JPS62112711A - Method for producing and recovering ultrafine particle - Google Patents

Method for producing and recovering ultrafine particle

Info

Publication number
JPS62112711A
JPS62112711A JP25069885A JP25069885A JPS62112711A JP S62112711 A JPS62112711 A JP S62112711A JP 25069885 A JP25069885 A JP 25069885A JP 25069885 A JP25069885 A JP 25069885A JP S62112711 A JPS62112711 A JP S62112711A
Authority
JP
Japan
Prior art keywords
substrate
ice
ultrafine
particles
ultrafine particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25069885A
Other languages
Japanese (ja)
Inventor
Toshihiko Odohira
尾土平 俊彦
Tetsuyoshi Wada
哲義 和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP25069885A priority Critical patent/JPS62112711A/en
Publication of JPS62112711A publication Critical patent/JPS62112711A/en
Pending legal-status Critical Current

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  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)

Abstract

PURPOSE:To easily produce and recover ultrafine particles by sticking the ultrafine evaporating particles formed by heating and evaporating the raw material to be made into the ultrafine particles in a vacuum vessel to a cooling body such as ice then taking out the cooling body and thawing the same. CONSTITUTION:A refrigerant such as freon is circulated into a metallic substrate 7 through an inlet 8 and an outlet 9 in the vacuum vessel 1 to cool the substrate and to form a cooling body layer 10 of ice or dryice, etc. on the substrate surface. After the inside of the vacuum vessel 1 is evacuated through a discharge hole to a vacuum, a material 5 such as Ni for the ultrafine particles in a crucible 3 is heated to evaporate by a electron gun 4. The ultrafine particle-like Ni vapor 6 deposits successively on the cooling body layer 10 such as ice or dryice on the substrate 7 surface to form the ultrafine particle layer 11 of Ni. Such layer is taken out of the vacuum vessel 1 and the ice or dryice is thawn or sublimated by which the ultrafine particles of Ni are recovered.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は超微粒子の製造法に関し、特に真空中で加熱さ
れて蒸発した超微粒子を容易に採取回収する方法に関す
る。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for producing ultrafine particles, and particularly to a method for easily collecting and recovering ultrafine particles that have been heated and evaporated in a vacuum.

(従来の技術) 従来の真空蒸発法によシ生成させた微粒子の採取回収す
る方法としては、蒸発粒子を不活性ガス雰囲気中で冷却
凝縮させて、微粒子化し、蒸発容器中に自然落下させて
回収する方法、あるいは蒸発粒子流に対向させて回収基
板を設置して、該回収基板に蒸発微粒子を付着堆積させ
、回収基板上の堆積微粒子を機械的に剥離させる方法な
どがあるが、回収処理後の粉化処理が必要であり、基板
あるいは粉化処理の過程で不純物の混入の可能性がある
こと、又粒子製造プロセスの連続化が困難など不具合的
が多い0又前者の場合自然落下した微粒子を効率よく回
収する機構を真空槽中に設置する必要があシ、限定され
た空間での粒子回収法としては実用性に欠けるきらいが
ある。
(Prior art) A conventional method for collecting and collecting fine particles generated by vacuum evaporation is to cool and condense the evaporated particles in an inert gas atmosphere, turn them into fine particles, and allow them to fall naturally into an evaporation container. There is a method of collecting the particles, or a method of installing a collection substrate facing the flow of evaporated particles, depositing the evaporated particles on the collection substrate, and then mechanically peeling off the deposited particles on the collection substrate. In the case of the former, there are many problems such as the need for subsequent powdering treatment, the possibility of contamination with impurities on the substrate or the powdering process, and the difficulty in making the particle manufacturing process continuous. It is necessary to install a mechanism to efficiently collect particles in a vacuum chamber, and this method tends to be impractical as a particle recovery method in a limited space.

