JPS6160156B2 - - Google Patents
Info
- Publication number
- JPS6160156B2 JPS6160156B2 JP18591683A JP18591683A JPS6160156B2 JP S6160156 B2 JPS6160156 B2 JP S6160156B2 JP 18591683 A JP18591683 A JP 18591683A JP 18591683 A JP18591683 A JP 18591683A JP S6160156 B2 JPS6160156 B2 JP S6160156B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- jig
- sulfur
- containing organic
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 50
- 238000000034 method Methods 0.000 claims description 17
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 14
- 229910052717 sulfur Inorganic materials 0.000 claims description 14
- 239000011593 sulfur Substances 0.000 claims description 14
- 150000002894 organic compounds Chemical class 0.000 claims description 13
- 229920003023 plastic Polymers 0.000 claims description 11
- 239000004033 plastic Substances 0.000 claims description 11
- 239000002904 solvent Substances 0.000 claims description 11
- -1 sulfide compound Chemical class 0.000 claims description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- GUUVPOWQJOLRAS-UHFFFAOYSA-N Diphenyl disulfide Chemical compound C=1C=CC=CC=1SSC1=CC=CC=C1 GUUVPOWQJOLRAS-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- 239000003021 water soluble solvent Substances 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- YPWFISCTZQNZAU-UHFFFAOYSA-N Thiane Chemical compound C1CCSCC1 YPWFISCTZQNZAU-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- RFUABQNZKSSKRX-UHFFFAOYSA-N methyl 4-(trifluoromethyl)pyridine-3-carboxylate Chemical compound COC(=O)C1=CN=CC=C1C(F)(F)F RFUABQNZKSSKRX-UHFFFAOYSA-N 0.000 description 2
- SUVIGLJNEAMWEG-UHFFFAOYSA-N propane-1-thiol Chemical compound CCCS SUVIGLJNEAMWEG-UHFFFAOYSA-N 0.000 description 2
- RAOIDOHSFRTOEL-UHFFFAOYSA-N tetrahydrothiophene Chemical compound C1CCSC1 RAOIDOHSFRTOEL-UHFFFAOYSA-N 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- DHBXNPKRAUYBTH-UHFFFAOYSA-N 1,1-ethanedithiol Chemical compound CC(S)S DHBXNPKRAUYBTH-UHFFFAOYSA-N 0.000 description 1
- KWPNNZKRAQDVPZ-UHFFFAOYSA-N 1,3-bis(2-methylphenyl)thiourea Chemical compound CC1=CC=CC=C1NC(=S)NC1=CC=CC=C1C KWPNNZKRAQDVPZ-UHFFFAOYSA-N 0.000 description 1
- WYJOVVXUZNRJQY-UHFFFAOYSA-N 2-Acetylthiophene Chemical compound CC(=O)C1=CC=CS1 WYJOVVXUZNRJQY-UHFFFAOYSA-N 0.000 description 1
- LXUNZSDDXMPKLP-UHFFFAOYSA-N 2-Methylbenzenethiol Chemical compound CC1=CC=CC=C1S LXUNZSDDXMPKLP-UHFFFAOYSA-N 0.000 description 1
- RVBUGGBMJDPOST-UHFFFAOYSA-N 2-thiobarbituric acid Chemical compound O=C1CC(=O)NC(=S)N1 RVBUGGBMJDPOST-UHFFFAOYSA-N 0.000 description 1
- BUZICZZQJDLXJN-UHFFFAOYSA-N 3-azaniumyl-4-hydroxybutanoate Chemical compound OCC(N)CC(O)=O BUZICZZQJDLXJN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- CETBSQOFQKLHHZ-UHFFFAOYSA-N Diethyl disulfide Chemical compound CCSSCC CETBSQOFQKLHHZ-UHFFFAOYSA-N 0.000 description 1
