JPS6186922A - Wet exhaust gas treatment apparatus - Google Patents

Wet exhaust gas treatment apparatus

Info

Publication number
JPS6186922A
JPS6186922A JP59207026A JP20702684A JPS6186922A JP S6186922 A JPS6186922 A JP S6186922A JP 59207026 A JP59207026 A JP 59207026A JP 20702684 A JP20702684 A JP 20702684A JP S6186922 A JPS6186922 A JP S6186922A
Authority
JP
Japan
Prior art keywords
dust removal
gas
exhaust gas
cooling dust
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59207026A
Other languages
Japanese (ja)
Other versions
JPH0376964B2 (en
Inventor
Fumio Kadota
文男 門田
Yasumasa Ishibashi
石橋 康正
Shinichi Shinozaki
紳一 篠崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP59207026A priority Critical patent/JPS6186922A/en
Publication of JPS6186922A publication Critical patent/JPS6186922A/en
Publication of JPH0376964B2 publication Critical patent/JPH0376964B2/ja
Granted legal-status Critical Current

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  • Separation Of Particles Using Liquids (AREA)
  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)

Abstract

PURPOSE:To perform the removal of dust in low pressure loss with high effeciency, by mounting a primary cooling dust removal part, a secondary cooling dust removal part, a mixing part, a bypass flow passage for introducing a part of the exhaust gas from the primary cooling dust removal part into the mixing part and a gas flow control mechanism. CONSTITUTION:Exhaust gas is cooled in the primary cooling dust removal part A below a spray nozzle 110, while dust therein is removed, to be converted to high temp. saturated gas and a part thereof is introduced into an over- saturation part B through a bypass duct 121 and the remainder is introduced into the secondary cooling dust removal part C below a spray nozzle 112 and flowed upwardly as low temp. saturated gas and mixed with the high temp. saturated gas in an over-saturation part B to grow fine particles into coarse particles. A damper 131 regulates the amount of the high temp. saturated gas so as to obtain sufficient coarse particle forming effect. The particle- containing gas is passed through an absorbing part packed bed D and a mist catch part E to further remove dust therein.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は湿式の排ガス処理装置に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a wet exhaust gas treatment device.

