JPS62102590A - Flexible printed circuit substrate - Google Patents

Flexible printed circuit substrate

Info

Publication number
JPS62102590A
JPS62102590A JP24254985A JP24254985A JPS62102590A JP S62102590 A JPS62102590 A JP S62102590A JP 24254985 A JP24254985 A JP 24254985A JP 24254985 A JP24254985 A JP 24254985A JP S62102590 A JPS62102590 A JP S62102590A
Authority
JP
Japan
Prior art keywords
printed circuit
flexible printed
circuit board
layer
nickel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24254985A
Other languages
Japanese (ja)
Inventor
金也 熊沢
堀口 正男
昭夫 野尻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP24254985A priority Critical patent/JPS62102590A/en
Publication of JPS62102590A publication Critical patent/JPS62102590A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は電子機器等の内部配線材として用いられるフレ
キシブルプリント回路基板に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a flexible printed circuit board used as an internal wiring material for electronic equipment and the like.

〔従来の技術〕[Conventional technology]

従来フレキシブルプリント回路基板は、プラスチックフ
ィルムに厚さ35μ程度の電気銅箔を接着剤で貼゛り合
わせて基板とした後、該銅箔をエンチングすることによ
り必要な回路を形成していた。
Conventionally, flexible printed circuit boards have been made by laminating electrical copper foil with a thickness of about 35 microns to a plastic film with an adhesive, and then etching the copper foil to form the necessary circuits.

又最近では高密度実装が急激に進められフレキシブルプ
リント回路パターンも5本/llから10本/flの要
求が高まってきて、それに対する解決手段として物理蒸
着法やイオンブレーティング法によるフレキシブルプリ
ント回路基板の製法が開発された。これらの方法では加
熱脱ガス処理やイオンボンバード処理等の前処理を充分
行うことにより比較的密着力が良く、しかもピンホール
のない配線層が形成されたフレキシブ、ルプリント回路
基板が得られている。
Recently, high-density packaging has rapidly progressed, and the demand for flexible printed circuit patterns from 5 lines/ll to 10 lines/fl has increased, and as a solution to this, flexible printed circuit boards using physical vapor deposition or ion blating methods are used. A manufacturing method was developed. With these methods, flexible and printed circuit boards with relatively good adhesion and pinhole-free wiring layers can be obtained by sufficiently performing pretreatments such as heating degassing treatment and ion bombardment treatment. .

一方、プラスチックフィルムと銅箔との貼り合わせ式の
フレキシブルプリント回路基板及びスパッタリング法や
イオンブレーティング法等の物理蒸着法による配線層形
成のフレキシブルプリント回路基板においても接続部は
特に高い信頬性が要求されるため、金メッキを施すのが
一般的である。例えば貼り合わ式のフレキシブルプリン
ト回路基板では銅配線層の上にニッケルメッキを厚さ1
μ程度付着せしめ更にその上に99.7%以上の品位の
金メッキが厚さ0.2μ以上施されている。ここでニッ
ケルメッキが施されているのは銅が金に食われるのを、
また、その拡散を防ぐためである。
On the other hand, in flexible printed circuit boards made by laminating plastic film and copper foil, and in flexible printed circuit boards in which wiring layers are formed using physical vapor deposition methods such as sputtering or ion blating, the connections have particularly high reliability. Because of this requirement, it is common to use gold plating. For example, in a bonded flexible printed circuit board, nickel plating is applied to the copper wiring layer to a thickness of 1.
Gold plating with a quality of 99.7% or higher is applied to a thickness of 0.2 μm or more. The reason why nickel plating is applied here is to prevent copper from being eaten by gold.
This is also to prevent its spread.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかし、前記の貼り合わせ式のフレキシブルプリント回
路基板には次のような問題点がある。■プラスチックフ
ィルムとtlA fiを貼り合わせるために特殊な接着
剤が必要になり又使用されるプラスチックフィルムの方
も種類が限定されるため、比較的耐熱性の良いプラスチ
ックフィルムしか使うことが出来ない、■ピンホールの
ない薄い銅箔の製作は困難であり又貼り合わせ技術も容
易でない。
However, the above bonded type flexible printed circuit board has the following problems. ■A special adhesive is required to bond the plastic film and tlA fi, and the types of plastic film used are limited, so only plastic films with relatively good heat resistance can be used. ■It is difficult to produce thin copper foil without pinholes, and bonding technology is also not easy.

