JPS6170931U - - Google Patents
Info
- Publication number
- JPS6170931U JPS6170931U JP15547384U JP15547384U JPS6170931U JP S6170931 U JPS6170931 U JP S6170931U JP 15547384 U JP15547384 U JP 15547384U JP 15547384 U JP15547384 U JP 15547384U JP S6170931 U JPS6170931 U JP S6170931U
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- semiconductor wafer
- pot
- irradiating
- distributed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007740 vapor deposition Methods 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15547384U JPS6170931U (enExample) | 1984-10-15 | 1984-10-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15547384U JPS6170931U (enExample) | 1984-10-15 | 1984-10-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6170931U true JPS6170931U (enExample) | 1986-05-15 |
Family
ID=30713484
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15547384U Pending JPS6170931U (enExample) | 1984-10-15 | 1984-10-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6170931U (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007224354A (ja) * | 2006-02-23 | 2007-09-06 | Hitachi Zosen Corp | 真空蒸着方法および真空蒸着装置 |
-
1984
- 1984-10-15 JP JP15547384U patent/JPS6170931U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007224354A (ja) * | 2006-02-23 | 2007-09-06 | Hitachi Zosen Corp | 真空蒸着方法および真空蒸着装置 |