[従来の技術と発明が解決しようとする問題点]従来の
湿式排ガス処理装置例えば排煙脱流装置等の場合には、
硫黄酸化物(SOX )および硫化水素(H(1)等の
ガス吸収と共に、排ガス中のダスト除去を兼ているもの
が多い。このダスト除去のために、入口部のガス冷却部
に湿式スクラバを設けている。なおここにスクラバとは
、気体中の不純物を水等の液体を利用して除去する装置
をいう。そこで第4図を参照して従来の湿式排ガス処理
装置について説明する。第4図中符号1は吸収塔を示し
、この吸収塔1にはダクト2が接続されている。上記吸
収塔1内の下部には冷却水3が収容されており、この冷
却水はポンプ4により配管5および6、これら配管5お
よび6に接続されたスプレィノズル7および8を介して
ダクト2および吸収塔1内にスプレィされる。また図中
符号aは冷却除塵部を示し、この冷却除塵部aで上記ス
プレィノズル8を介してスプレィされる冷却水3により
排ガスの冷却、除塵を行なうとともに、一部ガス吸収を
行なう。またb部は、ガス吸収の為の充填層部を示し、
この充填層部すでも一部除塵が行なわれる。さらに0部
はミスト除去部である。上記ミスト除去部Cにはミスト
キャッチ9が設置されている。このようなスプレィ式ス
クラバにおいては、その圧力損失は通常50〜300M
q程度であるが、スクラバ装置のダスト捕集機構は、液
滴とダストの慣性衝突によるため、特に数μm〜サブミ
クロン粒子の除去率は急激に低下する。またベンチュリ
スクラバを使用した場合には、上記スプレィ式に比べて
総合除塵効率は向上するがサブミクロン粒子の除塵効率
は低下する。またこの場合には圧力損失を500〜15
00sQと相当大きくする必要がある。そして動力面を
考えた場合にも、ボイラ排ガス等のガス吊の多い排ガス
処理には不向である。
[Prior art and problems to be solved by the invention] In the case of a conventional wet exhaust gas treatment device, such as a flue gas deflow device,
In addition to absorbing gases such as sulfur oxides (SOX) and hydrogen sulfide (H(1)), many scrubbers also remove dust from the exhaust gas.To remove this dust, a wet scrubber is installed in the gas cooling section at the inlet. Note that the scrubber here refers to a device that removes impurities in gas using a liquid such as water.Therefore, a conventional wet exhaust gas treatment device will be explained with reference to FIG. 4. Reference numeral 1 in the figure indicates an absorption tower, and a duct 2 is connected to this absorption tower 1. Cooling water 3 is stored in the lower part of the absorption tower 1, and this cooling water is piped through a pump 4. 5 and 6, and are sprayed into the duct 2 and the absorption tower 1 through spray nozzles 7 and 8 connected to these pipes 5 and 6. In addition, the reference numeral a in the figure indicates a cooling dust removal section, and this cooling dust removal section a The cooling water 3 sprayed through the spray nozzle 8 cools the exhaust gas, removes dust, and also partially absorbs gas. Part b indicates a packed bed part for gas absorption;
Part of the dust removal is also carried out in this packed bed. Furthermore, part 0 is a mist removal part. A mist catch 9 is installed in the mist removing section C. In such a spray type scrubber, the pressure loss is usually 50 to 300M.
However, since the dust collection mechanism of the scrubber device relies on inertial collision between droplets and dust, the removal rate of particles of several μm to submicron drops sharply. Furthermore, when a Venturi scrubber is used, the overall dust removal efficiency is improved compared to the above-mentioned spray type, but the dust removal efficiency of submicron particles is lowered. In this case, the pressure loss should be 500 to 15
It is necessary to make it considerably large as 00sQ. Also, when considering the power aspect, it is not suitable for treating exhaust gas such as boiler exhaust gas, which has a large amount of gas.

本発明は以上の点に基づいてなされたものでその目的と
するところは、サブミクロン粒子の捕集効率を向上させ
ることにより低圧損、高効率の湿式排ガス処理装置を提
供することにある。
The present invention has been made based on the above points, and an object thereof is to provide a wet exhaust gas treatment device with low pressure loss and high efficiency by improving the collection efficiency of submicron particles.

[問題点を解決するための手段] すなわち本発明による湿式排ガス処理装置は、排ガスを
導入しガス吸収およびダスト除去を行なう一次冷却除塵
部と、この一次冷却除塵部を通過した排ガスを導入しガ
ス吸収およびダスト除去を行なう二次冷却除塵部と、上
記一次冷却除塵部を通過した排ガスの一部を上記二次冷
却除塵部の後流側に導入するバイパス流路と、このバイ
パス流路を介して導入された高温飽和ガスおよび上記二
次冷却除塵部を通過した低温飽和ガスとを混合させる混
合部と、上記一次冷却除塵部および二次冷却除塵部との
間に設けられ上記混合部における高温飽和ガスおよび低
温飽和ガスとの混合比を調節するガス量調節機構とを具
備したことを特徴とするものである。
[Means for Solving the Problems] That is, the wet exhaust gas treatment device according to the present invention includes a primary cooling dust removal section that introduces exhaust gas and performs gas absorption and dust removal, and a primary cooling dust removal section that introduces exhaust gas that has passed through the primary cooling dust removal section and performs gas absorption and dust removal. A secondary cooling dust removal section that absorbs and removes dust; a bypass flow path that introduces a part of the exhaust gas that has passed through the primary cooling dust removal section to the downstream side of the secondary cooling dust removal section; A mixing section that mixes the high-temperature saturated gas introduced at It is characterized by comprising a gas amount adjustment mechanism that adjusts the mixing ratio of the saturated gas and the low-temperature saturated gas.