そのため微細パターンの製作が不可能である。Therefore, it is impossible to produce fine patterns.

一方、スパッタリング法やイオンブレーティング法等の
物理蒸着法によるフレキシブルプリント回路基板に、前
記貼り合わ式フレキシブルプリント回路基板に行ったと
同様のニッケルメッキ、金メッキを施すと、形成された
銅Fli膜とプラスチックフィルムとの密着力が極めて
弱くなり場合によっては剥離することもある。これらの
原因は定かではないが恐ら(メッキ浴に浸漬されたフレ
キシブルプリント回路基板においてw4薄膜に吸収され
た水分子アニオンやカチオン等が結晶粒界を通過して銅
薄膜、プラスチック基板の界面に何らかの影響を与えて
いるものと考えられる。
On the other hand, when nickel plating or gold plating is applied to a flexible printed circuit board formed by a physical vapor deposition method such as sputtering or ion-blating, as in the case of the above-mentioned bonded flexible printed circuit board, the formed copperFli film and plastic The adhesion to the film becomes extremely weak and may peel off in some cases. The cause of these problems is not certain, but it is likely that (in the flexible printed circuit board immersed in the plating bath, water molecule anions and cations absorbed by the W4 thin film pass through the grain boundaries and reach the interface between the copper thin film and the plastic substrate. It is thought that this has some kind of influence.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は上記の問題点を解決するため研究した結果なさ
れたもので、配線層を蒸発粒子エネルギー1eV以上の
物理蒸着法によって銅にて形成したフレキシブルプリン
ト回路基板において、前記銅配線層の上に前記物理蒸着
法によりニッケル層を形成し、更にその上に金層を形成
したことを特徴とするフレキシブルプリント回路基板を
提供するものである。
The present invention was made as a result of research to solve the above problems, and includes a flexible printed circuit board in which a wiring layer is formed of copper by a physical vapor deposition method with an evaporation particle energy of 1 eV or more. The present invention provides a flexible printed circuit board characterized in that a nickel layer is formed by the physical vapor deposition method, and a gold layer is further formed thereon.

以下図面を参照して本発明の詳細な説明する。The present invention will be described in detail below with reference to the drawings.

第1図は本発明の一実施例であるフレキシブルプリント
回路基板の断面を示すもので、ポリエステル、ポリイミ
ド、ポリエーテルサルフォン、ポリフェニレンサルファ
イド、四弗化エチレン樹脂等のプラスチックフィルム1
上に蒸発粒子エネルギー1eV以上の物理蒸着法によっ
て銅配線層2を形成する。銅配線N2の厚さは用途によ
って適宜選択されるが通常1μ〜5μ程度である。何故
なら、厚さ1μ以下であるとピンホールが発生し易く、
又厚さ5μ以上では銅薄膜の内部応力によりカーリング
する一方屈曲性も劣るからである。銅配線層2形成後そ
の上に前記物理蒸着法によりニッケル層3を厚さ0.5
μ以上適宜付着せしめる。
FIG. 1 shows a cross section of a flexible printed circuit board that is an embodiment of the present invention, and shows a plastic film made of polyester, polyimide, polyether sulfone, polyphenylene sulfide, tetrafluoroethylene resin, etc.
A copper wiring layer 2 is formed thereon by physical vapor deposition with an evaporation particle energy of 1 eV or more. The thickness of the copper wiring N2 is appropriately selected depending on the application, but is usually about 1 μm to 5 μm. This is because if the thickness is less than 1μ, pinholes are likely to occur.
Further, if the thickness is 5 μm or more, curling occurs due to the internal stress of the thin copper film, and the flexibility is also poor. After forming the copper wiring layer 2, a nickel layer 3 is formed thereon to a thickness of 0.5 cm by the physical vapor deposition method.
Appropriately attach more than μ.