- FCSHMCFRCYZTRQ-UHFFFAOYSA-N N,N'-diphenylthiourea Chemical compound C=1C=CC=CC=1NC(=S)NC1=CC=CC=C1 FCSHMCFRCYZTRQ-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- SVXOWLIZJQQBKC-UHFFFAOYSA-N [ethyl(methyl)carbamothioyl]sulfanyl n-ethyl-n-methylcarbamodithioate Chemical compound CCN(C)C(=S)SSC(=S)N(C)CC SVXOWLIZJQQBKC-UHFFFAOYSA-N 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000013405 beer Nutrition 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 150000001923 cyclic compounds Chemical class 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- CCAFPWNGIUBUSD-UHFFFAOYSA-N diethyl sulfoxide Chemical compound CCS(=O)CC CCAFPWNGIUBUSD-UHFFFAOYSA-N 0.000 description 1
- 150000002019 disulfides Chemical class 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- QJFUMFCCMJJLIE-UHFFFAOYSA-N ethanethial Chemical compound CC=S QJFUMFCCMJJLIE-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- OHOJRYNNXNLLOK-UHFFFAOYSA-N imidazolidine-2,4-dithione Chemical compound S=C1CNC(=S)N1 OHOJRYNNXNLLOK-UHFFFAOYSA-N 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000010137 moulding (plastic) Methods 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- GVIJJXMXTUZIOD-UHFFFAOYSA-N thianthrene Chemical compound C1=CC=C2SC3=CC=CC=C3SC2=C1 GVIJJXMXTUZIOD-UHFFFAOYSA-N 0.000 description 1
- 125000004149 thio group Chemical group *S* 0.000 description 1
- 150000003564 thiocarbonyl compounds Chemical class 0.000 description 1
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- GLQWRXYOTXRDNH-UHFFFAOYSA-N thiophen-2-amine Chemical compound NC1=CC=CS1 GLQWRXYOTXRDNH-UHFFFAOYSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
- 229940103494 thiosalicylic acid Drugs 0.000 description 1
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical compound CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
- 229960002447 thiram Drugs 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
Description
本発明は経済的に有利なプラスチツク成形品の
電気メツキ方法に関する。更にくわしくは、メツ
キ工程中にメツキ治具、(すなわちメツキをほど
こそうとするプラスチツク成形品を取付け、通電
させるようにした治具)の引つ掛け替えの必要が
ないメツキ方法に関する。
すなわち本発明は、含硫黄有機化合物の溶液に
メツキ用治具を浸漬した後、プラスチツク成形品
を装着し、メツキをほどこすことを特徴とするプ
ラスチツクのメツキ方法である。
メツキ用治具は一般に、電気良導体である銅な
いしは銅合金により構成されており、メツキしよ
うとする物を1又は複数個取付けられるようにな
つている。又メツキをほどこした時治具自体がメ
ツキされないよう、必要な部分以外は治具表面を
塩化ビニールのような絶縁体でコーテイングする
ことによりマスキングされている。
しかしプラスチツク成形品のメツキにおいて
は、メツキプロセス中に成形品を導電化する工程
がある。このためメツキ治具のコーテイング表面
も導電化されてしまい、電気メツキがほどこされ
てしまうと言う問題がある。このためプラスチツ
クのメツキにおいては、成形品の導電化工程(い
わゆる化学メツキ)までと、それ以後の電気メツ
キ工程でメツキ治具を取替えると言う作業、すな
わち治具替えを行なつている。このための労務費
は非常に大きく、プラスチツクメツキ原価のなか
でもかなりの部分をしめている。又、メツキ工程
の中途から半製品を大気中に取出し、人手に触れ
ることは、油脂分の付着とか成形品表面のキズ発
生等の問題を引きおこし、メツキ不良の発生原因
となつていた。
本発明は通常のメツキ治具を使用前に、特定の
薬液に浸漬することにより、治具コーテイング面
へのメツキの付着が防止出来、治具替えをしなく
とも、治具をよごすことなくメツキをすることが
出来るプラスチツクのメツキ方法である。
本発明のメツキ法は、メツキ前にメツキ治具を
メルカプト化合物、チオカルボニル化合物、スル
フイド化合物など、含硫黄有機化合物の溶液の中
に浸漬することを特徴としており、その他のプロ
セスは通常のメツキ方法と同様である。
実験によるとほとんどの含硫黄有機化合物が有
効であつた。すなわちモノまたはジスルフイド化
合物、チアゾール、チオラン、チアンなどの含硫
黄環状化合物、チオ基(−S−)、スルホニル基
