JPS6210512B2 - - Google Patents

Info

Publication number
JPS6210512B2
JPS6210512B2 JP55132253A JP13225380A JPS6210512B2 JP S6210512 B2 JPS6210512 B2 JP S6210512B2 JP 55132253 A JP55132253 A JP 55132253A JP 13225380 A JP13225380 A JP 13225380A JP S6210512 B2 JPS6210512 B2 JP S6210512B2
Authority
JP
Japan
Prior art keywords
acid
group
amino
methyl
carboxyl group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55132253A
Other languages
Japanese (ja)
Other versions
JPS5758689A (en
Inventor
Hiroshi Sadaki
Hirokazu Narita
Hiroyuki Imaizumi
Yoshinori Konishi
Takihiro Inaba
Tatsuo Hirakawa
Hideo Taki
Masaru Tai
Yasuo Watanabe
Isamu Saikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyama Chemical Co Ltd
Original Assignee
Toyama Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyama Chemical Co Ltd filed Critical Toyama Chemical Co Ltd
Priority to JP55132253A priority Critical patent/JPS5758689A/en
Priority to NZ198350A priority patent/NZ198350A/en
Priority to GB8128011A priority patent/GB2089339B/en
Priority to PH26215A priority patent/PH18072A/en
Priority to CA000386066A priority patent/CA1204735A/en
Priority to AU75438/81A priority patent/AU550330B2/en
Priority to IN1045/CAL/81A priority patent/IN155375B/en
Priority to IL74415A priority patent/IL74415A/en
Priority to ZA816576A priority patent/ZA816576B/en
Priority to DE3152934A priority patent/DE3152934C2/de
Priority to IT49348/81A priority patent/IT1172201B/en
Priority to NL8104386A priority patent/NL8104386A/en
Priority to DE3152932A priority patent/DE3152932C2/de
Priority to DE3152935A priority patent/DE3152935C2/de
Priority to PL1981238228A priority patent/PL137674B1/en
Priority to DE19813137854 priority patent/DE3137854A1/en
Priority to US06/304,912 priority patent/US4489072A/en
Priority to DE3152931A priority patent/DE3152931C2/de
Priority to AT0410981A priority patent/AT375082B/en
Priority to ES505760A priority patent/ES505760A0/en
Priority to KR1019810003579A priority patent/KR860000487B1/en
Priority to HU812759A priority patent/HU185850B/en
Priority to FI812980A priority patent/FI75575C/en
Priority to HU831798A priority patent/HU188021B/en
Priority to SE8105658A priority patent/SE453090B/en
Priority to LU83650A priority patent/LU83650A1/en
Priority to DK421881A priority patent/DK163877C/en
Priority to NO813252A priority patent/NO161117C/en
Priority to PT73727A priority patent/PT73727B/en
Priority to MX7609A priority patent/MX155025A/en
Priority to RO112113A priority patent/RO86825B/en
Priority to CH4519/84A priority patent/CH651837A5/en
Priority to RO112112A priority patent/RO86824B/en
Priority to BE0/206067A priority patent/BE890499A/en
Priority to FR8118156A priority patent/FR2509310B1/en
Priority to RO81105405A priority patent/RO82689A/en
Priority to RO112111A priority patent/RO86823B/en
Priority to DD81233599A priority patent/DD202436A5/en
Priority to CH4520/84A priority patent/CH652130A5/en
Priority to CH6202/81A priority patent/CH652129A5/en
Priority to DD81247292A priority patent/DD208351A5/en
Priority to CH4521/84A priority patent/CH652128A5/en
Priority to EG543/81A priority patent/EG17373A/en
Publication of JPS5758689A publication Critical patent/JPS5758689A/en
Priority to ES514670A priority patent/ES514670A0/en
Priority to ES514671A priority patent/ES8306157A1/en
Priority to ES514669A priority patent/ES8306155A1/en
Priority to FR8215995A priority patent/FR2511374B1/en
Priority to FR8215992A priority patent/FR2511377B1/en
Priority to FR8215994A priority patent/FR2511373B1/en
Priority to CS827531A priority patent/CS236493B2/en
Priority to SU823521951A priority patent/SU1318144A3/en
Priority to SU823520352A priority patent/SU1308198A3/en
Priority to AR29180883A priority patent/AR240645A1/en
Priority to AT0055483A priority patent/AT378961B/en
Priority to AT0055583A priority patent/AT378962B/en
Priority to AT0055683A priority patent/AT378193B/en
Priority to PH29076A priority patent/PH19147A/en
Priority to PH29078A priority patent/PH18484A/en
Priority to PH29077A priority patent/PH20221A/en
Priority to PH29075A priority patent/PH19251A/en
Priority to SU833635254A priority patent/SU1350166A1/en
Priority to CA000435930A priority patent/CA1200541A/en
Priority to GB838333402A priority patent/GB8333402D0/en
Priority to GB838333401A priority patent/GB8333401D0/en
Priority to GB08402250A priority patent/GB2136420B/en
Priority to GB08402249A priority patent/GB2135304B/en
Priority to IN603/CAL/84A priority patent/IN159126B/en
Priority to IN601/CAL/84A priority patent/IN158589B/en
Priority to IN602/CAL/84A priority patent/IN158590B/en
Priority to US06/654,681 priority patent/US4673738A/en
Priority to IL74415A priority patent/IL74415A0/en
Priority to IL76348A priority patent/IL76348A0/en
Priority to AU49863/85A priority patent/AU558669B2/en
Priority to AU49861/85A priority patent/AU568033B2/en
Priority to AU49862/85A priority patent/AU558649B2/en
Priority to AU49860/85A priority patent/AU558586B2/en
Priority to SE8600192A priority patent/SE468478B/en
Priority to SE8600195A priority patent/SE468477B/en
Priority to SE8600193A priority patent/SE468479B/en
Priority to SE8600194A priority patent/SE468476B/en
Priority to MX904686A priority patent/MX9046A/en
Priority to KR1019860002383A priority patent/KR860000932B1/en
Priority to FI870153A priority patent/FI80041C/en
Priority to US07/022,433 priority patent/US4879381A/en
Publication of JPS6210512B2 publication Critical patent/JPS6210512B2/ja
Priority to US07/707,221 priority patent/US5144027A/en
Granted legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/207-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/247-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/38Methylene radicals, substituted by nitrogen atoms; Lactams thereof with the 2-carboxyl group; Methylene radicals substituted by nitrogen-containing hetero rings attached by the ring nitrogen atom; Quaternary compounds thereof
    • C07D501/46Methylene radicals, substituted by nitrogen atoms; Lactams thereof with the 2-carboxyl group; Methylene radicals substituted by nitrogen-containing hetero rings attached by the ring nitrogen atom; Quaternary compounds thereof with the 7-amino radical acylated by carboxylic acids containing hetero rings
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00Medicinal preparations containing organic active ingredients
    • A61K31/33Heterocyclic compounds
    • A61K31/395Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/54Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with at least one nitrogen and one sulfur as the ring hetero atoms, e.g. sulthiame
    • A61K31/542Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with at least one nitrogen and one sulfur as the ring hetero atoms, e.g. sulthiame ortho- or peri-condensed with heterocyclic ring systems
    • A61K31/545Compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins, cefaclor, or cephalexine
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/207-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/247-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/38Methylene radicals, substituted by nitrogen atoms; Lactams thereof with the 2-carboxyl group; Methylene radicals substituted by nitrogen-containing hetero rings attached by the ring nitrogen atom; Quaternary compounds thereof
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/207-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/247-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/48Methylene radicals, substituted by hetero rings
    • C07D501/56Methylene radicals, substituted by hetero rings with the 7-amino radical acylated by carboxylic acids containing hetero rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/207-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/577-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with a further substituent in position 7, e.g. cephamycines

