JPS6161028B2 - - Google Patents

Info

Publication number
JPS6161028B2
JPS6161028B2 JP55005220A JP522080A JPS6161028B2 JP S6161028 B2 JPS6161028 B2 JP S6161028B2 JP 55005220 A JP55005220 A JP 55005220A JP 522080 A JP522080 A JP 522080A JP S6161028 B2 JPS6161028 B2 JP S6161028B2
Authority
JP
Japan
Prior art keywords
plate
chute
plates
chips
blades
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55005220A
Other languages
Japanese (ja)
Other versions
JPS56102682A (en
Inventor
Toshibumi Okudaira
Akihiro Suzuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP522080A priority Critical patent/JPS56102682A/en
Publication of JPS56102682A publication Critical patent/JPS56102682A/en
Publication of JPS6161028B2 publication Critical patent/JPS6161028B2/ja
Granted legal-status Critical Current

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  • Drying Of Solid Materials (AREA)

Description

【発明の詳細な説明】 本発明は合成樹脂チツプや錠剤の如き粉粒体を
棚段式乾燥機を用いて連続的に乾燥するに際し、
製品の品質ムラを極力抑えるよう工夫された棚段
式乾燥機を提供するものである。
DETAILED DESCRIPTION OF THE INVENTION When the present invention continuously dries powder and granular materials such as synthetic resin chips and tablets using a tray dryer,
The present invention provides a tray type dryer that is devised to minimize unevenness in product quality.

合成樹脂チツプや錠剤の如き粉粒体の連続式乾
燥機としては流動床乾燥機、回転乾燥機あるいは
撹拌乾燥機等各種の乾燥機が適用されている。し
かしながら乾燥中に粉粒体の形状がそこなわれた
りすることがあり、又ある範囲内に製品品質を維
持するためには上記乾燥機では十分ではない。
Various types of dryers such as fluidized bed dryers, rotary dryers, and stirring dryers are used as continuous dryers for powder and granular materials such as synthetic resin chips and tablets. However, the shape of the powder may be damaged during drying, and the dryer described above is not sufficient to maintain product quality within a certain range.

特に合成樹脂チツプの中で、ポリアミドやポリ
エステルの如き繊維用に供する合成樹脂チツプの
場合、ある一定の水分値を維持するように乾燥し
ないと紡糸あるいは延伸工程でトラブルの原因と
なる。
Particularly among synthetic resin chips, in the case of synthetic resin chips used for fibers such as polyamide and polyester, if they are not dried to maintain a certain moisture level, problems may occur during the spinning or drawing process.

このためポリアミドやポリエステルのチツプを
連続的に乾燥する場合、乾燥機の具備する特性と
して、ピストンフロー性ということが強く要求さ
れる。即ち、乾燥機に入つたチツプは設定した必
要な乾燥時間で排出されなければならない。もち
ろんデツトスペースが存在するのは不可である。
又、ピストンフロー性が極めてよくても乾燥中に
チツプがこわれたり或はこすれたりしてチツプが
破砕し、より小片になつたり粉状のものが発生す
ると、やはり紡糸工程でトラブルの原因となる。
For this reason, when polyamide or polyester chips are continuously dried, the dryer is strongly required to have piston flow properties. That is, the chips placed in the dryer must be discharged after the required drying time has been set. Of course, it is impossible for a dead space to exist.
Furthermore, even if the piston flow properties are extremely good, if the chips break or rub during drying, and the chips break up and become smaller pieces or powder, it can still cause trouble in the spinning process. .

このように繊維用合成樹脂チツプの乾燥機は乾
燥効率が良いことは言うまでもなく、形状を損う
ことなくかつピストンフロー性の極めて良いこと
が強く要求されている。
As described above, a dryer for synthetic resin chips for textiles is strongly required not only to have good drying efficiency but also to have extremely good piston flow properties without damaging the shape.

