JPS61502402A - Sensitization method for oxidation/reduction photoreaction catalyst and photoreaction catalyst - Google Patents
Sensitization method for oxidation/reduction photoreaction catalyst and photoreaction catalystInfo
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- JPS61502402A JPS61502402A JP60501479A JP50147985A JPS61502402A JP S61502402 A JPS61502402 A JP S61502402A JP 60501479 A JP60501479 A JP 60501479A JP 50147985 A JP50147985 A JP 50147985A JP S61502402 A JPS61502402 A JP S61502402A
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- 239000003054 catalyst Substances 0.000 title claims description 37
- 230000003647 oxidation Effects 0.000 title claims description 19
- 238000007254 oxidation reaction Methods 0.000 title claims description 19
- 238000000034 method Methods 0.000 title claims description 16
- 206010070834 Sensitisation Diseases 0.000 title claims description 8
- 230000008313 sensitization Effects 0.000 title claims description 8
- 150000003839 salts Chemical group 0.000 claims description 17
- 239000007788 liquid Substances 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 12
- 239000011941 photocatalyst Substances 0.000 claims description 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 10
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 9
- 239000003446 ligand Substances 0.000 claims description 7
- 238000006303 photolysis reaction Methods 0.000 claims description 6
- 238000009835 boiling Methods 0.000 claims description 5
- -1 iron complex salt Chemical class 0.000 claims description 5
- 238000007539 photo-oxidation reaction Methods 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 239000007864 aqueous solution Substances 0.000 claims description 4
- 230000001235 sensitizing effect Effects 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical group [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 230000031700 light absorption Effects 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 229910052723 transition metal Inorganic materials 0.000 claims description 3
- 150000003624 transition metals Chemical class 0.000 claims description 3
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical group N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 claims description 2
- 230000002378 acidificating effect Effects 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 239000012634 fragment Substances 0.000 claims 3
- ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 2,3-dimethylbutane Chemical group CC(C)C(C)C ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 0.000 claims 2
- 239000012266 salt solution Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 10
- 239000000243 solution Substances 0.000 description 9
- 239000002245 particle Substances 0.000 description 8
- 238000006722 reduction reaction Methods 0.000 description 8
- 239000000725 suspension Substances 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000015843 photosynthesis, light reaction Effects 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910052724 xenon Inorganic materials 0.000 description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 3
- 239000004904 UV filter Substances 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000007809 chemical reaction catalyst Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000003100 immobilizing effect Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 238000005199 ultracentrifugation Methods 0.000 description 2
- 229910017146 AlTl Inorganic materials 0.000 description 1
- 101100522123 Caenorhabditis elegans ptc-1 gene Proteins 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 239000012327 Ruthenium complex Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000000502 dialysis Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000007540 photo-reduction reaction Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical group C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K9/00—Tenebrescent materials, i.e. materials for which the range of wavelengths for energy absorption is changed as a result of excitation by some form of energy
- C09K9/02—Organic tenebrescent materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/40—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
- B01J23/46—Ruthenium, rhodium, osmium or iridium
- B01J23/462—Ruthenium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/02—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen
- C01B3/04—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by decomposition of inorganic compounds, e.g. ammonia
- C01B3/042—Decomposition of water
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/36—Hydrogen production from non-carbon containing sources, e.g. by water electrolysis
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/10—Process efficiency
- Y02P20/133—Renewable energy sources, e.g. sunlight
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Combustion & Propulsion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Catalysts (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるため要約のデータは記録されません。 (57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】 酸化/還元光反応触媒の増感方法および光反応触媒 この発明は半導体系酸化/還元光反応触媒の増感方法、これによって得られた光 反応触媒及び可視光線中の水性又は水性有機液体の光酸化若しくは水性液体の光 分解用の上記光反応触媒の利用に関する。[Detailed description of the invention] Sensitization method for oxidation/reduction photoreaction catalyst and photoreaction catalyst This invention describes a method for sensitizing semiconductor-based oxidation/reduction photocatalysts, and the light obtained by this method. Photo-oxidation of reaction catalysts and aqueous or aqueous organic liquids in visible light or light of aqueous liquids The present invention relates to the use of the above photoreaction catalyst for decomposition.
その目的のひとつは水素の光反応による製造である。One of its purposes is the production of hydrogen by photoreaction.
この発明の主題は請求の範囲に記載されている。The subject matter of the invention is defined in the claims.