(発明が解決しようとする問題点) 本発明は生成した微粒子の回収における従来法の有する
不具合を解消しうる微粒子の採取回収法を提供しようと
するものである。
(Problems to be Solved by the Invention) The present invention seeks to provide a method for collecting and collecting fine particles that can overcome the problems of conventional methods in collecting generated fine particles.

(問題点を解決するための手段) 本発明は超微粒子の原料となる材料を真空中で加熱蒸発
させ、蒸発した超微粒子を、容易に融解、昇華する物質
の冷却固化体よシなる基板上に付着させ、その後基板を
加熱して融解又は昇華させて超微粒子を採取することを
特徴とする超微粒子の製造回収法である。
(Means for Solving the Problems) The present invention heats and evaporates a raw material for ultrafine particles in a vacuum, and deposits the evaporated ultrafine particles on a substrate made of a cooled solidified substance that easily melts and sublimates. This is a method for producing and recovering ultrafine particles, which is characterized by collecting ultrafine particles by depositing them on a substrate and then heating the substrate to melt or sublimate them.

以下、本発明の具体的手段を第1図に従って詳述する。Hereinafter, specific means of the present invention will be explained in detail with reference to FIG.

第1図において、1は真空槽、2は排気孔、5はルツボ
、4は電子銃、5け蒸発材料、6は蒸気流、7は回収基
板、8は冷媒入口、9は冷媒出口、10は氷(又はドラ
イアイス)層、11は超微粒子層である。
In FIG. 1, 1 is a vacuum chamber, 2 is an exhaust hole, 5 is a crucible, 4 is an electron gun, 5 is an evaporation material, 6 is a vapor flow, 7 is a recovery board, 8 is a refrigerant inlet, 9 is a refrigerant outlet, 10 is an ice (or dry ice) layer, and 11 is an ultrafine particle layer.

排気孔2により真空に保たれた真空槽1中に1超微粒子
原料となる蒸発材料5をルツボ5中に設置し、電子銃4
によって蒸発材料4をアタックして蒸気流6を生成させ
る0この蒸気流6に対向した位置には、冷媒により冷却
される回収基板7が設置されており、該回収基板7上に
は容易に融解する物質、例えば氷、又は容易に昇華する
物質、例えばドライアイスの層10が形成されている。
An evaporation material 5 to be used as an ultrafine particle raw material is placed in a crucible 5 in a vacuum chamber 1 kept in vacuum by an exhaust hole 2, and an electron gun 4 is placed in the crucible 5.
A recovery substrate 7 that is cooled by a refrigerant is installed at a position facing the vapor flow 6, and a recovery substrate 7 that is cooled by a refrigerant is placed on the recovery substrate 7. A layer 10 of a substance that sublimates, for example ice, or a substance that sublimates easily, for example dry ice, is formed.

そのため、蒸気流6は氷又はドライアイス層10に次々
と堆積し超微粒子層11を形成することになる。
Therefore, the vapor flow 6 is deposited one after another on the ice or dry ice layer 10 to form an ultrafine particle layer 11.

超微粒子層11の堆積が終了したところで、真空槽1か
ら氷又はドライアイス層10を介して超微粒子層11が
堆積している回収基板7を取出し、氷又はドライアイス
層10を融解又は昇華させることだよって、超微粒子を
回収基板7から分離して回収する。
When the deposition of the ultrafine particle layer 11 is completed, the recovery substrate 7 on which the ultrafine particle layer 11 is deposited is taken out from the vacuum chamber 1 via the ice or dry ice layer 10, and the ice or dry ice layer 10 is melted or sublimated. Therefore, the ultrafine particles are separated from the collection substrate 7 and collected.

このような方法で超微粒子を回収することにより、回収
の過程で回収基板よりの不純物の混入する可能性を低減
させることができる。
By collecting ultrafine particles using such a method, it is possible to reduce the possibility that impurities from the collection substrate will be mixed in during the collection process.

又、回収基板を連続的に移動させるようにすることによ
って、超微粒子の製造回収を連続化しうろこともでき、
その工業的価値は著しく大である。
In addition, by continuously moving the collection substrate, the production and collection of ultrafine particles can be made continuous.
Its industrial value is extremely large.

