JPS6154063A - Method for processing surface of capstan - Google Patents

Method for processing surface of capstan

Info

Publication number
JPS6154063A
JPS6154063A JP17510784A JP17510784A JPS6154063A JP S6154063 A JPS6154063 A JP S6154063A JP 17510784 A JP17510784 A JP 17510784A JP 17510784 A JP17510784 A JP 17510784A JP S6154063 A JPS6154063 A JP S6154063A
Authority
JP
Japan
Prior art keywords
capstan
liquid
electrolytic
tape
nitric acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17510784A
Other languages
Japanese (ja)
Inventor
Hiroshi Kato
浩 加藤
Hitoshi Nakada
仁 仲田
Masaru Sekine
関根 勝
Takuji Inanaga
稲永 卓二
Tsutomu Kayama
賀山 勉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pioneer Corp
Original Assignee
Pioneer Electronic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Electronic Corp filed Critical Pioneer Electronic Corp
Priority to JP17510784A priority Critical patent/JPS6154063A/en
Publication of JPS6154063A publication Critical patent/JPS6154063A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve the performance of a capstan by carrying out an electrolytic etching of a stainless-made capstan in an electrolytic liquid mixed with a depression liquid on the basis of nitric acid. CONSTITUTION:An electrolytic liquid 3 is based on nitric acid and a mixed liquid with chromic acid is used as a depression liquid. Aside from chormic acid, triethanol amine or urea is used as a depression liquid. Firstly, a stainless-made capstan 6 is set by a crip 7 as a cathod 5. Secondly, a current is flown from a power source in an electrolytic liquid mixed with a depression liquid on the basis of nitric for electrolytic etching on the peripheral surface of the capstan 6. After the electrolytic etching, the captan 6 is washed before drying. By such a method for surface processing, a constant and micro roughened surface is formed on the surface of the capstan to decrease a wow, flatter phenomenon, eliminate a flutter echo at a tape and make possible manufacturing.

Description

【発明の詳細な説明】 〔発明の技術的分野〕 この発明は、キャプスタンの表面を良好な粗面に加工で
きるキャプスタンの表面加工方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a capstan surface processing method that can process the surface of a capstan to a good roughness.

〔発明の技術的背景およびその問題点〕テープレコーダ
に用いるキャプスタンは、通常、ステンレスを材料とし
て形成されている。ところが、テープをピンチローラと
協動して走行させるのには、例えば第1図に示すように
キャプスタンaの周面に粗面alを形成してピンチロー
ラCを定速走行させ、ワウ・フラッグを減少する努力が
なされている。この際、キャプスタンaの粗面a1の形
成状態を荒くすると、摩擦力が増大してワウ・フラッグ
を減少させテープCが走行するが、スリップによりテー
プCに鳴きと称する異常音が生ずる0反対にキャプスタ
ンaの粗面a1の形成度合を疎にすると、スリップによ
り、テープCが定速走行しなくなり、ワウ・フラッグが
悪化する。
[Technical background of the invention and its problems] Capstans used in tape recorders are usually made of stainless steel. However, in order to run the tape in cooperation with the pinch roller, for example, as shown in FIG. Efforts are being made to reduce flags. At this time, if the rough surface a1 of the capstan a is roughened, the frictional force will increase, the wah flag will decrease, and the tape C will run, but the slip will cause the tape C to make an abnormal sound called squealing. If the degree of formation of the rough surface a1 of the capstan a is made sparse, the tape C will no longer run at a constant speed due to slip, and the wow flag will worsen.

ところで、キャプスタンaの従来の表面加工方法は、機
械加工後、表面の粗化を液体ホーニングで行うものであ
った。
By the way, the conventional surface processing method for capstan a is to roughen the surface by liquid honing after machining.

しかしながら上記従来の表面加方法ではキャプスタンa
の周面に形成する粗面alの形成度合が大きく、表面が
荒れ過ぎるため、テープCへの摩擦力が大きくなって引
張力が増加することによりワウ・フラッタが少なくなる
が、テープCのリバース時等、テープCの走行方向が急
激に反対状態に変化する操作時にテープCとキャプスタ
ンaとの摩擦力でテープCに鳴きと称する異常音が生ず
ることがあった。
However, in the conventional surface finishing method described above, the capstan a
Since the degree of formation of rough surface Al on the circumferential surface of Tape C is large and the surface is too rough, the frictional force against Tape C increases and the tensile force increases, which reduces wow and flutter, but the reverse of Tape C At times, when the running direction of the tape C suddenly changes to the opposite state, the frictional force between the tape C and the capstan a sometimes causes the tape C to make an abnormal sound called squealing.

