JPS6210994B2 - - Google Patents
Info
- Publication number
- JPS6210994B2 JPS6210994B2 JP11629483A JP11629483A JPS6210994B2 JP S6210994 B2 JPS6210994 B2 JP S6210994B2 JP 11629483 A JP11629483 A JP 11629483A JP 11629483 A JP11629483 A JP 11629483A JP S6210994 B2 JPS6210994 B2 JP S6210994B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- structural formula
- hydrogen
- added
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000001875 compounds Chemical class 0.000 claims description 15
- 229910052739 hydrogen Inorganic materials 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 10
- -1 acetoxymethyl Chemical group 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 150000002431 hydrogen Chemical group 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 239000011591 potassium Substances 0.000 claims description 5
- 229910052700 potassium Inorganic materials 0.000 claims description 5
- 229930186147 Cephalosporin Natural products 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 4
- 229940124587 cephalosporin Drugs 0.000 claims description 4
- 150000001780 cephalosporins Chemical class 0.000 claims description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 229910052708 sodium Inorganic materials 0.000 claims description 3
- 239000011734 sodium Substances 0.000 claims description 3
- 125000005103 alkyl silyl group Chemical group 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical group 0.000 claims description 2
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 claims description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 2
- 125000000714 pyrimidinyl group Chemical group 0.000 claims description 2
- 125000003831 tetrazolyl group Chemical group 0.000 claims description 2
- 125000001113 thiadiazolyl group Chemical group 0.000 claims description 2
- 125000001425 triazolyl group Chemical group 0.000 claims description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 230000003301 hydrolyzing effect Effects 0.000 claims 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 27
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical group ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 21
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 21
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 15
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 15
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 239000013078 crystal Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 7
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-methylmorpholine Substances CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- RIFGWPKJUGCATF-UHFFFAOYSA-N ethyl chloroformate Chemical compound CCOC(Cl)=O RIFGWPKJUGCATF-UHFFFAOYSA-N 0.000 description 6
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 238000005917 acylation reaction Methods 0.000 description 5
- 150000008064 anhydrides Chemical class 0.000 description 5
- 150000005331 phenylglycines Chemical class 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 150000003952 β-lactams Chemical class 0.000 description 4
- HSHGZXNAXBPPDL-HZGVNTEJSA-N 7beta-aminocephalosporanic acid Chemical compound S1CC(COC(=O)C)=C(C([O-])=O)N2C(=O)[C@@H]([NH3+])[C@@H]12 HSHGZXNAXBPPDL-HZGVNTEJSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 238000000921 elemental analysis Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- ZGUNAGUHMKGQNY-ZETCQYMHSA-N L-alpha-phenylglycine zwitterion Chemical compound OC(=O)[C@@H](N)C1=CC=CC=C1 ZGUNAGUHMKGQNY-ZETCQYMHSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 239000002262 Schiff base Substances 0.000 description 2
- 150000004753 Schiff bases Chemical class 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 239000003242 anti bacterial agent Substances 0.000 description 2
- 229940088710 antibiotic agent Drugs 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- FZFAMSAMCHXGEF-UHFFFAOYSA-N chloro formate Chemical compound ClOC=O FZFAMSAMCHXGEF-UHFFFAOYSA-N 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 239000012024 dehydrating agents Substances 0.000 description 2
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- LULXBAGMGMJJRW-UHFFFAOYSA-N n,2-bis(trimethylsilyl)acetamide Chemical compound C[Si](C)(C)CC(=O)N[Si](C)(C)C LULXBAGMGMJJRW-UHFFFAOYSA-N 0.000 description 2
- 235000011007 phosphoric acid Nutrition 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 125000006239 protecting group Chemical group 0.000 description 2
- RJFPBECTFIUTHB-INEUFUBQSA-N (6r,7r)-7-azaniumyl-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate Chemical compound S1CC=C(C(O)=O)N2C(=O)[C@@H](N)[C@H]21 RJFPBECTFIUTHB-INEUFUBQSA-N 0.000 description 1
- 125000001506 1,2,3-triazol-5-yl group Chemical group [H]N1N=NC([H])=C1[*] 0.000 description 1
- CVBUKMMMRLOKQR-UHFFFAOYSA-N 1-phenylbutane-1,3-dione Chemical compound CC(=O)CC(=O)C1=CC=CC=C1 CVBUKMMMRLOKQR-UHFFFAOYSA-N 0.000 description 1
- HUTNOYOBQPAKIA-UHFFFAOYSA-N 1h-pyrazin-2-one Chemical compound OC1=CN=CC=N1 HUTNOYOBQPAKIA-UHFFFAOYSA-N 0.000 description 1
