JPS6198868U - - Google Patents
Info
- Publication number
- JPS6198868U JPS6198868U JP18360284U JP18360284U JPS6198868U JP S6198868 U JPS6198868 U JP S6198868U JP 18360284 U JP18360284 U JP 18360284U JP 18360284 U JP18360284 U JP 18360284U JP S6198868 U JPS6198868 U JP S6198868U
- Authority
- JP
- Japan
- Prior art keywords
- vacuum chamber
- semiconductor manufacturing
- vacuum
- evacuate
- atmosphere
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18360284U JPS6198868U (enExample) | 1984-12-05 | 1984-12-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18360284U JPS6198868U (enExample) | 1984-12-05 | 1984-12-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6198868U true JPS6198868U (enExample) | 1986-06-24 |
Family
ID=30741098
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18360284U Pending JPS6198868U (enExample) | 1984-12-05 | 1984-12-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6198868U (enExample) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57174465A (en) * | 1981-04-20 | 1982-10-27 | Kokusai Electric Co Ltd | High frequency ion etching device |
-
1984
- 1984-12-05 JP JP18360284U patent/JPS6198868U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57174465A (en) * | 1981-04-20 | 1982-10-27 | Kokusai Electric Co Ltd | High frequency ion etching device |
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