以下、本発明の具体的実施例をあげ、更に本発明を詳述
する。
Hereinafter, the present invention will be further explained in detail by giving specific examples of the present invention.

実施例1:N1微粒子の製造回収 真空度10−” wmHgの条件下で、電子ビーム加熱
法(SXW電子ビーム)により 、[を加熱蒸発させ、
Niの蒸発粒子流れに対向させて一10’0に冷却した
氷基板を設置した。氷基板の設置法としては、真空蒸発
室内に於て、10−’ trrm Hgに減圧する前に
鋼製の回収基板表面の水をフレオン冷媒によシ冷却して
一10′oにて氷結させ、その後減圧処理を施行した。
Example 1: Production and Recovery of N1 Fine Particles [ was heated and evaporated by an electron beam heating method (SXW electron beam) under a vacuum degree of 10"wmHg,
An ice substrate cooled to -10'0 was placed opposite the flow of Ni evaporated particles. The method for installing the ice substrate is to cool the water on the surface of the steel recovery substrate with a Freon refrigerant and freeze it at -10'oC in a vacuum evaporation chamber before reducing the pressure to 10' trrm Hg. , and then subjected to depressurization treatment.

かかる条件下にて水蓄板表面に蒸発堆積処理を10分間
行った後、真空槽よシ基板を回収し、氷を融解した後、
Ni微粒子を回収した。製造した微粒子の平均粒径は(
105μであった〇 実施例2:ム60.微粒子の製造回収 真空度10−” ym Hgの条件下でムrイオンスパ
ッター法によりムl、0.基板よりムム0.微粒子を蒸
発させ、ムl、0.蒸発流に対向させて−90’0に冷
却したドライアイス基板を設置した。ドライアイス基板
の設置法としては前実施例と同様に真空槽内を10″″
!1w]lltg に減圧する前に鋼製の回収基板表面
をアンモニアガス冷媒によシー 90 ’Oに冷却して
ドライアイス基板を生成させ、その後、減圧処理を行っ
てムl*osのスパッター処理を20分間施行した。該
処理後、基板を回収し、ドライアイスを気化除去して基
板よシムl、0.微粒子を回収した。A/、 O,微粒
子の平均粒径はα1μであった。
After performing evaporation deposition treatment on the surface of the water storage plate for 10 minutes under these conditions, the substrate was recovered from the vacuum chamber, and the ice was melted.
Ni fine particles were collected. The average particle size of the produced fine particles is (
〇Example 2: μ60. Production and recovery of fine particles: Evaporate the fine particles from the mul, 0. substrate using the mul ion sputtering method under the vacuum degree of 10'' ym Hg, and evaporate the mul, 0. fine particles by facing the evaporation flow to -90'. A dry ice substrate cooled to 0 was installed.The method of installing the dry ice substrate was as in the previous example, with the interior of the vacuum chamber 10''
! Before reducing the pressure to 1w]lltg, the surface of the steel recovery substrate was cooled to 90'O with an ammonia gas refrigerant to generate a dry ice substrate, and then the pressure was reduced to perform sputtering of mul*os. The test was carried out for 20 minutes. After the treatment, the substrate is recovered, the dry ice is removed by vaporization, and the substrate is shim l, 0. Fine particles were collected. A/, O, the average particle size of the fine particles was α1μ.