- LLCOQBODWBFTDD-UHFFFAOYSA-N 1h-triazol-1-ium-4-thiolate Chemical compound SC1=CNN=N1 LLCOQBODWBFTDD-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- NTCCNERMXRIPTR-UHFFFAOYSA-N 2-hydroxy-1-naphthaldehyde Chemical compound C1=CC=CC2=C(C=O)C(O)=CC=C21 NTCCNERMXRIPTR-UHFFFAOYSA-N 0.000 description 1
- FUGKCSRLAQKUHG-UHFFFAOYSA-N 5-chloro-2-hydroxybenzaldehyde Chemical compound OC1=CC=C(Cl)C=C1C=O FUGKCSRLAQKUHG-UHFFFAOYSA-N 0.000 description 1
- NVIAYEIXYQCDAN-CLZZGJSISA-N 7beta-aminodeacetoxycephalosporanic acid Chemical compound S1CC(C)=C(C(O)=O)N2C(=O)[C@@H](N)[C@@H]12 NVIAYEIXYQCDAN-CLZZGJSISA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 102100039875 Histone H3-7 Human genes 0.000 description 1
- 101001035307 Homo sapiens Histone H3-7 Proteins 0.000 description 1
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- WRUZLCLJULHLEY-UHFFFAOYSA-N N-(p-hydroxyphenyl)glycine Chemical compound OC(=O)CNC1=CC=C(O)C=C1 WRUZLCLJULHLEY-UHFFFAOYSA-N 0.000 description 1
- 125000000066 S-methyl group Chemical group [H]C([H])([H])S* 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000010933 acylation Effects 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000006242 amine protecting group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 description 1
- 238000010170 biological method Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001718 carbodiimides Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 150000002081 enamines Chemical class 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- NDOGLIPWGGRQCO-UHFFFAOYSA-N hexane-2,4-dione Chemical compound CCC(=O)CC(C)=O NDOGLIPWGGRQCO-UHFFFAOYSA-N 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 208000015181 infectious disease Diseases 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- XMJHPCRAQCTCFT-UHFFFAOYSA-N methyl chloroformate Chemical compound COC(Cl)=O XMJHPCRAQCTCFT-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- KINULKKPVJYRON-PVNXHVEDSA-N n-[(e)-[10-[(e)-(4,5-dihydro-1h-imidazol-2-ylhydrazinylidene)methyl]anthracen-9-yl]methylideneamino]-4,5-dihydro-1h-imidazol-2-amine;hydron;dichloride Chemical compound Cl.Cl.N1CCN=C1N\N=C\C(C1=CC=CC=C11)=C(C=CC=C2)C2=C1\C=N\NC1=NCCN1 KINULKKPVJYRON-PVNXHVEDSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000006501 nitrophenyl group Chemical group 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 244000052769 pathogen Species 0.000 description 1
- UYWQUFXKFGHYNT-UHFFFAOYSA-N phenylmethyl ester of formic acid Natural products O=COCC1=CC=CC=C1 UYWQUFXKFGHYNT-UHFFFAOYSA-N 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 238000006884 silylation reaction Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000004646 sulfenyl group Chemical group S(*)* 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- PVFOMCVHYWHZJE-UHFFFAOYSA-N trichloroacetyl chloride Chemical compound ClC(=O)C(Cl)(Cl)Cl PVFOMCVHYWHZJE-UHFFFAOYSA-N 0.000 description 1
- PNQBEPDZQUOCNY-UHFFFAOYSA-N trifluoroacetyl chloride Chemical compound FC(F)(F)C(Cl)=O PNQBEPDZQUOCNY-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
Landscapes
- Cephalosporin Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
本発明は、抗生剤として有用な構造式()の
セフアロスポリン誘導体の製造方法に関する。
上記式中、
R1は水素または炭素原子1ないし5の低級ア
ルキル基有機塩形成基であり、
Aは水素またはヒドロキシ基であり、
Bは水素、ハロゲン、メチル、ヒドロキシメチ
ル、アセトキシメチル、メトキシまたは―
CH2SR3基であり、
R2は水素、ナトリウム、カリウムまたはエス
テル形成基であり、
R3はトリアゾリル、テトラゾリル、チアジア
ゾリル、ピリミジニルまたはこれらの一部置換さ
れた基である。
セフアロスポリン抗生剤は、グラム陰性および
陽性病原菌の感染治療剤として脚光を受け、関心
の対象となつており、上記構造式()の化合物
は有用な抗菌作用を有する化合物であつて、それ
の製造方法は多くの文献に公知されている。
これら公知された製造方法を省察すれば、一般
にフエニルグライシン或はその誘導体と7―
ADCAまたは7―ACA等のようなセフアロスポ
リン誘導体のアミノ・グループをアシル化反応さ
せて製造するのであるが、おおよそ、つぎの幾つ
かの方法に分類される。
第一は、米国特許第3843639号、第3957773号、
第3997532号;日本国特公昭52―142091号、ドイ
ツ特許第2718741号のように酸ハライド、特にフ
エニルグライシンクロライドヒドロクロライド或
はその誘導体とセフアロスポリン誘導体と反応さ
せて製造する方法である。この方法は酸塩化物の
製造が産業的に容易でなく、これらの方法により
製造された製品は品質が良くないので、大体にみ
て産業性が少ない。
第二は、米国特許第3252973号のように、カル
ボジイミドのような脱水剤を使用してアシル化反
応させるものであるが、これらの脱水剤も高価で
あるので、やはり、産業性が少ない。
第三は、米国特許第3422103号、第3489752号、
第3518260号、第3560489号、第3769181号、第
3925372号、第3985741号および日本国特公昭48―
72185号等のように混合酸無水物にしてアシル化
反応させるもので、これらは産業的に大変有用な
方法である。
この際使用されるアミン保護基としては、ベン
ジルオキシカルボニル、パラメトキシベンジルオ
キシカルボニル、tert―ブトキシカルボニル、ジ
フエニルメトキシカルボニル、β,β,β―トリ
クロロエトキシカルボニル等のウレタン系と、ア
リルメチル―o―ニトロフエニル、スルフエニ
ル、パラニトロフエニルスルフエニル等のスルフ
エニン系、エチルアセトアセテイト、メチルアセ
トアセテイト、アセチルアセトン、ベンゾイルア
セトン、プロピオニルアセトン等のエナミン系、
5―クロロサリシルアルデヒド、2―ヒドロキシ
―1―ナフタアルデヒド、3―ヒドロキシピラジ
ン等のアリルメチレン系が主に導入される。
しかし、これらの保護グループは比較的高価で
あり、また分子量も大きく、しかも一部の保護グ
ループはそれの除去が容易でない等、上記の従来
方法には経済面から多くの難点が伴つている。
本発明者らは、このような欠点を補完すべき新
しい方法を求めて研究を重ねた末、本発明を完成
した。
本発明をより詳しく説明すれば、ホルムアルデ
ヒドをフエニルグライシン誘導体と反応させてア
ミングループを保護したビス体構造式()の化
合物をつくり、ここに酸塩化物か、エチルクロロ
ホルメイト或はメチルクロロホルメイト等を作用
させて、酸無水物状態の構造式()の化合物を
得た後、構造式()の化合物を反応させてから
加水分解させて構造式()の化合物を製造する
発明である。
上記式中、
R1およびA,Bはさきに定義したとおりであ
り、
R2は水素、ナトリウム、カリウムまたはエス
テル形成基であり、
R4はtert―ブチル基、メトキシ、エトキシまた
は炭素数1ないし5の低級アルキルまたはフエニ
ルグループ等であり、
R5は炭素数ないし5の低級アルキル基、アル
キルシリル基或は有機塩形成基である。
構造式()の化合物は、フエニルグライシン
誘導体をホルムアルデヒドと反応させて製造する
が、その際メタノール、エタノール、イソプロパ
ノール等の極性溶媒中で可性ソーダ、可性カリ等
の無機塩基かトリエチルアミン等の3級塩基、ピ
リジン等の芳香族塩基等を使用してフエニルグラ
イシン誘導体を溶解した後、ホルマリンと反応さ