前記物理N@法を用いるのは銅配線層2とニッケルN3
との密着力を強固にするためであり又良質な膜が期待さ
れるからである。又ニッケルを薄膜層として用いるのは
物理蒸着法によって銅、亜鉛、スズ等を薄膜化した場合
、その薄膜の性質上、水分等に対して弱(そのため表面
抵抗値を増大させ、更に界面での剥離を引き起こしやす
いが、ニッケルは比較的化学的に安定しており、又この
上に金層3を設けた時、金がニッケルへ拡散する速度が
遅く、更には銅配線層2と金層4との間にニッケル層3
を設けると一種の緩衝層になり機械特性上特に屈曲特性
において優れた働きをする等の理由による。最後に、接
続部の信頼性向上のため金層4が設けられる。この金層
4は物理蒸着法に限定されず通常のメッキ法で形成して
もかまわず、フレキシブルプリント回路基板の要求特性
、コスト等を考慮して適宜選択される。なお、銅配線層
2形成後のニッケル層3の形成の際は、一度大気に戻す
ことなく、真空中で成膜されることが望ましい。何故な
ら大気中では銅配線層2の表面が酸化したり種々の吸着
分子のために界面剥離が助長されるからである。
The physical N@ method is used for copper wiring layer 2 and nickel N3.
This is to strengthen the adhesion with the film, and a high-quality film is expected. In addition, using nickel as a thin film layer is difficult when copper, zinc, tin, etc. are made into a thin film by physical vapor deposition, and due to the nature of the thin film, it is vulnerable to moisture etc. (therefore, it increases the surface resistance value and also increases the Although nickel tends to cause peeling, it is relatively chemically stable, and when the gold layer 3 is provided on top of it, the rate of gold diffusion into the nickel is slow, and furthermore, the copper wiring layer 2 and the gold layer 4 Nickel layer 3 between
This is because when provided, it becomes a kind of buffer layer and has excellent mechanical properties, especially in terms of bending properties. Finally, a gold layer 4 is provided to improve the reliability of the connection. This gold layer 4 is not limited to the physical vapor deposition method, but may be formed by an ordinary plating method, and is appropriately selected in consideration of the required characteristics, cost, etc. of the flexible printed circuit board. Note that when forming the nickel layer 3 after forming the copper wiring layer 2, it is desirable that the film be formed in a vacuum without returning to the atmosphere. This is because in the atmosphere, the surface of the copper wiring layer 2 is oxidized and various adsorbed molecules promote interfacial peeling.

〔実施例1〕 厚さ25μのポリイミドフィルム(東しデュポン製、商
品名Kapton)上に、平板マグネトロン直流スパッ
タリング装置を用いてArガス圧4 X 10−’T。
[Example 1] A polyimide film (manufactured by DuPont East, trade name: Kapton) with a thickness of 25 μm was coated with an Ar gas pressure of 4×10 −′ T using a flat plate magnetron direct current sputtering device.

rr、D、C,500V X 8 Aの条件下で銅をス
パッタし2μ厚さの銅配線層を得た。その後真空状態を
破らず引き続き同一条件でニッケルをスパッタし0.5
μ厚さのニッケル層を形成した。その後空気中に取り出
してエツチング法により所望の導体回路パターンを形成
し最後にそのパターンの端部(接続部)に0.3μ厚さ
の金メッキを施してフレキシブルプリント回路基板を得
た。得られた上記回路基板について第2図に示す装置を
用いて屈曲試験(曲げ半径5m、屈曲回数30回/分)
を実施したところ屈曲回数lOO万回まで異常は認めら
れず良好な特性を示した。なお前記試験方法はフレキシ
ブルプリント回路基板の一端を固定片7に他端を可動片
6に固定し、可動片8を図の点線の位置まで動かして元
の位置にもどす。これを屈曲回数1回と数えた。なお、
リード線6は金メッキを施したパターン端部4にハンダ
にて接続されている。
Copper was sputtered under the conditions of rr, D, C, 500V x 8A to obtain a 2μ thick copper wiring layer. After that, nickel was sputtered under the same conditions without breaking the vacuum state to 0.5
A nickel layer of μ thickness was formed. Thereafter, it was taken out into the air and a desired conductor circuit pattern was formed by etching, and finally the ends (connection parts) of the pattern were plated with gold to a thickness of 0.3 μm to obtain a flexible printed circuit board. The obtained circuit board was subjected to a bending test using the apparatus shown in Fig. 2 (bending radius 5 m, number of bends 30 times/min).
When the test was carried out, no abnormality was observed up to 100,000 bends, and good characteristics were exhibited. In the test method, one end of the flexible printed circuit board is fixed to the fixed piece 7 and the other end is fixed to the movable piece 6, and the movable piece 8 is moved to the position indicated by the dotted line in the figure and returned to its original position. This was counted as one bending. In addition,
The lead wire 6 is connected to the gold-plated pattern end 4 by solder.