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • Epidemiology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pharmacology & Pharmacy (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Medicinal Chemistry (AREA)
  • Cephalosporin Compounds (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は、7−アミノ−3−置換メチルセフエ
ムカルボン酸類又はそのカルボキシル基における
誘導体又はそれらの塩の製造法に関し、詳細に
は、 一般式 〔式中、R1は水素原子を;R2はアミノ基を;Xは
置換基を有するかもしくは有しないアシルオキシ
基を;〓Yは〓S又はS→Oを意味する。〕 で表わされる。セフアロスポラン酸類又はそのカ
ルボキシル基における誘導体又はそれらの塩に、
有機溶媒中、酸又は酸の錯化合物の存在下、環中
の炭素原子が置換されていてもよいトリアゾール
又はテトラゾール又はそれらの塩を反応させ、所
望により次いで保護基の脱離又はカルボキシル基
を保護又は塩とすることからなる、 一般式 〔式中R1、R2およびYは前記した意味を有し、R3
は環中の炭素原子が置換されていてもよいトリア
ゾリル又はテトラゾリル基を示す。ただし、−
CH2R3は、R3の窒素原子と隣接するエキソメチ
レン基の炭素原子と結合しているものとする。〕 で表わされる7−アミノ−3−置換メチルセフエ
ムカルボン酸類又はそのカルボキシル基における
誘導体又はそれらの塩の製造法に関する。 而して、本発明の目的とするところは、セフア
ロスポラン系化合物を製造する際、中間体として
有用な一般式〔〕で表わされる7−アミノ−3
−置換メチルセフエムカルボン酸類又はそのカル
ボキシル基に於ける誘導体又はそれらの塩を工業
的に容易な操作で好収率かつ高純度で得る方法を
提供せんとするにある。 従来、一般式〔〕で表わされる化合物中、
R3が1−(1H−1・2・3−トリアゾリル)及び
1−(1H−1・2・3・4−テトラゾリル)基で
ある化合物を製造する方法としては、7−ACA
の3位をアジドで置換〔ザ・ジヤーナル・オブ・
アンチバイオテクス、25、No.1.64(1972)〕した
後閉環化する方法〔特公昭50−13275号〕が知ら
れていた。 しかし、この従来方法は反応工程が多く、また
収率も低いことから工業的生産には不向きであ
り、また、一般式〔〕に於いてR3が1−(1H−
1・2・3−トリアゾリル)又は1−(1H−1・
2・3・4−テトラゾリル)基である化合物しか
製造することができない。 このような状況にあつて、本発明者等は、セフ
アロスポラン環の3位のエキソメチレン基の炭素
原子が、R3の任意の窒素原子と結合している一
般式〔〕で表わされる化合物を工業的に容易に
かつ好収率に得る製造法を開発せんとして鋭意研
究した結果、有機溶媒中、酸又は酸の錯化合物の
存在下、一般式〔〕で表わされる化合物又はそ
のカルボキシル基に於ける誘導体又はそれらの塩
と、環中の炭素原子が置換されていてもよいトリ
アゾール又はテトラゾール又はそれらの塩を反応
させ、所望により次いで保護基の脱離又はカルボ
キシル基を保護又は塩とすれば、これらの目的が
達成されることを見出し本発明を完成した。 本発明方法によれば、一般式〔〕において
R3が1−(1H−1・2・3−トリアゾリル)及び
1−(1H−1・2・3・4−テトラゾリル)基の
みならず、2−(2H−1・2・3−トリアゾリ
ル)、1−(1H−1・2・4−トリアゾリル)、4
−(4H−1・2・4−トリアゾリル)及び2−
(2H−1・2・3・4−テトラゾリル)基等の新
規な化合物を得ることもでき、更に、〓Yが〓S
である化合物のみならず、〓Yが〓S→Oである
化合物も出発原料として用いることができ、反応
中又は後処理の段階で、〓S→Oを〓Sとするこ
ともできる。 以下、本発明を詳細に説明する。 本発明において、Xのアシルオキシ基として
は、例えば、アセトキシ、プロピオニルオキシ又
はブチリルオキシ等のアルカノイルオキシ基;ア
クリロイルオキシ等のアルケノイルオキシ基;ベ
ンゾイルオキシ又はナフトイルオキシ等のアロイ
ルオキシ基が挙げられ、これらはハロゲン原子、
ニトロ基、アルキル基、アルコキシ基、アルキル
チオ基、アシルオキシ基、アシルアミノ基、ヒド
ロキシル基、カルボキシル基、スルフアモイル
基、カルバモイル基、カルボアルコキシカルバモ
イル基、アロイルカルバモイル基、カルボアルコ
キシスルフアモイル基、アリール基、カルバモイ
ル基等の一種以上の置換基で置換されていてもよ
い。 また、環中の炭素原子が置換されていてもよい
トリアゾール又はテトラゾールとしては、例え
ば、ハロゲン原子、アルキル基、ヒドロキシル
基、アルアルキル基、アルコキシ基、アルキルチ
オ基、シアノ基、アミノ基、カルボキシル基、ア
ルコキシアルキル基、アミノアルキル基、N−ア
ルキルアミノアルキル基、ハロアルキル基、アシ
ル基等の一種以上の置換基で環中の炭素原子が置
換されていてもよい1・2・3−トリアゾール、
1・2・4−トリアゾール又は1・2・3・4−
テトラゾールが挙げられる。これら、1・2・3
−トリアゾール、1・2・4−トリアゾールおよ
び1・2・3・4−テトラゾールは以下に示すよ
うに互変異性体が存在し、いずれの異性体でもま
た、混合物の状態でも反応に供することができ
る。 (式中、Rは水素原子又は上述した置換基を示
し、2個のRは同一であつてもよく又異なつてい
てもよい。) 一般式〔〕に於いて、R3で表わされる基と
しては、具体的に上述した置換基で環中の炭素原
子が置換されていてもよい1−(1H−1・2・3
−トリアゾリル)、2−(2H−1・2・3−トリ
アゾリル)、1−(1H−1・2・4−トリアゾリ
ル)、4−(4H−1・2・4−トリアゾリル)、1
−(1H−1・2・3・4−テトラゾリル)又は2
−(2H−1・2・3・4−テトラゾリル)基が挙
げられる。 上述したX、環中の炭素原子が置換されていて
もよいトリアゾールおよびテトラゾールの置換基
に於いて、ヒドロキシル基、アミノ基及びカルボ
キシル基は通常用いられる保護基で保護されてい
てもよい。 アミノ基の保護基としては、通常アミノ保護基
として使用し得るすべての基を含み、例えば、ト
リクロロエトキシカルボニル、トリブロモエトキ
シカルボニル、ベンジルオキシカルボニル、p−
トルエンスルホニル、p−ニトロベンジルオキシ
カルボニル、o−ブロモベンジルオキシカルボニ
ル、クロロアセチル、トリフルオロアセチル、ホ
ルミル、tert.−ブトキシカルボニル、p−メト
キシベンジルオキシカルボニル、3・4−ジメト
キシベンジルオキシカルボニル、4−(フエニル
アゾ)ベンジルオキシカルボニル、4−(4−メ
トキシフエニルアゾ)ベンジルオキシカルボニ
ル、ピリジン−1−オキサイド−2−イル−メト
キシカルボニル、2−ピリジルメトキシカルボニ
ル、2−フリルオキシカルボニル、ジフエニルメ
トキシカルボニル、1・1−ジメチルプロポキシ
カルボニル、イソプロポキシカルボニル、1−シ
クロプロピルエトキシカルボニル、フタロイル、
サクシニル、1−アダマンチルオキシカルボニ
ル、8−キノリルオキシカルボニル等の脱離しや
すいアシル基が挙げられ、さらに例えば、トリチ
ル、2−ニトロフエニルチオ、2・4−ジニトロ
フエニルチオ、2−ヒドロキシベンジリデン、2
−ヒドロキシ−5−クロロベンジリデン、2−ヒ
ドロキシ−1−ナフチルメチレン、3−ヒドロキ
シ−4−ピリジルメチレン、1−メトキシカルボ
ニル−2−プロピリデン、1−エトキシカルボニ
ル−2−プロピリデン、3−エトキシカルボニル
−2−ブチリデン、1−アセチル−2−プロピリ
デン、1−ベンゾイル−2−プロピリデン、1−
〔N−(2−メトキシフエニル)カルバモイル〕−
2−プロピリデン、1−〔N−(4−メトキシフエ
ニル)カルバモイル〕−2−プロピリデン、2−
エトキシカルボニルシクロヘキシリデン、2−エ
トキシカルボニルシクロペンチリデン、2−アセ
チルシクロヘキシリデン、3・3−ジメチル−5
−オキソシクロヘキシリデン等の脱離しやすい
基、また、ジ−もしくはトリアルキルシリル等の
アミノ基の保護基が挙げられる。また、ヒドロキ
シル基の保護基としては通常ヒドロキシル基の保
護基として使用し得るすべての基を含み、例え
ば、ベンジルオキシカルボニル、4−ニトロベン
ジルオキシカルボニル、4−ブロモベンジルオキ
シカルボニル、4−メトキシベンジルオキシカル
ボニル、3・4−ジメトキシベンジルオキシカル
ボニル、4−(フエニルアゾ)ベンジルオキシカ
ルボニル、4−(4−メトキシフエニルアゾ)ベ
ンジルオキシカルボニル、tert.−ブトキシカル
ボニル、1・1−ジメチルプロポキシカルボニ
ル、イソプロポキシカルボニル、ジフエニルメト
キシカルボニル、2−ピリジルメトキシカルボニ
ル、2・2・2−トリクロロエトキシカルボニ
ル、2・2・2−トリブロモエトキシカルボニ
ル、2−フルフリルオキシカルボニル、1−アダ
マンチルオキシカルボニル、1−シクロプロピル
エトキシカルボニル、3−キノリルオキシカルボ
ニル、トリフルオロアセチル等の脱離しやすいア
シル基の外、ベンジル、トリチル、メトキシメチ
ル、2−ニトロフエニルチオ、2・4−ジニトロ
フエニルチオ等の基が挙げられる。 さらに、カルボキシル基の保護基としては、通
常のカルボキシル基の保護基として使用し得るす
べての基を含み、例えば、そのエステル部分がメ
チル、エチル、プロピル、イソプロピル、tert.
−ブチル、ブチル、ベンジル、ジフエニルメチ
ル、トリフエニルメチル、p−ニトロベンジル、
p−メトキシベンジル、ベンゾイルメチル、アセ
チルメチル、p−ニトロベンゾイルメチル、p−
ブロモベンゾイルメチル、p−メタンスルホニル
ベンゾイルメチル、フタルイミドメチル、トリク
ロロエチル、1・1−ジメチル−2−プロピニ
ル、アセトキシメチル、プロピオニルオキシメチ
ル、ピバロイルオキシメチル、1・1−ジメチル
プロピル、1・1−ジメチル−2−プロペニル、
3−メチル−3−ブテニル、サクシンイミドメチ
ル、1−シクロプロピルエチル、メチルスルフエ
ニルメチル、フエニルスルフエニルメチル、メチ
ルチオメチル、フエニルチオメチル、ジメチルア
ミノメチル、キノリン−1−オキサイド−2−メ
チル、ピリジン−1−オキサイド−2−イル−メ
チル、ビス−(p−メトキシフエニル)メチル等
であるエステル、さらに特開昭46−7073号公報及
びオランダ国公開公報7105259号に記載されてい
る、例えばジメチルクロロシランの如きシリル化
合物で保護されていてもよい。 一般式〔〕及び一般式〔〕の化合物のカル
ボキシル基における誘導体としては、例えば次の
様なものが挙げられる。 (a) エステル類:エステル類としては、反応に悪
影響を与えないすべてのエステルを含み、例え
ば、メチルエステル、エチルエステル、プロピ
ルエステル、イソプロピルエステル、ブチルエ
ステル、tert.−ブチルエステル、メトキシメ
チルエステル、エトキシメチルエステル、フエ
ノキシメチルエステル、メチルチオメチルエス
テル、メチルチオエチルエステル、フエニルチ
オメチルエステル、ジメチルアミノエチルエス
テル、ジエチルアミノエチルエステル、モルホ
リノエチルエステル、ピペリジノエチルエステ
ル、アセチルメチルエステル、フエナシルエス
テル、トルオイルメチルエステル、4−ニトロ
フエナシルエステル、アセトキシメチルエステ
ル、ピバロイルオキシメチルエステル、ベンゾ
イルオキシメチルエステル、1・1−ジアセチ
ルメチルエステル、1−アセチル−1−メトキ
シカルボニルメチルエステル、メタンスルホニ
ルエチルエステル、トルエンスルホニルエチル
エステル、ブロモメチルエステル、ヨードエチ
ルエステル、トリクロロエチルエステル、シア
ノメチルエステル、テノイルメチルエステル、
フタルイミドメチルエステル等の置換又は非置
換のアルキルエステル;シクロヘキシルエステ
ル、シクロヘプチルエステル等のシクロアルキ
ルエステル;プロペニルエステル、アリルエス
テル、3−ブテニルエステル等のアルケニルエ
ステル;プロピニルエステル等のアルキニルエ
ステル;フエニルエステル、トリルエステル、
キシリルエステル、ナフチルエステル、p−ニ
トロフエニルエステル、2・4−ジニトロフエ
ニルエステル、p−メトキシフエニルエステ
ル、トリクロロフエニルエステル、ペンタクロ
ロフエニルエステル、p−メタンスルホニルフ
エニルエステル等の置換又は非置換のアリール
エステル;ベンジルエステル、フエネチルエス
テル、p−クロロベンジルエステル、p−ニト
ロベンジルエステル、p−メトキシベンジルエ
ステル、3・5−ジメトキシベンジルエステ
ル、ジフエニルメチルエステル、ビス−(4−
メトキシフエニル)メチルエステル、3・5−
ジ−tert.−ブチル−4−ヒドロキシベンジル
エステル、トリチルエステル等の置換又は非置
換のアルアルキルエステル;インダニルエステ
ル;フタリジルエステル;その他カルボキシル
基とハロゲン原子、ニトロ基、アルコキシ基等
で置換されたあるいは非置換のチオアルコー
ル、テトラヒドロフラノール、1−シクロプロ
ピルエタノール、1−フエニル−3−メチル−
5−ピラゾロン、3−ヒドロキシピリジン、2
−ヒドロキシピリジン−1−オキシドなどから
形成されるエステル;又はカルボキシル基とメ
トキシアセチレン、エトキシアセチレン、
tert.−ブチルエチニルジメチルアミン、エチ
ルエチニルジエチルアミン、N−エチル−5−
フエニルイソオキサゾリウム−3−スルホン酸
塩との反応によつて形成されるエステルが挙げ
られる。 (b) カルボキシル基とN−ヒドロキシコハク酸イ
ミド、N−ヒドロキシフタルイミド、ジメチル
ヒドロキシルアミン、ジエチルヒドロキシルア
ミン、1−ヒドロキシピペリジン、オキシム等
の無水物。 (c) アミド類:アミド類としては、酸アミド、N
−置換酸アミド、N・N−ジ置換アミドのすべ
てを含み、例えば、N−メチル酸アミド、N−
エチル酸アミド等のN−アルキル酸アミド;N
−フエニル酸アミド等のN−アリール酸アミ
ド;N・N−ジメチル酸アミド、N・N−ジエ
チル酸アミド、N−エチル−N−メチル酸アミ
ド等のN・N−ジアルキル酸アミド;イミダゾ
ール、4−置換イミダゾール、トリアゾロピリ
ドン等の酸アミドが挙げられる。 本発明において一般式〔〕及び一般式〔〕
の化合物又はそのカルボキシル基における誘導体
又はそれらの塩のそれらの塩としては、酸性基に
おける塩及び塩基性基における塩の両方を包含す
る。酸性基における塩としては、例えば、ナトリ
ウム、カリウム等のアルカリ金属との塩;カルシ
ウム、マグネシウム等のアルカリ土類金属との
塩;アンモニウム塩;トリエチルアミン、ジエチ
ルアミン、ピリジン、N−メチルピペリジン、N
−メチルモルホリン、N・N−ジメチルアニリン
等の含窒素有機塩基との塩が挙げられる。また塩
基性基における塩としては、塩酸、硫酸等の鉱酸
との塩;シユウ酸、ギ酸、トリクロロ酢酸、トリ
フルオロ酢酸等の有機酸との塩;メタンスルホン
酸、トルエンスルホン酸、ナフタレンスルホン酸
等のスルホン酸との塩が挙げられる。尚、一般式
〔〕の化合物の塩は予め単離して用いてもよ
く、あるいは系内で調製してもよい。 環中の炭素原子が置換されていてもよいトリア
ゾール及びテトラゾールは必要に応じ塩基性塩又
は酸性塩の形で反応に供してもよい。該塩基性塩
及び酸性塩としては、前述のような塩の形が挙げ
られる。 本発明方法に使用される酸または酸の錯化合物
としては、例えば、プロトン酸、ルイス酸または
ルイス酸の錯化合物が挙げられる。プロトン酸と
しては例えば、硫酸類、スルホン酸類又は超強酸
類(超強酸とは100%硫酸より強い酸を意味し、
前述の硫酸類およびスルホン酸類の一部も含まれ
る)が挙げられ、更に具体的には、硫酸、クロロ
硫酸又はフルオロ硫酸等の硫酸類;メタンスルホ
ン酸又はトリフルオロメタンスルホン酸等のアル
キル(モノ−又はジ−)スルホン酸又はp−トル
エンスルホン酸等のアリール(モノ−、ジ−又は
トリ−)スルホン酸等のスルホン酸類;過塩素
酸、マジツク酸(FSO3H−SbF5)、FSO3H−
AsF5、CF3SO3H−SbF5、HF−BF3、H2SO4
SO3等の超強酸類が挙げられる。また、ルイス酸
としては、例えば、三弗化硼素等が挙げられる。 また、ルイス酸の錯化合物としては、例えば、
三弗化硼素とジエチルエーテル、ジ−n−プロピ
ルエーテル、ジ−n−ブチルエーテル等とのジア
ルキルエーテル錯塩;エチルアミン、n−プロピ
ルアミン、n−ブチルアミン、トリエタノールア
ミン等とのアミン錯塩;ギ酸エチル、酢酸エチル
等とのカルボン酸エステル錯塩;酢酸、プロピオ
ン酸等との脂肪酸錯塩;又はアセトニトリル、プ
ロピオニトリル等とのニトリル錯塩等が挙げられ
る。 次に、本発明方法の実施態様を説明する。 本発明方法は、前述したように、一般式〔〕
で表わされる化合物又はそのカルボキシル基にお
ける誘導体又はそれらの塩と、環中の炭素原子が
置換されていてもよいトリアゾール又はテトラゾ
ール又はそれらの塩を有機溶媒中、酸又は酸の錯
化合物の存在下に、反応させる。 反応に用いられる有機溶媒としては、反応に悪
影響を及ぼさない全ての有機溶媒を挙げることが
でき、例えば、ニトロメタン、ニトロエタン、ニ
トロプロパン等のニトロアルカン類;ギ酸、酢
酸、トリフルオロ酢酸、ジクロロ酢酸、プロピオ
ン酸等の有機カルボン酸類;アセトン、メチルエ
チルケトン、メチルイソブチルケトン等のケトン
類;ジエチルエーテル、ジイソプロピルエーテ
ル、ジオキサン、テトラヒドロフラン、エチレン
グリコールジメチルエーテル、アニソール、ジメ
チルセルソルブ等のエーテル類;ギ酸エチル、炭
酸ジエチル、酢酸メチル、酢酸エチル、クロロ酢
酸エチル、酢酸ブチル等のエステル類;アセトニ
トリル、ブチロニトリル等のニトリル類;又はス
ルホラン等のスルホラン類を挙げることができ、
これらの溶媒を二種以上混合して用いてもよい。
また、これらの有機溶媒とルイス酸とで形成され
る錯化合物を溶媒として使用してもよい。酸又は
酸の錯化合物の使用量は、一般式〔〕で表わさ
れる化合物又はそのカルボキシル基における誘導
体又はそれらの塩に対し、当モル以上であればよ
く、個々の場合に応じ適当増減させることができ
る。特に、2〜10倍モル量の使用が好ましい。酸
の錯化合物を用いる場合には、これ自体を溶媒と
して用いることができ、二種以上の錯化合物を混
合して用いてもよい。 また、環中の炭素原子が置換されていてもよい
トリアゾール又はテトラゾール又はそれらの塩の
使用量は、一般式〔〕で表わされる化合物又は
そのカルボキシル基における誘導体又はそれらの
塩に対し、当モル以上であればよいが、特に1.0
〜5.0倍モル量の使用が好ましい。 反応は、通常0〜80℃の温度にて行なわれ、反
応時間は一般に数分〜数十時間である。本反応の
系内に水分があると原料又は生成物のラクトン化
およびβ−ラクタム環の開裂等好ましくない副反
応を惹起する恐れがあるので、反応系内を無水の
状態に保つことが望ましい。 この要望を満たすために、反応系内に適当な脱
水剤、例えば、五酸化リン、ポリリン酸、五塩化
リン、三塩化リン、オキシ塩化リン等のリン化合
物;N・O−ビス(トリメチルシリル)アセトア
ミド、トリメチルシリルアセトアミド、トリメチ
ルクロロシラン、ジメチルジクロロシラン等の有
機シリル化剤;アセチルクロリド、p−トルエン
スルホニルクロリド等の有機酸クロリド;無水酢
酸、無水トリフルオロ酢酸等の酸無水物;無水硫
酸マグネシウム、無水塩化カルシウム、モレキユ
ラーシーブ、カルシウムカーバイト等の無機乾燥
剤等を添加してもよい。 一般式〔〕で表わされる化合物のカルボキシ
ル基における誘導体を原料として使用した場合、
反応後の処理により一般式〔〕で表わされる化
合物が得られることもあるが、所望により、保護
基を常法で脱離させ、一般式〔〕で表わされる
化合物を得ることもできる。環中の炭素原子が置
換されていてもよいトリアゾール又はテトラゾー
ル又はそれらの塩が、ヒドロキシル基、アミノ
基、カルボキシル基等で置換されている場合、本
反応を実施する前に、これらの基を保護し、反応
終了後、常套の脱離反応に付すことにより、所望
の化合物を得ることができる。 また、一般式〔〕で表わされる目的化合物は
所望により、常法に従つてカルボキシル基の保護
または塩とすることができ、相当する化合物を得
ることもできる。 また、本発明方法を実施すれば、一般にR3
任意の窒素原子とセフアロスポラン環の3位のエ
キソメチレン基の炭素原子とが結合した混合物が
得られる場合もあり、反応条件を必要に応じて変
えることにより、R3の特定の窒素原子とセフア
ロスポリン環の3位のエキソメチレン基の炭素原
子とが結合した化合物を得ることもできる。 このようにして得られる目的化合物は、常法手
段により単離採取することができる。 そして本発明の△−セフエム化合物は、既知
又は新規なアシル基にて、セフアロスポラン環の
7位をアミド化することにより、グラム陽性菌な
らびにグラム陰性菌に対して、有効な種々の有用
なセフアロスポリン系化合物へと誘導でき、中間
体として有用な化合物である。 次に、本発明を実施例を挙げて具体的に説明す
る。 実施例 1 (1) 7−アミノセフアロスポラン酸(以後、7−
ACAと略記する)2.72gをスルホラン13mlに
懸濁させ、これに三弗化硼素・ジエチルエーテ
ル錯塩14.2gおよび5−メチルテトラゾール
1.0gを加えて、室温で17時間反応させる。反
応終了後、反応液を氷水15ml中に投入し、氷冷
下28%アンモニア水でPH3.5に調整する。析出
晶を取し、水5mlおよびアセトン5mlで順次
洗浄した後、乾燥すれば、7−アミノ−3−
〔2−(5−メチル−2H−1・2・3・4−テ
トラゾリル)メチル〕−△−セフエム−4−
カルボン酸および7−アミノ−3−〔1−(5−
メチル−1H−1・2・3・4−テトラゾリ
ル)メチル〕−△−セフエム−4−カルボン
酸の混合物の結晶1.76gを得る。 (2) (1)で得られた結晶1.76gをメタノール18mlに
懸濁させ、これにp−トルエンスルホン酸1水
和物1.13gを加えて溶解させた後、ジフエニル
ジアゾメタン4.6gを徐々に加え、室温下15分
間反応させる。反応終了後、減圧下に溶媒を留
去する。残留物を酢酸エチル30mlおよび水30ml
から成る混合溶媒に溶解させ、炭酸水素ナトリ
ウムでPH8に調整する。次いで有機層を分取
し、これを無水硫酸マグネシウムで乾燥後、減
圧下に溶媒を留去する。残留物をカラムクロマ
トグラフイー(和光シリカゲルC−200;展開
溶媒、ベンゼン:酢酸エチル=4:1)で精製
すれば、融点157〜160℃(分解)を示す7−ア
ミノ−3−〔2−(5−メチル−2H−1・2・
3・4−テトラゾリル)メチル〕−△−セフ
エム−4−カルボン酸ベンズヒドリルエステル
0.79gおよび融点92℃(分解)を示す7−アミ
ノ−3−〔1−(5−メチル−1H−1・2・
3・4−テトラゾリル)メチル〕−△−セフ
エム−4−カルボン酸ベンズヒドリルエステル
0.14gを得る。 Γ7−アミノ−3−〔2−(5−メチル−2H−
1・2・3・4−テトラゾリル)メチル〕−
−セフエム−4−カルボン酸ベンズヒド
リルエステル IR(KBr)cm-1;νC=O1770、1720 NMR(CDCl3)ppm値; 1.75(2H、bs、−NH2)、 2.48(3H、s、−CH3)、 3.20(2H、s、
The present invention relates to a method for producing 7-amino-3-substituted methyl cefemcarboxylic acids, derivatives at the carboxyl group, or salts thereof, and in particular, the general formula [In the formula, R 1 is a hydrogen atom; R 2 is an amino group; X is an acyloxy group with or without a substituent; Y means S or S→O. ] It is expressed as . To cephalosporanic acids or their carboxyl group derivatives or salts thereof,
In an organic solvent, in the presence of an acid or an acid complex, a triazole or tetrazole, or a salt thereof, in which the carbon atoms in the ring may be substituted, is reacted, and if desired, the protecting group is then removed or the carboxyl group is protected. or as a salt, the general formula [In the formula, R 1 , R 2 and Y have the above-mentioned meanings, and R 3
represents a triazolyl or tetrazolyl group in which carbon atoms in the ring may be substituted. However, −
It is assumed that CH 2 R 3 is bonded to the carbon atom of the exomethylene group adjacent to the nitrogen atom of R 3 . ] It is related with the manufacturing method of the 7-amino-3-substituted methyl cefem carboxylic acid represented by these, its derivative in the carboxyl group, or those salts. Therefore, the object of the present invention is to obtain a 7-amino-3 compound represented by the general formula [ ] that is useful as an intermediate when producing cephalosporan compounds.
It is an object of the present invention to provide a method for obtaining -substituted methyl cefem carboxylic acids, derivatives thereof at the carboxyl group, or salts thereof in good yield and high purity by industrially easy operations. Conventionally, among the compounds represented by the general formula [],
7 - ACA
Replace the 3rd position with azide [The Journal of
Anti-Biotechs, 25 , No. 1.64 (1972)] followed by ring closure [Japanese Patent Publication No. 13275/1983] was known. However, this conventional method requires many reaction steps and has a low yield, making it unsuitable for industrial production.
1,2,3-triazolyl) or 1-(1H-1,
Only compounds that are 2,3,4-tetrazolyl) groups can be produced. Under these circumstances, the present inventors have developed a compound represented by the general formula [ ] in which the carbon atom of the exomethylene group at position 3 of the cephalosporan ring is bonded to any nitrogen atom of R 3 . As a result of intensive research aimed at developing a production method that can be obtained easily and with good yield, we found that the compound represented by the general formula [] or its carboxyl group in the presence of an acid or an acid complex in an organic solvent. If a derivative or a salt thereof is reacted with a triazole or tetrazole or a salt thereof in which the carbon atom in the ring may be substituted, and if desired, the protecting group is then removed or the carboxyl group is protected or converted into a salt. The inventors have completed the present invention by discovering that the above objects can be achieved. According to the method of the present invention, in the general formula []
R 3 is not only a 1-(1H-1,2,3-triazolyl) and 1-(1H-1,2,3,4-tetrazolyl) group, but also a 2-(2H-1,2,3-triazolyl) group. , 1-(1H-1.2.4-triazolyl), 4
-(4H-1,2,4-triazolyl) and 2-
It is also possible to obtain new compounds such as (2H-1,2,3,4-tetrazolyl) groups, and further, when 〓Y is 〓S
Not only compounds in which 〓Y is 〓S→O can also be used as starting materials, and 〓S→O can also be changed to 〓S during the reaction or in the post-treatment stage. The present invention will be explained in detail below. In the present invention, examples of the acyloxy group of halogen atom,
Nitro group, alkyl group, alkoxy group, alkylthio group, acyloxy group, acylamino group, hydroxyl group, carboxyl group, sulfamoyl group, carbamoyl group, carbalkoxycarbamoyl group, aroylcarbamoyl group, carbalkoxysulfamoyl group, aryl group, carbamoyl It may be substituted with one or more substituents such as groups. In addition, examples of the triazole or tetrazole in which carbon atoms in the ring may be substituted include a halogen atom, an alkyl group, a hydroxyl group, an aralkyl group, an alkoxy group, an alkylthio group, a cyano group, an amino group, a carboxyl group, 1,2,3-triazole in which a carbon atom in the ring may be substituted with one or more substituents such as an alkoxyalkyl group, an aminoalkyl group, an N-alkylaminoalkyl group, a haloalkyl group, an acyl group, etc.;
1,2,4-triazole or 1,2,3,4-
Examples include tetrazole. These, 1, 2, 3
- Triazole, 1,2,4-triazole, and 1,2,3,4-tetrazole have tautomers as shown below, and any isomer or mixture can be subjected to the reaction. can. (In the formula, R represents a hydrogen atom or the above-mentioned substituent, and the two Rs may be the same or different.) In the general formula [], a group represented by R 3 , 1-(1H-1, 2, 3
-triazolyl), 2-(2H-1.2.3-triazolyl), 1-(1H-1.2.4-triazolyl), 4-(4H-1.2.4-triazolyl), 1
-(1H-1.2.3.4-tetrazolyl) or 2
-(2H-1.2.3.4-tetrazolyl) group is mentioned. In the above-mentioned substituents of X, triazole and tetrazole in which carbon atoms in the ring may be substituted, the hydroxyl group, amino group and carboxyl group may be protected with a commonly used protecting group. Protecting groups for amino groups include all groups that can normally be used as amino protecting groups, such as trichloroethoxycarbonyl, tribromoethoxycarbonyl, benzyloxycarbonyl, p-