せ、無水硫酸マグネシウム、無水硫酸ソーダ等の
無機塩類脱水剤か、共沸混合物を形成する溶媒を
使用して水分を除去する。この場合最も好ましい
共沸溶媒としてはベンゼンかトルエン、n―ヘキ
サンが使用される。
この際、フエニルグライシン誘導体とホルムア
ルデヒドを同じ当量反応させると、シツフ塩基
(Schiff base)となるが、本発明者らはホルムア
ルデヒド1/2当量を使用することにより新規物質
であるビス体化合物、構造式()が生成される
ことを融点、UV、元素分析によつて確認した。
下記の表は、フエニルグライシン誘導体のシツ
フ塩基とビス体の分析結果である。
The present invention relates to a method for producing a cephalosporin derivative of structural formula () useful as an antibiotic agent. In the above formula, R 1 is hydrogen or a lower alkyl organic salt-forming group having 1 to 5 carbon atoms, A is hydrogen or a hydroxy group, and B is hydrogen, halogen, methyl, hydroxymethyl, acetoxymethyl, methoxy or ―
It is a CH 2 SR 3 group, R 2 is hydrogen, sodium, potassium or an ester-forming group, and R 3 is triazolyl, tetrazolyl, thiadiazolyl, pyrimidinyl or a partially substituted group thereof. Cephalosporin antibiotics have been attracting attention and interest as agents for treating infections with Gram-negative and -positive pathogens. is known in many documents. Considering these known production methods, it is generally found that phenylglycine or its derivatives and 7-
It is produced by subjecting the amino group of a cephalosporin derivative such as ADCA or 7-ACA to an acylation reaction, and it is roughly classified into the following several methods. The first is U.S. Patent No. 3843639, No. 3957773,
No. 3997532; Japanese Pat. These methods are not industrially easy to produce acid chlorides, and the products produced by these methods are of poor quality, so they generally have little industrial efficiency. The second method, as disclosed in US Pat. No. 3,252,973, is to carry out the acylation reaction using a dehydrating agent such as carbodiimide, but these dehydrating agents are also expensive and therefore have little industrial utility. The third is U.S. Patent No. 3422103, No. 3489752,
No. 3518260, No. 3560489, No. 3769181, No.
No. 3925372, No. 3985741 and Japan Special Public Service 1977-
As in No. 72185, mixed acid anhydrides are used for acylation reaction, and these methods are very useful industrially. The amine protecting groups used in this case include urethane-based groups such as benzyloxycarbonyl, paramethoxybenzyloxycarbonyl, tert-butoxycarbonyl, diphenylmethoxycarbonyl, β,β,β-trichloroethoxycarbonyl, and allylmethyl-o- Sulfenine series such as nitrophenyl, sulfenyl, para-nitrophenyl sulfenyl, enamine series such as ethyl acetoacetate, methyl acetoacetate, acetylacetone, benzoylacetone, propionylacetone,
Allylmethylene-based compounds such as 5-chlorosalicyaldehyde, 2-hydroxy-1-naphthaldehyde, and 3-hydroxypyrazine are mainly introduced. However, these conventional methods have many disadvantages from an economical point of view, such as the fact that these protective groups are relatively expensive and have large molecular weights, and some of the protective groups are not easy to remove. The present inventors completed the present invention after repeated research in search of a new method to compensate for these drawbacks. To explain the present invention in more detail, formaldehyde is reacted with a phenylglycine derivative to create a compound with the bis structural formula () in which the amine group is protected, and then acid chloride, ethyl chloroformate, or methyl An invention in which a compound of structural formula () is obtained in an acid anhydride state by reacting with chloroformate, etc., and then the compound of structural formula () is reacted and then hydrolyzed to produce a compound of structural formula (). It is. In the above formula, R 1 and A, B are as defined above, R 2 is hydrogen, sodium, potassium, or an ester-forming group, and R 4 is a tert-butyl group, methoxy, ethoxy, or a carbon number of 1 to 1. 5 lower alkyl or phenyl group, and R 5 is a lower alkyl group having 5 to 5 carbon atoms, an alkylsilyl group, or an organic salt-forming group. The compound of structural formula () is produced by reacting a phenylglycine derivative with formaldehyde. At this time, an inorganic base such as sodium chloride, potassium hydroxide, or triethylamine is added in a polar solvent such as methanol, ethanol, or isopropanol. After dissolving the phenylglycine derivative using a tertiary base, an aromatic base such as pyridine, etc., it is reacted with formalin, and then treated with an inorganic salt dehydrating agent such as anhydrous magnesium sulfate or anhydrous sodium sulfate, or an azeotrope. The water is removed using a forming solvent. In this case, the most preferred azeotropic solvent is benzene, toluene, or n-hexane. At this time, when the same equivalent amount of phenylglycine derivative and formaldehyde are reacted, a Schiff base is produced, but by using 1/2 equivalent of formaldehyde, the present inventors created a new substance, a bis-form compound, The formation of the structural formula () was confirmed by melting point, UV, and elemental analysis. The table below shows the analysis results of Schiff base and bis form of phenylglycine derivatives.
