JPS6197917A - X ray exposure device - Google Patents
X ray exposure deviceInfo
- Publication number
- JPS6197917A JPS6197917A JP59218364A JP21836484A JPS6197917A JP S6197917 A JPS6197917 A JP S6197917A JP 59218364 A JP59218364 A JP 59218364A JP 21836484 A JP21836484 A JP 21836484A JP S6197917 A JPS6197917 A JP S6197917A
- Authority
- JP
- Japan
- Prior art keywords
- atmosphere chamber
- chamber
- ray
- junction portion
- screw
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 12
- 238000007789 sealing Methods 0.000 claims abstract description 8
- 239000007788 liquid Substances 0.000 claims description 13
- 230000000903 blocking effect Effects 0.000 claims description 2
- 238000000926 separation method Methods 0.000 claims 1
- 238000002834 transmittance Methods 0.000 claims 1
- 230000008439 repair process Effects 0.000 abstract description 4
- 230000005856 abnormality Effects 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 3
- 229920001971 elastomer Polymers 0.000 abstract description 2
- 230000035699 permeability Effects 0.000 abstract description 2
- 238000012856 packing Methods 0.000 abstract 3
- 238000000034 method Methods 0.000 abstract 1
- 238000004904 shortening Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 5
- 238000000605 extraction Methods 0.000 description 3
- 239000001307 helium Substances 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 241000257465 Echinoidea Species 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明はＸ線によりマスクパターンをウニ・・に露光す
るＸ線露光装置に係バ特に装置内の光学系等を修理する
に好適なＸ線露光装置に関するものである。[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to an X-ray exposure device that exposes a mask pattern to sea urchins with X-rays, and is particularly suitable for repairing optical systems in the device. This relates to an exposure device.
第５図に示す如く、雰囲気チャンバ４内にはアライメン
トの光学系９等が収納されているが、従来技術ではこれ
等を修理する場合に作業性が悪い欠点があった。As shown in FIG. 5, an alignment optical system 9 and the like are housed in the atmosphere chamber 4, but the prior art has the disadvantage of poor workability when repairing these.
すなわち、従来一般に採用されているｘ＠Ｎ光装置とし
ては、例えば米国特許第４４０易６６号に示される如き
ものがある０第Ｓ図は上記のものに近似するＸ線露光装
置構造を示す。That is, as an x@N optical apparatus that has been generally employed in the past, there is one such as that shown in US Pat. No. 4,406,66, for example. FIG.
Ｘ線発生源１の真空チャンバ２にはＸ線を取出すための
ベリリウム薄膜からなるＸ線取出窓３が設けられている
。真空チャンバ２のＸ線取出窓６側には雰囲気チャンバ
４が連結し、雰囲気チャンバ４のＸ線取出窓６と対峙す
る開口部側にはマスク６がこれを間止し、真空吸着溝１
５を弁し吸着される。雰囲気チャンバ４の内部５にはＸ
線を透過させ易い気体、例えばヘリウムが充満されると
共に、アライメント位置検出用の光学系９および待機機
構１２等が収納される。待機機構１２は光学系の対物レ
ンズ１０等を図示のアライメント位置に位置決めすると
共に、これをＸ線の通路１１から外れる待機位置（図示
せず）に移動するためのものである。また雰囲気チャン
バ４の内部５にはヘリウムが２注入管１３よシヘリウム
が注入されると共に１ ヘリウムが２排出管１４によン
これを排出し、内部５の圧力が大気圧とほぼ同一になる
様に調整している。A vacuum chamber 2 of the X-ray source 1 is provided with an X-ray extraction window 3 made of a beryllium thin film for extracting X-rays. An atmosphere chamber 4 is connected to the X-ray extraction window 6 side of the vacuum chamber 2, and a mask 6 interrupts this on the opening side of the atmosphere chamber 4 facing the X-ray extraction window 6.
5 and is absorbed. The inside 5 of the atmosphere chamber 4 has an X
It is filled with a gas that easily transmits light, such as helium, and also houses an optical system 9 for detecting alignment position, a standby mechanism 12, and the like. The standby mechanism 12 is for positioning the objective lens 10 and the like of the optical system at the illustrated alignment position, and also for moving it to a standby position (not shown) out of the X-ray path 11. Furthermore, helium is injected into the interior 5 of the atmosphere chamber 4 through the injection pipe 13, and helium is discharged through the discharge pipe 14, so that the pressure in the interior 5 becomes almost the same as atmospheric pressure. is being adjusted.
ウェハ７はマスク６と対峙して配設され、チルトステー
ジ２０とアライメントステージ８上に載置される。これ
等のステージ２ｏ、８はウェハの３軸方向の位置調整を
するものである。The wafer 7 is disposed facing the mask 6 and placed on the tilt stage 20 and alignment stage 8. These stages 2o and 8 are used to adjust the position of the wafer in three axial directions.