Toluenesulfonyl, p-nitrobenzyloxycarbonyl, o-bromobenzyloxycarbonyl, chloroacetyl, trifluoroacetyl, formyl, tert.-butoxycarbonyl, p-methoxybenzyloxycarbonyl, 3,4-dimethoxybenzyloxycarbonyl, 4- (phenylazo)benzyloxycarbonyl, 4-(4-methoxyphenylazo)benzyloxycarbonyl, pyridin-1-oxide-2-yl-methoxycarbonyl, 2-pyridylmethoxycarbonyl, 2-furyloxycarbonyl, diphenylmethoxycarbonyl , 1,1-dimethylpropoxycarbonyl, isopropoxycarbonyl, 1-cyclopropylethoxycarbonyl, phthaloyl,
Examples include acyl groups that are easily eliminated such as succinyl, 1-adamantyloxycarbonyl, 8-quinolyloxycarbonyl, and further examples include trityl, 2-nitrophenylthio, 2,4-dinitrophenylthio, and 2-hydroxybenzylidene. ,2
-Hydroxy-5-chlorobenzylidene, 2-hydroxy-1-naphthylmethylene, 3-hydroxy-4-pyridylmethylene, 1-methoxycarbonyl-2-propylidene, 1-ethoxycarbonyl-2-propylidene, 3-ethoxycarbonyl-2 -butylidene, 1-acetyl-2-propylidene, 1-benzoyl-2-propylidene, 1-
[N-(2-methoxyphenyl)carbamoyl]-
2-propylidene, 1-[N-(4-methoxyphenyl)carbamoyl]-2-propylidene, 2-
Ethoxycarbonylcyclohexylidene, 2-ethoxycarbonylcyclopentylidene, 2-acetylcyclohexylidene, 3,3-dimethyl-5
Examples include groups that are easily eliminated such as -oxocyclohexylidene, and protecting groups for amino groups such as di- or trialkylsilyl. In addition, the protecting group for a hydroxyl group includes all groups that can normally be used as a protecting group for a hydroxyl group, such as benzyloxycarbonyl, 4-nitrobenzyloxycarbonyl, 4-bromobenzyloxycarbonyl, 4-methoxybenzyloxy Carbonyl, 3,4-dimethoxybenzyloxycarbonyl, 4-(phenylazo)benzyloxycarbonyl, 4-(4-methoxyphenylazo)benzyloxycarbonyl, tert.-butoxycarbonyl, 1,1-dimethylpropoxycarbonyl, isopropoxy Carbonyl, diphenylmethoxycarbonyl, 2-pyridylmethoxycarbonyl, 2,2,2-trichloroethoxycarbonyl, 2,2,2-tribromoethoxycarbonyl, 2-furfuryloxycarbonyl, 1-adamantyloxycarbonyl, 1-cyclo In addition to easily leaving acyl groups such as propyl ethoxycarbonyl, 3-quinolyloxycarbonyl, trifluoroacetyl, etc., groups such as benzyl, trityl, methoxymethyl, 2-nitrophenylthio, 2,4-dinitrophenylthio, etc. Can be mentioned. Furthermore, the carboxyl group-protecting group includes all groups that can be used as ordinary carboxyl group-protecting groups, such as those whose ester moiety is methyl, ethyl, propyl, isopropyl, tert.
-butyl, butyl, benzyl, diphenylmethyl, triphenylmethyl, p-nitrobenzyl,
p-methoxybenzyl, benzoylmethyl, acetylmethyl, p-nitrobenzoylmethyl, p-
Bromobenzoylmethyl, p-methanesulfonylbenzoylmethyl, phthalimidomethyl, trichloroethyl, 1,1-dimethyl-2-propynyl, acetoxymethyl, propionyloxymethyl, pivaloyloxymethyl, 1,1-dimethylpropyl, 1,1 -dimethyl-2-propenyl,
3-Methyl-3-butenyl, succinimidomethyl, 1-cyclopropylethyl, methylsulfenylmethyl, phenylsulfenylmethyl, methylthiomethyl, phenylthiomethyl, dimethylaminomethyl, quinoline-1-oxide-2- Esters such as methyl, pyridin-1-oxide-2-yl-methyl, bis-(p-methoxyphenyl)methyl, etc., as well as those described in JP-A-46-7073 and Dutch Publication No. 7105259 , for example, may be protected with a silyl compound such as dimethylchlorosilane. Examples of the carboxyl group derivatives of the general formula [] and the compound of the general formula [] include the following. (a) Esters: Esters include all esters that do not adversely affect the reaction, such as methyl ester, ethyl ester, propyl ester, isopropyl ester, butyl ester, tert.-butyl ester, methoxymethyl ester, Ethoxymethyl ester, phenoxymethyl ester, methylthiomethyl ester, methylthioethyl ester, phenylthiomethyl ester, dimethylaminoethyl ester, diethylaminoethyl ester, morpholinoethyl ester, piperidinoethyl ester, acetylmethyl ester, phenacyl ester , toluoyl methyl ester, 4-nitrophenacyl ester, acetoxymethyl ester, pivaloyloxymethyl ester, benzoyloxymethyl ester, 1,1-diacetyl methyl ester, 1-acetyl-1-methoxycarbonyl methyl ester, methanesulfonyl Ethyl ester, toluenesulfonyl ethyl ester, bromomethyl ester, iodoethyl ester, trichloroethyl ester, cyanomethyl ester, tenoyl methyl ester,
Substituted or unsubstituted alkyl esters such as phthalimidomethyl ester; cycloalkyl esters such as cyclohexyl ester and cycloheptyl ester; alkenyl esters such as propenyl ester, allyl ester, and 3-butenyl ester; alkynyl esters such as propynyl ester; phenyl ester, tolyl ester,
Substitution or Unsubstituted aryl ester; benzyl ester, phenethyl ester, p-chlorobenzyl ester, p-nitrobenzyl ester, p-methoxybenzyl ester, 3,5-dimethoxybenzyl ester, diphenylmethyl ester, bis-(4-
methoxyphenyl) methyl ester, 3,5-
Substituted or unsubstituted aralkyl esters such as di-tert.-butyl-4-hydroxybenzyl ester and trityl ester; indanyl ester; phthalidyl ester; other substituted with carboxyl group and halogen atom, nitro group, alkoxy group, etc. or unsubstituted thioalcohol, tetrahydrofuranol, 1-cyclopropylethanol, 1-phenyl-3-methyl-
5-pyrazolone, 3-hydroxypyridine, 2
-Esters formed from hydroxypyridine-1-oxide, etc.; or carboxyl groups and methoxyacetylene, ethoxyacetylene,
tert.-butylethynyldimethylamine, ethylethynyldiethylamine, N-ethyl-5-
Mention may be made of esters formed by reaction with phenyl isoxazolium-3-sulfonate. (b) Carboxyl group and anhydride such as N-hydroxysuccinimide, N-hydroxyphthalimide, dimethylhydroxylamine, diethylhydroxylamine, 1-hydroxypiperidine, oxime, etc. (c) Amides: Amides include acid amide, N
-Includes all substituted acid amides and N/N-disubstituted amides, such as N-methyl acid amide, N-
N-alkyl acid amide such as ethyl acid amide; N
- N-aryl acid amides such as phenyl acid amide; N·N-dialkyl acid amides such as N·N-dimethyl acid amide, N·N-diethyl acid amide, N-ethyl-N-methyl acid amide; imidazole, 4 -Acid amides such as substituted imidazoles and triazolopyridones. In the present invention, general formula [] and general formula []
The salts of the compounds or derivatives or salts thereof at the carboxyl group include both salts at the acidic group and salts at the basic group. Examples of salts with acidic groups include salts with alkali metals such as sodium and potassium; salts with alkaline earth metals such as calcium and magnesium; ammonium salts; triethylamine, diethylamine, pyridine, N-methylpiperidine, and
- Salts with nitrogen-containing organic bases such as methylmorpholine and N.N-dimethylaniline are mentioned. Salts with basic groups include salts with mineral acids such as hydrochloric acid and sulfuric acid; salts with organic acids such as oxalic acid, formic acid, trichloroacetic acid, and trifluoroacetic acid; methanesulfonic acid, toluenesulfonic acid, and naphthalenesulfonic acid. Examples include salts with sulfonic acids such as. Incidentally, the salt of the compound of the general formula [] may be used after being isolated in advance, or may be prepared in-system. Triazoles and tetrazoles in which carbon atoms in the rings may be substituted may be subjected to the reaction in the form of basic salts or acidic salts, if necessary. The basic salts and acidic salts include the salt forms described above. The acid or acid complex compound used in the method of the present invention includes, for example, a protonic acid, a Lewis acid, or a complex compound of a Lewis acid. Protonic acids include, for example, sulfuric acids, sulfonic acids, or super strong acids (super strong acid means an acid stronger than 100% sulfuric acid,
Examples include sulfuric acids such as sulfuric acid, chlorosulfuric acid or fluorosulfuric acid; alkyl (mono- or sulfonic acids such as aryl (mono-, di- or tri-)sulfonic acids such as di-)sulfonic acid or p-toluenesulfonic acid; perchloric acid, magicic acid ( FSO3H - SbF5 ), FSO3H
AsF 5 , CF 3 SO 3 H−SbF 5 , HF−BF 3 , H 2 SO 4
Examples include super strong acids such as SO 3 . Furthermore, examples of the Lewis acid include boron trifluoride. Further, as complex compounds of Lewis acids, for example,
Dialkyl ether complex salts of boron trifluoride with diethyl ether, di-n-propyl ether, di-n-butyl ether, etc.; amine complex salts with ethylamine, n-propylamine, n-butylamine, triethanolamine, etc.; ethyl formate, Examples include carboxylic acid ester complex salts with ethyl acetate, etc.; fatty acid complex salts with acetic acid, propionic acid, etc.; and nitrile complex salts with acetonitrile, propionitrile, etc. Next, embodiments of the method of the present invention will be described. As mentioned above, the method of the present invention is based on the general formula []
A compound represented by the above, or a derivative thereof in the carboxyl group, or a salt thereof, and a triazole or tetrazole, or a salt thereof, in which a carbon atom in the ring may be substituted, in an organic solvent in the presence of an acid or a complex compound of an acid. , react. Examples of the organic solvent used in the reaction include all organic solvents that do not adversely affect the reaction, such as nitroalkanes such as nitromethane, nitroethane, and nitropropane; formic acid, acetic acid, trifluoroacetic acid, dichloroacetic acid, Organic carboxylic acids such as propionic acid; ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; ethers such as diethyl ether, diisopropyl ether, dioxane, tetrahydrofuran, ethylene glycol dimethyl ether, anisole, and dimethyl cellosolve; ethyl formate, diethyl carbonate, Esters such as methyl acetate, ethyl acetate, ethyl chloroacetate, and butyl acetate; nitriles such as acetonitrile and butyronitrile; and sulfolanes such as sulfolane;
Two or more of these solvents may be used in combination.
Moreover, a complex compound formed by these organic solvents and a Lewis acid may be used as a solvent. The amount of the acid or acid complex compound to be used may be at least the equivalent molar amount relative to the compound represented by the general formula [] or its carboxyl group derivative or salt thereof, and may be increased or decreased as appropriate depending on the individual case. can. In particular, it is preferable to use 2 to 10 times the molar amount. When using an acid complex compound, it can be used by itself as a solvent, or two or more types of complex compounds may be used in combination. In addition, the amount of triazole or tetrazole, or a salt thereof, which may have a substituted carbon atom in the ring, should be used in an amount equal to or more than one molar amount based on the compound represented by the general formula [] or its carboxyl group derivative or salt thereof. 1.0 is fine, especially 1.0
It is preferable to use a molar amount of ~5.0 times. The reaction is usually carried out at a temperature of 0 to 80°C, and the reaction time is generally several minutes to several tens of hours. If moisture is present in the reaction system, there is a risk of causing undesirable side reactions such as lactonization of the raw materials or products and cleavage of the β-lactam ring, so it is desirable to maintain the reaction system in an anhydrous state. To meet this demand, a suitable dehydrating agent is added to the reaction system, such as phosphorus compounds such as phosphorus pentoxide, polyphosphoric acid, phosphorus pentachloride, phosphorus trichloride, and phosphorus oxychloride; N.O-bis(trimethylsilyl)acetamide. , trimethylsilylacetamide, trimethylchlorosilane, dimethyldichlorosilane; organic acid chlorides such as acetyl chloride, p-toluenesulfonyl chloride; acid anhydrides such as acetic anhydride, trifluoroacetic anhydride; anhydrous magnesium sulfate, anhydrous chloride An inorganic desiccant such as calcium, molecular sieve, calcium carbide, etc. may be added. When a derivative of the carboxyl group of the compound represented by the general formula [] is used as a raw material,
A compound represented by the general formula [] may be obtained by treatment after the reaction, but if desired, the protecting group can be removed by a conventional method to obtain a compound represented by the general formula []. If the triazole or tetrazole or their salts, which may have substituted carbon atoms in the ring, are substituted with a hydroxyl group, amino group, carboxyl group, etc., these groups should be protected before carrying out this reaction. After the reaction is completed, the desired compound can be obtained by subjecting it to a conventional elimination reaction. Furthermore, if desired, the target compound represented by the general formula [] can be protected with a carboxyl group or converted into a salt according to a conventional method, and a corresponding compound can also be obtained. Furthermore, if the method of the present invention is carried out, a mixture in which any nitrogen atom of R 3 and the carbon atom of the exomethylene group at the 3-position of the cephalosporan ring are generally bonded may be obtained, and the reaction conditions may be adjusted as necessary. By changing, it is also possible to obtain a compound in which a specific nitrogen atom of R 3 is bonded to the carbon atom of the exomethylene group at the 3-position of the cephalosporin ring. The target compound thus obtained can be isolated and collected by conventional means. By amidating the 7-position of the cephalosporan ring with a known or new acyl group, the Δ3 -cephem compound of the present invention can be used to produce various useful cephalosporins that are effective against Gram-positive and Gram-negative bacteria. It is a compound that can be derived into a series of compounds and is useful as an intermediate. Next, the present invention will be specifically explained with reference to Examples. Example 1 (1) 7-aminocephalosporanic acid (hereinafter 7-
(abbreviated as ACA) was suspended in 13 ml of sulfolane, and 14.2 g of boron trifluoride diethyl ether complex salt and 5-methyltetrazole were suspended in 13 ml of sulfolane.
Add 1.0 g and react at room temperature for 17 hours. After the reaction is completed, the reaction solution is poured into 15 ml of ice water, and the pH is adjusted to 3.5 with 28% ammonia water under ice cooling. Take the precipitated crystals, wash them with 5 ml of water and 5 ml of acetone, and dry them to obtain 7-amino-3-
[2-(5-methyl-2H-1,2,3,4-tetrazolyl)methyl]-△ 3 -cephem-4-
carboxylic acid and 7-amino-3-[1-(5-
1.76 g of crystals of a mixture of methyl-1H-1,2,3,4-tetrazolyl)methyl] -Δ3 -cephem-4-carboxylic acid are obtained. (2) Suspend 1.76 g of the crystals obtained in (1) in 18 ml of methanol, add and dissolve 1.13 g of p-toluenesulfonic acid monohydrate, and then gradually add 4.6 g of diphenyldiazomethane. Add and react for 15 minutes at room temperature. After the reaction is completed, the solvent is distilled off under reduced pressure. The residue was dissolved in 30 ml of ethyl acetate and 30 ml of water.
Dissolve in a mixed solvent consisting of and adjust the pH to 8 with sodium hydrogen carbonate. Next, the organic layer is separated, dried over anhydrous magnesium sulfate, and then the solvent is distilled off under reduced pressure. Purification of the residue by column chromatography (Wako silica gel C-200; developing solvent, benzene:ethyl acetate = 4:1) yields 7-amino-3-[2- (5-methyl-2H-1・2・
3,4-tetrazolyl)methyl]-△ 3 -cephem-4-carboxylic acid benzhydryl ester
7-Amino-3-[1-(5-methyl-1H-1.2.
3,4-tetrazolyl)methyl]-△ 3 -cephem-4-carboxylic acid benzhydryl ester
Obtain 0.14g. Γ7-amino-3-[2-(5-methyl-2H-
1,2,3,4-tetrazolyl)methyl]-
3 -cephem-4-carboxylic acid benzhydryl ester IR (KBr) cm -1 ; νC=O1770, 1720 NMR (CDCl 3 ) ppm value; 1.75 (2H, bs, -NH 2 ), 2.48 (3H, s, −CH 3 ), 3.20 (2H, s,