【表】
構造式()で示される化合物は、R1が水素
である場合、適当なシリル化剤で保護した後、ア
シル化反応に利用する。
シリル化剤としてはジクロロジメチルシラン、
トリメチルクロロシラン、ヘキサメチルジシラザ
ン、N,O―ビストリメチルシリルアセトアマイ
ド、N,O―ビストリメチルシリルウレア等が使
用され、溶媒としては塩化メチレン、ベンゼン、
トルエン、テトラヒドロブタン、クロロホルム等
の不活性有機溶媒が使用される。
最終段階でアシル化および加水分解反応後、結
晶の生成は生成化合物の特性によつて溶媒化され
ている物質として生成されるか、直接所望の物質
になることもあつて、このときの溶媒の選択は大
変重要な因子として作用する。
構造式()の化合物を製造する場合、溶媒と
してはクロロホルム、ジクロロメタンのようなハ
ロゲン化アルカン類またはベンゼンのような芳香
族炭化水素、アセトンやメチルイソブチルケトン
のようなケトン類、酢酸エチルのようなエステル
類、アセトニトリルのようなニトリル類、ジメチ
ルホルムアマイド、ジメチルスルホキサイドのよ
うなアプロチツクな溶媒およびこれらのうちの混
合溶媒、またこれらと水、メタノール、エタノー
ル等、極性溶媒との混合溶媒が使用され、これら
はAおよびBの置換体によつて適宜選択される。
また、混合酸無水物を製造するときメチルクロロ
ホルメイト、エチルクロロホルメイト、ピハロイ
ルクロライド、トリクロロアセチルクロライド、
トリフルオロアセチルクロライド等の酸ハロゲン
化物、アルキル燐酸、亜硫酸等が使用される。
実施例 1
N,N′―メチレン―ビス―α―アミノフエニ
ルグライシンポタシウム塩の製造
メチルアルコール50mlにポタシウムヒドロキサ
イド(85%)6.6gr.を溶解させた後、フエニルグ
ライシン15.1gr.(0.1モル)を加えて溶かし、35
%ホルマリン水溶液4.3gr.(0.005モル)を加えた
後、4時間に亘つて常温で反応させ、n―ヘキサ
ン200mlを加えて還流させながら水とメチルアル
コールを除去した後、エーテル200mlに分散し
過すると、黄白色結晶19.0gr.(97.3%)を得る。
融 点:159〜160℃
UV :248nm(λmax)
元素分析:
計算値 C52.3%,H4.13%,N7.17%
実測値 C52.2%,H4.10%,N7.10%
実施例 2
N,N′―メチレン―ビス―α―アミノ―パラ
―ヒドロキシフエニルグライシンポタシウムの
製造
メチルアルコール50mlにポタシウムヒドロキサ
イド(85%)6.6gr.を溶解した後、パラ―ヒドロ
キシフエニルグライシン16.7gr.(0.1モル)を加
えて溶かし、35%ホルマリン水溶液4.3gr.(0.05
モル)を加えた後、4時間に亘つて常温で撹拌
し、n―ヘキサン200mlを加えて還流させながら
水とメチルアルコールを除去した後、エチル200
mlに分散させて過すると、黄白色結晶20.5gr.
