JPS62109330A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS62109330A JPS62109330A JP60249376A JP24937685A JPS62109330A JP S62109330 A JPS62109330 A JP S62109330A JP 60249376 A JP60249376 A JP 60249376A JP 24937685 A JP24937685 A JP 24937685A JP S62109330 A JPS62109330 A JP S62109330A
- Authority
- JP
- Japan
- Prior art keywords
- pads
- bonding
- chip
- pad
- wire
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04042—Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0555—Shape
- H01L2224/05552—Shape in top view
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/4847—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
- H01L2224/49171—Fan-out arrangements
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Wire Bonding (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野〕
本発明は集積回路を形成したチップを有する半導体装置
に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a semiconductor device having a chip forming an integrated circuit.
集積回路を形成したチップのボンディングパッドと、チ
ップ外に配設された例えばインナーリードのボンディン
グエリアとの電気的接続は、金あるいはアルミニウムか
らなるボンディングワイヤを介してなされる。そしてこ
れら電極とワイヤの接合は、例えば超音波ボンディング
法あるいは熱圧着ボンディング法により行なわれる。こ
こで、チップのボンディングパッドの平面形状は、従来
は例えば「日経エレクトロニクス」、別冊[マイクロデ
バイセズJNo、2、P140〜141(1984年6
月11日、日経マグロウヒル礼発行)に示されるように
四角形である。Electrical connections between the bonding pads of the chip forming the integrated circuit and the bonding areas of, for example, inner leads provided outside the chip are made via bonding wires made of gold or aluminum. These electrodes and wires are bonded by, for example, an ultrasonic bonding method or a thermocompression bonding method. Here, the planar shape of the bonding pad of the chip has conventionally been determined by, for example, "Nikkei Electronics", separate volume [Micro Devices J No. 2, P140-141 (June 1984).
It is rectangular as shown in the Nikkei McGraw-Hill Rei issue published on May 11th.
ところで、チップ上に配設される複数のパッド相互の間
隔は、半導体素子の高密度化につれて小さくなっている
。なぜなら、パッケージの端子数すなわちチップ上のパ
ッド数が素子の高密度化、高集積化につれて多くなるの
に反し、チップそのもののサイズは大きくなることがな
いからである。Incidentally, the distance between a plurality of pads arranged on a chip is becoming smaller as the density of semiconductor elements becomes higher. This is because, while the number of terminals of a package, that is, the number of pads on a chip increases as the density and integration of devices become higher, the size of the chip itself does not increase.
このため、従来の平面形状が四角形のパッドでは、ワイ
ヤボンディングを高精度で制御した場合にも、ワイヤと
パッドが電気的にショートする確率が高くなる。この事
情を第3図および第4図を参照して説明する。For this reason, with conventional pads having a rectangular planar shape, even when wire bonding is controlled with high precision, there is a high probability that the wire and the pad will be electrically shorted. This situation will be explained with reference to FIGS. 3 and 4.
第3図はセラミックパッケージにチップをマウントし、
ワイヤボンディングを施した状態を示す平面図である。Figure 3 shows the chip mounted in a ceramic package.
FIG. 3 is a plan view showing a state in which wire bonding has been performed.
セラミック基板1の中央部分にはチップ2がマウントさ
れ、基板1の側面部分からはインナーリード3が延びて
いる。この複数本のインナーリード3はチップ2上の複
数のボンディングパッド4とそれぞれ対応しており、イ
ンナーリード3の先端のボンディングエリアとパッド4
との間にはボンディングワイヤ5が設けられている。図
から朗らかなように、チップの4辺それぞれの中心部分
のパッドから導き出されるワイヤはチップの辺に対して
ほぼ直交しているが、チップの4角に近い部分のパッド
から導き出されるワイヤはチップの辺に斜めに交叉する
ようになる。A chip 2 is mounted on the center portion of the ceramic substrate 1, and inner leads 3 extend from the side portions of the substrate 1. The plurality of inner leads 3 correspond to the plurality of bonding pads 4 on the chip 2, and the bonding area at the tip of the inner lead 3 and the pad 4 correspond to each other.
A bonding wire 5 is provided between the two. As you can clearly see from the figure, the wires led out from the pads at the center of each of the four sides of the chip are almost perpendicular to the sides of the chip, but the wires led out from the pads near the four corners of the chip are It will intersect diagonally with the sides of .
第4図(a)はチップの4角近傍のパッド4a。FIG. 4(a) shows pads 4a near the four corners of the chip.
4b、4Gの間隔が、比較的大きい場合を示している。This shows a case where the interval between 4b and 4G is relatively large.