【式】)、 4.70(1H、d、J=5Hz、C6−H)、 4.87(1H、d、J=5Hz、C7−H)、 5.30、5.72(2H、ABq、J=16Hz、[Formula]), 4.70 (1H, d, J=5Hz, C 6 -H), 4.87 (1H, d, J=5Hz, C 7 -H), 5.30, 5.72 (2H, ABq, J=16Hz,

【式】)、 6.92(1H、s、−CH〓)、 7.30(10H、s、【formula】), 6.92 (1H, s, -CH〓), 7.30 (10H, s,

【式】)、 Γ7−アミノ−3−〔1−(5−メチル−1H−
1・2・3・4−テトラゾリル)メチル〕−
−セフエム−4−カルボン酸ベンズヒド
リルエステル IR(KBr)cm-1;νC=O1770、1725 NMR(CDCl3)ppm値; 1.80(2H、s、−NH2) 2.15(3H、s、−CH3) 3.30(2H、s、
[Formula]), Γ7-amino-3-[1-(5-methyl-1H-
1,2,3,4-tetrazolyl)methyl]-
Δ3 -Cefem-4-carboxylic acid benzhydryl ester IR (KBr) cm -1 ; νC=O1770, 1725 NMR (CDCl 3 ) ppm value; 1.80 (2H, s, -NH 2 ) 2.15 (3H, s, - CH 3 ) 3.30 (2H, s,

【式】)、 4.70(1H、d、j=5Hz、C6−H)、 4.85(1H、d、J=5Hz、C7−H)、 5.00、5.38(2H、ABq、J=16Hz、[Formula]), 4.70 (1H, d, j = 5Hz, C 6 - H), 4.85 (1H, d, J = 5Hz, C 7 - H), 5.00, 5.38 (2H, ABq, J = 16Hz,