(97.0%)を得る。
融 点:173℃(分解)
UV :250nm(λmax)
元素分析:
計算値 C48.3%,H3.8%,N6.63%
実測値 C48.2%,H3.7%,N6.6%
実施例 3
7―(D―α―アミノ―α―フエニルアセトア
ミノ)―3―メチル―8―オキソ―5―チア―
1―アザバイシクロ〔4,2,C〕オクト―2
―N―2―カルボン酸の製造
メチレンクロライド200mlに実施例1で得られ
た物質19.5gr.(0.05モル)を分散した後、0℃以
下に保ちながらn―N―メチルモルホリン0.3ml
およびエチルクロロホルメイト11.9gr.(0.11モ
ル)を加えて40分間同じ温度で撹拌した後、7―
アミノデスアセトキシセフアロスポリン酸
21.4gr.(0.1モル)をメチレンクロライド100ml
と、ヘキサメチルジシラザン20mlと6時間のあい
だ還流させた後、冷却した溶液を1時間に亘つて
加え、0℃で1.5時間撹拌してから、水50mlと濃
塩酸10mlとを加えて30分間撹拌する。ついで水層
を分離して不純物を除去し、エチルアセテイト
130ml、メタノール50mlを加えた後、アンモニア
水でPHを5.0に調節し、生成された結晶を過し
てアセトンで洗浄した後、乾燥すると黄白色結晶
28.2gr.(77.1%)が得られる。
旋光度:〔α〕20 D=145.0(C=1%,H2O)
UV:λmax,261nm
IR:νKBr Maxcm-1
3400(アミン),
1760(β―ラクタム),
1680(アミドカルボニル)
含量:97.8%(無水物基準、ヨード滴定法)
実施例 4
7―(D―α―アミノ―パラ―ヒドロキシフエ
ニルアセトアミド)―3―メチル―3―オキソ
―5―チア―1―アザバイシクロ〔4,2,
O〕オクト―2―N―2―カルボン酸の製造
ジメチルホルムアマイド100mlに実施例2で得
られた物質21.1gr.(0.005モル)を加え、0℃以
下に保ちながらN―メチルモルホリン0.3mlとエ
チルクロロホルメイト11.9gr.(0.11モル)を加
え、40分間同じ温度で撹拌した後、7―アミノデ
スアセトキシセフアロスポラン酸21.4gr.(0.1モ
ル)をメチレンクロライド100mlとヘキサメチル
ジシラザン20mlと6時間のあいだ還流させた後、
冷却した溶液を1時間に亘つて加え0℃で1.5時
間撹拌した後、水100mlと濃塩酸10mlを加え30分
間撹拌してから水層を分離して不純物を除去し、
50℃で加温しながらトリエチルアミンでPHを5.0
に調節して生成された結晶を常温で1時間放置し
た後、過して小量の水で再結晶化させて乾燥す
ると、微黄白色結晶24.0gr.(62.8%)が得られ
る。
旋光度:〔α〕20 D=+163.4゜(1%,H2O)
UV:λmax, 264nm
νKBr Maxcm1
3400(アミン),
1760(β―ラクタム),
1680(アミドカルボニル)
含 量:97.6%(無水物基準、ヨード滴定法)
96.8%(無水物基準、生物学的方法)
実施例 5
7―(D―α―アミノ―α―フエニルアセトア
ミノ)―3―クロロ―3―セフエム―4―カル
ボン酸の製造
塩化メチレン200mlに実施例1で得られた物質
19.5gr.(0.05モル)を懸濁させ、−10℃に冷却し
た後、N―メチルモルホリン0.3mlとクロロホル
メイト10.4gr.(0.11モル)を加えて、同じ温度で
1時間のあいだ反応させ、この溶液に7―アミノ
―3―セフエム―4―カルボン酸23.4gr.(0.1モ
ル)を塩化メチレン100mlおよびアセトニトリル
20mlおよびN,O―ビストリメチルシリルアセト
アマイドと一緒にシリ化した後、1時間に亘つて
−10℃で滴加する。
0℃で2時間反応させてから水100mlを加え、
塩酸でPHを1.5に調節した後、30分間撹拌して水
層だけを分離して不純物を除去した後、アセトニ
トリル50mlを加え、トリエチルアミンでPHを5.0
に調節すると、20.0gr.(54.4%)の製品が得られ
る。
UV :λmax 265nm(PH7緩衝液)
IR :νKBr Max
3400(アミン),
1750(β―ラクタム),
1680(アミドカルボニル),
1590(カルボン酸)
NMR:δppm
6.5〜6.7(2H,多重C2―H2),
4.84(1H,二重C6―H),
4.26(1H,二重C7―H),
2.44(5H単一,芳香族H)
実施例 6
7―(D―α―アミノ―パラ―ヒドロキシフエ
ニルアセトアミド)―3―〔(1,2,3―ト
リアゾール―5―イル)チオメチル〕―3―セ
フエム―4―カルボン酸の製造
実施例2で得られた化合物4.23gr.(0.01モル)
をアセトニトリル80mlに懸濁させ、N,N―ジメ
チルベンジルアミン0.1mlを加えた後、−10℃でエ
チルクロロホルメイト2.4gr.(0.022モル)を加え
てから同じ温度で40分間反応させる。
別にクロロホルム50mlに7―アミノセフアロス
ポラン酸5.44gr.(0.22モル)を入れてトリエチル
アミン3.2mlを加えて溶解し、この溶液を−10℃
で混合無水物溶液で1時間滴加して同じ温度で2
時間、常温で1時間ずつ反応させる。溶液を減圧
下で留去し、アセトン40mlおよびN,N′―ジメ
チルホルムアマイド15mlに懸濁させ、0℃でポタ
シウム―2―エチルヘキサエイト(43%)、
8.8gr.(0.02モル)およびトリエチルアミン2滴
を滴加して1時間反応させる。ここに5―メルカ
プト―1,2,3―トリアゾール2.0gr.(0.02モ
ル)を加えた後、70℃で2時間のあいだ反応させ
て5℃に冷却してから水30mlを加える。塩酸でPH
を2に調節した後、20分間反応させる。溶媒を減
圧下で蒸留除去し、不溶物質を除去した後、エチ
ルアセテイトで3回抽出して減圧蒸留したうえで
再び水30mlに溶かしてPHを5.0に調整して放置す
ると結晶が析出する。この結晶を過してメチル
アルコールで洗浄して乾燥すると、4.3gr.(46.5
%)の目的物が得られる。
比旋光度:〔α〕20 D=+54
IR :νKBr Maxcm-1
3400(ハイドロキシル、アミン基),
1760(β―ラクタム),
1675(アマイドカルボニル)
1595(カルボン酸)
NMR:δppm
3.4(2H単一 SCH2),
4.40(2H単一 CH2S),
4.85(1H単一 α―水素),
5.10(2H多重,ラクタム),
6.85(2H二重,芳香族),
7.20(2H二重,芳香族),
7.45(1H単一,トリアゾール=CH―N
=)
実施例 7
7―(D―α―アミノ―α―フエニルアセトア
ミド)―セフアロスポラン酸の製造
アセトニトリル70mlに実施例1で得られた化合
物3.90gr.(0.01モル)を懸濁させ、N,N―ジメ
チルベンジルアミン0.1mlを加え、−10℃に冷却し
た後、エチルクロロホルメイト2.4gr.を加えて40
分間同じ温度で反応させる。
別にクロロホルム50mlに7―アミノセフアロス
ポラン酸5.44gr.(0.02モル)を入れ、トリエチル
アミン3.2mlを加えて溶解させた溶液を上記混合
無水物溶液に−10℃で1時間に亘つて滴加し、こ
の温度で2時間、常温で1時間反応させる。
溶媒を減圧下で留去し、エチルアセテイトで洗
浄してから水30mlおよび42%燐酸溶液でPHを酸性
に調節してエチルアセテイトで3回抽出した後、
溶媒を減圧蒸留した残渣に水30mlおよび塩酸を加
えて溶解させ、5℃に保ちながらトリエチルアミ
ンでPHを4.8に調節して得られる物質を過して
メチルアルコールで洗浄、乾燥すると乳白色の結
晶性粉末の7―D―(α―アミノフエニルアセト
アミド)―セフアロスポラン酸の2水和物5.4gr.
(61.4%)が得られる。
融 点:222℃(分解)
UV :λmax,260nm
比旋光度:〔α〕20 D=
+83(C=0.5%,H2O:CH3CN混合溶液)[Table] When R 1 is hydrogen, the compound represented by the structural formula () is used in the acylation reaction after being protected with an appropriate silylating agent. As a silylation agent, dichlorodimethylsilane,