The present invention relates to an economically advantageous method for electroplating plastic moldings. More specifically, it relates to a plating method that does not require replacing the plating jig (i.e., the jig to which the plastic molded product to be plated is attached and energized) during the plating process. That is, the present invention is a plastic plating method characterized by immersing a plating jig in a solution of a sulfur-containing organic compound, attaching a plastic molded article, and applying plating. A plating jig is generally made of copper or a copper alloy, which is a good electrical conductor, and is adapted to attach one or more objects to be plated. In addition, to prevent the jig itself from being plated when plating is performed, the surface of the jig is masked by coating the surface of the jig with an insulator such as vinyl chloride, except for necessary parts. However, in plating plastic molded products, there is a step of making the molded product electrically conductive during the plating process. For this reason, there is a problem in that the coating surface of the plating jig also becomes conductive, and electroplating cannot be performed. For this reason, when plating plastics, the plating jig is replaced up to the process of making the molded product conductive (so-called chemical plating) and in the subsequent electroplating process, that is, the jig is replaced. The labor costs for this are extremely large and account for a large portion of the plastic plating cost. In addition, taking the semi-finished product out into the atmosphere during the plating process and touching it with human hands causes problems such as oil and fat adhesion and scratches on the surface of the molded product, which causes plating defects. The present invention prevents plating from adhering to the coating surface of the jig by immersing a regular plating jig in a specific chemical solution before use. This is a method of plating plastic that can do the following. The plating method of the present invention is characterized by immersing the plating jig in a solution of sulfur-containing organic compounds such as mercapto compounds, thiocarbonyl compounds, and sulfide compounds before plating. It is similar to Experiments have shown that most sulfur-containing organic compounds are effective. That is, mono- or disulfide compounds, sulfur-containing cyclic compounds such as thiazole, thiolane, thian, thio group (-S-), sulfonyl group
【式】チオカルボニル基[Formula] Thiocarbonyl group
【式】メルカプト基(−SH)を含
む硫黄化合物などである。具体的に例示すれば、
テトラメチルチウラムモノスルフイド、テトラメ
チルチウラムジスルフイド、テトラ−n−ブチル
チウラムジスルフイド、ジメチルジエチルチウラ
ムジスルフイド、ジフエニルジスルフイド、チア
ゾール、ベンゾチアゾール、チオラン、チアン、
チアントレン、2−チオバルビツル酸、ジチオア
メリド、チオフエン、アミノチオフエン、アセチ
ルチオフエン、チオウレタン、二硫化エチル、二
硫化フエニル、β,β′−ジチオジプロピオン
酸、チオアセトアルデヒド、ジメチルスルホキシ
ド、エチルスルホキシド、ジ−n−ブチルスルホ
キシド、ジチオヒダントイン、チオ尿素、1,3
−ジフエニル−2−チオ尿素、2,2′−ジトリル
チオ尿素、2−メルカプトベンゾチアゾール、チ
オサリチル酸、2,5−ジメルカプト−1,3,
4−チアジアゾール、チオフエノール、チオクレ
ゾール、エタンジチオール、プロピルメルカプタ
ン、チオインジゴなどが挙げられているが、これ
らに限定されるものではない。