光電気化学セル若しくは水素の光化学発生器、特に太陽エネルギー変換に基づく 装置で遭遇する当面の問題は、このエネルギー変換の効率である。この問題を克 服するため現在、光反応染料による光反応触媒表面の改質、上記光反応触媒の適 当な物質によるドーピングなど、さまざまな解決方法が提案されている。Photoelectrochemical cells or photochemical generators of hydrogen, especially based on solar energy conversion The immediate problem encountered with the device is the efficiency of this energy conversion. overcome this problem Currently, in order to meet the requirements of Various solutions have been proposed, including doping with suitable substances.
水性液体の光分解などの用途で太陽エネルギー変換効率の問題を解決するため、 可視光線領域内若しくはその近傍に光吸収帯域を有する光反応触媒に着目するこ とは興味深い。チタニウムと8−ヒドロキシキノリンの錯塩を使用して酸化チタ ン(TiO2)の錯塩を形成し、酸化チタン粒子を可視光線中で利用できるよう にこれら粒子を増感できる〔これに関連する。 J、Am、Chem、Soc、 105 、5695(1983)参照〕。To solve the problem of solar energy conversion efficiency in applications such as photolysis of aqueous liquids, Focusing on photoreaction catalysts that have a light absorption band within or near the visible light range. That's interesting. Titanium oxide using a complex salt of titanium and 8-hydroxyquinoline Forms a complex salt of titanium oxide (TiO2) and makes titanium oxide particles available in visible light. These particles can be sensitized to [related to this]. J, Am, Chem, Soc, 105, 5695 (1983)].
しかしこの種類の光反応触媒の利用は、水の光分解により酸素を製造できないと いうことにより制約される。However, the use of this type of photocatalyst requires that oxygen cannot be produced by photolysis of water. It is limited by what you say.
この発明の目的は、可視光線中で水性液体を光分解して、満足できる効率で、水 素と酸素の発生を可能にする増感光反応触媒を提供するにある。これは請求範囲 に示した方法により、半導体系酸化/還元光触媒を増感することにより得られる 。It is an object of this invention to photolyze aqueous liquids in visible light to produce water with satisfactory efficiency. The object of the present invention is to provide a sensitized photoreaction catalyst that enables the generation of hydrogen and oxygen. This is the scope of claim Obtained by sensitizing a semiconductor-based oxidation/reduction photocatalyst using the method shown in .
驚ろくべきことに、酸化チタンなどの半導体系酸化/還元光触媒の表面に例えば ビピリジル若しくはフェナンスロイルタイプの配位子と遷移金属との錯塩の一部 からなるクロモフォール(Chromophore)を固定することにより所望 の効果が得られることが見出された。Surprisingly, on the surface of semiconductor-based oxidation/reduction photocatalysts such as titanium oxide, for example, Some complex salts of bipyridyl or phenanthroyl type ligands and transition metals By immobilizing Chromophore consisting of It was found that the following effects can be obtained.
この発明によると、最も一般的にはルテニウム。According to this invention, most commonly ruthenium.
クローム若しくは鉄錯塩の一部がら成り、一般式たゾし、記号りは配位子である ジイソプロピル2.ff−ビピリジル−4,4′−ジカルボキシレートを表わし 、この錯塩フラグメントから構成されるのが好ましい。It consists of a part of chromium or iron complex salt, the general formula is tazo, and the symbol is a ligand. Diisopropyl2. ff-bipyridyl-4,4'-dicarboxylate , is preferably composed of this complex salt fragment.
このタイプのクロモフォールは光反応触媒の使用状態で完全に安定であり、光反 応触媒の光吸収をシフトさせて600n’mを越える範囲にまで拡大した。This type of chromophol is completely stable under conditions of use as a photocatalyst; The light absorption of the reaction catalyst was shifted to extend beyond 600 nm.
か\るクロモフォールの安定性は錯塩フラグメントRuL′++ のチタン酸化物粒子表面への化学的な固定、より正確には以下に示す: (L=ニジイソプロピル、2′−ビピリジル−4,4′−ジカルボキシレート〕 のRu −0−Ti結合の形成により説明できる。The stability of chromofol is determined by the complex salt fragment RuL'++ chemical fixation on the surface of titanium oxide particles, more precisely: (L=nidiisopropyl, 2'-bipyridyl-4,4'-dicarboxylate) This can be explained by the formation of a Ru-0-Ti bond.