この場合には、例えばパッド4aから導き出されるワイ
ヤ5aと、これに隣接するパッド4bの角部との間隔が
比較的大きく保たれるので、これらが電気的にショート
する確率は小さい。第4図(b)はチップの4辺近傍の
パッド48〜4Cの間隔が比較的小さい場合を示してい
る。この場合には、例えばパッド4aから導き出される
ワイヤ5aはこれに隣接するパッド4bの角部上方を通
っているので、これらが電気的にショートする確率が大
きくなる。特に、図示のようにワイヤ3a〜3Cがパッ
ド2a〜2Cに対しで超音波法でウェッジボンディング
されるときは、ワイヤが通る位置が低いのでショートが
発生しやすい。In this case, for example, the distance between the wire 5a led out from the pad 4a and the corner of the adjacent pad 4b is kept relatively large, so that the probability that they will be electrically shorted is small. FIG. 4(b) shows a case where the spacing between the pads 48 to 4C near the four sides of the chip is relatively small. In this case, for example, since the wire 5a led out from the pad 4a passes above the corner of the adjacent pad 4b, there is a high probability that these will be electrically short-circuited. Particularly, when the wires 3a to 3C are wedge-bonded to the pads 2a to 2C using the ultrasonic method as shown in the figure, short circuits are likely to occur because the wires pass through a low position.
そこで本発明は、半導体素子の高密度化、微細化に伴っ
てチップ上のパッド相互の間隔が小さくなったときに、
パッドから導き出されるワイヤがこれに隣接するパッド
と電気的にショートしやすいという従来技術の問題点を
解決しようとするものである。Therefore, the present invention aims to solve the problem when the spacing between pads on a chip becomes smaller due to the increase in density and miniaturization of semiconductor devices.
This is an attempt to solve the problem of the prior art in that a wire led out from a pad tends to be electrically short-circuited with an adjacent pad.
上記の問題点を解決するため、本発明に係る半導体装置
は、複数のボンディングパッド中の−っのパッドからチ
ップ外のボンディングエリアに導き出されるボンディン
グワイヤに対し、これに隣接する伯のパッドの上記ワイ
ヤに対する角部を削溝し1=ことを特徴とする。In order to solve the above-mentioned problems, the semiconductor device according to the present invention provides a bonding wire led out from a pad (-) among a plurality of bonding pads to a bonding area outside the chip, while an adjacent pad (-) It is characterized by cutting grooves at the corners of the wire.
(作 用)
上記の手段を採用したため、本発明に係る半導体装置で
は、一つのパッドから導き出されたワイヤの下方に、隣
接するパッドの角部が存在することがなくなり、従って
パッド相互の間隔が小さくかつワイヤの延びている高さ
が低いときにも、このワイヤとこれに隣接するパッドの
間の直線距離が比較的大きく保たれる。(Function) Since the above means is adopted, in the semiconductor device according to the present invention, the corners of adjacent pads do not exist below the wire led out from one pad, and therefore the spacing between the pads is reduced. Even when the wire is small and the height over which the wire extends is low, the linear distance between this wire and the pad adjacent to it remains relatively large.
以下、添付図面の第1図および第2図を参照して本発明
のいくつかの実施例を説明する。Hereinafter, some embodiments of the present invention will be described with reference to FIGS. 1 and 2 of the accompanying drawings.
第1図は第1の実施例に係る半導体装置の、チップの角
部近傍の平面図で、第4図(b)に示す従来例と対応し
ている。そしてこれが第4図(b)のものと異なる点は
、各パッド4a〜4Cそれぞれの角部のうち、隣接する
パッドから導き出されたワイヤと対向する角部に、それ
ぞれ削落面6a。FIG. 1 is a plan view of the vicinity of a corner of a chip of a semiconductor device according to a first embodiment, and corresponds to the conventional example shown in FIG. 4(b). This is different from the one shown in FIG. 4(b) in that each of the pads 4a to 4C has a cut-off surface 6a at the corner that faces the wire led out from the adjacent pad.
6b、6cが形成されていることである。なお、この削
落面6a〜6Cはパッド4a〜4Cの辺に対して45度
をなしている。6b and 6c are formed. Note that the shaved surfaces 6a to 6C form an angle of 45 degrees with respect to the sides of the pads 4a to 4C.
第1図の構成によれば、パッドから導き出されるワイヤ
が、これに隣接するパッドの角部の上に存在することが
ない。従って、例えばパッドにアルミ製ワイヤをウェッ
ジボンディングしたためにワイヤが低い位置(チップに
近接した位置)から導き出された場合でも、パッドとワ
イヤが電気的にショートすることはない。その結果、各
パッドの間隔を小さくすることができる。但し、パッド
からワイヤが導き出される方向は、第3図に示したよう
にチップの辺の右側と左側で異なるので、これに応じて
削落面を形成する角部を異ならせる必要がある。According to the configuration shown in FIG. 1, the wire led out from the pad does not lie on the corner of the adjacent pad. Therefore, even if, for example, the aluminum wire is wedge-bonded to the pad and the wire is led out from a low position (close to the chip), there will be no electrical short-circuit between the pad and the wire. As a result, the spacing between each pad can be reduced. However, since the direction in which the wire is led out from the pad is different on the right side and the left side of the chip side as shown in FIG. 3, it is necessary to make the corners forming the scraped surfaces different accordingly.