溶剤としては、含硫黄有機化合物が溶解するも
のであればどのような溶媒でもよいが、メツキ液
の汚染の点から水溶性溶媒が好ましい。例えばエ
タノール、ブタノール、ジアセトンアルコールな
どのアルコール類、アセトン、メチルエチルケト
ンなどのケトン類、酢酸エチルのようなエステル
類、エチルエーテルなどのエーテル類などが入手
しやすく扱い易いので好適な溶剤である。しかし
疎水性溶剤例えばトルエン、キシレン、トリクロ
ルエタンなどでも浸漬処理後乾燥すれば使用でき
る。
溶液の濃度は1%以上であれば有効であるが、
一般的には繰返し使用するので、3〜20%の濃度
が好適である。
このような溶液に、メツキ治具をメツキ工程の
前に浸漬する。浸漬方法としては特別な技術を要
しない。ただメツキ治具を溶液に入れればよく、
通常はメツキ自動ラインに処理槽を付設すれば足
りる。
浸漬温度及び時間は、含硫黄有機化合物の種
類、溶液の濃度によつて若干異なるが、温度は常
温から溶液の沸点以下の温度、時間は温度条件に
よつてかわるが、1分以上であれば何時間でもよ
く、作業の都合で決められる。金属付着防止効果
の点からは、温度は高い方が、また時間は長い方
が、より効果が大きいと言える。
水溶性溶媒の溶液に浸漬したメツキ治具は、通
常溶媒または/および水で1〜2回洗滌してから
使用する。疎水性溶媒を使用した場合には、その
溶媒で数回洗滌し、乾燥してから用いるとよい。
金属付着防止効果は原則的には一回限りであ
り、治具を使う毎に浸漬処理を行なう。含硫黄有
機化合物が、特にスルフイド化合物又はメルカプ
ト化合物の場合には、治具を2回以上繰返し使用
しても金属の析出がみられないものがあつた。こ
のような場合には浸漬回数を何回かに一度に減ら
すことができる。
以下本発明を実施例によつて具体的に説明す
る。
実施例 1−16
塩化ビニールゾルでコーテイングされた通常の
メツキ治具を、第1表、実施例1から16の含硫黄
有機化合物溶液(10重量%、溶媒ジアセトンアル
コール)で各々浸漬処理(50℃、30分)し、ジア
セトンアルコール、水の順で洗浄し、風乾した。
この治具にアセタール樹脂の成形品を引つ掛
け、脱脂し、硫酸/リン酸からなるエツチング液
でエツチングし、触媒付与、活性化し、化学ニツ
ケルメツキしたところ、治具には化学メツキが析
出せず、成形品のみがニツケルメツキされた。引
続きこのものを銅、ニツケル、クロムの順に電気
メツキしたところ、第1表に示す通り、治具には
金属が全く付着しなかつた。
比較として塩化ビニールゾルでコーテイングさ
れたメツキ治具を、含硫黄有機化合物で処理する
ことなくそのままメツキに供したところ、第1表
比較例1の通り、1回目から治具全面にメツキが
析出した。従つて化学メツキ後に治具を交換しな
ければならなかつた。[Formula] A sulfur compound containing a mercapto group (-SH). To give a concrete example,
Tetramethylthiuram monosulfide, tetramethylthiuram disulfide, tetra-n-butylthiuram disulfide, dimethyldiethylthiuram disulfide, diphenyl disulfide, thiazole, benzothiazole, thiolane, thiane,
Thianthrene, 2-thiobarbituric acid, dithioamelide, thiophene, aminothiophene, acetylthiophene, thiourethane, ethyl disulfide, phenyl disulfide, β,β′-dithiodipropionic acid, thioacetaldehyde, dimethyl sulfoxide, ethyl sulfoxide, -n-butyl sulfoxide, dithiohydantoin, thiourea, 1,3
-diphenyl-2-thiourea, 2,2'-ditolylthiourea, 2-mercaptobenzothiazole, thiosalicylic acid, 2,5-dimercapto-1,3,
Examples include, but are not limited to, 4-thiadiazole, thiophenol, thiocresol, ethanedithiol, propylmercaptan, and thioindigo. The solvent may be any solvent as long as it dissolves the sulfur-containing organic compound, but water-soluble solvents are preferred from the viewpoint of contamination of the plating solution. For example, alcohols such as ethanol, butanol, and diacetone alcohol, ketones such as acetone and methyl ethyl ketone, esters such as ethyl acetate, and ethers such as ethyl ether are suitable solvents because they are readily available and easy to handle. However, hydrophobic solvents such as toluene, xylene, trichloroethane, etc. can also be used if they are dried after dipping. It is effective if the concentration of the solution is 1% or more, but
Since it is generally used repeatedly, a concentration of 3 to 20% is suitable. A plating jig is immersed in such a solution before the plating process. No special technique is required for the dipping method. All you have to do is put the plating jig into the solution.