以上の如き構成のＸ線露光装置にょシ発せられるＸ線に
よ）、マスク６上のパターンがウェハに露光され転写さ
れる。The pattern on the mask 6 is exposed and transferred onto the wafer by X-rays emitted by the X-ray exposure apparatus having the above configuration.
一方、使用中等において、雰囲気チャンバ４内に配置し
た光学系９や待機機構１２に異状が生ずる場合があるが
、従来技術ではこの修理に多くの時間を必要としていた
。これは、雰囲気チャンバ４内の気体の洩れを防止する
ため雰囲気チャンバ４の接合部は組立的においてシリコ
ンゴム等の接着剤によシシールされ、この取外し、再シ
ールに極め多くの時間を必要とするためである。On the other hand, during use, an abnormality may occur in the optical system 9 or the standby mechanism 12 disposed within the atmosphere chamber 4, but in the conventional technology, a lot of time is required for repairing this problem. This is because the joints of the atmosphere chamber 4 are sealed with an adhesive such as silicone rubber during assembly to prevent gas leakage within the atmosphere chamber 4, and it takes an extremely long time to remove and reseal. It's for a reason.
本発明は上記事情に鑑みてなされたもので、その目的は
雰囲気チャンバ内の修理を容易にすると共に、上記雰囲
気チャンバ内の気体の洩れを防止するＸ線露光装置を提
供することにある。The present invention has been made in view of the above circumstances, and an object thereof is to provide an X-ray exposure apparatus that facilitates repair of the atmosphere chamber and prevents gas leakage within the atmosphere chamber.
本発明は上記目的を達成するために、雰囲気チャンバを
分離可能の構造にすると共に、分離した接合部に雰囲気
チャンバと外気側とを遮断するシール手段を設けてなる
Ｘ線露光装置を特徴としたものである。In order to achieve the above object, the present invention is characterized by an X-ray exposure apparatus having a structure in which the atmosphere chamber can be separated, and a sealing means for blocking the atmosphere chamber from the outside air at the separated joint. It is something.
以下、本発明の実施例を図面に基づき説明する。 Embodiments of the present invention will be described below based on the drawings.
まず本実施例の概要を説明する。First, an outline of this embodiment will be explained.
第１図において第６図と同一符号の物は同−物又は同一
機能の物を示す。Components in FIG. 1 with the same reference numerals as in FIG. 6 indicate the same components or components with the same function.
第１図に示す如く、雰囲気チャンバ４は２分割され、接
合部１６間にはシール手段たるバッキング１８が介設さ
れ、ねじ１９の緊締によシ気体もれが防止される、光学
系９等の修理の場合には接合部１６を分離することによ
シ容易に行われる。As shown in FIG. 1, the atmosphere chamber 4 is divided into two parts, and a backing 18 serving as a sealing means is interposed between the joint 16, and an optical system 9, etc. is prevented from leaking by tightening a screw 19. Repairs can be easily carried out by separating the joint 16.
次に、本実施例を更に詳細に説明する。Next, this embodiment will be explained in more detail.
上記の如く、雰囲気チャンバ４は２分割されヂャバラ１
７を通する上チャンバと下チャンバに分離される。ヂャ
バラ１７は両チャンバの接合を円滑にするためのもので
ある。両チャンバのそれぞれの接合部１６には独立気泡
のスポンジゴム製のバッキング１８が介設される。また
接合部１６間にはねじ１９が架設される。バッキング１
８は上記の如く独立気泡で通気性が無く、シール性に優
′れねじ１９７を小さな締付力で緊締することによシシ
ール効果を上げることができる。As mentioned above, the atmosphere chamber 4 is divided into two parts with bellows 1.
It is separated into an upper chamber and a lower chamber through which 7 is passed. The bellows 17 is for smooth joining of both chambers. A backing 18 made of closed-cell sponge rubber is interposed at each joint 16 of both chambers. Further, a screw 19 is installed between the joint parts 16. Backing 1
As mentioned above, the sealing material 8 is a closed cell, has no air permeability, and has excellent sealing properties, and the sealing effect can be improved by tightening the screw 197 with a small tightening force.
雰囲気チャンバ４内の光学系９や待機機構１２等に異状
が生じた場合にはねじ１９を外し、バッキング１８の接
合部１６を離し、ジャバ′ニア１７を縮めて内部５を開
口して修理を行う。If an abnormality occurs in the optical system 9, standby mechanism 12, etc. inside the atmosphere chamber 4, remove the screw 19, separate the joint 16 of the backing 18, retract the jaws 17, and open the interior 5 to repair it. conduct.
第２図は本発明の他の実施例を示すものである。FIG. 2 shows another embodiment of the invention.
