JPS62112840U - - Google Patents
Info
- Publication number
- JPS62112840U JPS62112840U JP19279385U JP19279385U JPS62112840U JP S62112840 U JPS62112840 U JP S62112840U JP 19279385 U JP19279385 U JP 19279385U JP 19279385 U JP19279385 U JP 19279385U JP S62112840 U JPS62112840 U JP S62112840U
- Authority
- JP
- Japan
- Prior art keywords
- needle
- cathode
- ion source
- protrude
- embedded
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004544 sputter deposition Methods 0.000 claims 1
Landscapes
- Particle Accelerators (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19279385U JPS62112840U (de) | 1985-12-14 | 1985-12-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19279385U JPS62112840U (de) | 1985-12-14 | 1985-12-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62112840U true JPS62112840U (de) | 1987-07-18 |
Family
ID=31148208
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19279385U Pending JPS62112840U (de) | 1985-12-14 | 1985-12-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62112840U (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006093137A (ja) * | 2004-09-20 | 2006-04-06 | Samsung Electronics Co Ltd | イオン電流密度を向上させるアークチャンバを持つイオン注入装置 |
-
1985
- 1985-12-14 JP JP19279385U patent/JPS62112840U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006093137A (ja) * | 2004-09-20 | 2006-04-06 | Samsung Electronics Co Ltd | イオン電流密度を向上させるアークチャンバを持つイオン注入装置 |