Trimethylchlorosilane, hexamethyldisilazane, N,O-bistrimethylsilylacetamide, N,O-bistrimethylsilylurea, etc. are used, and the solvent is methylene chloride, benzene,
Inert organic solvents such as toluene, tetrahydrobutane, chloroform, etc. are used. After the acylation and hydrolysis reactions in the final stage, crystals may be produced as a solvated substance depending on the characteristics of the product compound, or they may directly become the desired substance. Selection acts as a very important factor. When producing a compound of structural formula (), the solvent may be chloroform, halogenated alkanes such as dichloromethane, aromatic hydrocarbons such as benzene, ketones such as acetone or methyl isobutyl ketone, or ethyl acetate. Uses esters, nitriles such as acetonitrile, aprotic solvents such as dimethylformamide, dimethyl sulfoxide, mixed solvents of these, and mixed solvents of these with polar solvents such as water, methanol, ethanol, etc. and these are appropriately selected depending on the substituents of A and B.
In addition, when producing mixed acid anhydrides, methyl chloroformate, ethyl chloroformate, pihaloyl chloride, trichloroacetyl chloride,
Acid halides such as trifluoroacetyl chloride, alkyl phosphoric acids, sulfurous acids, etc. are used. Example 1 Production of N,N'-methylene-bis-α-aminophenylglycine potassium salt After dissolving 6.6 gr. of potassium hydroxide (85%) in 50 ml of methyl alcohol, 15.1 gr. of phenylglycine was dissolved. (0.1 mol) and dissolve it, 35
% formalin aqueous solution (0.005 mol) was added, reacted at room temperature for 4 hours, added 200 ml of n-hexane and removed water and methyl alcohol under reflux, and then dispersed in 200 ml of ether and filtered. Then, 19.0gr. (97.3%) of yellowish white crystals were obtained. Melting point: 159-160℃ UV: 248nm (λmax) Elemental analysis: Calculated values C52.3%, H4.13%, N7.17% Actual values C52.2%, H4.10%, N7.10% Examples 2 Production of N,N'-methylene-bis-α-amino-para-hydroxyphenylglycine potassium After dissolving 6.6gr. of potassium hydroxide (85%) in 50ml of methyl alcohol, para-hydroxyphenylglycine Add and dissolve 16.7gr. (0.1mol), and 4.3gr. (0.05mol) of 35% formalin aqueous solution.
200 ml of n-hexane was added and refluxed to remove water and methyl alcohol, and then 200 ml of ethyl
ml of yellowish white crystals 20.5gr.
(97.0%). Melting point: 173℃ (decomposition) UV: 250nm (λmax) Elemental analysis: Calculated values C48.3%, H3.8%, N6.63% Actual values C48.2%, H3.7%, N6.6% Implemented Example 3 7-(D-α-amino-α-phenylacetamino)-3-methyl-8-oxo-5-thia-
1-Azabaicyclo [4,2,C] Octo-2
- Production of N-2-carboxylic acid After dispersing 19.5 gr. (0.05 mol) of the substance obtained in Example 1 in 200 ml of methylene chloride, 0.3 ml of n-N-methylmorpholine was prepared while keeping the temperature below 0°C.
and 11.9gr. (0.11mol) of ethyl chloroformate and stirred at the same temperature for 40 minutes, then
Aminodesacetoxycephalosporinic acid
21.4gr. (0.1mol) methylene chloride 100ml
After refluxing with 20 ml of hexamethyldisilazane for 6 hours, the cooled solution was added over 1 hour, stirred at 0°C for 1.5 hours, then 50 ml of water and 10 ml of concentrated hydrochloric acid were added for 30 minutes. Stir. The aqueous layer was then separated to remove impurities and ethyl acetate
After adding 130ml and 50ml of methanol, adjust the pH to 5.0 with aqueous ammonia, filter the generated crystals, wash with acetone, and dry to produce yellowish white crystals.