このような事情より、最近合成樹脂チツプ、錠
剤さらには食品関係の乾燥において棚段式乾燥機
が使用されつつある。第1〜3図はこのような乾
燥機の概略説明図を示すもので縦型柱状の容器本
体1内には熱媒用のジヤケツト3を設けた円環状
のプレート2,2′が多段に配設され、又このプ
レート2,2′に接して回転する羽根(レーキ)
5,5′を径方向に複数枚アーム6を介して取付
けた回転軸4が本体1の中心に垂直に配設されて
いる。上記プレート2と羽根5の関係は上から奇
数段では第2図に示すようにプレート2の内周端
にせき板2aが設けられると共に羽根5はプレー
ト2上の粉粒体を外周側に移動させるように径方
向に対し斜交して取付けられている。偶数段では
第3図の如くプレート2′の外径および内径が奇
数段のものより大きくかつ羽根5′は粉粒体を内
周(内径)側に移動させるように奇数段のものと
は逆方向に取付けられ、更に外周端にせき板2b
が設けられている。かかる従来の棚段式乾燥機に
あつてはスチーム、熱媒体等で入、出ノズル7,
8を介して所定温度に加熱されたプレート2上に
投入口9からチツプが定量的に供給されると、モ
ータ10によつて回転する回転軸4により羽根5
がプレート2に接しながら回転軸4を中心として
廻り、これによつてチツプは薄層状又は波状に分
散して渦巻状に外周側に移行し下段のプレート
2′に落下する。偶数段のプレート2′上では逆に
内周側に移行し内周端から下段に落下し、同様に
して順次下段に落下して所定時間の乾燥が行なわ
れたチツプは本体1の下面11に落下しその排出
口12から排出されるのであるが、このような従
来の装置は次の如き問題があつた。
Under these circumstances, tray dryers have recently been used for drying synthetic resin chips, tablets, and even food-related products. Figures 1 to 3 are schematic explanatory diagrams of such a dryer, in which annular plates 2, 2' each provided with a jacket 3 for a heat medium are arranged in multiple stages inside a vertical columnar container body 1. A blade (rake) is provided and rotates in contact with the plates 2, 2'.
A rotary shaft 4 having a plurality of arms 6 attached in the radial direction is disposed perpendicularly to the center of the main body 1. The relationship between the plates 2 and the blades 5 is such that in odd-numbered stages from the top, as shown in Figure 2, a weir plate 2a is provided at the inner peripheral end of the plate 2, and the blades 5 move the powder on the plate 2 to the outer peripheral side. It is installed obliquely to the radial direction so that the In the even-numbered stages, the outer and inner diameters of the plates 2' are larger than those in the odd-numbered stages, as shown in Figure 3, and the blades 5' are opposite to those in the odd-numbered stages so as to move the powder to the inner circumference (inner diameter) side. The weir plate 2b is attached to the outer peripheral edge.
is provided. In such a conventional tray type dryer, the inlet and outlet nozzles 7,
When chips are quantitatively supplied from the input port 9 onto the plate 2 heated to a predetermined temperature via the rotary shaft 4 rotated by the motor 10, the blades 5
rotates around the rotating shaft 4 while in contact with the plate 2, whereby the chips are dispersed in a thin layer or wave shape, move spirally to the outer circumferential side, and fall onto the lower plate 2'. On the even-numbered plates 2', the chips move toward the inner periphery and fall from the inner edge to the lower tier, and in the same way, the chips fall sequentially to the lower tier and are dried for a predetermined time on the bottom surface 11 of the main body 1. However, such conventional devices have the following problems.

すなわち、処理すべき粉粒体は上記のようにプ
レート2,2′上を内周側或は外周側へと移行し
プレート2,2′からプレート2,2′へと落下す
るが、特に錠剤や合成樹脂チツプの場合弾性が大
きいため四方八方に飛散しシヨートパスを起しや
すく、時には落下してきた粉粒体がプレート2,
2′に或は粉粒体同志が衝突してプレートのせき
板2a,2bを飛び越し本体下面11まで直行す
るものがある。このように粉粒体の落下時の衝突
による飛散のためシヨートパスがひんぱんに起り
ピストンフロー性がくずれ、このため乾燥むらが
生じ後工程においてトラブルを起こす欠点があつ
た。
That is, as described above, the powder or granular material to be treated moves on the plates 2, 2' to the inner circumferential side or the outer circumferential side and falls from the plates 2, 2' to the plates 2, 2'. In the case of powder or synthetic resin chips, they have a high elasticity, so they tend to scatter in all directions and cause short passes.
2', some particles collide with each other and jump over the plates 2a, 2b and go straight to the lower surface 11 of the main body. As described above, shot passes frequently occur due to scattering due to collisions of powder particles when they fall, which destroys piston flow properties, resulting in uneven drying, which causes trouble in subsequent processes.

本発明者はかかる現状に鑑み鋭意研究の結果、
合成樹脂チツプや錠剤の如き粉粒体を連続的に乾
燥するに際し、製品の品質むらが生じず品質の一
定した優れた製品を安定して得ることが可能な棚
段式乾燥機を考案するに至つた。
In view of the current situation, the inventor has conducted extensive research and found that
To devise a tray dryer that can stably obtain excellent products with consistent quality without causing unevenness in product quality when continuously drying powdered materials such as synthetic resin chips and tablets. I've reached it.