〔発明の目的〕[Purpose of the invention]

本発明は上述の如き点に鑑みてなされたものでありその
目的とするところは、硝酸をベースとして抑制液を混合
した電解液中で電解エツチングを施こすもので、ステン
レス製のキャプスタンの表面にエツチング液に対する酸
化被膜を形成するものであるから均一に且つ微小な粗面
を形成することができ、以ってワウ・フラッグ現象を少
なくしてテープの鳴き現象をな(し、しかも一度に多量
の加工が行えるのでコストが安価なキャプスタンの表面
加工方法を提供するのにある。
The present invention has been made in view of the above-mentioned points, and its purpose is to perform electrolytic etching on the surface of a stainless steel capstan in an electrolytic solution containing a nitric acid base and a suppressing solution. Since it forms an oxide film against the etching solution, it can form a uniform and finely roughened surface, thereby reducing the wow/flag phenomenon and eliminating the tape squeal phenomenon. An object of the present invention is to provide a capstan surface processing method that is inexpensive because it can perform a large amount of processing.

本発明は硝酸をベースとしてその酸化作用を抑制するた
めの抑制液を混合した電解液中での陰極に、ステンレス
製のキャプスタンを取付けて電解エツチングを行うこと
を基本的特徴とする。
The basic feature of the present invention is that electrolytic etching is carried out by attaching a stainless steel capstan to the cathode in an electrolytic solution containing nitric acid as a base and mixed with an inhibitor for suppressing its oxidation action.

〔発明の実施例〕[Embodiments of the invention]

以下本発明の詳細を第2図に従って使用する装置1とと
もに説明する。
The details of the invention will be explained below along with the device 1 used according to FIG.

2は浴槽、3は浴槽2内に入れられた電解液であり、こ
の電解液3は硝酸(HNO3)をベースとして、之に抑
制液(インヒビター剤)としてのクロム酸(CrO])
との混合溶液を用いる。硝酸は例えば60%溶液に水で
希釈して25〜35%熔液のものを用いる。クロム酸は
例えば水10     ’Qccに対して1〜2g程度
、混入した希釈液を用いる。前記抑制液としては例えば
水100ccに対して1〜10g混入したトリエタノー
ルアミンの希釈液や、水100cc中に尿素0.5〜1
gを混入した希釈液を用いる。
2 is a bathtub, and 3 is an electrolytic solution placed in the bathtub 2. This electrolytic solution 3 is based on nitric acid (HNO3), and also contains chromic acid (CrO] as an inhibitor agent).
Use a mixed solution with The nitric acid used is, for example, a 60% solution diluted with water and a 25 to 35% solution. For example, a diluted solution containing about 1 to 2 g of chromic acid per 10 Qcc of water is used. The inhibitory liquid may be, for example, a diluted solution of triethanolamine mixed in 1 to 10 g per 100 cc of water, or a diluted solution of urea of 0.5 to 1 g per 100 cc of water.
Use a diluted solution containing g.

4は陽極で、5は処理すべき、ステンレス製のキャプス
タン6をセット固定するためのクリップ7を備えた陰極
である。前記陽極4は、例えば処理すべきキャプスタン
6と同質材で形成するか又は鉛(P b)を用いる。8
は電源であり、この電源8は定電流電源のものを用いる
4 is an anode, and 5 is a cathode provided with a clip 7 for setting and fixing a capstan 6 made of stainless steel to be processed. The anode 4 may be made of the same material as the capstan 6 to be treated, or may be made of lead (Pb). 8
is a power supply, and this power supply 8 is a constant current power supply.

先ず、第1工程として、ステンレス製の例えば5US−
420−J2のキャプスタン6をクリップ7にて陰極5
としてセットし、 第2工程として硝酸をベースとして抑制液を混合した電
解溶液中で電源8から電流を流して陰極5とし−てセッ
トしたキャプスタン6の周面に電解エツチングを行う。
First, as a first step, a stainless steel plate, for example 5US-
Connect the capstan 6 of 420-J2 to the cathode 5 with the clip 7.
As a second step, a current is applied from a power source 8 in an electrolytic solution containing a nitric acid base mixed with a suppressing solution to perform electrolytic etching on the circumferential surface of the capstan 6, which is set as the cathode 5.

第3工程としては電解エツチングを行った前記キャプス
タン6を水洗し、その後、乾燥させる。
In the third step, the electrolytically etched capstan 6 is washed with water and then dried.

次に本発明の一実施例を説明する。Next, one embodiment of the present invention will be described.