【式】)、 6.90(1H、s、−CH〓)、 7.30(10H、s、【formula】), 6.90 (1H, s, -CH〓), 7.30 (10H, s,

【式】)、 (3) 7−アミノ−3−〔2−(5−メチル−2H−
1・2・3・4−テトラゾリル)メチル〕−△
−セフエム−4−カルボン酸ベンズヒドリル
エステル0.462gをアニソール0.5mlおよびトリ
フルオロ酢酸5mlの混合液に溶解させ、室温
下、1時間反応さる。 反応終了後、減圧下に溶媒を留去し、残留物
に水10mlおよび酢酸エチル10mlを加え、氷冷下
28%アンモニア水でPH8に調整する。次いで水
層を分取し、氷冷下2N−塩酸にてPH3.5に調整
する。析出晶を取し、水5mlおよびアセトン
5mlで順次洗浄した後、乾燥すれば、融点178
℃(分解)を示す7−アミノ−3−〔2−(5−
メチル−2H−1・2・3・4−テトラゾリ
ル)メチル〕−△−セフエム−4−カルボン
酸0.26gを得る。 IR(KBr)cm-1;νC=O1790、1610、1530 NMR(CF3COOD)ppm値; 2.70(3H、s、−CH3)、 3.73(2H、s、
[Formula]), (3) 7-amino-3-[2-(5-methyl-2H-
1,2,3,4-tetrazolyl)methyl]-△
0.462 g of 3 -cephem-4-carboxylic acid benzhydryl ester was dissolved in a mixture of 0.5 ml of anisole and 5 ml of trifluoroacetic acid, and reacted at room temperature for 1 hour. After the reaction, the solvent was distilled off under reduced pressure, 10 ml of water and 10 ml of ethyl acetate were added to the residue, and the mixture was cooled with ice.
Adjust the pH to 8 with 28% ammonia water. Next, separate the aqueous layer and adjust the pH to 3.5 with 2N hydrochloric acid while cooling on ice. Take the precipitated crystals, wash them with 5 ml of water and 5 ml of acetone, and dry them to obtain a melting point of 178.
7-amino-3-[2-(5-
0.26 g of methyl-2H-1.2.3.4-tetrazolyl)methyl] -Δ3 -cephem-4-carboxylic acid is obtained. IR (KBr) cm -1 ; νC=O1790, 1610, 1530 NMR (CF 3 COOD) ppm value; 2.70 (3H, s, -CH 3 ), 3.73 (2H, s,

【式】)、 5.40(2H、s、C6−H、C7−H)、 5.80、6.12(2H、ABq、J=16Hz、[Formula]), 5.40 (2H, s, C 6 -H, C 7 -H), 5.80, 6.12 (2H, ABq, J = 16Hz,

【式】) 同様にして7−アミノ−3−〔1−(5−メチ
ル−1H−1・2・3・4−テトラゾリル)メ
チル〕−△−セフエム−4−カルボン酸ベン
ズヒドリルエステル0.462gから融点195℃(分
解)を示す7−アミノ−3−〔1−(5−メチル
−1H−1・2・3・4−テトラゾリル)メチ
ル〕−△−セフエム−4−カルボン酸0.25g
を得る。 IR(KBr)cm-1;νC=O1795、1615、1530。 NMR(CF3COOD)ppm値; 2.95(3H、s、−CH3)、 3.90(2H、bs、
[Formula]) Similarly, 7-amino-3-[1-(5-methyl-1H-1,2,3,4-tetrazolyl)methyl]-△ 3 -cephem-4-carboxylic acid benzhydryl ester 0.462 g 0.25 g of 7-amino-3-[1-(5-methyl-1H-1,2,3,4-tetrazolyl)methyl]-△ 3 -cephem-4-carboxylic acid having a melting point of 195°C (decomposition) from
get. IR (KBr) cm -1 ; νC=O1795, 1615, 1530. NMR (CF 3 COOD) ppm value; 2.95 (3H, s, -CH 3 ), 3.90 (2H, bs,

【式】)、 5.45(2H、s、C6−H、C7−H)、 5.57、5.92(2H、ABq、J=16Hz、[Formula]), 5.45 (2H, s, C 6 -H, C 7 -H), 5.57, 5.92 (2H, ABq, J = 16Hz,

【式】 ) 実施例 2 (1) 実施例1の(1)と同様の反応を表−1の条件で
実施し、表−1の結果を得た。 (2) (1)で得られた生成物を、実施例1の(2)と同様
に反応、処理して、表−2の結果を得た。ここ
で得られた化合物の物性は、実施例1の(2)で得
られた化合物のものと一致した。
[Formula] ) Example 2 (1) The same reaction as in Example 1 (1) was carried out under the conditions shown in Table 1, and the results shown in Table 1 were obtained. (2) The product obtained in (1) was reacted and treated in the same manner as in (2) of Example 1 to obtain the results shown in Table 2. The physical properties of the compound obtained here were consistent with those of the compound obtained in Example 1 (2).

【表】【table】

【表】 実施例 3 (1) 7−AC、2.72gを三弗化硼素6.78gを含む
酢酸エチル30mlに懸濁させ、これに5−メチル
テトラゾール2.52gを加え、室温で16時間反応
させる。反応終了後、反応液を氷水30ml中に投
入し、氷冷下28%アンモニア水でPH3.5に調整
する。析出晶を取し、水5mlおよびアセトン
5mlで順次洗浄した後、乾燥すれば、7−アミ
ノ−3−〔2−(5−メチル−2H−1・2・
3・4−テトラゾリル)メチル〕−△−セフ
エム−4−カルボン酸および7−アミノ−3−
〔1−(5−メチル−1H−1・2・3・4−テ
トラゾリル)メチル〕−△−セフエム−4−
カルボン酸の混合物の結晶2.34gを得る。 (2) (1)で得られた結晶2.34gを実施例1の(2)と同
様に反応、処理すれば、7−アミノ−3−〔2
−(5−メチル−2H−1・2・3・4−テトラ
ゾリル)メチル〕−△−セフエム−4−カル
ボン酸ベンズヒドリルエステル2.0gおよび7
−アミノ−3−〔1−(5−メチル−1H−1・
2・3・4−テトラゾリル)メチル〕−△
セフエム−4−カルボン酸ベンズヒドリルエス
テル0.13gを得る。尚、これらの化合物の物性
は実施例1の(2)で得られた化合物のものと一致
した。 実施例 4 実施例3−(1)と同様の反応を表−3に示す条件
で実施、表−3の結果を得た。
[Table] Example 3 (1) 2.72 g of 7-AC is suspended in 30 ml of ethyl acetate containing 6.78 g of boron trifluoride, 2.52 g of 5-methyltetrazole is added thereto, and the suspension is reacted at room temperature for 16 hours. After the reaction is completed, the reaction solution is poured into 30 ml of ice water, and the pH is adjusted to 3.5 with 28% ammonia water under ice cooling. The precipitated crystals were collected, washed successively with 5 ml of water and 5 ml of acetone, and dried to give 7-amino-3-[2-(5-methyl-2H-1.2.
3,4-tetrazolyl)methyl]-△ 3 -cephem-4-carboxylic acid and 7-amino-3-
[1-(5-methyl-1H-1,2,3,4-tetrazolyl)methyl]-△ 3 -cephem-4-
2.34 g of crystals of a mixture of carboxylic acids are obtained. (2) If 2.34 g of the crystals obtained in (1) are reacted and treated in the same manner as in (2) of Example 1, 7-amino-3-[2
-(5-Methyl-2H-1,2,3,4-tetrazolyl)methyl]-△ 3 -cephem-4-carboxylic acid benzhydryl ester 2.0g and 7
-amino-3-[1-(5-methyl-1H-1.
2,3,4-tetrazolyl)methyl]-△ 3-
0.13 g of cefem-4-carboxylic acid benzhydryl ester is obtained. The physical properties of these compounds were consistent with those of the compound obtained in Example 1 (2). Example 4 The same reaction as in Example 3-(1) was carried out under the conditions shown in Table 3, and the results shown in Table 3 were obtained.

【表】 実施例 5 (1) 7−ACA2.72gを酢酸27mlに懸濁させ、こ
れに濃硫酸2.5gおよび5−メチルテトラゾー
ル1.0gを加え、60℃で4時間反応させる。反
応終了後、減圧下に溶媒を留去し、残留物に水
15mlを加え、氷冷下28%アンモニア水でPH3.5
に調整する。 析出晶を取し、水5mlおよびアセトン5ml
で順次洗浄した後、乾燥すれば、7−アミノ−
3−〔2−(5−メチル−2H−1・2・3・4
−テトラゾリル)メチル〕−△−セフエム−
4−カルボン酸および7−アミノ−3−〔1−
(5−メチル−1H−1・2・3・4−テトラゾ
リル)メチル〕−△−セフエム−4−カルボ
ン酸の混合物の結晶0.4gを得る。 (2) (1)で得られた結晶0.4gを実施例1の(2)と同
様に反応、処理すれば、7−アミノ−3−〔2
−(5−メチル−2H−1・2・3・4−テトラ
ゾリル)メチル〕−△−セフエム−4−カル
ボン酸ベンズヒドリルエステル0.1gおよび7
−アミノ−3−〔1−(5−メチル−1H−1・
2・3・4−テトラゾリル)メチル〕−△
セフエム−4−カルボン酸ベンズヒドリルエス
テル0.03gを得る。これらの化合物の物性は実
施例1の(2)で得られた化合物のものと一致し
た。 実施例 6 (1) 7−ACA2.72gをトリフルオロ酢酸19mlに
溶解させ、これに、三弗化硼素・ジエチルエー
テル錯塩7.1gおよび5−アセチルアミノテト
ラゾール1.4gを加えて、室温で7時間反応さ
せる。反応終了後、減圧下に溶媒を留去し、残
留物に水15mlを加え、氷冷下28%アンモニア水
でPH3.5に調整する。 析出晶を取し、水5mlおよびアセトン5ml
で順次洗浄した後乾燥すれば、7−アミノ−3
−〔2−(5−アセチルアミノ−2H−1・2・
3・4−テトラゾリル)メチル〕−△−セフ
エム−4−カルボン酸の粗結晶1.0gを得る。 (2) (1)で得られた粗結晶1.0gをメタノール10ml
に懸濁させ、これにp−トルエンスルホン酸1
水和物0.56gを加え溶解させた後、ジフエニル
ジアゾメタン2.3gを徐々に加え、室温下15分
間反応させる。反応終了後、減圧下に溶媒を留
去し、残留物を酢酸エチル20mlおよび水20mlの
混合液に溶解させ、炭酸水素ナトリウムでPH8
に調整する。次いで、有機層を分取し、無水硫
酸マグネシウムで乾燥後、減圧下に溶媒を留去
する。残留物をカラムクロマトグラフイー(和
光シリカゲルC−200:展開溶媒、ベンゼン:
酢酸エチル=4:1)で精製すれば、融点106
〜108℃(分解)を示す7−アミノ−3−〔2−
(5−メチル−2H−1・2・3・4−テトラゾ
リル)メチル〕−△−セフエム−4−カルボ
ン酸ベンズヒドリルエステル0.35gを得る。 IR(KBr)cm-1;νC=O1770、1720、1700 NMR(CDCl3)ppm値 1.95(2H、bs、−NH2)、 2.20(3H、s、−NHCOCH3 )、 3.20(2H、bs、
[Table] Example 5 (1) 2.72 g of 7-ACA is suspended in 27 ml of acetic acid, 2.5 g of concentrated sulfuric acid and 1.0 g of 5-methyltetrazole are added, and the suspension is reacted at 60°C for 4 hours. After the reaction is complete, the solvent is distilled off under reduced pressure and the residue is diluted with water.
Add 15ml and bring to PH3.5 with 28% ammonia water under ice cooling.
Adjust to. Take the precipitated crystals and add 5 ml of water and 5 ml of acetone.
After sequentially washing and drying, 7-amino-
3-[2-(5-methyl-2H-1, 2, 3, 4
-Tetrazolyl)methyl]-△ 3 -Cefem-
4-carboxylic acid and 7-amino-3-[1-
0.4 g of crystals of a mixture of (5-methyl-1H-1,2,3,4-tetrazolyl)methyl] -Δ3 -cephem-4-carboxylic acid are obtained. (2) If 0.4 g of the crystals obtained in (1) is reacted and treated in the same manner as in (2) of Example 1, 7-amino-3-[2
-(5-Methyl-2H-1,2,3,4-tetrazolyl)methyl]-△ 3 -cephem-4-carboxylic acid benzhydryl ester 0.1g and 7
-amino-3-[1-(5-methyl-1H-1.
2,3,4-tetrazolyl)methyl]-△ 3-
0.03 g of cefem-4-carboxylic acid benzhydryl ester is obtained. The physical properties of these compounds were consistent with those of the compound obtained in Example 1 (2). Example 6 (1) 2.72 g of 7-ACA was dissolved in 19 ml of trifluoroacetic acid, 7.1 g of boron trifluoride diethyl ether complex salt and 1.4 g of 5-acetylaminotetrazole were added thereto, and the mixture was reacted at room temperature for 7 hours. let After the reaction is complete, the solvent is distilled off under reduced pressure, 15 ml of water is added to the residue, and the pH is adjusted to 3.5 with 28% aqueous ammonia under ice cooling. Take the precipitated crystals and add 5 ml of water and 5 ml of acetone.
If washed sequentially with water and dried, 7-amino-3
-[2-(5-acetylamino-2H-1・2・
1.0 g of crude crystals of 3,4-tetrazolyl)methyl] -Δ3 -cephem-4-carboxylic acid are obtained. (2) Add 1.0 g of the crude crystals obtained in (1) to 10 ml of methanol.
to which p-toluenesulfonic acid 1
After adding and dissolving 0.56 g of hydrate, 2.3 g of diphenyldiazomethane was gradually added and reacted for 15 minutes at room temperature. After the reaction, the solvent was distilled off under reduced pressure, the residue was dissolved in a mixture of 20 ml of ethyl acetate and 20 ml of water, and the pH was adjusted to 8 with sodium hydrogen carbonate.
Adjust to. Next, the organic layer is separated, dried over anhydrous magnesium sulfate, and then the solvent is distilled off under reduced pressure. The residue was subjected to column chromatography (Wako silica gel C-200: developing solvent, benzene:
If purified with ethyl acetate = 4:1), the melting point is 106
7-Amino-3-[2-
0.35 g of (5-methyl-2H-1,2,3,4-tetrazolyl)methyl] -Δ3 -cephem-4-carboxylic acid benzhydryl ester is obtained. IR (KBr) cm -1 ; νC=O1770, 1720, 1700 NMR ( CDCl3 ) ppm value 1.95 (2H, bs, -NH2 ), 2.20 (3H, s, -NHCOC H3 ), 3.20 (2H, bs ,

【式】)、 4.67(1H、d、J=5Hz、C6−H)、 4.82(1H、d、J=5Hz、C7−H)、 5.32、5.68(2H、ABq、J=16Hz、[Formula]), 4.67 (1H, d, J = 5Hz, C 6 -H), 4.82 (1H, d, J = 5Hz, C 7 -H), 5.32, 5.68 (2H, ABq, J = 16Hz,