以上詳述したように、本発明は超微粒子を真空蒸発によ
シ製造する方法として実用性高い方法であり、工業的価
値が顕著なものである。
As described in detail above, the present invention is a highly practical method for producing ultrafine particles by vacuum evaporation, and has significant industrial value.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明を説明するだめの概念図である。 復代理人  内 1)  明 復代理人  萩 原 亮 − 復代理人  安 西 篤 夫 図面の浄書(内容に変更なし) 第1図 昭和61年 2月−3日 FIG. 1 is a conceptual diagram for explaining the present invention. Sub-agent: 1) Akira Sub-agent Ryo Hagi Hara - Sub-agent Atsuo Yasunishi Engraving of drawings (no changes to content) Figure 1 February-3, 1986

Claims (1)

【特許請求の範囲】[Claims] 超微粒子の原料となる材料を真空中で加熱蒸発させ、蒸
発した超微粒子を、容易に融解、昇華する物質の冷却固
化体よりなる基板上に付着させ、その後基板を加熱して
融解又は昇華させて超微粒子を採取することを特徴とす
る超微粒子の製造回収法。
The raw material for ultrafine particles is heated and evaporated in a vacuum, the evaporated ultrafine particles are deposited on a substrate made of a cooled solidified substance that easily melts and sublimates, and then the substrate is heated to melt or sublimate. A method for producing and recovering ultrafine particles, characterized by collecting ultrafine particles using
JP25069885A 1985-11-11 1985-11-11 Method for producing and recovering ultrafine particle Pending JPS62112711A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25069885A JPS62112711A (en) 1985-11-11 1985-11-11 Method for producing and recovering ultrafine particle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25069885A JPS62112711A (en) 1985-11-11 1985-11-11 Method for producing and recovering ultrafine particle

Publications (1)

Publication Number Publication Date
JPS62112711A true JPS62112711A (en) 1987-05-23

Family

ID=17211711

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25069885A Pending JPS62112711A (en) 1985-11-11 1985-11-11 Method for producing and recovering ultrafine particle

Country Status (1)

Country Link
JP (1) JPS62112711A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03118829A (en) * 1989-09-29 1991-05-21 Mc:Kk Production of superfine particle
JPH06145724A (en) * 1992-11-10 1994-05-27 Jgc Corp Production of ultrafine grain
US7367999B2 (en) 2001-07-27 2008-05-06 Fujifilm Corporation Ultrafine particles and method and apparatus for producing the same
JP2014527123A (en) * 2011-08-01 2014-10-09 ザ ユニバーシティ オブ バーミンガム Method for producing particle aggregate

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5178774A (en) * 1974-12-30 1976-07-08 Ryoji Ueda CHOBIFUNOSEIZOHOSHUSURUHOHOTOSOCHI
JPS589902A (en) * 1981-07-11 1983-01-20 Riken Corp Production of fine metallic particle
JPS58133307A (en) * 1982-02-01 1983-08-09 Hitachi Ltd Preparation of ultrafine particle
JPS60155609A (en) * 1984-01-25 1985-08-15 Daido Steel Co Ltd Production of pulverous metallic powder
JPS60204810A (en) * 1984-03-27 1985-10-16 Nippon Sanso Kk Method and device for producing ultrafine metallic particle

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5178774A (en) * 1974-12-30 1976-07-08 Ryoji Ueda CHOBIFUNOSEIZOHOSHUSURUHOHOTOSOCHI
JPS589902A (en) * 1981-07-11 1983-01-20 Riken Corp Production of fine metallic particle
JPS58133307A (en) * 1982-02-01 1983-08-09 Hitachi Ltd Preparation of ultrafine particle
JPS60155609A (en) * 1984-01-25 1985-08-15 Daido Steel Co Ltd Production of pulverous metallic powder
JPS60204810A (en) * 1984-03-27 1985-10-16 Nippon Sanso Kk Method and device for producing ultrafine metallic particle

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03118829A (en) * 1989-09-29 1991-05-21 Mc:Kk Production of superfine particle
JPH06145724A (en) * 1992-11-10 1994-05-27 Jgc Corp Production of ultrafine grain
US7367999B2 (en) 2001-07-27 2008-05-06 Fujifilm Corporation Ultrafine particles and method and apparatus for producing the same
JP2014527123A (en) * 2011-08-01 2014-10-09 ザ ユニバーシティ オブ バーミンガム Method for producing particle aggregate
US10233545B2 (en) 2011-08-01 2019-03-19 The University Of Birmingham Method for producing particulate clusters

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