先ず、クリップ7にて5US−420−J2を用いて形
成したキャプスタン6を浴槽2中の陰極4にセット固定
する0次いで60%の濃度の硝酸(HNO3)水を入れ
て濃度25〜35%に希釈したものをベースとして、之
に100ccの水に1〜2 (g)添加した濃度のクロ
ム酸(、CrOコ)を50:50の比率で混入した電解
液中で、電源8から処理すべきキャプスタン6に対して
1本当り、0.08〜0.1(A)の定電流を前記電解
液3の液温か25〜35°Cの下で、5〜6秒、通電す
ることにより電解エツチングを行う。その後、キャプス
タン6をクリップ7から取り外し、水槽中での水で2〜
3秒程度、水洗し、それから流水中で超音波を用いて2
〜3秒間、超音波水洗を行う。
First, set and fix the capstan 6 formed using 5US-420-J2 on the cathode 4 in the bathtub 2 using the clip 7. Then, add nitric acid (HNO3) water with a concentration of 60% to a concentration of 25 to 35%. Chromic acid (CrO) with a concentration of 1 to 2 (g) added to 100 cc of water is mixed in an electrolytic solution at a ratio of 50:50, and processed from the power supply 8. By applying a constant current of 0.08 to 0.1 (A) to each capstan 6 for 5 to 6 seconds at the temperature of the electrolytic solution 3 of 25 to 35 ° C. Perform electrolytic etching. After that, remove the capstan 6 from the clip 7 and soak it in water in an aquarium.
Rinse with water for about 3 seconds, then use ultrasonic waves under running water to
Perform ultrasonic water washing for ~3 seconds.

このように水洗作業を2回に分けたのは、水洗作業を確
実になして、必要以外の不純物をキャプスタン6から洗
い出すためである。
The reason why the water washing work is divided into two steps is to ensure that the water washing work is carried out reliably and to wash out unnecessary impurities from the capstan 6.

このように硝酸(HNO3)をベースとした電解溶液中
で陰極5としてセット固定されることにより電解エツチ
ングされた5US−420−J2製のキャプスタン6の
周面は微小で且つ均一の粗面6aが形成されるから、キ
ャプスタン6とピンチローラ(ゴムローラ)牛の協動作
用によりテープを定速走行でき、ワウ・フラッグを少な
くできるとともにリバース操作時のようにテープの走行
方向が急激に反対快感になった場合にテープとキャプス
タン6との摩擦でも鳴きと称する異常音が生じない、ま
た、キャプスタン6の周面に電解エツチングにより微小
で且つ均一の粗面6aが形成されるのは、処理すべきキ
ャプスタン6を陽極4とは異なって陰極5としてセット
固定することによりエツチング液としての硝酸(HNO
3)の働きを抑え、且つこの硝酸(HNO3)に混合し
た抑制液としてのクロム酸(CrO3)の作用により、
5O3−420−J 2の大部分の組成原子としての鉄
(Fe)の酸化被膜がキャプスタン6の表面に形成され
ることにより、電解エツチング液としての硝酸(HNO
3)の酸化を抑制し、キャプスタン6の周面を均一に且
つ微小にエツチングするものと考えられる。この場合電
源8による通電時間と電流を変化させることにより、エ
ツチングの度合をコントロールできる。
The peripheral surface of the capstan 6 made of 5US-420-J2, which has been electrolytically etched by being set and fixed as the cathode 5 in an electrolytic solution based on nitric acid (HNO3), has a minute and uniform rough surface 6a. is formed, so the tape can be run at a constant speed by the cooperation between the capstan 6 and the pinch roller (rubber roller), reducing wow flags and causing the tape to suddenly change direction in the opposite direction, such as during reverse operation. In this case, the friction between the tape and the capstan 6 does not cause abnormal noise called squealing, and the fine and uniform rough surface 6a is formed on the circumferential surface of the capstan 6 by electrolytic etching. By setting and fixing the capstan 6 to be treated as a cathode 5, different from the anode 4, nitric acid (HNO) is used as an etching solution.
3), and by the action of chromic acid (CrO3) as a suppressing liquid mixed with this nitric acid (HNO3),
5O3-420-J2 An oxide film of iron (Fe), which constitutes most of the atoms, is formed on the surface of the capstan 6, so that nitric acid (HNO) as an electrolytic etching solution is
It is thought that the oxidation of 3) is suppressed and the peripheral surface of the capstan 6 is etched uniformly and minutely. In this case, the degree of etching can be controlled by changing the energization time and current from the power source 8.