このようにして増感された光反応触媒は、水性若しくは水性有機液体に590乃 至665nmの波長で光線を照射して、満足すべき効率で水素の入手を可能にす ることが分った。それぞれ水素と酸素を与える水の光分解も同じく効率よく行な われるようになった。The photoreaction catalyst sensitized in this way can be added to an aqueous or aqueous organic liquid at a temperature of 590°C. Irradiation with light at wavelengths up to 665 nm makes it possible to obtain hydrogen with satisfactory efficiency. It turns out that Photolysis of water, which yields hydrogen and oxygen, respectively, is also carried out efficiently. It started to get worse.
この発明によると、光反応触媒は任意の適当な方法によって、半導体の表面に選 択されたタロモフォールを固定することにより増感される。この発明)こよる方 法のひとつの望ましい実施方法では、光反応触媒は、一般式 %式% たゾし、Lは上記の通りで、Xはたとえば塩素などのハロゲン原子を表わし、こ の錯塩の酸性水溶液の存在下で光線照射される。According to the invention, the photoreaction catalyst is selected on the surface of the semiconductor by any suitable method. Sensitization is achieved by immobilizing selected talomofol. This invention) In one preferred implementation of the method, the photoreaction catalyst has the general formula %formula% , L is as above, and X represents a halogen atom such as chlorine; is irradiated with light in the presence of an acidic aqueous solution of the complex salt.
Tie、系の酸化/還元触媒は文献に説明された方法で有利に調製できる。上述 の錯塩の溶液は市販品力)ら入手できる′。Tie-based oxidation/reduction catalysts can be advantageously prepared by methods described in the literature. mentioned above A solution of the complex salt of is available commercially.
光照射のため、選択された量の触媒が、錯塩のそれぞれの場合に応じて0,5乃 至5X10−’モル程度の稀釈水溶液中に懸濁される。もし必要であれば、酸を 添加して一般に1−3の範囲の規定値に溶液の2口が調整される。この方法は約 1.5 X 10−’モルの錯塩濃度で約2のpH値で実施されるのが好まし7 い。実際の光照射前に、設備はたとえばアルゴンなどの不活性ガスでガス抜きさ れる。このようにして調製された懸濁液が選択された温度、ごく一般的には50 ℃と沸点との間の賜度に加熱される。操作温度は約100℃が好ましい。光照射 は研究室で一般に慣用される紫外線([1”yJ:rなど通常の手段で実施され る。照射は実際上、最初に溶解された錯塩がすべて消失するまで、一般に24時 間以上継絖される。For photoirradiation, the selected amount of catalyst is 0.5 to Suspended in a dilute aqueous solution on the order of 5 x 10-' molar. If necessary, add acid Two portions of the solution are adjusted to a specified value, generally in the range of 1-3, by addition. This method is about It is preferably carried out at a pH value of about 2 with a complex salt concentration of 1.5 x 10-' molar. stomach. Before the actual light irradiation, the equipment is degassed with an inert gas, e.g. argon. It will be done. The suspension thus prepared is heated to a selected temperature, most commonly 50°C. It is heated to a temperature between °C and the boiling point. The operating temperature is preferably about 100°C. light irradiation is carried out by the usual means commonly used in laboratories, such as ultraviolet light ([1”yJ:r). Ru. Irradiation is generally carried out for 24 hours until all initially dissolved complex salts have disappeared. It is connected for more than a while.
このようにして増感された光反応触媒が例えば濾過若しくは超遠心分mなどの方 法で捕集し、精製され、最後に従来の方法で乾燥される。経験によるとこのタイ プの光酸化触媒は数週間も使用状態で安定して効果を発揮する。The photoreaction catalyst sensitized in this way can be used, for example, by filtration or ultracentrifugation. It is collected by a method, purified and finally dried by a conventional method. According to experience this Thailand The photo-oxidation catalyst in the photooxidation catalyst remains stable and effective for several weeks.
この発明によると、このタイプの増感光反応触媒は可視光線中で水性液体を照射 することにより水素ガスの発生に有利に利用できる。これは、例えばトリエタノ ールアミンの稀釈水溶液などの水性有機液体の光酸化を実施することにより行な われ、例えば、この有機化合物は電子を放出するドナーのような作用を示す。According to this invention, this type of sensitized photocatalyst irradiates an aqueous liquid in visible light. By doing so, it can be advantageously used to generate hydrogen gas. This is for example trietano This is done by carrying out photooxidation of an aqueous organic liquid, such as a dilute aqueous solution of amine. For example, this organic compound acts like a donor that releases electrons.
