JPS61500756A - アミノ基でブロックされたポリイソシアネートを基礎とする架橋剤を含有する陰極析出可能な水性分散液の製法 - Google Patents
アミノ基でブロックされたポリイソシアネートを基礎とする架橋剤を含有する陰極析出可能な水性分散液の製法Info
- Publication number
- JPS61500756A JPS61500756A JP85500715A JP50071585A JPS61500756A JP S61500756 A JPS61500756 A JP S61500756A JP 85500715 A JP85500715 A JP 85500715A JP 50071585 A JP50071585 A JP 50071585A JP S61500756 A JPS61500756 A JP S61500756A
- Authority
- JP
- Japan
- Prior art keywords
- nickel
- layer
- coating
- plating
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/206—Electrodes for devices having potential barriers
- H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photovoltaic Devices (AREA)
- Electrodes Of Semiconductors (AREA)
- Chemically Coating (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US56306183A | 1983-12-19 | 1983-12-19 | |
US563061 | 1983-12-19 | ||
US65927984A | 1984-10-10 | 1984-10-10 | |
US06/681,003 US4609565A (en) | 1984-10-10 | 1984-12-13 | Method of fabricating solar cells |
US681003 | 1984-12-13 | ||
PCT/US1984/002065 WO1985002939A1 (en) | 1983-12-19 | 1984-12-14 | Method of fabricating solar cells |
US659279 | 1996-06-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61500756A true JPS61500756A (ja) | 1986-04-17 |
Family
ID=27415903
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP85500715A Pending JPS61500756A (ja) | 1983-12-19 | 1984-12-14 | アミノ基でブロックされたポリイソシアネートを基礎とする架橋剤を含有する陰極析出可能な水性分散液の製法 |
Country Status (9)
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0168431A4 (en) * | 1983-12-19 | 1989-01-19 | Mobil Solar Energy Corp | Method of fabricating solar cells. |
US4650695A (en) * | 1985-05-13 | 1987-03-17 | Mobil Solar Energy Corporation | Method of fabricating solar cells |
NL2009382C2 (en) | 2012-08-29 | 2014-03-18 | M4Si B V | Method for manufacturing a solar cell and solar cell obtained therewith. |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4004044A (en) * | 1975-05-09 | 1977-01-18 | International Business Machines Corporation | Method for forming patterned films utilizing a transparent lift-off mask |
US4347264A (en) * | 1975-09-18 | 1982-08-31 | Solarex Corporation | Method of applying contacts to a silicon wafer and product formed thereby |
US4152824A (en) * | 1977-12-30 | 1979-05-08 | Mobil Tyco Solar Energy Corporation | Manufacture of solar cells |
US4214966A (en) * | 1979-03-20 | 1980-07-29 | Bell Telephone Laboratories, Incorporated | Process useful in the fabrication of articles with metallized surfaces |
US4224084A (en) * | 1979-04-16 | 1980-09-23 | Rca Corporation | Method and structure for passivating a semiconductor device |
US4289381A (en) * | 1979-07-02 | 1981-09-15 | Hughes Aircraft Company | High selectivity thin film polarizer |
US4261762A (en) * | 1979-09-14 | 1981-04-14 | Eaton Corporation | Method for conducting heat to or from an article being treated under vacuum |
JPS6059994B2 (ja) * | 1979-10-09 | 1985-12-27 | 三菱電機株式会社 | アルミニウム膜またはアルミニウム合金膜の微細パタ−ン形成方法 |
US4343830A (en) * | 1980-11-13 | 1982-08-10 | Motorola, Inc. | Method for improving the efficiency of solar cells having imperfections |
JPS5821324A (ja) * | 1981-07-30 | 1983-02-08 | Agency Of Ind Science & Technol | 水素添加した半導体薄膜成長用金属表面基板の前処理方法 |
EP0168431A4 (en) * | 1983-12-19 | 1989-01-19 | Mobil Solar Energy Corp | Method of fabricating solar cells. |
WO1985002943A1 (en) * | 1983-12-19 | 1985-07-04 | Mobil Solar Energy Corporation | Method of fabricating solar cells |
-
1984
- 1984-12-14 EP EP19850900535 patent/EP0167589A4/en not_active Withdrawn
- 1984-12-14 WO PCT/US1984/002065 patent/WO1985002939A1/en not_active Application Discontinuation
- 1984-12-14 JP JP85500715A patent/JPS61500756A/ja active Pending
- 1984-12-14 DE DE19843490612 patent/DE3490612T1/de not_active Withdrawn
- 1984-12-14 NL NL8420338A patent/NL8420338A/nl unknown
- 1984-12-14 AU AU38886/85A patent/AU574761B2/en not_active Ceased
- 1984-12-14 GB GB08515901A patent/GB2162996B/en not_active Expired
-
1985
- 1985-08-16 SE SE8503833A patent/SE456624B/sv not_active IP Right Cessation
- 1985-12-14 CH CH3598/85A patent/CH669476A5/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO1985002939A1 (en) | 1985-07-04 |
SE8503833L (sv) | 1985-08-16 |
SE456624B (sv) | 1988-10-17 |
EP0167589A1 (en) | 1986-01-15 |
EP0167589A4 (en) | 1989-01-19 |
NL8420338A (nl) | 1985-11-01 |
SE8503833D0 (sv) | 1985-08-16 |
GB2162996B (en) | 1987-08-12 |
DE3490612T1 (de) | 1985-11-28 |
GB2162996A (en) | 1986-02-12 |
AU3888685A (en) | 1985-07-12 |
AU574761B2 (en) | 1988-07-14 |
GB8515901D0 (en) | 1985-07-24 |
CH669476A5 (enrdf_load_stackoverflow) | 1989-03-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4557037A (en) | Method of fabricating solar cells | |
US4612698A (en) | Method of fabricating solar cells | |
US4609565A (en) | Method of fabricating solar cells | |
US4321283A (en) | Nickel plating method | |
JPH0520914B2 (enrdf_load_stackoverflow) | ||
US5010040A (en) | Method of fabricating solar cells | |
WO1995012898A1 (en) | High efficiency silicon solar cells and methods of fabrication | |
EP0935296A3 (en) | Method of forming thin zinc oxide film, and method of producing semiconductor element substrate and photovoltaic element using thin zinc oxide film | |
JPH0572114B2 (enrdf_load_stackoverflow) | ||
KR960001468B1 (ko) | 반사 방지막을 갖는 태양 전지의 제조방법 | |
US4392010A (en) | Photovoltaic cells having contacts and method of applying same | |
JPS61500756A (ja) | アミノ基でブロックされたポリイソシアネートを基礎とする架橋剤を含有する陰極析出可能な水性分散液の製法 | |
US4650695A (en) | Method of fabricating solar cells | |
AU573696B2 (en) | Ion milling | |
AU574431B2 (en) | Proton milling as a form of plating mask | |
JPS61500757A (ja) | 太陽電池の製造方法 | |
JPH023310B2 (enrdf_load_stackoverflow) | ||
JPS61500755A (ja) | 太陽電池の製造方法 | |
JPS5975681A (ja) | 太陽電池の電極形成法 | |
GB2107741A (en) | Electroless plating of nickel onto silicon | |
JPS5885574A (ja) | 太陽電池及びその製造方法 | |
JP2020161599A (ja) | 太陽電池の製造方法 | |
JPS58100465A (ja) | 太陽電池の電極形成法 | |
KR870000768A (ko) | 태양전지의 제조방법 | |
TW201034225A (en) | Method of fabricating a solar cell |