[作用] つまりサブミクロン粒子の捕集効率を向上させるために
は、粒子の表面に水上気を凝縮させて粒子を粗粒化させ
る必要があり、このような水蒸気の粒子表面への凝縮を
実現する方法としては、蒸気吸込法および高温飽和ガス
、低温飽和ガス混合法が考えられている。本発明はこの
内高温飽和ガス、低温飽和ガス混合法を実現するもので
、一次冷却除塵部からバイパス流路を介して導入した高
温飽和ガスと二次冷却除塵部からの低温飽和ガスとを混
合部にて混合させることにより、微細粒子を粗粒化せん
とするものである。これを第4図を参照して説明すると
、高温飽和ガス21(温度がT2で湿度がH2)と低温
飽和ガス22(温度がT3で湿度が1」3)とを混合さ
せて、過飽和状態を作る(図中符号24で示す)。この
過飽和状態24は一時的なものである。この過飽和状態
24から飽和状態25に変化する時、仮に核となる粒子
が存在すればその粒子に湿度(ΔH)に相当する水蒸気
が粒子表面に凝集する。これによって粒子の粗粒化を図
る構成である。なお図中符号20で示す点は、湿式排ガ
ス処理装置の入口ガス状態を示す点で、温度がT1で湿
度がHlである。
[Effect] In other words, in order to improve the collection efficiency of submicron particles, it is necessary to make the particles coarser by condensing the air above the water on the particle surface, and this condensation of water vapor on the particle surface is achieved. Possible methods for this include a steam suction method and a method of mixing high-temperature saturated gas and low-temperature saturated gas. The present invention realizes a method of mixing high-temperature saturated gas and low-temperature saturated gas, in which high-temperature saturated gas introduced from the primary cooling dust removal section via a bypass flow path and low-temperature saturated gas from the secondary cooling dust removal section are mixed. The purpose is to coarsen the fine particles by mixing them in one part. To explain this with reference to FIG. 4, a supersaturated state is created by mixing high temperature saturated gas 21 (temperature T2 and humidity H2) and low temperature saturated gas 22 (temperature T3 and humidity 1"3). (indicated by reference numeral 24 in the figure). This supersaturation state 24 is temporary. When the supersaturated state 24 changes to the saturated state 25, if a core particle exists, water vapor corresponding to the humidity (ΔH) condenses on the surface of the particle. This structure aims to make the particles coarser. Note that the point indicated by the reference numeral 20 in the figure indicates the inlet gas state of the wet exhaust gas treatment device, where the temperature is T1 and the humidity is Hl.

[発明の効果コ したがって微細粒子を効果的に粗粒化させることができ
、それによってサブミクロン粒子等の微細粒子の捕集効
率を大幅に向上させることが可能となる。
[Effects of the Invention] Therefore, fine particles can be effectively coarsened, thereby making it possible to significantly improve the collection efficiency of fine particles such as submicron particles.

