JPS6170931U - - Google Patents

Info

Publication number
JPS6170931U
JPS6170931U JP15547384U JP15547384U JPS6170931U JP S6170931 U JPS6170931 U JP S6170931U JP 15547384 U JP15547384 U JP 15547384U JP 15547384 U JP15547384 U JP 15547384U JP S6170931 U JPS6170931 U JP S6170931U
Authority
JP
Japan
Prior art keywords
vapor deposition
semiconductor wafer
pot
irradiating
distributed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15547384U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15547384U priority Critical patent/JPS6170931U/ja
Publication of JPS6170931U publication Critical patent/JPS6170931U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP15547384U 1984-10-15 1984-10-15 Pending JPS6170931U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15547384U JPS6170931U (enrdf_load_stackoverflow) 1984-10-15 1984-10-15

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15547384U JPS6170931U (enrdf_load_stackoverflow) 1984-10-15 1984-10-15

Publications (1)

Publication Number Publication Date
JPS6170931U true JPS6170931U (enrdf_load_stackoverflow) 1986-05-15

Family

ID=30713484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15547384U Pending JPS6170931U (enrdf_load_stackoverflow) 1984-10-15 1984-10-15

Country Status (1)

Country Link
JP (1) JPS6170931U (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007224354A (ja) * 2006-02-23 2007-09-06 Hitachi Zosen Corp 真空蒸着方法および真空蒸着装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007224354A (ja) * 2006-02-23 2007-09-06 Hitachi Zosen Corp 真空蒸着方法および真空蒸着装置

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