２分割された雰囲気チャンバ４のヂャパラ１７を有する
上チャンバの接合部１６ａには下チャンバの接合部１６
ｂ側に突出する突出板２２が形成される。また接合部１
６′ｂには突出板２２を挾み、接合部１６ａ側に突出す
る溝２１が形成される。The joint part 16a of the lower chamber is connected to the joint part 16a of the upper chamber having the bellows 17 of the atmosphere chamber 4 divided into two parts.
A protruding plate 22 protruding toward the b side is formed. Also, joint part 1
A groove 21 is formed in 6'b, sandwiching the protruding plate 22 and protruding toward the joint portion 16a.
また接合部１６１）のｎ２１の両側には溝２１ａ。Further, there are grooves 21a on both sides of n21 of the joint portion 161).
２１ｂが並設される。溝２１内にはシリコンオイル等の
液体２３が充填され液体部りを形成する。21b are arranged in parallel. The groove 21 is filled with a liquid 23 such as silicone oil to form a liquid portion.
この液体２′５内には突出板２２が浸漬さる。以上によ
シ接合部１６ａ、１６ｂは液体２５の液体部にそれぞれ
接触し、これを介して結合される。なお接合部１６ａと
１６ｂはねじ１９によシ連結される。A projecting plate 22 is immersed in this liquid 2'5. As described above, the joint portions 16a and 16b each contact the liquid part of the liquid 25 and are connected via this. Note that the joint portions 16a and 16b are connected by a screw 19.
以上の構成によシ突出板１６１Ｌが上記液体部に浸漬し
ている限シ、雰囲気チャンバ４と外気側とは遮断され、
完全にシールされる。また接合５１６ａと１ろｂとが平
行でなく、変形が相互間に生じても液体シールのためバ
ッキング、よ、りもシール性が向上する０逆に雰囲気チ
ャンバ４を比較的剛性の低い軽量な構造のものから形成
してもよく、安価に製作し得る。With the above configuration, as long as the protruding plate 161L is immersed in the liquid part, the atmosphere chamber 4 and the outside air side are cut off,
completely sealed. In addition, even if the joints 516a and 1b are not parallel and deformation occurs between them, the sealing performance is improved even more than the backing due to the liquid seal. It may be formed from a structural material and can be manufactured at low cost.
一方、上記の如く、雰囲気チャンバ４内の圧力はほぼ外
気側の圧力と等しいため、この圧力巻によって液体２５
が外部に洩れることはない。しかし気体の流入流量の調
整ミス等によシ雰囲気チャンバ４の内部圧力が過大とな
った場合には液体２３がもれ、マスク６等の破損を防止
することが可能となシ、安全弁の機能を果す。また溝２
１から液体２３が洩れても両側の溝２１ａ、２１ｂにま
ず漏洩するので雰囲気チャンバ４の内外に液体２５が飛
散することがなく、汚染が防止される。On the other hand, as mentioned above, since the pressure inside the atmosphere chamber 4 is approximately equal to the pressure on the outside air side, this pressure winding causes the liquid 25
will not be leaked to the outside. However, if the internal pressure of the atmosphere chamber 4 becomes excessive due to a mistake in adjusting the gas inflow flow rate, etc., the liquid 23 can leak and damage to the mask 6 etc. can be prevented.The safety valve function fulfill. Also groove 2
Even if the liquid 23 leaks from the atmosphere chamber 4, it first leaks into the grooves 21a and 21b on both sides, so the liquid 25 does not scatter inside or outside the atmosphere chamber 4, and contamination is prevented.
上記実施例において、光学系９が全て雰囲気チャンバ４
内に収納されている場合を示したが、その一部か収納さ
れている場合（例えば、米国特許第４４０５３５６号）
に対しても同様に適用される。In the above embodiment, the optical system 9 is entirely connected to the atmosphere chamber 4.
Although the case where it is stored in the inside is shown, the case where only a part of it is stored (for example, U.S. Pat. No. 4,405,356)
The same applies to.
以上の説明によって明らかな如く、本発明によれは雰囲
気チャンバ内の修理が容易に、かつ迅速にできると共に
、雰囲気チャンバ内の気体の洩れを防止し得る効果が上
げられる。As is clear from the above description, according to the present invention, the interior of the atmosphere chamber can be easily and quickly repaired, and gas leakage within the atmosphere chamber can be prevented.
第１図は本発明の一実施例を示す断面図、第２図は本発
明の他の実施例を示す部分断面図、第６図は従来のｘｓ
ｇ党装置の一例を示す断面図である。
１・・・Ｘ線発生源、 ４・・・雰囲気チャンバ、
６・・・マスク、 ７・・・ウニノ・％ ９・・
・光学系、１６゜１６ａ、１６ｂ・・・接合部、 １
７・・・ヂャパラ、１８・・・バッキング、 １９・
・・ねじ、 ２１．２１ａ。
２１ｂ・・・溝、２２・・・突出板％ ２５・・・液
体。
、／。
代理人弁理士 高 橋 明 興゛−
才 ／ 図
）Ｘ２ 図Fig. 1 is a sectional view showing one embodiment of the present invention, Fig. 2 is a partial sectional view showing another embodiment of the invention, and Fig. 6 is a conventional xs
FIG. 3 is a cross-sectional view showing an example of a g-party device. 1... X-ray source, 4... Atmosphere chamber,
6...Mask, 7...Unino% 9...