[実施例] 以下第1図を参照して本発明の第1の実施例を説明する
。第1図は本実施例による湿式排ガス処理装置の概略構
成を示す断面図であり、図中符号101は吸収塔を示し
、この吸収塔101にはダクト102が接続されている
。上記吸収塔101内には冷却水103が収容されてい
る。この冷却水103内には、カセイソーダおよび水酸
化マグネシウム等のアルカリ性物質が含有されており、
これによってSOxおよびHC,2等ののガス吸収を効
果的に行なおうとするものである。また上記吸収塔10
1には吸込配管104を介してポンプ105が接続され
ている。このポンプ105の吐出配管107+、t、上
記吸収塔101の上部を貫通配置されており、その先端
にはスプレィノズル108が接続されている。上記吐出
配管107には別の吐出配管109が分岐接続されてお
り、この吐出配管109は上記ダクト102の上部を貫
通配置されている。その先端にはスプレィノズル110
が接続されている。上記吐出配管107にはさらに別の
吐出配管111が分岐接続されており、この吐出配管1
11は吸収塔101の略中間位置を貫通して配設されて
いる。この吐出配管111の先端には二次冷却除塵部用
スプレィノズル112が接続されている。上記吐出配管
111には熱交換器113が介挿されているともに、外
部補給水供給配管114が接続されている。上記ダクト
102と吸収塔101との間にはバイパスダクト121
が配設されている。
[Embodiment] A first embodiment of the present invention will be described below with reference to FIG. FIG. 1 is a cross-sectional view showing a schematic configuration of a wet exhaust gas treatment apparatus according to this embodiment. In the figure, reference numeral 101 indicates an absorption tower, and a duct 102 is connected to this absorption tower 101. Cooling water 103 is accommodated within the absorption tower 101 . This cooling water 103 contains alkaline substances such as caustic soda and magnesium hydroxide.
This is intended to effectively absorb gases such as SOx and HC, 2, etc. In addition, the absorption tower 10
1 is connected to a pump 105 via a suction pipe 104. A discharge pipe 107+, t of this pump 105 is arranged to pass through the upper part of the absorption tower 101, and a spray nozzle 108 is connected to the tip thereof. Another discharge pipe 109 is branched and connected to the above-mentioned discharge pipe 107, and this discharge pipe 109 is arranged to penetrate through the upper part of the above-mentioned duct 102. At its tip is a spray nozzle 110
is connected. Further, another discharge pipe 111 is branched and connected to the discharge pipe 107, and this discharge pipe 1
11 is disposed to penetrate through the absorption tower 101 at a substantially intermediate position. A spray nozzle 112 for a secondary cooling dust removal section is connected to the tip of this discharge pipe 111. A heat exchanger 113 is inserted into the discharge pipe 111, and an external make-up water supply pipe 114 is connected thereto. A bypass duct 121 is provided between the duct 102 and the absorption tower 101.
is installed.

上記ダクト102のスプレィノズル11oの下方位置は
、−次冷却除腹部Aとなっており、ダクト102を介し
て導入された排ガスは、この−次冷却系除塵部Aにて増
湿冷却され約60’C程度の高温飽和ガスとなり、また
その際除塵およびガス吸収が行なわれる。上記一次冷却
除塵部Aを通過した排ガスの一部は、上記バイパスダク
ト121を介して過飽和部Bに導入される。一方残りの
排ガスは前記スプレィノズル112の下方の絞り部(こ
の絞り部が二次冷却除塵部となる)C内に導入される。
The position below the spray nozzle 11o of the duct 102 is a sub-cooling section A, and the exhaust gas introduced through the duct 102 is humidified and cooled in the sub-cooling system dust removing section A, and is cooled to about 60% by cooling. It becomes a high-temperature saturated gas with a temperature of about 'C, and dust removal and gas absorption are performed at this time. A part of the exhaust gas that has passed through the primary cooling dust removal section A is introduced into the supersaturation section B via the bypass duct 121. On the other hand, the remaining exhaust gas is introduced into a constricted section C below the spray nozzle 112 (this constricted section becomes a secondary cooling dust removal section).

この二次冷却除塵部Cにて上記スプレィノズル112よ
りスプレィされる冷却水103により冷却され、約40
℃程度の低温飽和ガスとなる。なおこの時冷却水103
の代りに外部補給水を使用してもよい。1だその際除0
およびガス吸収も行なわれる。この二次冷却除塵部Cを
通過した低温飽和ガスは上方に流通して上記過飽和部B
内に流入する。この過飽和部Bにて前記バイパスダクト
121を介して導入された高温飽和ガスに衝突し、夫々
の圧力の差により両者は混合する。
In this secondary cooling dust removing section C, the water is cooled by the cooling water 103 sprayed from the spray nozzle 112, and the
It becomes a low temperature saturated gas of about ℃. At this time, the cooling water 103
External makeup water may be used instead. 0 except when it's 1
and gas absorption. The low-temperature saturated gas that has passed through the secondary cooling dust removal section C flows upward to the supersaturated section B.
flow inside. In this supersaturated portion B, the gas collides with the high-temperature saturated gas introduced through the bypass duct 121, and the two are mixed due to the difference in their respective pressures.

