中で焼
なましをすることを言い、好ましくは10″Torr以
上の高真空であることが望ましい。Further, vacuum annealing refers to annealing in a vacuum of 10''2 Torr or more, preferably a high vacuum of 10'' Torr or more.
なお、再結晶組織とは再結晶温度以上にステンレス鋼を
加熱して得られる組織でおり、結晶粒子の大きさによら
ず適用できる。また、オーステナイト系ステンレスとは
常はで安定なオーステナイト組織を有するステンレス鋼
であり、Fe、C。Note that the recrystallized structure is a structure obtained by heating stainless steel above the recrystallization temperature, and can be applied regardless of the size of crystal grains. In addition, austenitic stainless steel is a stainless steel that usually has a stable austenitic structure, and contains Fe and C.
Ni、Cr、Mn、N量等を適当量含みかつその他特性
に応じてPHSHs8.Txg Nbg TarMo、
Cuを適宜加えられたステンレスを含むものである。PHSHs8. containing appropriate amounts of Ni, Cr, Mn, N, etc., depending on other characteristics. Txg Nbg TarMo,
It contains stainless steel to which Cu is appropriately added.
以下実施例に基づき本発明を説明する。The present invention will be explained below based on Examples.
(実施例)
SUS304冷間圧延鋼板(0,25nynt)に通常
の前処理により脱脂、酸洗処理後、下記に示すめっき条
件でウッド浴によりストライクニッケルめっきを施し、
その後、半光沢ニッケルめっき及び光沢ニッケルめっき
を1μ施すと美麗な表面を持つニッケルめっき面が得ら
れた。(Example) A SUS304 cold rolled steel plate (0.25 nynt) was degreased and pickled by normal pretreatment, and then struck nickel plated in a wood bath under the plating conditions shown below.
Thereafter, 1 micron of semi-bright nickel plating and bright nickel plating were applied to obtain a nickel-plated surface with a beautiful surface.
めっき条件は以下に示す通である。The plating conditions are as shown below.
ストライクニッケル条件
塩化ニッケル 250 g / Q塩
酸 100 g / Q電流密度 5
A/dイ
半光沢ニッケルめっき条件
硫酸ニッケル 280 g / Q塩化ニッケル
50 g / Qは う 酸
4 5 g / QナイカP
C−330g / Q
(ジャパンローナル製)
浴 温 50〜60℃電流密度
2〜8A/drI?
光沢ニッケルめっき条件
硫酸ニッケル 280 g / Q塩化ニッケル
50 g / Qは う 酸
45g/QYニッケルRH−11mQ/Q
(口拡メタルブレーティング製)
YニッケルR)I−210+nQ/Q
(口拡メタルブレーティングH)
浴 温 50〜60℃電流密度
2〜8A/dイ
その後、水素雰囲気中において光輝焼鈍を施すとNiめ
っき面は美麗な表面を保持しかつ5US304は再結晶
されていた。Strike nickel conditions Nickel chloride 250 g/Q salt
Acid 100 g/Q current density 5
A/d semi-bright nickel plating conditions Nickel sulfate 280 g/Q Nickel chloride 50 g/Q oxic acid
4 5 g / Q Naica P
C-330g/Q (manufactured by Japan Ronal) Bath temperature 50-60℃ Current density
2~8A/drI? Bright nickel plating conditions Nickel sulfate 280 g/Q Nickel chloride 50 g/Q oxic acid
45g/QY nickel RH-11mQ/Q (made by wide-mouth metal brating) Y nickel R) I-210+nQ/Q (wide-mouth metal brating H) Bath temperature 50-60℃ Current density
After bright annealing in a hydrogen atmosphere at 2 to 8 A/d, the Ni-plated surface maintained a beautiful surface and 5US304 was recrystallized.
ニッケルめっき面の光沢度を30’正反射率で測定し、
また180°曲げにより加工性を評価した。The glossiness of the nickel plated surface was measured using a 30' specular reflectance.
Further, workability was evaluated by 180° bending.
また、比較材として5US304光輝焼鈍材に同様に下
記に示す半光沢ニッケルめっき及び光沢ニッケルめっき
を1μ施すとニッケルめっきの表面は曇っていた。また
、5US304光輝焼鈍材にパフ研摩を実施後、半光沢
ニッケルめっき及び光沢ニッケルめっきを1μ施すと美
麗な表面が得られたが、180°曲げを施すと曲げ部に
クラックが認められた。Further, as a comparison material, when 5US304 bright annealed material was similarly coated with 1 μm of semi-bright nickel plating and bright nickel plating shown below, the surface of the nickel plating was cloudy. Further, after performing puff polishing on 5US304 bright annealed material, a beautiful surface was obtained by applying 1 μm of semi-bright nickel plating and bright nickel plating, but cracks were observed in the bent portion when bending 180°.
以上の結果を第1表にまとめる。The above results are summarized in Table 1.
第1表評価結果 O・・・・・・良好 X・・・・・・クラックあるいは割れが認められる。Table 1 Evaluation results O...Good X: Cracks or cracks are observed.
(効果)
以上本発明の方法によれば薄いニッケルめっきでも優れ
た光沢及び加工性を有するオーステナイト系ステンレス
鋼のニッケルめっき材が得られる。(Effects) As described above, according to the method of the present invention, a nickel-plated austenitic stainless steel material having excellent gloss and workability even with thin nickel plating can be obtained.
Claims (1)
めっき又は光沢ニッケルめっきを施した後に、光輝焼鈍
又は真空焼鈍することを特徴とするニッケルめっき材の
製造方法。A method for producing a nickel-plated material, which comprises applying semi-bright nickel plating or bright nickel plating to a rolled austenitic stainless steel material and then bright annealing or vacuum annealing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25492885A JPS62116795A (en) | 1985-11-15 | 1985-11-15 | Production of nickel plated material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25492885A JPS62116795A (en) | 1985-11-15 | 1985-11-15 | Production of nickel plated material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62116795A true JPS62116795A (en) | 1987-05-28 |
Family
ID=17271803
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25492885A Pending JPS62116795A (en) | 1985-11-15 | 1985-11-15 | Production of nickel plated material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62116795A (en) |
-
1985
- 1985-11-15 JP JP25492885A patent/JPS62116795A/en active Pending
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