・Optical system, 16° 16a, 16b...Joint part, 1
7... Jyapara, 18... Backing, 19.
...Screw, 21.21a. 21b...Groove, 22...Protruding plate% 25...Liquid. ,/. Representative Patent Attorney Akira Takahashi / Diagram)X2 Diagram
Claims (1)
高い気体を充満すると共に、アライメント光学系を収納
し、マスクを吸着する雰囲気チャンバと、上記マスクに
対峙して配置するウェハを載置するアライメントステー
ジ等とから構成され、上記マスクのパターンをＸ線によ
り上記ウェハに露光するＸ線露光装置において、上記雰
囲気チャンバを分離可能に形成すると共に、上記分離箇
所の接合部に、上記雰囲気チャンバ内と外気側とを遮断
するシール手段を設けることを特徴とするＸ線露光装置
。 ２、上記シール手段が、上記雰囲気チャンバを分離する
接合位置に、対峙する接合部のそれぞれに接触する液体
溜りを有するものからなることを特徴とする特許請求の
範囲第１項に記載のＸ線露光装置。[Scope of Claims] 1. An X-ray generation source, an atmosphere chamber connected to the X-ray generation source, filled with a gas having high X-ray transmittance, housing an alignment optical system, and adsorbing a mask, and the above-mentioned mask. In an X-ray exposure apparatus that exposes the pattern of the mask to the wafer with X-rays, the atmosphere chamber is formed to be separable, and the atmosphere chamber is separably formed. An X-ray exposure apparatus characterized in that a sealing means for blocking the inside of the atmosphere chamber and the outside air side is provided at the joint part of the separation part. 2. The X-ray device according to claim 1, wherein the sealing means has a liquid reservoir in contact with each of the opposing joints at the joint position separating the atmospheric chambers. Exposure equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59218364A JPS6197917A (en) | 1984-10-19 | 1984-10-19 | X ray exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59218364A JPS6197917A (en) | 1984-10-19 | 1984-10-19 | X ray exposure device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6197917A true JPS6197917A (en) | 1986-05-16 |
Family
ID=16718728
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59218364A Pending JPS6197917A (en) | 1984-10-19 | 1984-10-19 | X ray exposure device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6197917A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012138631A (en) * | 2008-09-17 | 2012-07-19 | Asml Netherlands Bv | Lithographic apparatus and method of operating lithographic apparatus |
-
1984
- 1984-10-19 JP JP59218364A patent/JPS6197917A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012138631A (en) * | 2008-09-17 | 2012-07-19 | Asml Netherlands Bv | Lithographic apparatus and method of operating lithographic apparatus |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2009079908A1 (en) | Glove box | |
| JPS6197917A (en) | X ray exposure device | |
| JPH07174896A (en) | Mirror unit and exposing device with the unit | |
| US20070290309A1 (en) | System and Method for Hermetically Sealing a Package | |
| JP2005148254A (en) | Lens holder, aligner, and device production method | |
| JPH0828775A (en) | Leak part repairing device | |
| US3289698A (en) | Device for providing a leak-tight coupling between two sealed enclosures | |
| JPH1089507A (en) | Pressure relief device used in heater by saturated steam of heating medium | |
| JPH05150445A (en) | Mask for exposure | |
| JPH11108285A (en) | Method and device for flange surface sealing in flange joint part of pipe | |
| KR20070069341A (en) | Reticle for manufacturing semiconductor | |
| JP2002349739A (en) | Valve box | |
| JPH049297B2 (en) | ||
| JPS6086748A (en) | Ambient sample chamber for electron microscope | |
| JP2003232405A (en) | Vibration isolating coupling having elastomer for scanning electron microscope and the like | |
| JP2004363369A (en) | Chamber, aligner, method of fabricating device | |
| JPH0328700B2 (en) | ||
| JPS59208716A (en) | Mask protection apparatus | |
| JP2006142176A (en) | Separating apparatus and seal | |
| JPH07151292A (en) | Repair of piping | |
| JP7329614B2 (en) | SEAL INSPECTION DEVICE AND SEAL INSPECTION METHOD | |
| JPH03107800A (en) | Vacuum piping | |
| KR101516247B1 (en) | gasket | |
| JP2002019849A (en) | Packing method, packing structure and optical apparatus | |
| JPH02298900A (en) | Driving mechanism for partition wall |