第2図は第2の実施例に係る半導体装置の、チップの角
部近傍の平面図である。−そしてこれが第1図のものと
異なる点は、各パッド4a〜4Cそれぞれの角部のうち
、チップ2の辺に近い側の2つづつの角部に削落面6a
〜6c、7a〜7Cが設けられていることである。なお
、この例においても削落面6a〜6c、7a〜7Cとパ
ッド4a〜4Cの辺とのなす角度は45度になっている
。FIG. 2 is a plan view of the vicinity of a corner of a chip of a semiconductor device according to a second embodiment. -The difference between this and the one in FIG. 1 is that, among the corners of each pad 4a to 4C, two corners on the side closer to the edge of the chip 2 have a cut-off surface 6a.
~6c, 7a~7C are provided. In addition, also in this example, the angle between the cut surfaces 6a to 6c, 7a to 7C and the sides of the pads 4a to 4C is 45 degrees.
第2図の構成によれば、パッドから導き出されるワイヤ
が、これに隣接するパッドの角部の上に存在することは
ない。その結果、各パッドの間隔を小さくでき、例えば
110μmX110μmのパッドの角部を15μmだけ
削溝したときは、パッド間隔は200μmから135μ
mに削減される。また、削落面はパッドの2つの角部に
形成されているので、チップの各辺の一方の角部近傍で
も他方の角部近傍でも、同一形状のパッドでよい。According to the configuration of FIG. 2, the wires leading out of the pads do not lie over the corners of adjacent pads. As a result, the spacing between each pad can be reduced. For example, when the corner of a 110 μm x 110 μm pad is grooved by 15 μm, the pad spacing will be reduced from 200 μm to 135 μm.
m. Further, since the cut surfaces are formed at the two corners of the pad, the pads may have the same shape whether near one corner or the other corner on each side of the chip.
すなわち、第2図の如くワイヤがパッドか右下の方向へ
導き出されるときは例えばワイヤ5bと削落面6Cが対
向するが、ワイヤが左下の方向へ導き出されるときは例
えばワイヤ5bと削落面7aが対向することになり、削
落面を形成する位置を変える必要がない。That is, when the wire is led out to the lower right of the pad as shown in FIG. 2, for example, the wire 5b and the cut surface 6C face each other, but when the wire is led out to the lower left, for example, the wire 5b and the cut surface 6C face each other. 7a will face each other, and there is no need to change the position where the cut surface is formed.
本発明は上記の実施例に限定されるものではなく、種々
の変形がI]J能である。例えば削落面は45度以外の
角度としてもよく、チップにおけるパッドの位置により
角度を異ならせてもよい。また、削落面を円弧状として
もよい。The present invention is not limited to the embodiments described above, and various modifications are possible. For example, the shaved surface may have an angle other than 45 degrees, and the angle may vary depending on the position of the pad on the chip. Further, the cut surface may be formed into a circular arc shape.
一方、ボンディングワイヤはアルミニウム製のものに限
られず、ボンディング法も超音波によるウェッジボンデ
ィング法に限られない。On the other hand, the bonding wire is not limited to those made of aluminum, and the bonding method is not limited to the wedge bonding method using ultrasonic waves.
(発明の効果)
以上の通りは本発明では、チップ上のパッドからチップ
外のボンディングエリアに導き出されるボンディングワ
イヤに対し、これに隣接する他のパッドの上記ボンディ
ングワイヤに対向する角部を削溝するようにしたので、
ボンディングワイヤと隣接するパッドが電気的にショー
トする確率は著しく小さくなり、従ってパッドの間隔を
小さくして素子を高密度化、微細化した半導体装置を得
ることができる。(Effects of the Invention) As described above, in the present invention, for a bonding wire led from a pad on a chip to a bonding area outside a chip, grooves are formed in the corners of other adjacent pads opposite to the bonding wire. I decided to do this, so
The probability of electrical short-circuiting between pads adjacent to bonding wires is significantly reduced, and therefore, it is possible to obtain a semiconductor device with high density and miniaturized elements by reducing the spacing between the pads.
