JPS616151B2 - - Google Patents
Info
- Publication number
- JPS616151B2 JPS616151B2 JP7419681A JP7419681A JPS616151B2 JP S616151 B2 JPS616151 B2 JP S616151B2 JP 7419681 A JP7419681 A JP 7419681A JP 7419681 A JP7419681 A JP 7419681A JP S616151 B2 JPS616151 B2 JP S616151B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Photoreceptors In Electrophotography (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7419681A JPS57192258A (en) | 1981-05-19 | 1981-05-19 | Film forming apparatus using glow discharge |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7419681A JPS57192258A (en) | 1981-05-19 | 1981-05-19 | Film forming apparatus using glow discharge |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57192258A JPS57192258A (en) | 1982-11-26 |
JPS616151B2 true JPS616151B2 (ja) | 1986-02-24 |
Family
ID=13540180
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7419681A Granted JPS57192258A (en) | 1981-05-19 | 1981-05-19 | Film forming apparatus using glow discharge |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57192258A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0712148A2 (en) | 1994-11-11 | 1996-05-15 | Hitachi, Ltd. | Plasma display system |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59217615A (ja) * | 1983-05-23 | 1984-12-07 | Toshiba Corp | アモルフアスシリコン成膜装置 |
JPS609876A (ja) * | 1983-06-29 | 1985-01-18 | Matsushita Electric Ind Co Ltd | 薄膜製造装置 |
JPS6086276A (ja) * | 1983-10-17 | 1985-05-15 | Canon Inc | 放電による堆積膜の形成方法 |
JPS6126780A (ja) * | 1984-07-17 | 1986-02-06 | Stanley Electric Co Ltd | プラズマcvd装置 |
JP2719502B2 (ja) * | 1995-01-24 | 1998-02-25 | キヤノン株式会社 | 電子写真光受容部材の製造方法 |
-
1981
- 1981-05-19 JP JP7419681A patent/JPS57192258A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0712148A2 (en) | 1994-11-11 | 1996-05-15 | Hitachi, Ltd. | Plasma display system |
Also Published As
Publication number | Publication date |
---|---|
JPS57192258A (en) | 1982-11-26 |