JPS6159339U - - Google Patents
Info
- Publication number
- JPS6159339U JPS6159339U JP14625284U JP14625284U JPS6159339U JP S6159339 U JPS6159339 U JP S6159339U JP 14625284 U JP14625284 U JP 14625284U JP 14625284 U JP14625284 U JP 14625284U JP S6159339 U JPS6159339 U JP S6159339U
- Authority
- JP
- Japan
- Prior art keywords
- drying tank
- air
- carrier
- fan
- exhaust gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001035 drying Methods 0.000 claims description 8
- 239000007921 spray Substances 0.000 claims 1
- 238000007664 blowing Methods 0.000 description 1
- 239000012050 conventional carrier Substances 0.000 description 1
Landscapes
- Drying Of Solid Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14625284U JPS6159339U (ko) | 1984-09-25 | 1984-09-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14625284U JPS6159339U (ko) | 1984-09-25 | 1984-09-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6159339U true JPS6159339U (ko) | 1986-04-21 |
Family
ID=30704491
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14625284U Pending JPS6159339U (ko) | 1984-09-25 | 1984-09-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6159339U (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011009677A (ja) * | 2009-05-28 | 2011-01-13 | Kyocera Corp | 半導体ウエハ処理方法および半導体ウエハ乾燥装置 |
-
1984
- 1984-09-25 JP JP14625284U patent/JPS6159339U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011009677A (ja) * | 2009-05-28 | 2011-01-13 | Kyocera Corp | 半導体ウエハ処理方法および半導体ウエハ乾燥装置 |