この混合により前述した原理に基づき微細粒子が粗粒化
される。前記バイパスダクト121内にはガス量調節機
構としてのダンパ131が設置されており、このダンパ
131の開度を自動あるいは手動により調節することに
より、バイパスダクト121を介して吸収塔101内に
導入される高温飽和ガスの量を調節し、それによって低
温飽和ガスおよび高温飽和ガスの混合比を調節する。な
お十分な粗粒化効果を得るためには、低温飽和ガスおよ
び高温飽和ガスとの混合比を適切なものとする必要があ
り、得にボイラ等の場合にはその付加変動の対応のため
にも適切な制御が必要とされる。
Through this mixing, fine particles are coarsened based on the principle described above. A damper 131 as a gas amount adjustment mechanism is installed in the bypass duct 121, and by automatically or manually adjusting the opening degree of this damper 131, gas is introduced into the absorption tower 101 through the bypass duct 121. The amount of hot saturated gas used is adjusted, thereby adjusting the mixing ratio of cold saturated gas and hot saturated gas. In addition, in order to obtain a sufficient grain coarsening effect, it is necessary to have an appropriate mixing ratio of low-temperature saturated gas and high-temperature saturated gas, and in particular, in the case of boilers, etc., it is necessary to adjust the mixing ratio to cope with the additional fluctuation. Appropriate controls are also required.

モして粗粒化された粒子を含んだ排ガスは上昇し、吸収
部充填層X層りおよびミストキャッチ部Eを通過し、さ
らに上方に流通する。上記ミストキャッチ部Eにはミス
トキャッチ122が設置されている。
The exhaust gas containing coarse particles rises, passes through the absorption section filling layer X layer and the mist catch section E, and further flows upward. A mist catch 122 is installed in the mist catch section E.

その際上記粗粒化された粒子は、吸収部充填![’)お
よびミストキャッチ部Eにて除去される。尚上記吸収部
充填層りには前記スプレィノズル108より冷却水10
3がスプレィされる。
At that time, the coarsened particles fill the absorption part! [') and is removed at the mist catch section E. In addition, the cooling water 10 is supplied from the spray nozzle 108 to the absorption section filling layer.
3 is sprayed.

以上本実施例による湿式排ガス処理装置によると、低温
飽和ガスと高温飽和ガスとを適切な混合比で混合させる
ことにより、サブミクロン粒子等の微細粒子を効果的に
in化することができ、その結果吸収部充填層りおびミ
ストキャッチ部Eでのサブミクロン粒子の除去効率を大
幅に向上させることが可能となる。
As described above, according to the wet exhaust gas treatment device according to the present embodiment, by mixing low temperature saturated gas and high temperature saturated gas at an appropriate mixing ratio, fine particles such as submicron particles can be effectively inverted. As a result, it becomes possible to significantly improve the removal efficiency of submicron particles in the absorption section filling layer and the mist catch section E.

次に第2図を参照して第2の実施例を説明する。Next, a second embodiment will be described with reference to FIG.

すなわち前記第1の実施例ではガス量調節磯溝として、
ダンパ131を使用したが、本実施例の場合には、図に
示すように二次冷却除塵部りの上方に間隔を存して環状
部材141を配置し、この環状部材141の中央に円環
部142を配置させる。
That is, in the first embodiment, as the gas amount adjusting rock groove,
Although the damper 131 was used, in the case of this embodiment, an annular member 141 is arranged above the secondary cooling dust removal section with a gap as shown in the figure, and a circular ring is placed in the center of this annular member 141. 142 is placed.

この円環部142は吸収塔101の外に設置された油圧
ユニット143に連結されており、鉛直方向にスライド
可能な構成となっている。そして上記円環部142を上
下動させることにより環状部材141と二次冷却系除塵
部Cを形成している絞り部材144との間(スロート部
)の間隔が調節され、それによって高温飽和ガスの流量
ひいては低温飽和ガスと高温飽和ガスとの混合比を調節
する。またスプレィノズル112は上方に指向した状態
で設置さ・れている。他の構成は前記第1の実施例と同
様であり、その説明は省略する。
This annular portion 142 is connected to a hydraulic unit 143 installed outside the absorption tower 101, and is configured to be slidable in the vertical direction. By moving the annular part 142 up and down, the distance between the annular member 141 and the throttle member 144 (throat part) forming the dust removal part C of the secondary cooling system is adjusted. The flow rate and the mixing ratio of the low temperature saturated gas and the high temperature saturated gas are adjusted. Further, the spray nozzle 112 is installed so as to be oriented upward. The other configurations are the same as those of the first embodiment, and their explanation will be omitted.