28.2gr. (77.1%) is obtained. Optical rotation: [α] 20 D = 145.0 (C = 1%, H 2 O) UV: λmax, 261 nm IR: ν KBr Max cm -1 3400 (amine), 1760 (β-lactam), 1680 (amide carbonyl) Content: 97.8% (anhydride standard, iodometric titration method) Example 4 7-(D-α-amino-para-hydroxyphenylacetamide)-3-methyl-3-oxo-5-thia-1-azabicyclo[4 ,2,
O] Production of oct-2-N-2-carboxylic acid 21.1gr. (0.005mol) of the substance obtained in Example 2 was added to 100ml of dimethylformamide, and the mixture was mixed with 0.3ml of N-methylmorpholine while keeping the temperature below 0°C. After adding 11.9 gr. (0.11 mol) of ethyl chloroformate and stirring at the same temperature for 40 minutes, 21.4 gr. (0.1 mol) of 7-aminodesacetoxycephalosporanic acid was added to 100 ml of methylene chloride and 20 ml of hexamethyldisilazane. After refluxing for 6 hours,
After adding the cooled solution over 1 hour and stirring at 0°C for 1.5 hours, 100 ml of water and 10 ml of concentrated hydrochloric acid were added and stirred for 30 minutes, and the aqueous layer was separated to remove impurities.
Adjust the pH to 5.0 with triethylamine while heating at 50℃.
The resulting crystals were allowed to stand at room temperature for 1 hour, then filtered, recrystallized with a small amount of water, and dried to yield 24.0gr. (62.8%) of slightly yellowish white crystals. Optical rotation: [α] 20 D = +163.4° (1%, H 2 O) UV: λmax, 264nm ν KBr Max cm 1 3400 (amine), 1760 (β-lactam), 1680 (amide carbonyl) Content :97.6% (anhydride standard, iodometry method) 96.8% (anhydride standard, biological method) Example 5 7-(D-α-amino-α-phenylacetamino)-3-chloro-3- Production of cefem-4-carboxylic acid Substance obtained in Example 1 in 200 ml of methylene chloride
After suspending 19.5 gr. (0.05 mol) and cooling it to -10°C, 0.3 ml of N-methylmorpholine and 10.4 gr. (0.11 mol) of chloroformate were added and reacted at the same temperature for 1 hour. , 23.4 gr. (0.1 mol) of 7-amino-3-cephem-4-carboxylic acid was added to this solution in 100 ml of methylene chloride and acetonitrile.
After silification with 20 ml and N,O-bistrimethylsilylacetamide, it is added dropwise over the course of 1 hour at -10°C. After reacting at 0℃ for 2 hours, add 100ml of water.
After adjusting the pH to 1.5 with hydrochloric acid, stir for 30 minutes to separate only the aqueous layer and remove impurities, add 50 ml of acetonitrile, and adjust the pH to 5.0 with triethylamine.
A product of 20.0gr. (54.4%) is obtained. UV: λmax 265nm (PH7 buffer) IR: ν KBr Max 3400 (amine), 1750 (β-lactam), 1680 (amide carbonyl), 1590 (carboxylic acid) NMR: δppm 6.5-6.7 (2H, multiple C 2 - H 2 ), 4.84 (1H, double C 6 -H), 4.26 (1H, double C 7 -H), 2.44 (5H single, aromatic H) Example 6 7-(D-α-amino- Production of para-hydroxyphenylacetamide)-3-[(1,2,3-triazol-5-yl)thiomethyl]-3-cephem-4-carboxylic acid 4.23 gr. (0.01 mole)
was suspended in 80 ml of acetonitrile, 0.1 ml of N,N-dimethylbenzylamine was added thereto, 2.4 gr. (0.022 mol) of ethyl chloroformate was added at -10°C, and the mixture was allowed to react at the same temperature for 40 minutes. Separately, add 5.44 gr. (0.22 mol) of 7-aminocephalosporanic acid to 50 ml of chloroform, dissolve by adding 3.2 ml of triethylamine, and stir this solution at -10°C.
at the same temperature for 1 hour with a mixed anhydride solution.
React for 1 hour at room temperature. The solution was evaporated under reduced pressure, suspended in 40 ml of acetone and 15 ml of N,N'-dimethylformamide, and dissolved in potassium 2-ethyl hexaate (43%) at 0°C.
8.8 gr. (0.02 mol) and 2 drops of triethylamine are added dropwise and allowed to react for 1 hour. After adding 2.0gr. (0.02mol) of 5-mercapto-1,2,3-triazole, the mixture was allowed to react at 70°C for 2 hours, cooled to 5°C, and then 30ml of water was added. PH with hydrochloric acid
After adjusting the temperature to 2, let it react for 20 minutes. After removing the solvent by distillation under reduced pressure and removing insoluble substances, extract with ethyl acetate three times, distill under reduced pressure, dissolve again in 30 ml of water, adjust the pH to 5.0, and leave to stand to precipitate crystals. When this crystal is filtered, washed with methyl alcohol, and dried, it yields 4.3gr. (46.5gr.
