JPS6192054U - - Google Patents
Info
- Publication number
- JPS6192054U JPS6192054U JP17798884U JP17798884U JPS6192054U JP S6192054 U JPS6192054 U JP S6192054U JP 17798884 U JP17798884 U JP 17798884U JP 17798884 U JP17798884 U JP 17798884U JP S6192054 U JPS6192054 U JP S6192054U
- Authority
- JP
- Japan
- Prior art keywords
- conductive connecting
- discharge plates
- connects
- boat
- connecting rod
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910002804 graphite Inorganic materials 0.000 claims description 2
- 239000010439 graphite Substances 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
Description
第1図は本考案の一実施例を示す斜視図、第2
図は一部破断で示す同平面図である。 1…電極、2…放電板、3…導電性連結棒、7
…黒鉛棒、8…石英管。
図は一部破断で示す同平面図である。 1…電極、2…放電板、3…導電性連結棒、7
…黒鉛棒、8…石英管。
Claims (1)
- 一対の電極からなり、該電極は、それぞれ所定
間隔をもつて平行に配設された複数枚の放電板と
、該放電板のそれぞれ一端下部を連結する黒鉛棒
と、該放電板のそれぞれ他端上部を連結する導電
性連結棒とを備え、双方の電極の前記導電性連結
棒が対向するように且つそれぞれの前記放電板が
交互に位置するように配設したプラズマCVD用
ボートにおいて、前記導電性連結棒の内少なくと
も反応ガスの導入側に位置する導電性連結棒に石
英管が外嵌されたことを特徴とするプラズマCV
D用ボート。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17798884U JPS6192054U (ja) | 1984-11-22 | 1984-11-22 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17798884U JPS6192054U (ja) | 1984-11-22 | 1984-11-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6192054U true JPS6192054U (ja) | 1986-06-14 |
Family
ID=30735557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17798884U Pending JPS6192054U (ja) | 1984-11-22 | 1984-11-22 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6192054U (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01103828A (ja) * | 1987-10-16 | 1989-04-20 | Fuji Electric Corp Res & Dev Ltd | プラズマcvd装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55123130A (en) * | 1979-03-16 | 1980-09-22 | Fujitsu Ltd | Plasma treating device |
JPS5643724A (en) * | 1979-09-13 | 1981-04-22 | Pacific Western Systems | Method and device for semiconductorrwafer pecvvtreatment |
JPS5710937A (en) * | 1980-06-25 | 1982-01-20 | Mitsubishi Electric Corp | Plasma gaseous phase growth device |
-
1984
- 1984-11-22 JP JP17798884U patent/JPS6192054U/ja active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55123130A (en) * | 1979-03-16 | 1980-09-22 | Fujitsu Ltd | Plasma treating device |
JPS5643724A (en) * | 1979-09-13 | 1981-04-22 | Pacific Western Systems | Method and device for semiconductorrwafer pecvvtreatment |
JPS5710937A (en) * | 1980-06-25 | 1982-01-20 | Mitsubishi Electric Corp | Plasma gaseous phase growth device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01103828A (ja) * | 1987-10-16 | 1989-04-20 | Fuji Electric Corp Res & Dev Ltd | プラズマcvd装置 |