Normally, it is sufficient to attach a treatment tank to the automatic line. The immersion temperature and time vary slightly depending on the type of sulfur-containing organic compound and the concentration of the solution, but the temperature ranges from room temperature to the boiling point of the solution, and the time varies depending on the temperature conditions, but if it is 1 minute or more, You can work for as many hours as you like, depending on your work schedule. In terms of metal adhesion prevention effect, it can be said that the higher the temperature and the longer the time, the greater the effect. A plating jig immersed in a solution of a water-soluble solvent is usually washed once or twice with the solvent and/or water before use. When a hydrophobic solvent is used, it is advisable to wash it several times with the solvent and dry it before use. In principle, the effect of preventing metal adhesion is only available once, and the immersion treatment is performed every time the jig is used. In some cases where the sulfur-containing organic compound was a sulfide compound or a mercapto compound, metal precipitation was not observed even after the jig was used twice or more. In such cases, the number of immersions can be reduced to several times at once. The present invention will be specifically explained below using examples. Example 1-16 An ordinary plating jig coated with vinyl chloride sol was immersed (50% ℃, 30 minutes), washed with diacetone alcohol and then water, and air-dried. When an acetal resin molded product was hung on this jig, degreased, etched with an etching liquid consisting of sulfuric acid/phosphoric acid, catalyzed and activated, and chemically nickel plated, no chemical plating was deposited on the jig. , only the molded parts were nickel plated. Subsequently, this material was electroplated with copper, nickel, and chromium in that order, and as shown in Table 1, no metal adhered to the jig. As a comparison, when a plating jig coated with vinyl chloride sol was subjected to plating as it was without being treated with a sulfur-containing organic compound, plating was deposited on the entire surface of the jig from the first time, as shown in Comparative Example 1 in Table 1. . Therefore, the jig had to be replaced after chemical plating.
【表】
実施例 17−21
塩化ビールゾルでコーテイングされたメツキ治
具を、第2表の含硫黄有機化合物溶液(溶媒ジア
セトンアルコール)の同表に示す各濃度で浸漬処
理(50℃、30分)し、実施例1と同様の方法でメ
ツキし、治具への金属付着具合を観察したところ
第2表の結果が得られた。表から明らかなように
1%でも効果が認められた。[Table] Example 17-21 A plating jig coated with chloride beer sol was immersed in each concentration shown in Table 2 of the sulfur-containing organic compound solution (solvent diacetone alcohol) (50°C, 30 minutes). ) and plated in the same manner as in Example 1, and the degree of metal adhesion to the jig was observed, and the results shown in Table 2 were obtained. As is clear from the table, the effect was observed even at 1%.
【表】
実施例 22−25
塩化ビニールゾルでコーテイングされたメツキ
治具を、含硫黄有機化合物としてテトラ−n−ブ
チルチウラムジスルフイドを用い、第3表に示す
溶媒にこれを10重量%溶解せしめ、同表の各浸漬
条件で浸漬処理し、実施例1と同様の方法でメツ
キし、治具への金属付着具合を観察した結果を第
3表に示す。表から明らかなように、水溶性溶媒
はもちろんのこと、疎水性溶媒でも同じ効果が認
められ、浸漬条件も何ら制約を受けないことがわ
かる。[Table] Example 22-25 A plating jig coated with vinyl chloride sol was dissolved at 10% by weight in the solvent shown in Table 3 using tetra-n-butylthiuram disulfide as the sulfur-containing organic compound. Table 3 shows the results of observing the degree of metal adhesion to the jig. As is clear from the table, the same effect is observed not only with water-soluble solvents but also with hydrophobic solvents, and it can be seen that the immersion conditions are not subject to any restrictions.