【式】)、 6.90(1H、s、−CH〓)、 7.25(10H、s、【formula】), 6.90 (1H, s, -CH〓), 7.25 (10H, s,

【式】)、 9.75(1H、bs、〓NH) (3) 7−アミノ−3−〔2−(5−アセチルアミノ
−2H−1・2・3・4−テトラゾリル)メチ
ル〕−△−セフエム−4−カルボン酸ベンズ
ヒドリルエステル0.505gをアニソール0.5mlお
よびトリフルオロ酢酸5mlの混合液に溶解さ
せ、室温下1時間反応させる。反応終了後、減
圧下に溶媒を留去し、残留物に水10mlおよび酢
酸エチル10mlを加え、氷冷下28%アンモニア水
でPH8に調整する。次いで、水層を分取し、氷
冷下、2N−塩酸にてPH3.5に調整する。析出晶
を取し、水5mlおよびアセトン5mlで順次洗
浄した後、乾燥すれば、融点179℃(分解)を
示す7−アミノ−3−〔2−(5−アセチルアミ
ノ−2H−1・2・3・4−テトラゾリル)メ
チル〕−△−セフエム−4−カルボン酸0.31
gを得る。 IR(KBr)cm-1;νC=O1790、1690、1610、
1530 NMR(CF3COOD)ppm値; 2.42(3H、s、−CH3)、 3.70(2H、s、
[Formula]), 9.75 (1H, bs, 〓NH) (3) 7-amino-3-[2-(5-acetylamino-2H-1.2.3.4-tetrazolyl)methyl]-△ 3 − 0.505 g of cefem-4-carboxylic acid benzhydryl ester is dissolved in a mixture of 0.5 ml of anisole and 5 ml of trifluoroacetic acid, and reacted at room temperature for 1 hour. After the reaction is complete, the solvent is distilled off under reduced pressure, 10 ml of water and 10 ml of ethyl acetate are added to the residue, and the pH is adjusted to 8 with 28% aqueous ammonia under ice cooling. Next, the aqueous layer is separated and adjusted to pH 3.5 with 2N hydrochloric acid under ice cooling. The precipitated crystals were collected, washed successively with 5 ml of water and 5 ml of acetone, and dried to give 7-amino-3-[2-(5-acetylamino-2H-1.2. 3,4-tetrazolyl)methyl]-△ 3 -cephem-4-carboxylic acid 0.31
get g. IR (KBr) cm -1 ; νC=O1790, 1690, 1610,
1530 NMR (CF 3 COOD) ppm value; 2.42 (3H, s, -CH 3 ), 3.70 (2H, s,

【式】)、 5.40(2H、s、C6−H、C7−H)、 5.94(2H、bs、[Formula]), 5.40 (2H, s, C 6 -H, C 7 -H), 5.94 (2H, bs,

【式】) 実施例 7 (1) 5−アセチルアミノテトラゾールの代りに他
の置換テトラゾール化合物を用いて実施例1の
(1)または実例6の(1)と同様の反応を実施し、表
−4の結果を得た。 (2) 実施例6の(2)と同様にエステル化して、表−
5の化合物を得た。生成物の物性を表−6に示
す。 (3) 実施例6の(3)と同様に脱エステル化して表−
7の化合物を得た。
[Formula]) Example 7 (1) The procedure of Example 1 was carried out using other substituted tetrazole compounds in place of 5-acetylaminotetrazole.
A reaction similar to (1) or (1) of Example 6 was carried out, and the results shown in Table 4 were obtained. (2) Esterified in the same manner as in Example 6 (2), and the table
Compound 5 was obtained. The physical properties of the product are shown in Table 6. (3) Deesterified in the same manner as in Example 6 (3) and
Compound 7 was obtained.

【表】【table】

【表】【table】

【表】【table】

【表】【table】

【表】【table】

【表】【table】

【表】【table】

【表】 上記表中、生成物のDとE、IとJ、KとL、
FとG、CとMの分離は実施例6の(2)と同様に、
カラムクロマトグラフイー(和光シリカゲルC−
200;展開溶媒、ベンゼン:酢酸エチル=4:
1)処理によつた。
[Table] In the above table, products D and E, I and J, K and L,
Separation of F and G and C and M is carried out in the same manner as in Example 6 (2).
Column chromatography (Wako silica gel C-
200; developing solvent, benzene: ethyl acetate = 4:
1) Due to treatment.

【表】【table】

【表】【table】

【表】 実施例 8 7−ACA2.72gをトリフルオロ酢酸19mlに溶
解させ、これに三弗化硼素・ジエチルエーテル錯
塩7.1gおよび1・2・4−トリアゾール0.75g
を加えて、室温で7時間反応させる。反応終了
後、減圧下に溶媒を留去し、残留物に水15mlを加
え、氷冷下28%アンモニア水でPH3.5に調整す
る。析出晶を取し、水5mlおよびアセトン5ml
で順次洗浄した後、乾燥すれば、融点149℃(分
解)を示す7−アミノ−3−〔1−(1H−1・
2・4−トリアゾリル)メチル〕−△−セフエ
ム−4−カルボン酸2.5gを得る。 IR(KBr)cm-1;νC=O1790、1610、1530 NMR(CF3COOD)ppm値; 4.00(2H、bs、
[Table] Example 8 2.72 g of 7-ACA was dissolved in 19 ml of trifluoroacetic acid, and 7.1 g of boron trifluoride diethyl ether complex salt and 0.75 g of 1,2,4-triazole were added to the solution.
and react at room temperature for 7 hours. After the reaction is complete, the solvent is distilled off under reduced pressure, 15 ml of water is added to the residue, and the pH is adjusted to 3.5 with 28% aqueous ammonia under ice cooling. Take the precipitated crystals and add 5 ml of water and 5 ml of acetone.
After sequential washing with water and drying, 7-amino-3-[1-(1H-1
2.5 g of 2,4-triazolyl)methyl] -Δ3 -cephem-4-carboxylic acid are obtained. IR (KBr) cm -1 ; νC=O1790, 1610, 1530 NMR (CF 3 COOD) ppm value; 4.00 (2H, bs,

【式】)、 5.47(4H、bs、C6−H、C7−H、[Formula]), 5.47 (4H, bs, C 6 -H, C 7 -H,

【式】)、 8.70(1H、s、【formula】), 8.70 (1H, s,

【式】)、 9.80(1H、s、【formula】), 9.80 (1H, s,

【式】)、 実施例 9 1・2・4−トリアゾールの代わりに他のトリ
アゾール化合物を用いて実施例8と同様に反応さ
せ、表−8の化合物を得た。(原料として7−
ACA2.72gを用いた。)
[Formula]), Example 9 A reaction was carried out in the same manner as in Example 8 using another triazole compound instead of 1,2,4-triazole to obtain the compounds shown in Table 8. (7-
2.72g of ACA was used. )

【表】【table】

【表】【table】

【表】 実施例 10 (1) 7−ACA2.72gをトリフルオロ酢酸20mlに
溶解させ、これに三弗化硼素・ジエチルエーテ
ル錯塩7.1gおよび4−カルボキシ−1・2・
3−トリアゾール1.24gを加え、室温で5時間
反応させる。反応終了後、減圧下に溶媒を留去
し、残留物に水15mlを加え氷冷下28%アンモニ
ア水でPH3.5に調整する。 析出晶を取し、水5mlおよびアセトン5ml
で順次洗浄した後乾燥すれば、7−アミノ−3
−〔1−(4−カルボキシ−1H−1・2・3−
トリアゾリル)メチル〕−△−セフエム−4
−カルボン酸(この生成物の構造は推定構造で
ある。)の粗結晶1.45gを得る。 (2) (1)で得られた粗結晶1.45gをメタノール15ml
に懸濁させ、これにp−トルエンスルホン酸1
水和物0.85gを加えて溶解させた後、ジフエニ
ルジアゾメタン3.44gを徐々に加え、室温下15
分間反応させる。反応終了後、減圧下に溶媒を
留去し、残留物を酢酸エチル15mlおよび水15ml
の混合溶媒に溶解させ、炭酸水素ナトリウムを
用いてPH8に調整する。次いで、有機層を分取
し、水15mlで2回洗浄した後、無水硫酸マグネ
シウムで乾燥し、減圧下に溶媒を留去して得ら
れた残留物を、カラムクロマトグラフイー(和
光シリカゲルC−200;展開溶媒、ベンゼン:
酢酸エチル=5:1)にて精製すれば、融点96
〜101℃(分解)を示す7−アミノ−3−〔1−
(4−ジフエニルメトキシカルボニル)−1H−
1・2・3−トリアゾリル)メチル〕−△
セフエム−4−カルボン酸ベンズヒドリルエス
テル(この生成物の構造は推定構造である。)
0.24gを得る。 IR(KBr)cm-1;νC=O1770、1720 NMR(CDCl3)ppm値; 2.33(2H、bs、−NH2)、 2.78、3.21(2H、ABq、J=18Hz、
[Table] Example 10 (1) 2.72 g of 7-ACA was dissolved in 20 ml of trifluoroacetic acid, and 7.1 g of boron trifluoride diethyl ether complex salt and 4-carboxy-1.2.
Add 1.24 g of 3-triazole and react at room temperature for 5 hours. After the reaction is complete, the solvent is distilled off under reduced pressure, 15 ml of water is added to the residue, and the pH is adjusted to 3.5 with 28% ammonia water under ice cooling. Take the precipitated crystals and add 5 ml of water and 5 ml of acetone.
If washed sequentially with water and dried, 7-amino-3
-[1-(4-carboxy-1H-1,2,3-
triazolyl)methyl]-△ 3 -cephem-4
- 1.45 g of crude crystals of carboxylic acid (the structure of this product is a predicted structure) are obtained. (2) Add 1.45 g of the crude crystals obtained in (1) to 15 ml of methanol.
to which p-toluenesulfonic acid 1
After adding and dissolving 0.85 g of hydrate, 3.44 g of diphenyldiazomethane was gradually added and
Let it react for a minute. After the reaction, the solvent was distilled off under reduced pressure, and the residue was mixed with 15 ml of ethyl acetate and 15 ml of water.
Dissolve in a mixed solvent of and adjust the pH to 8 using sodium hydrogen carbonate. Next, the organic layer was separated, washed twice with 15 ml of water, dried over anhydrous magnesium sulfate, and the solvent was distilled off under reduced pressure. The resulting residue was subjected to column chromatography (Wako silica gel C- 200; Developing solvent, benzene:
If purified with ethyl acetate = 5:1), the melting point is 96.
7-Amino-3-[1-
(4-diphenylmethoxycarbonyl)-1H-
1,2,3-triazolyl)methyl]-△ 3-
Cefem-4-carboxylic acid benzhydryl ester (The structure of this product is a predicted structure.)
Obtain 0.24g. IR (KBr) cm -1 ; νC=O1770, 1720 NMR ( CDCl3 ) ppm value; 2.33 (2H, bs, -NH2 ), 2.78, 3.21 (2H, ABq, J=18Hz,

【式】)、 4.71(1H、d、J=5Hz、C6−H)、 4.90(1H、d、J=5Hz、C7−H)、 5.32、5.92(2H、ABq、J=16Hz、[Formula]), 4.71 (1H, d, J = 5Hz, C 6 -H), 4.90 (1H, d, J = 5Hz, C 7 -H), 5.32, 5.92 (2H, ABq, J = 16Hz,

【式】)、 6.86(2H、s、−COOC(C6H52×2)、 7.20(20H、s、[Formula]), 6.86 (2H, s, -COOC H (C 6 H 5 ) 2 × 2), 7.20 (20H, s,

【式】×4)、 8.11(1H、s、
[Formula] × 4), 8.11 (1H, s,

【式】) 実施例 11 置換−1・2・4−トリアゾール類を実施例1
の(1)および(2)と同様に反応させ、表−9の化合物
を得た。
[Formula]) Example 11 Substituted-1,2,4-triazoles in Example 1
The reaction was carried out in the same manner as in (1) and (2) to obtain the compounds shown in Table 9.

【表】【table】

【表】【table】

【表】 実施例 12 実施例10の(1)と同様に反応させて表−10の化合
物を得た。 表−10における生成物の物性(IRおよび
NMR)は、実施例8のものと一致した。 表中、※印は原料として、7−アミノ−3−ア
セトキシメチル−△−セフエム−4−カルボン
酸−1−オキシドを用いた。
[Table] Example 12 The compounds shown in Table 10 were obtained by reacting in the same manner as in Example 10 (1). Physical properties of the products in Table 10 (IR and
NMR) was consistent with that of Example 8. In the table, 7-amino-3-acetoxymethyl- Δ3 -cephem-4-carboxylic acid-1-oxide was used as the raw material marked with *.