すなわち、本発明は断面が円形もしくは多角形
状の縦型柱状容器内に熱媒用のジヤケツトを有す
るプレートを多段に配設するとともに各プレート
上に該プレートに接する羽根を径方向に複数枚設
けたアームを容器の中心に垂直に配した回転軸に
取付け、上部投入口から供給された粉粒体をプレ
ート上でその内周又は外周側に移行させて順次下
段のプレートに落下させるようにした棚段式乾燥
機において、プレート間でかつプレートの内周又
は外周端の近傍位置に回転軸と共に一体となつて
回転するシユートを最内周又は最外周側の羽根と
対応する位置に配設するとともに、羽根をシユー
ト出口の直後位置となるように設け、かつシユー
ト出口位置に対応するプレートの周面側にせき板
を設けたことを特徴とする棚段式乾燥機である。
That is, in the present invention, plates having heat medium jackets are arranged in multiple stages in a vertical columnar container having a circular or polygonal cross section, and a plurality of blades are provided on each plate in contact with the plates in the radial direction. A shelf with an arm attached to a rotating shaft placed perpendicular to the center of the container, so that the powder and granules supplied from the upper input port are transferred to the inner or outer circumference of the plate and sequentially fall onto the lower plate. In a tiered dryer, a chute that rotates together with a rotating shaft is arranged between the plates and near the inner or outer edge of the plate at a position corresponding to the innermost or outermost blade, and , a tray type dryer characterized in that the blades are provided at a position immediately after the chute outlet, and a weir plate is provided on the peripheral surface side of the plate corresponding to the chute outlet position.

以下、本発明を図面に基づいて説明する。第4
図は本発明の実施例を示す断面概略図、第5図と
第6図は奇数段および偶数段のプレート部平面図
である。図において、20,20′は各プレート
2,2′間に回転軸4に固定されたアーム21,
21′を介してその先端に取付けられたシユート
で、プレート2′の上方に位置するシユート20
はその入口20aがプレート2の外周端近傍で最
外周の羽根5と対応する位置(羽根5によつて粉
粒体がプレート2の外周端から落下する位置)に
開口し、又出口20bはプレート2′の外周端部
に近くかつ最外周の羽根5′と対応する位置(落
下した粉粒体が最外周の羽根5′によつて送り作
用を受けるような位置)に開口している。
Hereinafter, the present invention will be explained based on the drawings. Fourth
The figure is a schematic cross-sectional view showing an embodiment of the present invention, and FIGS. 5 and 6 are plan views of plate portions of odd-numbered stages and even-numbered stages. In the figure, 20 and 20' are an arm 21 fixed to the rotating shaft 4 between each plate 2 and 2',
The chute 20 is located above the plate 2' and is attached to its tip via 21'.
The inlet 20a opens at a position corresponding to the outermost blade 5 near the outer peripheral edge of the plate 2 (the position where the powder falls from the outer peripheral edge of the plate 2 by the blade 5), and the outlet 20b opens at a position corresponding to the outermost blade 5 near the outer peripheral edge of the plate 2. It opens at a position near the outer peripheral end of the blade 2' and corresponding to the outermost blade 5' (a position where the fallen powder is fed by the outermost blade 5').

プレート2の上方に位置するシユート20′は
逆にプレート2,2′の内周端側に上記シユート
20と同様な配置で配設されている。更に本体1
の最上部に設けられた投入口22はその下端出口
23がアーム6の回転に支障ない範囲で出来るだ
けプレート2に近くなるように開口している。そ
の他の構成は第1〜3図に示すものと同様であ
り、第1〜3図と同じ符号で示す。
On the contrary, the chute 20' located above the plate 2 is disposed on the inner peripheral end side of the plates 2, 2' in the same arrangement as the chute 20 described above. Furthermore, main body 1
The input port 22 provided at the top of the inlet 22 is opened so that its lower end outlet 23 is as close to the plate 2 as possible within a range that does not interfere with the rotation of the arm 6. The other configurations are similar to those shown in FIGS. 1 to 3, and are indicated by the same symbols as in FIGS. 1 to 3.