%) of the target product is obtained. Specific optical rotation: [α] 20 D = +54 IR: ν KBr Max cm -1 3400 (hydroxyl, amine group), 1760 (β-lactam), 1675 (amide carbonyl) 1595 (carboxylic acid) NMR: δppm 3.4 ( 2H single SCH 2 ), 4.40 (2H single CH 2 S), 4.85 (1H single α-hydrogen), 5.10 (2H multiple, lactam), 6.85 (2H double, aromatic), 7.20 (2H double , aromatic), 7.45 (1H single, triazole=CH—N
=) Example 7 Production of 7-(D-α-amino-α-phenylacetamide)-cephalosporanic acid 3.90 gr. (0.01 mol) of the compound obtained in Example 1 was suspended in 70 ml of acetonitrile, and N, Add 0.1 ml of N-dimethylbenzylamine and cool to -10°C, then add 2.4 gr. of ethyl chloroformate and mix for 40 minutes.
Incubate at the same temperature for minutes. Separately, 5.44 gr. (0.02 mol) of 7-aminocephalosporanic acid was added to 50 ml of chloroform, and 3.2 ml of triethylamine was added to dissolve the solution, which was added dropwise to the above mixed anhydride solution at -10°C over 1 hour. , react at this temperature for 2 hours and at room temperature for 1 hour. The solvent was distilled off under reduced pressure, washed with ethyl acetate, adjusted to acidic pH with 30 ml of water and 42% phosphoric acid solution, and extracted three times with ethyl acetate.
Add 30 ml of water and hydrochloric acid to the residue obtained by distilling the solvent under reduced pressure, dissolve it, adjust the pH to 4.8 with triethylamine while keeping it at 5°C, filter the obtained substance, wash with methyl alcohol, and dry it to form a milky white crystalline powder. 7-D-(α-aminophenylacetamide)-cephalosporanic acid dihydrate 5.4gr.
(61.4%) is obtained. Melting point: 222℃ (decomposition) UV: λmax, 260nm Specific rotation: [α] 20 D = +83 (C = 0.5%, H 2 O: CH 3 CN mixed solution)
Claims (1)
()の化合物と反応させた后ここに下記構造式
()の化合物と反応させ、さらにこの反応生成
物を加水分解することにより、 (式中、 R1は水素または炭素原子1ないし5の低級ア
ルキル基であり、 Aは水素またはヒドロキシ基であり、 Bは水素、ハロゲン、メチル、ヒドロキシメチ
ル、アセトキシメチル、メトキシまたは、―
CH2SR3基であり、 R2は水素、ナトリウム、カリウムまたはエス
テル形成基であり、 R3はトリアゾリル、テトラゾリル、チアジア
ゾリル、ピリミジニルまたはこれらの一部置換さ
れた基であり、 R4はTert―ブチル、メトキシ、エトキシ基ま
たは炭素数1ないし5の低級アルキルまたはフエ
ニルグループを示し、 R5は炭素数1ないし5の低級アルキル基、ア
ルキルシリル基或は有機塩形成基を示す。) 上記構造式()の化合物を製造することを特
徴とするセフアロスポリン誘導体の製造方法。[Scope of Claims] 1. Reacting a compound of the following structural formula () with a compound of the following structural formula (), then reacting it with a compound of the following structural formula (), and further hydrolyzing this reaction product. According to (In the formula, R 1 is hydrogen or a lower alkyl group having 1 to 5 carbon atoms, A is hydrogen or a hydroxy group, and B is hydrogen, halogen, methyl, hydroxymethyl, acetoxymethyl, methoxy or -
CH 2 SR 3 group, R 2 is hydrogen, sodium, potassium or an ester-forming group, R 3 is triazolyl, tetrazolyl, thiadiazolyl, pyrimidinyl or a partially substituted group thereof, R 4 is Tert- It represents a butyl, methoxy, ethoxy group, a lower alkyl group having 1 to 5 carbon atoms, or a phenyl group, and R 5 represents a lower alkyl group having 1 to 5 carbon atoms, an alkylsilyl group, or an organic salt-forming group. ) A method for producing a cephalosporin derivative, which comprises producing a compound of the above structural formula ().
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11629483A JPS608296A (en) | 1983-06-29 | 1983-06-29 | Manufacture of cephalosporin derivative |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11629483A JPS608296A (en) | 1983-06-29 | 1983-06-29 | Manufacture of cephalosporin derivative |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS608296A JPS608296A (en) | 1985-01-17 |
JPS6210994B2 true JPS6210994B2 (en) | 1987-03-10 |
Family
ID=14683468
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11629483A Granted JPS608296A (en) | 1983-06-29 | 1983-06-29 | Manufacture of cephalosporin derivative |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS608296A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2564826B2 (en) * | 1987-05-29 | 1996-12-18 | 大同特殊鋼株式会社 | Method for manufacturing dispersion-strengthened alloy thin-walled pipe |
EP0341991A3 (en) * | 1988-05-13 | 1991-08-28 | Eli Lilly And Company | Method for recovery of antibiotics from mother liquors and novel pharmaceutically-acceptable salts thereof |
-
1983
- 1983-06-29 JP JP11629483A patent/JPS608296A/en active Granted
Also Published As
Publication number | Publication date |
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JPS608296A (en) | 1985-01-17 |
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