よって前記第1の実施例と同様の効果を奏することが可
能となる。
Therefore, it is possible to achieve the same effects as the first embodiment.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の第1の実施例を示す湿式排ガス処理装
置の断面図、第2図は第2の実施例を示す湿式排ガス処
理装置の断面図、第3図は本発明の詳細な説明するため
の図、第4図は従来の湿式排ガス処理装置の断面図であ
る。 101・・・吸収塔、102・・・ダクト、121・・
・バイパスダクト(バイパス流路)、131・・・ダン
パ(ガス量調節機構)、A・・・一次冷却除塵部、B・
・・過飽和部、C・・・二次冷却除塵部、D・・・吸収
充填部、E・・・ミストキャッチ部。 出願人復代理人 弁理士 鈴江武彦 第3 凶 〃゛ス涙 渡4121 手続補正書 60・貸・−4 昭和  年     日 特許庁長官 志 賀   学 殿 1、事件の表示 特願昭59−207026号 2、発明の名称 湿式排ガス処理装置 3o補正をする者 事件との関係    特許出願人 <620)三菱重工業株式会社 4、復代理人 (1〉明細書第2頁第3行目の「硫化」を「塩化」と訂
正する。 (2)明細書第3頁第3行目の「ミストキャッチ9」を
「ミストキャッチャ−9」と訂正する。 (3)明細書第4頁第17行目の「水上気」を「水蒸気
」と訂正する。 (4)明細書第4頁第20行目の「吸込法」を−吹込法
」と訂正する。 (5)明細書第5頁第6行目の「第4図」を「第3図」
と訂正する。 (6)明細書第5頁第15行目の[図る構成で必るJを
「図ることができる」と訂正する。 (7)明細書第9頁第2行目の「冑に」を「特に」と訂
正する。
FIG. 1 is a sectional view of a wet exhaust gas treatment device showing a first embodiment of the present invention, FIG. 2 is a sectional view of a wet exhaust gas treatment device showing a second embodiment, and FIG. 3 is a detailed view of the wet exhaust gas treatment device of the present invention. FIG. 4, which is an explanatory diagram, is a cross-sectional view of a conventional wet exhaust gas treatment device. 101... Absorption tower, 102... Duct, 121...
・Bypass duct (bypass flow path), 131... Damper (gas amount adjustment mechanism), A... Primary cooling dust removal section, B...
... Supersaturation section, C... Secondary cooling dust removal section, D... Absorption filling section, E... Mist catch section. Applicant's Sub-Attorney Patent Attorney Takehiko Suzue No. 3 Suzue Namida 4121 Procedural Amendment 60/Rent-4 Showa Year 1999 Japanese Patent Office Commissioner Manabu Shiga 1, Patent Application for Indication of Case No. 1982-207026 2 , Relation to the case of the person who amended the name of the wet exhaust gas treatment device 3o Patent applicant <620) Mitsubishi Heavy Industries, Ltd. (2) Correct “Mist Catch 9” on page 3, line 3 of the specification to “Mist Catcher-9”. (3) Correct “Mist Catcher 9” on page 4, line 17 of the specification. "air" is corrected to "steam". (4) "Suction method" on page 4, line 20 of the specification is corrected to "-blow method". (5) "Blowing method" on page 5, line 6 of the specification is corrected. Figure 4” to “Figure 3”
I am corrected. (6) On page 5, line 15 of the specification, [J that is required in the configuration to be designed is corrected to "can be designed." (7) In the second line of page 9 of the specification, the word "helmet" is corrected to "particularly."