次にこのような構成からなる装置において、投
入口22から供給された、例えば、合成樹脂チツ
プは最上段のプレート2の内周端部に落下し、回
転する羽根5により薄層状或は波状となつて徐々
に外周側に移行しながらこの間に乾燥される。外
周端に移行したチツプは羽根5と共に所定の位置
を保持して回転するシユート20に受け入れら
れ、次段のプレート2′外周端部に落下する。こ
の2段目に落下したチツプはアーム6の回転によ
り第1段目と同様であるが逆方向(内周方向)に
(1回転につきほぼ羽根の径方向の長さだけ)移
動し、アーム6の所定回転でプレート2′の内周
端に移行して前述と同様にここからシユート2
0′を介して更に下段即ち第3段目のプレート2
上に落下する。この場合、チツプはシユート2
0,20′を介して次段のプレート2,2′に落下
するからシユート20,20′に規制され、四方
八方に飛散することがなくほぼシユート20,2
0′の下方に位置することになりシヨートパス等
を起すことがない。
Next, in a device having such a configuration, for example, synthetic resin chips supplied from the input port 22 fall onto the inner circumferential edge of the uppermost plate 2, and are turned into a thin layer or wave shape by the rotating blades 5. It is dried during this time while gradually moving toward the outer circumferential side. The chips that have moved to the outer peripheral end are held in a predetermined position together with the blades 5, are received by the rotating chute 20, and fall onto the outer peripheral end of the next plate 2'. Due to the rotation of the arm 6, the chips that have fallen to the second stage move in the same way as the first stage, but in the opposite direction (inner circumferential direction) (approximately the length of the blade in the radial direction per rotation). At a predetermined rotation of
0' to the lower stage, that is, the third stage plate 2.
fall on top. In this case, the chip is shoot 2
Since it falls onto the next plate 2, 2' through the chute 20, 20', it is regulated by the chute 20, 20', and it does not scatter in all directions and almost falls onto the chute 20, 2'.
Since it is located below 0', short passes etc. do not occur.

次にチツプは上述のような操作が繰返され最下
段の本体下面11上に移行し、所定時間の乾燥作
用を受けたチツプは排出口12から取り出され
る。ここで、シユートと羽根の上、下段間の関係
は第5〜6図に示す如く、下段の羽根5,5′は
上段のものより回転方向に対して直後の位置すな
わちシユート20,20′の出口の直後に設け、
上段からシユートを介して落下してきたチツプが
直ちに移動するように配するのが効率的な乾燥を
行う上から好ましい。シユート20,20′は処
理すべき粉粒体によつて上下又は左右(前後)方
向に変更が可能な如くアーム21,21′に取付
けておくのがよく、又シユート20,20′の形
状としては落下時の衝撃をやわらげるために彎曲
或は屈曲状にしてもよい。回転軸4(羽根5,
5′の回転数は処理すべき粉粒体、乾燥時間等に
よつて適宜決められるが、ピストンフロー性とい
う見地からは低速程好ましく通常は3r.p.m以下
とする。粉粒体の深層は乾燥効率、設備容量等を
考慮して決めるが、チツプの場合通常は5〜30mm
程度であり、又シユートの出口20b,20′b
とプレート2,2′との間隔はプレート2,2′上
のチップの上層より10〜30mm前後にするのがよ
い。
Next, the above-described operation is repeated so that the chips are transferred to the bottom surface 11 of the main body at the lowest stage, and the chips that have been dried for a predetermined period of time are taken out from the discharge port 12. Here, the relationship between the chute and the upper and lower stages of the blades is as shown in FIGS. Installed immediately after the exit,
From the viewpoint of efficient drying, it is preferable to arrange the apparatus so that the chips falling from the upper stage through the chute are immediately moved. The chute 20, 20' is preferably attached to the arm 21, 21' so that it can be changed vertically or horizontally (front and back) depending on the powder or granular material to be processed, and the shape of the chute 20, 20' may be curved or curved to soften the impact when dropped. Rotating shaft 4 (blade 5,
The rotational speed of the rotation speed 5' is appropriately determined depending on the powder and granular material to be treated, the drying time, etc., but from the viewpoint of piston flow properties, the lower the speed, the better, and it is usually 3 rpm or less. The depth of the granular material is determined by considering drying efficiency, equipment capacity, etc., but in the case of chips, it is usually 5 to 30 mm.
and the outlet 20b, 20'b of the chute
It is preferable that the distance between the chips and the plates 2, 2' be approximately 10 to 30 mm from the upper layer of chips on the plates 2, 2'.

尚、本実施例は乾燥をプレート2,2′の加熱
によつて行うものについて示したが、更に熱風供
給又は真空吸引を同時に行うようにしてもよいこ
とは言うまでもない。
In this embodiment, drying is carried out by heating the plates 2, 2', but it goes without saying that hot air supply or vacuum suction may be carried out at the same time.