なお上記実施例では硝酸(HNO3)に対する抑制液と
してクロム酸(CrO3)を用いているが、抑制剤とし
てはクロム酸のほかに100ccの水に1〜Log程度
、添加したトリエタノールアミンや100ccの水に0
.5〜1g程度、添加した尿素溶液も使用される。しか
も上記実施例では陰極エツチングを行い、キャプスタン
6の粗面6aを均一に且つ微小に加工しているが、陽極
4にキャプスタン6を装着して同一の電解液3でエツチ
ングできることは云うまでもない。
In the above example, chromic acid (CrO3) is used as an inhibitor against nitric acid (HNO3), but in addition to chromic acid, triethanolamine added to 100 cc of water at a concentration of about 1 to Log and 100 cc of water are also used as inhibitors. 0 in water
.. A urea solution to which about 5 to 1 g is added is also used. Moreover, in the above embodiment, the rough surface 6a of the capstan 6 is processed uniformly and minutely by cathode etching, but it goes without saying that the capstan 6 can be attached to the anode 4 and etched using the same electrolyte 3. Nor.

〔発明の効果〕〔Effect of the invention〕

上述のように本発明は、硝酸をベースとした抑制液を混
合した電解液中で電解エツチングを行うものであるから
、ステンレス製のキャプスタンの表面にエツチングの抵
抗となる酸化被膜が形成されることにより、キャプスタ
ンの周面には硝酸をエツチング液のベースとした電解エ
ツチングにより均一に且つ微小な粗面が形成される。従
って殿械加工後に液体ホーニングを行っていた従来のキ
ャプスタンの表面加工法とは異なり、ピンチ・ローラと
協動してテープを定速走行させることができ、ワウ・フ
ラツグをなくすことができるとともにいわゆるテープの
鳴き現象を一掃でき、さらには一度に多量の加工が行え
るので安価となる。
As described above, since the present invention performs electrolytic etching in an electrolytic solution mixed with a nitric acid-based inhibitor, an oxide film is formed on the surface of the stainless steel capstan to resist etching. As a result, a uniform and finely roughened surface is formed on the circumferential surface of the capstan by electrolytic etching using nitric acid as a base etching solution. Therefore, unlike the conventional capstan surface processing method that performs liquid honing after machining, the tape can be run at a constant speed in cooperation with a pinch roller, eliminating wow and flagging. The so-called tape squealing phenomenon can be eliminated, and since a large amount of processing can be done at once, it is inexpensive.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、キャプスタンとピンチローラでテープを走行
させる状態の従来例を示す斜面図、第2図は本発明を実
施するのに使用する装置の一例を示した斜面図である。 1・・・装置、2・・・浴槽、3・・・電解液、4・・
・陽極、5・・・陰極、6・・・キャプスタン、6a・
・・粗面、7・・・クリップ、8・・・電源。
FIG. 1 is a perspective view showing a conventional example in which a tape is run using a capstan and a pinch roller, and FIG. 2 is a perspective view showing an example of an apparatus used to carry out the present invention. 1... Apparatus, 2... Bathtub, 3... Electrolyte, 4...
・Anode, 5...Cathode, 6...Capstan, 6a・
...Rough surface, 7...Clip, 8...Power supply.

Claims (3)

【特許請求の範囲】[Claims] (1)ステンレス製のキャプスタンを硝酸をベースにし
て抑制液を混合した電解液中で電解エッチングを行うこ
とを特徴とするキャプスタンの表面加工方法。
(1) A capstan surface processing method characterized by electrolytically etching a stainless steel capstan in an electrolytic solution containing a nitric acid-based electrolyte and a suppressing solution.
(2)前記抑制液がクロム酸溶液であることを特徴とし
た特許請求の範囲第1項記載のキャプスタンの表面加工
方法。
(2) The capstan surface processing method according to claim 1, wherein the suppressing liquid is a chromic acid solution.
(3)前記抑制液がトリエタノールアミン又は尿素であ
ることを特徴とした特許請求の範囲第1項記載のキャプ
タスンの表面加工方法。
(3) The method for surface processing captason according to claim 1, wherein the inhibitory liquid is triethanolamine or urea.
JP17510784A 1984-08-24 1984-08-24 Method for processing surface of capstan Pending JPS6154063A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17510784A JPS6154063A (en) 1984-08-24 1984-08-24 Method for processing surface of capstan

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17510784A JPS6154063A (en) 1984-08-24 1984-08-24 Method for processing surface of capstan

Publications (1)

Publication Number Publication Date
JPS6154063A true JPS6154063A (en) 1986-03-18

Family

ID=15990380

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17510784A Pending JPS6154063A (en) 1984-08-24 1984-08-24 Method for processing surface of capstan

Country Status (1)

Country Link
JP (1) JPS6154063A (en)

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