このタイプの触媒はそれぞれ酸素と水素を与えるため可視光線中で照射して、例 えば蒸溜水など水性液体の光分解に有利に利用できる。This type of catalyst can be irradiated in visible light to give oxygen and hydrogen respectively, e.g. For example, it can be advantageously used for photolysis of aqueous liquids such as distilled water.
上述の場合に、照射は4001mより大きい、例えば450 n m 、 50 0 n mあるいはそれ以上のオーダの波長の光を利用して有利に行なえる。さ らに上記の照射は最も一般的には例えば光反応触媒の増感に使用されるのと同様 な設備中で、選択された水性液体の沸点で行なわれる。In the above case, the irradiation is greater than 4001 m, e.g. 450 nm, 50 nm This can be advantageously carried out using light having a wavelength on the order of 0 nm or more. difference Moreover, the above-mentioned irradiations are most commonly used for example in the sensitization of photocatalysts. The process is carried out in suitable equipment at the boiling point of the selected aqueous liquid.
以下の実施例はこの発明を実施するいくつかの方法の詳細を説明している。これ ら実施例はいかなる実施例1 酸化チタン系酸化/還元触媒の増感 a)触媒の調製 (T iO,/P t/Rub、)出発材料ニ ー(RuLΩCal、(L=ニジインプロピル、2′−ビピリジル−4,4′− ジカルボキシレート) 、 J、Am、Chem、Soc。The following examples provide details of several ways to practice the invention. this Example 1 Sensitization of titanium oxide based oxidation/reduction catalysts a) Preparation of catalyst (TiO,/Pt/Rub,) starting materials -(RuLΩCal, (L=nidiumpropyl, 2'-bipyridyl-4,4'- dicarboxylate), J, Am, Chem, Soc.
υ1,5695(1983月こより調製−Tie、(アナターゼ、 Nb含有量 約600 ppm。υ1,5695 (prepared from March 1983 - Tie, (anatase, Nb content Approximately 600 ppm.
主結晶サイズ100A、 BET 145 d/f)−TiC1,、J、Am、 Chem、Soc、 105. 6547(1983)により真空蒸溜により精 製 第一ステップはドーピングレベルで0.1%(7)Nbを与えるため、計算され た所定量のNbC1,の存在下に、0℃の水中で、一定量のT i Cl、を加 水分解することであった。加水分解された溶液(pf(0,5)はpHが2に達 するまで透析された。Main crystal size 100A, BET 145 d/f)-TiC1,, J, Am, Chem, Soc, 105. Purified by vacuum distillation according to 6547 (1983) made The first step is calculated to give a doping level of 0.1%(7)Nb. In the presence of a predetermined amount of NbCl, in water at 0°C, a certain amount of TiCl was added. It was to decompose water. The hydrolyzed solution (pf(0,5) reaches pH 2. Dialysis was performed until
次にH,PtC1,とRub4がこのようにして調製された酸性溶液にそれぞれ 添加され、添加量はTie、粒子にそれぞれPtおよびRub、 0.5%の含 有量を与えるよう算定される。得られた溶液を続いて60℃で乾固し、残留物が この温度に24時間保持された。この操作段階で、Rub、のRu0tへの瞬間 的な分解が観察された(黒色の沈澱物〕。Next, H, PtC1, and Rub4 were added to the acidic solution prepared in this way, respectively. The added amount is Tie, and the particles contain Pt and Rub, respectively, 0.5%. It is calculated to give a certain amount. The resulting solution was subsequently dried at 60°C until the residue This temperature was maintained for 24 hours. At this operation stage, the moment of Rub, to Ru0t Decomposition was observed (black precipitate).
このようにして得られた乾燥残留物50ηが水25#!eに懸濁され、懸濁物を まずアルゴンでガス抜きした後、照射した(キセノンランプno 450ワツト )。50η of the dry residue thus obtained is 25# of water! e, the suspension is suspended in First, after degassing with argon, it was irradiated (xenon lamp no. 450 watts). ).
ヘキサクロロプラチネートアニオンの還元力、J、AlTl。Reducing power of hexachloroplatinate anion, J, AlTl.
Ghem、 Soc、旦0 、4318(1978) に説明された方法にした がって実施され、照射は約30分後に、ガス相に水素が発生後たゾちに中止され た。Ghem, Soc, Dan0, 4318 (1978). The irradiation was then stopped after about 30 minutes, as soon as hydrogen was generated in the gas phase. Ta.
b)触媒の増感(Tie、/Pc/Rub、 )ルテニウム錯塩(RuL&)C 1,が3節で得られた触媒懸濁物(50■)1こ添加された。添加砒は1.5X 10’物のpH値はHCljこより2に調整される。b) Catalyst sensitization (Tie, /Pc/Rub, ) Ruthenium complex salt (RuL&)C 1, was added to the catalyst suspension (50 cm) obtained in Section 3. Added arsenic is 1.5X The pH value of the 10' product is adjusted to 2 using HClj.