又、最終段のプレートと本体下面との間にもシ
ユートを設けてもよい。以上に説明の如く、本考
案によればプレート間に羽根と共に回転するシユ
ートを取付けこのシユートを介して粉粒体を次段
のプレート上に落下させるようにしているから、
プレート間を落下する粉粒体を飛散させることな
くプレートの外周又は内周端部に供給でき、従つ
て粉粒体のシヨートパスがなくなり極めて品質が
良くかつ一定した製品が安定して得ることが可能
となる。
Further, a chute may also be provided between the final stage plate and the lower surface of the main body. As explained above, according to the present invention, a chute that rotates with the blades is installed between the plates, and the powder and granules are dropped onto the next plate through this chute.
The powder and granules that fall between the plates can be supplied to the outer or inner edges of the plates without scattering, and there is no shot pass of the powder, making it possible to stably obtain products of extremely high quality and consistency. becomes.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の実施例を示す断面概略図、第2
図と第3図は第1図に示すプレート部の奇数段お
よび隅数段の概略平面図、第4図は本発明の実施
例を示す断面概略図、第5図と第6図は第4図に
示すプレート部の奇数段および偶数段の概略平面
図である。 1……容器本体、2,2′……プレート、4…
…回転軸、5,5′……羽根、20,20′……シ
ユート、21,21′……アーム。
Figure 1 is a cross-sectional schematic diagram showing a conventional embodiment;
3 and 3 are schematic plan views of odd-numbered stages and corner-numbered stages of the plate section shown in FIG. 1, FIG. 4 is a schematic cross-sectional view showing an embodiment of the present invention, and FIGS. FIG. 3 is a schematic plan view of odd-numbered stages and even-numbered stages of the plate section shown in the figure. 1... Container body, 2, 2'... Plate, 4...
...rotating shaft, 5, 5'... blade, 20, 20'... chute, 21, 21'... arm.

Claims (1)

【特許請求の範囲】 1 断面が円形もしくは多角形状の縦型柱状容器
内に熱媒用のジヤケツトを有するプレートを多段
に配設するとともに各プレート上に該プレートに
接する羽根を径方向に複数枚設けたアームを容器
の中心に垂直に配した回転軸に取付け、上部投入
口から供給された粉粒体をプレート上でその内周
又は外周側に移行させて順次下段のプレートに落
下させるようにした棚段式乾燥機において、プレ
ート間でかつプレートの内周又は外周端の近傍位
置に回転軸と共に一体となつて回転するシユート
を最内周又は最外周側の羽根と対応する位置に配
設するとともに、羽根をシユート出口の直後位置
となるように設け、かつシユート出口位置に対応
するプレートの周面側にせき板を設けたことを特
徴とする棚段式乾燥機。 2 シユートがアームに設けた最内周又は最外周
側の羽根と対応する位置に配設されている特許請
求の範囲第1項記載の棚段式乾燥機。
[Scope of Claims] 1. Plates having heat medium jackets are arranged in multiple stages in a vertical columnar container with a circular or polygonal cross section, and each plate has a plurality of blades in contact with the plates in the radial direction. The provided arm is attached to a rotating shaft placed perpendicularly to the center of the container, so that the powder and granules supplied from the upper input port are transferred to the inner or outer periphery of the plate and sequentially fall onto the lower plate. In the tray type dryer, a chute that rotates together with the rotating shaft is arranged between the plates and near the inner or outer edge of the plate at a position corresponding to the innermost or outermost blade. In addition, a tray type dryer characterized in that the blades are provided at a position immediately after the chute exit, and a weir plate is provided on the peripheral surface side of the plate corresponding to the chute exit position. 2. The tray dryer according to claim 1, wherein the chute is disposed at a position corresponding to the innermost or outermost blade provided on the arm.
JP522080A 1980-01-22 1980-01-22 Shelffstage type drier Granted JPS56102682A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP522080A JPS56102682A (en) 1980-01-22 1980-01-22 Shelffstage type drier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP522080A JPS56102682A (en) 1980-01-22 1980-01-22 Shelffstage type drier

Publications (2)

Publication Number Publication Date
JPS56102682A JPS56102682A (en) 1981-08-17
JPS6161028B2 true JPS6161028B2 (en) 1986-12-23

Family

ID=11605107

Family Applications (1)

Application Number Title Priority Date Filing Date
JP522080A Granted JPS56102682A (en) 1980-01-22 1980-01-22 Shelffstage type drier

Country Status (1)

Country Link
JP (1) JPS56102682A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5357559A (en) * 1976-11-05 1978-05-24 Ube Ind Ltd Drying apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5357559A (en) * 1976-11-05 1978-05-24 Ube Ind Ltd Drying apparatus

Also Published As

Publication number Publication date
JPS56102682A (en) 1981-08-17

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