〔比較例1〕 実施例1で示した同じポリイミドフィルム上に平板マグ
ネトロン直流スパッタリング装置を用いてArガス圧4
 Xl0−’Torr、D、C,500V X 8 A
の条件下で銅をスパッタし2μ厚さの銅配線層を得た。
[Comparative Example 1] The same polyimide film shown in Example 1 was coated with an Ar gas pressure of 4 using a flat plate magnetron DC sputtering device.
Xl0-'Torr, D, C, 500V X 8 A
Copper was sputtered under the following conditions to obtain a 2μ thick copper wiring layer.

その後空気中に取り出してニッケルメッキを施したとこ
ろ下地の銅配線層の端部(接続部)が局所的に剥離し、
又ニッケルメッキが付着した部分も指でこすると容易に
剥離し次の金メッキを施すまでには到らなかった。
After that, when it was taken out into the air and nickel plated, the ends (connections) of the underlying copper wiring layer peeled off locally.
Also, the part to which the nickel plating was attached was easily peeled off when rubbed with a finger, and it was not possible to apply the next gold plating.

〔発明の効果〕〔Effect of the invention〕

本発明に係るフレキシブルプリント回路基板は可撓性、
耐ハンダ性を充分満足し、しかも接続部の信較性上欠く
ことのできない金層を容易に形成できる等本発明の工業
的価値は極めて高いものである。
The flexible printed circuit board according to the present invention is flexible,
The industrial value of the present invention is extremely high, as it can easily form a gold layer that satisfies solder resistance and is indispensable for the reliability of connections.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例であるフレキシブルプリント
回路基板の断面図、第2図は屈曲性評価のための概略図
である。 1〜プラスチツクフイルム、2〜銅配線層、3〜ニッケ
ル層、4〜金層、5〜フレキシブルプリント回路基板、
6〜リード線、7〜固定片、8〜可動片。 第1図 第2図 手続補正書(自発) 昭和61年7月22日 L 事件の表示  特願昭60−2142549号2、
発明の名称  フレキシブルプリント回路基板玉 補正
をする者 事件との関係 特許出願人 5 補正の内容 (1)本願明細書に添付した図面の第1図が間違って居
りましたので正しい第1図を提出いたします。 第1図
FIG. 1 is a sectional view of a flexible printed circuit board according to an embodiment of the present invention, and FIG. 2 is a schematic diagram for evaluating flexibility. 1 - plastic film, 2 - copper wiring layer, 3 - nickel layer, 4 - gold layer, 5 - flexible printed circuit board,
6 - lead wire, 7 - fixed piece, 8 - movable piece. Figure 1 Figure 2 Procedural amendment (voluntary) July 22, 1985 L Display of case Patent application No. 1988-2142549 2,
Title of the invention: Flexible printed circuit board ball Relationship with the case of the person making the amendment Patent applicant 5 Contents of the amendment (1) Figure 1 of the drawings attached to the specification of the present application was incorrect, so the correct Figure 1 was submitted. I will do it. Figure 1

Claims (1)

【特許請求の範囲】[Claims]  配線層を、蒸発粒子エネルギー1eV以上の物理蒸着
法によって、銅にて形成したフレキシブルプリント回路
基板において、前記鋼配線層上に前記物理蒸着法により
ニッケル層を形成し、更にその上に金層を形成したこと
を特徴とするフレキシブルプリント回路基板。
In a flexible printed circuit board in which a wiring layer is formed of copper by a physical vapor deposition method with an evaporation particle energy of 1 eV or more, a nickel layer is formed on the steel wiring layer by the physical vapor deposition method, and a gold layer is further formed on the nickel layer. A flexible printed circuit board characterized by forming a flexible printed circuit board.
JP24254985A 1985-10-29 1985-10-29 Flexible printed circuit substrate Pending JPS62102590A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24254985A JPS62102590A (en) 1985-10-29 1985-10-29 Flexible printed circuit substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24254985A JPS62102590A (en) 1985-10-29 1985-10-29 Flexible printed circuit substrate

Publications (1)

Publication Number Publication Date
JPS62102590A true JPS62102590A (en) 1987-05-13

Family

ID=17090754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24254985A Pending JPS62102590A (en) 1985-10-29 1985-10-29 Flexible printed circuit substrate

Country Status (1)

Country Link
JP (1) JPS62102590A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022085464A1 (en) * 2020-10-20 2022-04-28 セーレン株式会社 Conductive film having gold layer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022085464A1 (en) * 2020-10-20 2022-04-28 セーレン株式会社 Conductive film having gold layer

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