【表】 実施例 13 (1) 7−ACAのp−ニトロベンジルエステル
4.07gをトリフルオロ酢酸30mlに溶解させ、こ
れに三弗化硼素・ジエチルエーテル錯塩7.1g
および1・2・4−トリアゾール0.69gを加
え、室温下4時間反応させる。反応終了後、減
圧下に溶媒を留去し、得られた残留物に、水30
mlおよび酢酸エチル30mlを加え、次いで氷冷下
炭酸水素ナトリウムでPH7.0に調整した後、有
機層を分取する。分取した有機層を水洗し、次
いで無水硫酸マグネシウムで乾燥後、減圧下に
溶媒を留去すれば、融点114〜116℃(分解)を
示す7−アミノ−3−〔1−(1H−1・2・4
−トリアゾリル)メチル〕−△−セフエム−
4−カルボン酸p−ニトロベンジルエステル
0.67gを得る。 IR(KBr)cm-1;νC=O1770、1708 NMR(CDCl3)ppm値; 1.99(2H、s、−NH2)、 3.50(2H、s、
[Table] Example 13 (1) p-nitrobenzyl ester of 7-ACA
Dissolve 4.07g in 30ml of trifluoroacetic acid, and add 7.1g of boron trifluoride/diethyl ether complex salt to this.
and 0.69 g of 1,2,4-triazole were added, and the mixture was allowed to react at room temperature for 4 hours. After the reaction, the solvent was distilled off under reduced pressure, and the resulting residue was added with 30% water.
ml and 30 ml of ethyl acetate, and then the pH was adjusted to 7.0 with sodium hydrogen carbonate under ice cooling, and the organic layer was separated. The separated organic layer was washed with water, then dried over anhydrous magnesium sulfate, and the solvent was distilled off under reduced pressure. 7-Amino-3-[1-(1H-1・2・4
-Triazolyl)methyl]-△ 3 -Cefem-
4-Carboxylic acid p-nitrobenzyl ester
Obtain 0.67g. IR (KBr) cm -1 ; νC=O1770, 1708 NMR (CDCl 3 ) ppm value; 1.99 (2H, s, -NH 2 ), 3.50 (2H, s,

【式】)、 4.79(1H、d、J=5Hz、C6−H)、 4.86(1H、d、J=5Hz、C7−H)、 4.95、5.28(2H、ABq、J=15Hz、[Formula]), 4.79 (1H, d, J = 5Hz, C 6 -H), 4.86 (1H, d, J = 5Hz, C 7 -H), 4.95, 5.28 (2H, ABq, J = 15Hz,

【式】)、 5.24(2H、s、
[Formula]), 5.24 (2H, s,

【式】)、 7.53、8.15(4H、ABq、J=8Hz、【formula】), 7.53, 8.15 (4H, ABq, J=8Hz,

【式】)、 7.86(1H、s、【formula】), 7.86 (1H, s,

【式】)、 8.30(1H、s、【formula】), 8.30 (1H, s,

【式】) (2) 7−アミノ−3−〔1−(1H−1・2・4−
トリアゾリル)メチル〕−△−セフエム−4
−カルボン酸 p−ニトロベンジルエステル
4.16gをメタノール40mlおよびテトラヒドロフ
ラン20mlの混合溶媒に溶解させ、これに10%パ
ラジウム炭素3.0gを加え、室温下水素添加反
応を行なう。反応終了後、反応液を過した
液を減圧下に濃縮する。いで、残留物に酢酸エ
チル30mlおよび水30mlを加え、氷冷下炭酸水素
ナトリウムでPH7に調整し、水層を分取する。
これを、氷冷下、2N−塩酸でPH3.5に調整す
る。析出晶を取し、水5mlおよびアセトン5
mlで順次洗浄した後乾燥すれば、融点149℃
(分解)を示す7−アミノ−3−〔1−(1・
2・4−トリアゾリル)メチル−△−セフエ
ム−4−カルボン酸2.56gを得る。 この化合物の物性(IRおよびNMR)は、実
施例8のものと一致した。 実施例 14 7−アミノ−3−アセトキシメチル−△−セ
フエム−4−カルボン酸エチルエステル3.0gお
よび1・2・4−トリアゾール0.76gを実施例13
の(1)と同様に反応させれば、融点68〜72℃(分
解)を示す7−アミノ−3−〔1−(1H−1・
2・4−トリアゾリル)メチル〕−△−セフエ
ム−4−カルボン酸エチルエステル1.02gを得
る。 IR(KBr)cm-1;δC=O 1770、1720 NMR(CDCl3)ppm値; 0.89(3H、t、J=7Hz、−COOCH2CH3 )、 2.68(2H、bs、−NH2)、 3.51(2H、s、
[Formula]) (2) 7-Amino-3-[1-(1H-1・2・4-
triazolyl)methyl]-△ 3 -cephem-4
-Carboxylic acid p-nitrobenzyl ester
4.16 g was dissolved in a mixed solvent of 40 ml of methanol and 20 ml of tetrahydrofuran, 3.0 g of 10% palladium on carbon was added thereto, and a hydrogenation reaction was carried out at room temperature. After the reaction is completed, the reaction mixture is filtered and concentrated under reduced pressure. Then, add 30 ml of ethyl acetate and 30 ml of water to the residue, adjust the pH to 7 with sodium hydrogen carbonate under ice cooling, and separate the aqueous layer.
This was adjusted to pH 3.5 with 2N hydrochloric acid under ice cooling. Take the precipitated crystals and add 5 ml of water and 5 ml of acetone.
If washed sequentially with ml and dried, the melting point is 149℃.
(decomposition) 7-amino-3-[1-(1・
2.56 g of 2,4-triazolyl)methyl- Δ3 -cephem-4-carboxylic acid are obtained. The physical properties (IR and NMR) of this compound were consistent with those of Example 8. Example 14 3.0 g of 7-amino-3-acetoxymethyl-△ 3 -cephem-4-carboxylic acid ethyl ester and 0.76 g of 1,2,4-triazole were added to Example 13.
If the reaction is carried out in the same manner as in (1), 7-amino-3-[1-(1H-1・
1.02 g of 2,4-triazolyl)methyl] -Δ3 -cephem-4-carboxylic acid ethyl ester is obtained. IR (KBr) cm -1 ; δC=O 1770, 1720 NMR (CDCl 3 ) ppm value; 0.89 (3H, t, J=7Hz, -COOCH 2 CH 3 ), 2.68 (2H, bs, -NH 2 ) , 3.51 (2H, s,

【式】)、 4.47(2H、q、J=7Hz、−COOCH2 CH3)、 4.82(1H、d、J=5Hz、C6−H)、 4.98(1H、d、J=5Hz、C7−H) 4.98、5.35(2H、ABq、J=15Hz、[Formula]), 4.47 (2H, q, J=7Hz, -COOC H 2 CH 3 ), 4.82 (1H, d, J=5Hz, C 6 -H), 4.98 (1H, d, J=5Hz, C 7 −H) 4.98, 5.35 (2H, ABq, J=15Hz,

【式】)、 7.93(1H、s、【formula】), 7.93 (1H, s,

【式】)、 8.39(1H、s、【formula】), 8.39 (1H, s,

【式】) 実施例 15 7−アミノ−3−アセトキシメチル−△−セ
フエム−4−カルボン酸ベンズヒドリルエステル
4.38gをトリフルオロ酢酸30mlに溶解させ、これ
に三弗化硼素・ジエチルエーテル錯塩7.1gおよ
び1・2・4−トリアゾール0.9gを加え室温下
5時間反応させる。反応終了後、減圧下に溶媒を
留去し、得られた残留物に水30mlおよび酢酸エチ
ル30mlを加え、これを、氷冷下炭酸水素ナトリウ
ムでPH7に調整し水層を分取する。これを再び氷
冷下にて2N−塩酸を用いてPH3.5に調整する。析
出晶を取し水5mlおよびアセトン5mlで順次洗
浄した後、乾燥すれば、融点149℃(分解)を示
す7−アミノ−3−〔1−(1H−1・2・4−ト
リアゾリル)メチル〕−△−セフエム−4−カ
ルボン酸1.12gを得る。 この化合物の物性(IRおよびNMR)は実施例
8で得られたものと一致した。
[Formula]) Example 15 7-amino-3-acetoxymethyl- Δ3 -cephem-4-carboxylic acid benzhydryl ester
4.38 g was dissolved in 30 ml of trifluoroacetic acid, 7.1 g of boron trifluoride/diethyl ether complex salt and 0.9 g of 1,2,4-triazole were added thereto, and the mixture was reacted at room temperature for 5 hours. After the reaction is complete, the solvent is distilled off under reduced pressure, 30 ml of water and 30 ml of ethyl acetate are added to the resulting residue, the pH is adjusted to 7 with sodium bicarbonate under ice cooling, and the aqueous layer is separated. The pH of this was adjusted to 3.5 using 2N hydrochloric acid under ice cooling again. Take the precipitated crystals, wash them with 5 ml of water and 5 ml of acetone, and then dry them to obtain 7-amino-3-[1-(1H-1.2.4-triazolyl)methyl], which has a melting point of 149°C (decomposed). -Δ 1.12 g of 3 -cephem-4-carboxylic acid is obtained. The physical properties (IR and NMR) of this compound were consistent with those obtained in Example 8.

Claims (1)

【特許請求の範囲】 1 一般式 〔式中、R1は水素原子を;R2はアミノ基を;Xは
置換基を有するかもしくは有しないアシルオキシ
基を;〓Yは〓S又はS→Oを意味する。〕 で表わされるセフアロスポラン酸類又はそのカル
ボキシル基における誘導体又はそれらの塩に、有
機溶媒中、酸又は酸の錯化合物の存在下、環中の
炭素原子が置換されていてもよいトリアゾール又
はテトラゾール又はそれらの塩を反応させ、所望
により次いで保護基の脱離又はカルボキシル基を
保護又は塩とすることを特徴とする一般式 〔式中、R1、R2およびYは前記した意味を有し、
R3は環中の炭素原子が置換されていてもよいト
リアゾリル又はテトラゾリル基を示す。 ただし、−CH2R3は、R3の窒素原子と隣接する
エキソメチレン基の炭素原子と結合しているもの
とする。〕 で表わされる7−アミノ−3−置換メチルセフエ
ムカルボン酸類又はそのカルボキシル基における
誘導体又はそれらの塩の製造法。 2 酸又は酸の錯化合物が、プロトン酸、ルイス
酸又はルイス酸の錯化合物である特許請求の範囲
第1項記載の7−アミノ−3−置換メチルセフエ
ムカルボン酸類又はそのカルボキシル基における
誘導体又はそれらの塩の製造法。 3 プロトン酸が、硫酸塩、スルホン酸類又は超
強酸類である特許請求の範囲第2項記載の7−ア
ミノ−3−置換メチルセフエムカルボン酸類又は
そのカルボキシル基における誘導体又はそれらの
塩の製造法。 4 ルイス酸又はルイス酸の錯化合物が、三弗化
硼素又はその錯化合物である特許請求の範囲第2
項記載の7−アミノ−3−置換メチルセフエムカ
ルボン酸類又はそのカルボキシル基における誘導
体又はそれらの塩の製造法。 5 Xがアセトキシ基である特許請求の範囲第1
〜4項いずれかの項記載の7−アミノ−3−置換
メチルセフエムカルボン酸類又はそのカルボキシ
ル基における誘導体又はそれらの塩の製造法。 6 有機溶媒が、有機カルボン酸類、エーテル
類、エステル類、ニトリル類、ニトロアルカン類
又はスルホラン類である特許請求の範囲第1〜5
項いずれかの項記載の7−アミノ−3−置換メチ
ルセフエムカルボン酸類又はそのカルボキシル基
における誘導体又はそれらの塩の製造法。 7 R3が寒中の炭素原子が置換されていてもよ
い2−(2H−1・2・3−トリアゾリル)、1−
(1H−1・2・4−トリアゾリル)、4−(4H−
1・2・4−トリアゾリル)又は2−(2H−1・
2・3・4−テトラゾリル)基である特許請求の
範囲第1〜6項いずれかの項記載の7−アミノ−
3−置換メチルセフエムカルボン酸類又はそのカ
ルボキシル基における誘導体又はそれらの塩の製
造法。
[Claims] 1. General formula [In the formula, R 1 is a hydrogen atom; R 2 is an amino group; X is an acyloxy group with or without a substituent; Y means S or S→O. ] In an organic solvent, in the presence of an acid or an acid complex compound, the cephalosporanic acids represented by the above or their carboxyl group derivatives or their salts are added to triazoles or tetrazoles in which carbon atoms in the ring may be substituted, or their salts. A general formula characterized by reacting a salt and optionally removing a protecting group or protecting a carboxyl group or converting it into a salt. [In the formula, R 1 , R 2 and Y have the above-mentioned meanings,
R 3 represents a triazolyl or tetrazolyl group in which carbon atoms in the ring may be substituted. However, it is assumed that -CH2R3 is bonded to the carbon atom of the exomethylene group adjacent to the nitrogen atom of R3 . ] A method for producing a 7-amino-3-substituted methyl cefemcarboxylic acid represented by the following formula, a derivative in its carboxyl group, or a salt thereof. 2. 7-amino-3-substituted methyl cefemcarboxylic acids or derivatives thereof in the carboxyl group according to claim 1, wherein the acid or the acid complex is a protonic acid, a Lewis acid, or a complex of Lewis acids; How those salts are made. 3. The method for producing 7-amino-3-substituted methylcefemcarboxylic acids or their carboxyl group derivatives or salts thereof according to claim 2, wherein the protonic acid is a sulfate, sulfonic acid, or super strong acid. . 4 Claim 2 in which the Lewis acid or the complex compound of a Lewis acid is boron trifluoride or a complex compound thereof
A method for producing 7-amino-3-substituted methylcefemcarboxylic acids or derivatives at the carboxyl group or salts thereof as described in 2. 5 Claim 1 in which X is an acetoxy group
A method for producing a 7-amino-3-substituted methyl cefemcarboxylic acid, a carboxyl group derivative thereof, or a salt thereof according to any one of items 1 to 4. 6 Claims 1 to 5 in which the organic solvent is an organic carboxylic acid, ether, ester, nitrile, nitroalkane, or sulfolane.
A method for producing a 7-amino-3-substituted methyl cefemcarboxylic acid or a carboxyl group derivative thereof or a salt thereof according to any of the above items. 7 R 3 is 2-(2H-1.2.3-triazolyl), 1- in which the carbon atom in the cold may be substituted.
(1H-1,2,4-triazolyl), 4-(4H-
1,2,4-triazolyl) or 2-(2H-1.
7-amino- according to any one of claims 1 to 6, which is a 2,3,4-tetrazolyl) group.
A method for producing 3-substituted methyl cefem carboxylic acids, derivatives at the carboxyl group, or salts thereof.
JP55132253A 1980-09-25 1980-09-25 Novel preparation of 7-substituted or unsubstituted amino-3-substituted methylcephem carboxylic acids Granted JPS5758689A (en)

Priority Applications (85)