【表】【table】
【表】
なお実施例2について、化学ニツケルメツキ液
の代わりに化学銅メツキ液を用いて、またABS
のメツキにおいて、一般に使われている高クロム
酸/硫酸のエツチング液についても実験してみた
が、同様の効果が認められ、用途範囲が広いこと
を確認している。
本発明の実施により、プラスチツクメツキ工程
で、メツキ治具に金属が析出することがなくなつ
たため、メツキ中に治具を取替える必要がなくな
り、プラスチツクメツキコストが大巾に軽減出来
ることが明らかになつた。この他、引つ掛け替え
時に発生していたキズ、メツキ密着不良がなくな
り、不良率が大巾に軽減出来ることも大きな効果
である。[Table] Regarding Example 2, chemical copper plating solution was used instead of chemical nickel plating solution, and ABS
We also tested a commonly used high chromic acid/sulfuric acid etching solution for plating, and found similar effects, confirming that it can be used in a wide range of applications. By implementing the present invention, metal is no longer deposited on the plating jig during the plastic plating process, so it is no longer necessary to replace the jig during plating, and it has become clear that the cost of plastic plating can be significantly reduced. Ta. Another great effect is that the scratches and poor plating adhesion that occur when replacing hooks are eliminated, and the defective rate can be greatly reduced.
Claims (1)
漬した後プラスチツク成形品を装着しメツキをほ
どこすことを特徴とするプラスチツクのメツキ方
法。 2 含硫黄有機化合物がスルフイド化合物である
ことを特徴とする特許請求の範囲第1項記載のメ
ツキ方法。 3 含硫黄有機化合物がメルカプト化合物である
ことを特徴とする特許請求の範囲第1項記載のメ
ツキ方法。 4 含硫黄有機化合物溶液の溶媒が水溶性である
ことを特徴とする特許請求の範囲第1項記載のメ
ツキ方法。[Scope of Claims] 1. A method for plating plastic, which comprises immersing a plating jig in a solution of a sulfur-containing organic compound, then attaching a plastic molded article and applying plating. 2. The plating method according to claim 1, wherein the sulfur-containing organic compound is a sulfide compound. 3. The plating method according to claim 1, wherein the sulfur-containing organic compound is a mercapto compound. 4. The plating method according to claim 1, wherein the solvent of the sulfur-containing organic compound solution is water-soluble.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18591683A JPS6077994A (en) | 1983-10-06 | 1983-10-06 | Method for plating plastic |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18591683A JPS6077994A (en) | 1983-10-06 | 1983-10-06 | Method for plating plastic |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6077994A JPS6077994A (en) | 1985-05-02 |
JPS6160156B2 true JPS6160156B2 (en) | 1986-12-19 |
Family
ID=16179119
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18591683A Granted JPS6077994A (en) | 1983-10-06 | 1983-10-06 | Method for plating plastic |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6077994A (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006316350A (en) * | 2005-04-13 | 2006-11-24 | Hitachi Chem Co Ltd | Pretreatment liquid for electroless nickel plating, and pretreatment method to electroless nickel plating |
JP4308288B2 (en) | 2007-09-10 | 2009-08-05 | 新日本製鐵株式会社 | Outlet structure of melting furnace and repair method |
US9506150B2 (en) * | 2014-10-13 | 2016-11-29 | Rohm And Haas Electronic Materials Llc | Metallization inhibitors for plastisol coated plating tools |
FR3027923B1 (en) * | 2014-11-04 | 2023-04-28 | Pegastech | METALLIZATION PROCESS FOR PLASTIC PARTS |
EP3059277B2 (en) * | 2015-02-23 | 2022-03-30 | MacDermid Enthone Inc. | Inhibitor composition for racks when using chrome free etches in a plating on plastics process |
EP3228729A1 (en) * | 2016-04-04 | 2017-10-11 | COVENTYA S.p.A. | Process for metallization of an article having a plastic surface avoiding the metallization of the rack which fixes the article within the plating bath |
-
1983
- 1983-10-06 JP JP18591683A patent/JPS6077994A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6077994A (en) | 1985-05-02 |
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