得られた懸濁物を入れた50ゴの丸底フラスコが凝縮器付きの装置(こ接続され た。凝縮器は毛細管を経て水30aceをふくむ第二番目の容器に接続され、シ ステム全体がアルゴンでガス抜きされた。懸濁物は引き続きかく拌しながら加熱 沸騰させ、紫外線フィルター(420nm)および循環水を収容した二重壁を備 えたキセノンランプ(XBO45Qワット)で照射された。A 50-gallon round-bottomed flask containing the resulting suspension was placed in a device with a condenser (this is connected to Ta. The condenser is connected via a capillary tube to a second container containing 30 ace of water, The entire stem was degassed with argon. The suspension is heated with continued stirring. Boiling, equipped with a double wall containing UV filter (420 nm) and circulating water. It was irradiated with a xenon lamp (XBO45Q Watt).
懸濁物の照射は沸点で24時間継続され、増感された触媒の粒子が超遠心分離に より回収された。照射中、錯塩(RuL3)(:I 2 が徐々に溶液から消失 し、この現象はTiOβtハuO,粒子の濃厚な着色を伴なった。Irradiation of the suspension was continued for 24 hours at the boiling point, and the sensitized catalyst particles were subjected to ultracentrifugation. was recovered from. During irradiation, the complex salt (RuL3) (:I2) gradually disappears from the solution. However, this phenomenon was accompanied by intense coloring of the TiOβt particles.
得られた溶液はその紫外線吸収スペクトル(第1図参照〕を特徴とするものであ るが、この吸収スペクトルから466 n m (5%以下の濃度)における錯 塩(RuLすC1,の典型的な吸収をはゾ完全に消失したことが確認された。3 Q5nmにおける上記溶液の最大吸収率はジイソプロピル2.2’−ビピリジル −4゜4′−ジカルボキシレートの配位子に起因するものであった。The resulting solution is characterized by its ultraviolet absorption spectrum (see Figure 1). However, this absorption spectrum shows that the complex at 466 nm (concentration below 5%) It was confirmed that the typical absorption of the salt (RuL C1) completely disappeared.3 The maximum absorption of the above solution at Q5nm is diisopropyl 2,2'-bipyridyl This was attributed to the -4°4'-dicarboxylate ligand.
クロモフォールRuL2+十の固定は、【(,0およびメタノールによる粒子の 連続洗浄でテストされた。Fixation of chromophor RuL2+ was carried out by [(,0 and Tested with continuous cleaning.
第二番目の実験で水40 d (pH2)中でのTiOβ【/Ru0t触媒25 Hiの懸濁物の照射が100℃で36時間継続された。増感された触媒の粒子を 濾過、水洗。In the second experiment, TiOβ [/Ru0t catalyst 25 in water 40 d (pH 2) Irradiation of the Hi suspension was continued for 36 hours at 100°C. Sensitized catalyst particles Filtration and washing.
空気中で乾燥し、このように精製された触媒はその反射スペクトル(第2図)で 特徴付けられた。このスペクトルは48(lnmで最大で終りが600℃%mを 越えてのびる範囲の吸収率を特徴とする。この特徴的な吸収率は上述の通り、T i02粒子に化学的に結合されたクロモフォールRu Lx”に起因するもので あつた。The catalyst, dried in air and purified in this way, has a reflection spectrum (Figure 2) that shows characterized. This spectrum has a maximum of 48 (lnm) and ends at 600℃%m. It is characterized by an absorption rate that extends beyond. As mentioned above, this characteristic absorption rate is T This is caused by chromophor Ru Lx'' chemically bonded to i02 particles. It was hot.
実施例2 水の光還元に対する増感酸化/還元触媒の利用水中(pH10) にトリエタノ ールアミンをふくむ10−2モル溶液5 yteをRuL7” で増感されたT ie2/Pt/Ru0t触媒119の存在下で実施例1において説明した装置に より25℃で照射した。キセノンランプXBO450’7 ツ) (強度200 mW/cJ ) Ic 、Jl、 ル405nm以上のλで照射。水素ガスが 0.93m//hの割合で発生した。Example 2 Utilization of sensitized oxidation/reduction catalysts for photoreduction of water Trietano in water (pH 10) 5 yte of a 10-2 molar solution containing amine was sensitized with RuL7''. In the apparatus described in Example 1 in the presence of ie2/Pt/Ru0t catalyst 119 It was irradiated at 25°C. Xenon lamp XBO450'7) (Intensity 200 mW/cJ) Ic, Jl, Irradiation with λ of 405 nm or more. hydrogen gas It occurred at a rate of 0.93 m//h.