Claims (1)

【特許請求の範囲】[Claims] 排ガスを導入しガス吸収およびダスト除去を行なう一次
冷却除塵部と、この一次冷却除塵部を通過した排ガスを
導入しガス吸収およびダスト除去を行なう二次冷却除塵
部と、上記一次冷却除塵部を通過した排ガスの一部を上
記二次冷却除塵部の後流側に導入するバイパス流路と、
このバイパス流路を介して導入された高温飽和ガスおよ
び上記二次冷却除塵部を通過した低温飽和ガスとを混合
させる混合部と、上記一次冷却除塵部および二次冷却除
塵部との間に設けられ上記混合部における高温飽和ガス
および低温飽和ガスとの混合比を調節するガス量調節機
構とを具備したことを特徴とする湿式排ガス処理装置。
A primary cooling dust removal section that introduces exhaust gas and performs gas absorption and dust removal; a secondary cooling dust removal section that introduces the exhaust gas that has passed through the primary cooling dust removal section and performs gas absorption and dust removal; a bypass flow path that introduces a part of the exhausted exhaust gas to the downstream side of the secondary cooling dust removal section;
A mixing section that mixes the high-temperature saturated gas introduced through the bypass flow path and the low-temperature saturated gas that has passed through the secondary cooling dust removal section, and the primary cooling dust removal section and the secondary cooling dust removal section are provided. and a gas amount adjustment mechanism for adjusting the mixing ratio of the high-temperature saturated gas and the low-temperature saturated gas in the mixing section.
JP59207026A 1984-10-04 1984-10-04 Wet exhaust gas treatment apparatus Granted JPS6186922A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59207026A JPS6186922A (en) 1984-10-04 1984-10-04 Wet exhaust gas treatment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59207026A JPS6186922A (en) 1984-10-04 1984-10-04 Wet exhaust gas treatment apparatus

Publications (2)

Publication Number Publication Date
JPS6186922A true JPS6186922A (en) 1986-05-02
JPH0376964B2 JPH0376964B2 (en) 1991-12-09

Family

ID=16532972

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59207026A Granted JPS6186922A (en) 1984-10-04 1984-10-04 Wet exhaust gas treatment apparatus

Country Status (1)

Country Link
JP (1) JPS6186922A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63126016U (en) * 1987-02-09 1988-08-17
EP1366798A2 (en) * 1997-11-11 2003-12-03 Mitsubishi Heavy Industries, Ltd. A wet gas processing method and the apparatus using the same
JP2011147881A (en) * 2010-01-21 2011-08-04 Mitsubishi Heavy Industries Environmental & Chemical Engineering Co Ltd Exhaust gas treatment apparatus and method of operating the same
JP2017519929A (en) * 2014-03-26 2017-07-20 エクソンモービル アップストリーム リサーチ カンパニー System and method for adjustment of recirculated exhaust gas
EP3272411A4 (en) * 2015-03-16 2018-03-14 Fuji Electric Co., Ltd. Exhaust gas treatment apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63126016U (en) * 1987-02-09 1988-08-17
EP1366798A2 (en) * 1997-11-11 2003-12-03 Mitsubishi Heavy Industries, Ltd. A wet gas processing method and the apparatus using the same
EP1366798A3 (en) * 1997-11-11 2004-01-07 Mitsubishi Heavy Industries, Ltd. A wet gas processing method and the apparatus using the same
JP2011147881A (en) * 2010-01-21 2011-08-04 Mitsubishi Heavy Industries Environmental & Chemical Engineering Co Ltd Exhaust gas treatment apparatus and method of operating the same
JP2017519929A (en) * 2014-03-26 2017-07-20 エクソンモービル アップストリーム リサーチ カンパニー System and method for adjustment of recirculated exhaust gas
EP3272411A4 (en) * 2015-03-16 2018-03-14 Fuji Electric Co., Ltd. Exhaust gas treatment apparatus

Also Published As

Publication number Publication date
JPH0376964B2 (en) 1991-12-09

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