Application Number Priority Date Filing Date Title
JP55132253A JPS5758689A (en) 1980-09-25 1980-09-25 Novel preparation of 7-substituted or unsubstituted amino-3-substituted methylcephem carboxylic acids
NZ198350A NZ198350A (en) 1980-09-25 1981-09-14 Cephalosporins and intermediates;pharmaceutical compositions
GB8128011A GB2089339B (en) 1980-09-25 1981-09-16 Novel cephalosporins processes for producing the same intermediates thereof and process for producing the intermediates
PH26215A PH18072A (en) 1980-09-25 1981-09-16 Cephalosporins
CA000386066A CA1204735A (en) 1980-09-25 1981-09-16 Cephalosporins, processes for producing the same, intermediates thereof and process for producing the intermediates
AU75438/81A AU550330B2 (en) 1980-09-25 1981-09-17 Cephalosporin derivatives with a broad antibacterial spectrum 276
IN1045/CAL/81A IN155375B (en) 1980-09-25 1981-09-19
IL74415A IL74415A (en) 1980-09-25 1981-09-20 7-(substituted or unsubstituted amino)-3-substituted methyl-delta3-cephem-4-carboxylic acids
ZA816576A ZA816576B (en) 1980-09-25 1981-09-22 Cephalosporins,processes for producing same,intermediates thereof and process for producing the intermediates
DE3152934A DE3152934C2 (en) 1980-09-25 1981-09-23
IT49348/81A IT1172201B (en) 1980-09-25 1981-09-23 CEPHALOSPORINS AND THEIR INTERMEDIATES RELATIVE PODUCTION PROCESS AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM
NL8104386A NL8104386A (en) 1980-09-25 1981-09-23 CEPHALOSPORINS, PROCESSES FOR THE PREPARATION THEREOF, INTERMEDIATE PRODUCTS, METHOD FOR PREPARING THE INTERMEDIATE PRODUCTS, AND PHARMACEUTICAL PREPARATIONS CONTAINING THE CEPHALOSPORINES AS AN ACTIVE COMPONENT.
DE3152932A DE3152932C2 (en) 1980-09-25 1981-09-23
DE3152935A DE3152935C2 (en) 1980-09-25 1981-09-23
PL1981238228A PL137674B1 (en) 1980-09-25 1981-09-23 Method of obtaining derivatives of delta 3-cephemocarboxylic acid
DE19813137854 DE3137854A1 (en) 1980-09-25 1981-09-23 NEW CEPHALOSPORINE, METHOD FOR PRODUCING THE SAME, INTERMEDIATE STAGES AND METHOD FOR PRODUCING THE INTERMEDIATE STAGE
US06/304,912 US4489072A (en) 1980-09-25 1981-09-23 Cephalosporins
DE3152931A DE3152931C2 (en) 1980-09-25 1981-09-23
AT0410981A AT375082B (en) 1980-09-25 1981-09-24 METHOD FOR PRODUCING NEW CEPHALOSPORINES
ES505760A ES505760A0 (en) 1980-09-25 1981-09-24 A PROCEDURE FOR THE PRODUCTION OF NEW CEPHALOSPORINS.
KR1019810003579A KR860000487B1 (en) 1980-09-25 1981-09-24 Process for preparing cephalosporins
HU812759A HU185850B (en) 1980-09-25 1981-09-24 Process for preparing 7-/ /thiazol-4-yl/-acetamido- or hydroxy-imino- or alkoxy-imino-acetamido/ -delta up 3 -cefem-4-carboxylic acid derivatives
FI812980A FI75575C (en) 1980-09-25 1981-09-24 Process for the preparation of novel cephalosporins.
HU831798A HU188021B (en) 1980-09-25 1981-09-24 Process for preparing 7-amino-3-substituted methyl-cef-3-em-carboxylic acids
SE8105658A SE453090B (en) 1980-09-25 1981-09-24 NEW CEPHALOSPORIN DERIVATIVES, PROCEDURES FOR PREPARING THEREOF AND PHARMACEUTICAL COMPOSITION THEREOF
LU83650A LU83650A1 (en) 1980-09-25 1981-09-24 NOVEL CEPHALOSPORINS, THEIR PREPARATION PROCESS AND THEIR THERAPEUTIC APPLICATION
DK421881A DK163877C (en) 1980-09-25 1981-09-24 ANALOGY PROCEDURE FOR THE PREPARATION OF HIS UNKNOWN CEPHALOSPORINES
NO813252A NO161117C (en) 1980-09-25 1981-09-24 ANALOGY PROCEDURE FOR THE PREPARATION OF THERAPEUTIC ACTIVE CEPHALOSPORIN DERIVATIVES.
PT73727A PT73727B (en) 1980-09-25 1981-09-24 Novel cephalosporins processes for producing the same intermediates thereof and process for producing the inter- mediates
MX7609A MX155025A (en) 1980-09-25 1981-09-24 PROCEDURE TO PRODUCE CEPHALOSPORINS
RO112113A RO86825B (en) 1980-09-25 1981-09-25 Process for the preparation of 7-amino-3-methyl-substituted-delta3-cefem-4-carboxylic acids
CH4519/84A CH651837A5 (en) 1980-09-25 1981-09-25 INTERMEDIATE PRODUCTS FOR THE PRODUCTION OF NEW CEPHALOSPORINES.
RO112112A RO86824B (en) 1980-09-25 1981-09-25 Process for the preparation of cephalosporins
BE0/206067A BE890499A (en) 1980-09-25 1981-09-25 NOVEL CEPHALOSPORINS, THEIR PREPARATION PROCESS AND THEIR THERAPEUTIC APPLICATION
FR8118156A FR2509310B1 (en) 1980-09-25 1981-09-25 NOVEL CEPHALOSPORINS, THEIR PREPARATION PROCESS AND THEIR THERAPEUTIC APPLICATION
RO81105405A RO82689A (en) 1980-09-25 1981-09-25 PROCESS FOR THE PREPARATION OF CEPHALOSPORINS
RO112111A RO86823B (en) 1980-09-25 1981-09-25 Process for the preparation of cephalosporins
DD81233599A DD202436A5 (en) 1980-09-25 1981-09-25 PROCESS FOR THE PREPARATION OF NEW CEPHALOSPORINES
CH4520/84A CH652130A5 (en) 1980-09-25 1981-09-25 INTERMEDIATE PRODUCTS FOR THE PRODUCTION OF NEW cephalosporins.
CH6202/81A CH652129A5 (en) 1980-09-25 1981-09-25 NEW CEPHALOSPORINE, METHOD FOR THE PRODUCTION THEREOF.
DD81247292A DD208351A5 (en) 1980-09-25 1981-09-25 METHOD OF GENERATING A 7- (SUBSTATION OR SUBSTYLE-AMIONO) -3- (SUBST.-METHYL) -ELTA HIGH 3-CEPHEM-4-CARBON ACID
CH4521/84A CH652128A5 (en) 1980-09-25 1981-09-25 INTERMEDIATE PRODUCTS FOR PRODUCING NEW CEPHALOSPORINES AND METHOD FOR PRODUCING THE SAME.
EG543/81A EG17373A (en) 1980-09-25 1981-09-26 Novel cephalosporins process for production the same intermediates thereof and process for producting the intermediates
ES514670A ES514670A0 (en) 1980-09-25 1982-08-02 A PROCEDURE FOR THE PRODUCTION OF NEW CEPHALOSPORINS.
ES514671A ES8306157A1 (en) 1980-09-25 1982-08-02 7-(substituted or unsubstituted amino) 3-substituted methyl-3cephem-4-carboxylic acid
ES514669A ES8306155A1 (en) 1980-09-25 1982-08-02 7-(substituted or unsubstituted amino) 3-substituted methyl-3cephem-4-carboxylic acid
FR8215995A FR2511374B1 (en) 1980-09-25 1982-09-22 PROCESS FOR THE PREPARATION OF ACIDS 7- (SUBSTITUTED OR NON-AMINO) -3-METHYL SUBSTITUE-3-CEPHEME-4 CARBOXYLIQUES
FR8215992A FR2511377B1 (en) 1980-09-25 1982-09-22 NEW CEPHALOSPORINS AND THEIR SALTS
FR8215994A FR2511373B1 (en) 1980-09-25 1982-09-22 ACIDS 7- (AMINO SUBSTITUTED OR NOT) -3-METHYL SUBSTITUE-3-CEPHEME-4-CARBOXYLIQUES
CS827531A CS236493B2 (en) 1980-09-25 1982-10-22 Method of 7-amino-3-substituted methyl-delta 3-cephem-4-carboxyl acid's preparation
SU823521951A SU1318144A3 (en) 1980-09-25 1982-12-09 Method for producing cephalosporin derivatives or salts teherof
SU823520352A SU1308198A3 (en) 1980-09-25 1982-12-09 Method of producing 7-amino-3-substituted methyl-delta-3-cephem-4-carbonic acid or its acid-additive salts
AR29180883A AR240645A1 (en) 1980-09-25 1983-01-07 Process for the preparation of new cephalosporines
AT0055483A AT378961B (en) 1980-09-25 1983-02-18 METHOD FOR PRODUCING NEW CEPHALOSPORINES
AT0055583A AT378962B (en) 1980-09-25 1983-02-18 METHOD FOR PRODUCING NEW CEPHALOSPORINES
AT0055683A AT378193B (en) 1980-09-25 1983-02-18 METHOD FOR PRODUCING 7- (SUBSTITUTED OR UNSUBSTITUTED AMINO) -3- (SUBSTITUTED METHYL) -DELTA3-CEPHEM-4-CARBONIC ACIDS
PH29076A PH19147A (en) 1980-09-25 1983-06-17 Process for producing novel cephalosporin
PH29078A PH18484A (en) 1980-09-25 1983-06-17 Process for producing novel cephalosporins
PH29077A PH20221A (en) 1980-09-25 1983-06-17 Process for producing novel cephalosporins
PH29075A PH19251A (en) 1980-09-25 1983-06-17 Process for producing novel cephalosporin
SU833635254A SU1350166A1 (en) 1980-09-25 1983-08-24 7-amino-3-substituted methyl-delta 3-cephem-4-carboxylic acid as intermediate products in synthesis 7-acylamido-cephalosporins showing antibacterial properties
CA000435930A CA1200541A (en) 1980-09-25 1983-09-01 Cephalosporins, processes for producing the same, intermediates thereof and process for producing the intermediates
GB838333402A GB8333402D0 (en) 1980-09-25 1983-12-15 Cephalosporins intermediates
GB838333401A GB8333401D0 (en) 1980-09-25 1983-12-15 Cephalosporins intermediates
GB08402250A GB2136420B (en) 1980-09-25 1984-01-27 Cephalosporin derivatives
GB08402249A GB2135304B (en) 1980-09-25 1984-01-27 7-amino-3-(triazolyl or tetrazolyl)methyl-.3-cephem-4-carboxylic acidss
IN603/CAL/84A IN159126B (en) 1980-09-25 1984-08-29
IN601/CAL/84A IN158589B (en) 1980-09-25 1984-08-29
IN602/CAL/84A IN158590B (en) 1980-09-25 1984-08-29
US06/654,681 US4673738A (en) 1980-09-25 1984-09-26 Novel intermediates of cephalosporins and process for producing 7-(substituted or unsubstituted amino)-3-substituted methyl-Δ3 -cephem-4-carboxylic acids
IL74415A IL74415A0 (en) 1980-09-25 1985-02-21 7-(substituted or unsubstituted amino)-3-substituted methyl-delta3-cephem-4-carboxylic acids and a process for producing the same
IL76348A IL76348A0 (en) 1980-09-25 1985-09-10 Process for producing 7-(substituted or unsubstituted amino)-3-substituted methyl delta3-cephem-4-carboxylic acids
AU49863/85A AU558669B2 (en) 1980-09-25 1985-11-13 Cephalosporin derivatives
AU49861/85A AU568033B2 (en) 1980-09-25 1985-11-13 3-((1,2,4-triazolyl or 2 (1,2,3,4-tetrazolyl) methyl) cephalosporins
AU49862/85A AU558649B2 (en) 1980-09-25 1985-11-13 Preparation of 7-amino-3-triazolyl or tetrazolylmethylcephem -4- carboxylic acid derivatives
AU49860/85A AU558586B2 (en) 1980-09-25 1985-11-13 Cephalosporin derivatives
SE8600192A SE468478B (en) 1980-09-25 1986-01-16 NEW CEPHALOSPORIN DERIVATIVES WHICH ARE APPLICABLE AS INTERMEDIATE
SE8600195A SE468477B (en) 1980-09-25 1986-01-16 PROCEDURES FOR THE PREPARATION OF 7-AMINO-3-SUBSTITUTED CEPHALOSPORIC ACID
SE8600193A SE468479B (en) 1980-09-25 1986-01-16 NEW CEPHALOSPORIN DERIVATIVES WHICH ARE APPLICABLE AS INTERMEDIATE
SE8600194A SE468476B (en) 1980-09-25 1986-01-16 NEW 7- (SUBSTITUTED OR UNSUBSTITUTED AMINO) -3- SUBSTITUTED METHYL-CEFEM-4-CARBOXYL ACID
MX904686A MX9046A (en) 1980-09-25 1986-03-19 METHOD FOR PRODUCING CEPHALOSPORINS.
KR1019860002383A KR860000932B1 (en) 1980-09-25 1986-03-29 Process of preparing cephalosporanic acid derivatives
FI870153A FI80041C (en) 1980-09-25 1987-01-15 PROCEDURE FOR FRAMSTAELLNING AV 7-AMINO-3- (SUBSTITUTED METHYL) -3-CEFEM-4-CARBOXYLSYROR.
US07/022,433 US4879381A (en) 1980-09-25 1987-03-06 7-(substituted or unsubstituted amino) 3-substituted methyl-3 cephem-4-carboxylic acid
US07/707,221 US5144027A (en) 1980-09-25 1991-05-24 Cephalosporins, process for producing the same, intermediates thereof and process for producing the intermediates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55132253A JPS5758689A (en) 1980-09-25 1980-09-25 Novel preparation of 7-substituted or unsubstituted amino-3-substituted methylcephem carboxylic acids

Publications (2)

Publication Number Publication Date
JPS5758689A JPS5758689A (en) 1982-04-08
JPS6210512B2 true JPS6210512B2 (en) 1987-03-06

Family

ID=15076944

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55132253A Granted JPS5758689A (en) 1980-09-25 1980-09-25 Novel preparation of 7-substituted or unsubstituted amino-3-substituted methylcephem carboxylic acids

Country Status (10)

Country Link
JP (1) JPS5758689A (en)
AU (2) AU558669B2 (en)
BE (1) BE890499A (en)
CS (1) CS236493B2 (en)
GB (2) GB8333401D0 (en)
HU (1) HU188021B (en)
MX (1) MX9046A (en)
PL (1) PL137674B1 (en)
SU (3) SU1308198A3 (en)
ZA (1) ZA816576B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0390112U (en) * 1989-12-29 1991-09-13

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4870168A (en) * 1987-02-26 1989-09-26 Bristol-Myers Company 3-Unsaturated alkyl cephems from 3-triflyl cephems

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0390112U (en) * 1989-12-29 1991-09-13

Also Published As

Publication number Publication date
MX9046A (en) 1994-02-28
AU4986385A (en) 1986-03-20
BE890499A (en) 1982-03-25
HU188021B (en) 1986-03-28
PL238228A1 (en) 1983-05-23
AU558669B2 (en) 1987-02-05
ZA816576B (en) 1982-09-29
PL137674B1 (en) 1986-07-31
SU1350166A1 (en) 1987-11-07
AU558586B2 (en) 1987-02-05
CS236493B2 (en) 1985-05-15
SU1318144A3 (en) 1987-06-15
JPS5758689A (en) 1982-04-08
AU4986085A (en) 1986-03-20
GB8333401D0 (en) 1984-01-25
SU1308198A3 (en) 1987-04-30
GB8333402D0 (en) 1984-01-25

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