4650mの紫外線フィルターを利用すると、水素ガス収量の20%低下が観察 された。590 nmより大きいλで照射すると、水素ガスが5oμl/hの割 合で発生した。A 20% decrease in hydrogen gas yield was observed when using a 4650 m UV filter. It was done. When irradiated with λ larger than 590 nm, hydrogen gas is Occurred when
実施例3 水の光分解に対する増感酸化/還元触媒の利用水(pH2)40 mlにRuL t で増感されりTiO2//I)L/Ru0t 触媒50ηの懸濁液を実施例 1で説明した装置内で100℃で照射した。λは4200m Ju上である。水 素ガスは最初30μe/h の割合で発生し、20時間照射後は、400μeの 容積となった。Example 3 Use of sensitized oxidation/reduction catalyst for photolysis of water Add RuL to 40 ml of water (pH 2) An example of a suspension of TiO2//I)L/Ru0t catalyst 50η sensitized with t The irradiation was carried out at 100° C. in the apparatus described in 1. λ is above 4200 m Ju. water The elementary gas is initially generated at a rate of 30 μe/h, and after 20 hours of irradiation, it is generated at a rate of 400 μe/h. It became the volume.
照射中(12時間後に400μlのサンプルを取り出す)ガスのクロマトグラフ 分析では、実質上化学量論的な比率でのガス状混合物は、H,240μl(±2 0)および02(±10 ) 120μeで、残りは空気の存在による補正に起 因するものであることを示した。Gas chromatograph during irradiation (400 μl sample removed after 12 hours) In the analysis, the gaseous mixture in substantially stoichiometric proportions was mixed with H, 240 μl (±2 0) and 02 (±10) 120 μe, the rest is due to correction due to the presence of air. It was shown that this was caused by
増感された触媒が上述の条件下で、100℃で2週間以上照射された後も液性を 示すことも観察された。The sensitized catalyst maintained its liquid properties even after being irradiated for more than two weeks at 100°C under the above conditions. It was also observed that
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GB1506560A (en) * | 1974-03-15 | 1978-04-05 | Ici Ltd | Device |
US4105517A (en) * | 1977-09-30 | 1978-08-08 | Nasa | Solar photolysis of water |
-
1985
- 1985-04-30 US US06/824,694 patent/US4684537A/en not_active Expired - Fee Related
- 1985-04-30 DE DE8585901950T patent/DE3571456D1/en not_active Expired
- 1985-04-30 WO PCT/CH1985/000066 patent/WO1985005119A1/en active IP Right Grant
- 1985-04-30 EP EP85901950A patent/EP0179823B1/en not_active Expired
- 1985-04-30 JP JP60501479A patent/JPS61502402A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0815097B2 (en) * | 1990-04-17 | 1996-02-14 | エコール・ポリテクニツク・フエデラール・ドウ・ローザンヌ | Photocell |
JP2010064066A (en) * | 2008-08-11 | 2010-03-25 | Toyota Central R&D Labs Inc | Photocatalyst and catalyst body for reduction using the same |
US8652989B2 (en) | 2008-08-11 | 2014-02-18 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Photocatalyst and reducing catalyst using the same |
JP2010269303A (en) * | 2009-05-25 | 2010-12-02 | Sungkyunkwan Univ Foundation For Corporate Collaboration | Photocatalyst, preparation method thereof, photoreactor and photolysis method |
JP2011056416A (en) * | 2009-09-10 | 2011-03-24 | Toyota Central R&D Labs Inc | Photocatalyst and method for manufacturing photocatalyst |
JP2012024757A (en) * | 2010-06-24 | 2012-02-09 | Kyushu Univ | Light hydrogen generation catalyst consisting of base metal complex and titanium dioxide |
Also Published As
Publication number | Publication date |
---|---|
EP0179823A1 (en) | 1986-05-07 |
WO1985005119A1 (en) | 1985-11-21 |
EP0179823B1 (en) | 1989-07-12 |
US4684537A (en) | 1987-08-04 |
DE3571456D1 (en) | 1989-08-17 |
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