第1図は本発明の一実施例に係る半導体装置のチップの
角部近傍の平面図、第2図は他の実施例のチップの角部
近傍の平面図、第3図はセラミックパッケージにチップ
をマウントしてワイヤボンディングを施した状態を示す
平面図、第4図は従来例に係る半導体装置のチップの角
部近傍の平面図である。
1・・・セラミック基板、2・・・チップ、3・・・イ
ンナーリード、4,4a〜4C・・・ボンディングパッ
ド、5.5a〜5C・・・ボンディングワイヤ、68〜
6c、7a〜7G・・・削落面。FIG. 1 is a plan view of the vicinity of a corner of a chip of a semiconductor device according to an embodiment of the present invention, FIG. 2 is a plan view of the vicinity of a corner of a chip of another embodiment, and FIG. FIG. 4 is a plan view of the vicinity of a corner of a chip of a conventional semiconductor device. DESCRIPTION OF SYMBOLS 1... Ceramic board, 2... Chip, 3... Inner lead, 4, 4a-4C... Bonding pad, 5.5a-5C... Bonding wire, 68-
6c, 7a to 7G...Removed surfaces.
Claims (1)
これに対応してチップ外に配設された複数のボンディン
グエリアとを、ボンディングワイヤでそれぞれ接続して
なる半導体装置において、一つのボンディングパッドか
らボンディングエリアに導き出されるボンディングワイ
ヤに対し、これに隣接する他のボンディングパッドの前
記ボンディングワイヤに対向する角部を削落したことを
特徴とする半導体装置。 2、ボンディングパッド角部の削落面が、これに対向す
るボンディングワイヤと平行である特許請求の範囲第1
項記載の半導体装置。 3、ボンディングパッド角部の削落面が、当該ボンディ
ングパッドの各辺と45度をなしている特許請求の範囲
第1項記載の半導体装置。[Claims] 1. In a semiconductor device in which a plurality of bonding pads arranged on a chip and a plurality of corresponding bonding areas arranged outside the chip are respectively connected by bonding wires. A semiconductor device characterized in that, with respect to a bonding wire led out from one bonding pad to a bonding area, a corner portion of another bonding pad adjacent thereto facing the bonding wire is shaved off. 2. Claim 1, in which the shaved surface of the corner of the bonding pad is parallel to the bonding wire facing thereto.
1. Semiconductor device described in Section 1. 3. The semiconductor device according to claim 1, wherein the shaved surface of the corner of the bonding pad forms an angle of 45 degrees with each side of the bonding pad.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60249376A JPS62109330A (en) | 1985-11-07 | 1985-11-07 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60249376A JPS62109330A (en) | 1985-11-07 | 1985-11-07 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62109330A true JPS62109330A (en) | 1987-05-20 |
Family
ID=17192096
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60249376A Pending JPS62109330A (en) | 1985-11-07 | 1985-11-07 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62109330A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2631742A1 (en) * | 1988-05-23 | 1989-11-24 | United Technologies Corp | INTEGRATED CIRCUIT MODULE WITH IMPROVED WELDING OF LEGS |
-
1985
- 1985-11-07 JP JP60249376A patent/JPS62109330A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2631742A1 (en) * | 1988-05-23 | 1989-11-24 | United Technologies Corp | INTEGRATED CIRCUIT MODULE WITH IMPROVED WELDING OF LEGS |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2537014B2 (en) | Lead frame package for electronic devices | |
US3959579A (en) | Apertured semi-conductor device mounted on a substrate | |
US5550401A (en) | Lead on chip semiconductor device having bus bars and crossing leads | |
JP3138539B2 (en) | Semiconductor device and COB substrate | |
JP3247544B2 (en) | Semiconductor device | |
JPS62109330A (en) | Semiconductor device | |
JP7265502B2 (en) | semiconductor equipment | |
JP2004047715A (en) | Semiconductor connection relay member and semiconductor device | |
JP2533011B2 (en) | Surface mount semiconductor device | |
JP2007149809A (en) | Semiconductor device and its manufacturing method | |
CN113496976B (en) | Semiconductor device with a semiconductor device having a plurality of semiconductor chips | |
JP2538407B2 (en) | Surface mount semiconductor device | |
JP2001118954A (en) | Semiconductor device | |
JPH0878467A (en) | Semiconductor wafer, dicing method therefor and semiconductor device | |
JPS62202532A (en) | Semiconductor device | |
JP2913858B2 (en) | Hybrid integrated circuit | |
US7800237B2 (en) | Electronic device including a component stack and connecting elements, and connecting elements, and method for producing the electronic device | |
JPH08293571A (en) | Package and semiconductor integrated circuit device provided therewith | |
JP2006186053A (en) | Laminated semiconductor device | |
JP2001267351A (en) | Wire-bonding structure | |
JP2003109986A (en) | Semiconductor device | |
JP4686869B2 (en) | Semiconductor element and method for evaluating semiconductor element | |
JP2513138B2 (en) | Semiconductor integrated circuit device | |
JPH05206375A (en) | Multi-chip module | |
JP2006196615A (en) | Semiconductor device mounting board |