JPS6144195A - Continuous electroplating line - Google Patents

Continuous electroplating line

Info

Publication number
JPS6144195A
JPS6144195A JP16609784A JP16609784A JPS6144195A JP S6144195 A JPS6144195 A JP S6144195A JP 16609784 A JP16609784 A JP 16609784A JP 16609784 A JP16609784 A JP 16609784A JP S6144195 A JPS6144195 A JP S6144195A
Authority
JP
Japan
Prior art keywords
plating
electroplating
line
replacement
strip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16609784A
Other languages
Japanese (ja)
Other versions
JPS633034B2 (en
Inventor
Tetsuya Kohama
小浜 哲也
Akio Minamoto
源本 昭雄
Hiroshi Horyoda
法領田 宏
Shinjiro Murakami
村上 進次郎
Tamotsu Mizuta
水田 有
Asaharu Kihata
木畑 朝晴
Shuji Iwamoto
岩本 周治
Shinjiro Ishikawa
石川 晋二郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP16609784A priority Critical patent/JPS6144195A/en
Publication of JPS6144195A publication Critical patent/JPS6144195A/en
Publication of JPS633034B2 publication Critical patent/JPS633034B2/ja
Granted legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To manufacture products of uniform quality with improved work efficiency by placing plural electroplating apparatus for exchange side by side with plural electroplating apparatus and exchanging properly the apparatus as required. CONSTITUTION:Plural electroplating apparatus are divided into groups A (A1, A2), B (B1, B2) and arranged, and plural electroplating apparatus A1', A2', B1', B2' are placed side by side with said apparatus. When the apparatus in the group A are exchanged, the feed of a plating soln. to the group A is stopped, the apparatus A1, A2 are removed from the line, and the apparatus A1', A2' are placed in the line. During this time, ordinary plating is continued in the group B. A strip 31 is stretched before the exchange, and conductor rolls 32, an upper electrode 35' and an upper plating bath 34' above the strip 31 and backup rolls 33, a lower electrodes 35 and a lower plating bath 34 under the strip 31 are separately exchanged. Thus, the exchange can be carried out in a short time.

Description

【発明の詳細な説明】 〈産業上の利用分野) 本発明は金属ストリップ等の交換可能な電気めっき装置
を有する連続電気めっきラインに関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a continuous electroplating line with replaceable electroplating equipment, such as metal strips.

(従来技術とその問題点) 従来、金属ストリップをめっきする技術の一般例として
、第6a図の水平型、第6b図の縦型、第6C図のラジ
アル)J、電気めっき装置が使われてきた。これらの図
に示す様に、一般にめっき液を入れためっき槽中を通し
て金属ストリップ61を浸漬、導通走行させる。TfS
6図中、62は通電ロール、63は押えロール、64は
めっき槽。
(Prior art and its problems) Conventionally, as general examples of techniques for plating metal strips, horizontal type as shown in Fig. 6a, vertical type as shown in Fig. 6b, radial type as shown in Fig. 6C, and electroplating equipment have been used. Ta. As shown in these figures, a metal strip 61 is generally immersed and run through a plating bath containing a plating solution. TfS
In Figure 6, 62 is an energizing roll, 63 is a presser roll, and 64 is a plating tank.

65は電極であり、66はめっき浴をあられし。65 is an electrode, and 66 is a plating bath.

このt極65には、可溶性または不溶性の陽極を用いて
、通電ロール62により金属ストリップ61を陰極とし
て電解する。
A soluble or insoluble anode is used as the t-electrode 65, and electrolysis is performed using the energizing roll 62 with the metal strip 61 as a cathode.

このような、めっき装置の従来例においては。In such a conventional example of plating equipment.

下記の事由によりその稼動が著しく阻害され、生産能率
を落している。
Due to the following reasons, its operation is significantly hindered and production efficiency is reduced.

(1)ms図におけるifJ電ロール62.押えロール
63へのめっき液付着、異物かみこみ等のトラブルある
いは腐食庁耗からくるロール交換。
(1) ifJ electrical roll 62 in ms diagram. Roll replacement due to problems such as plating solution adhering to the presser roll 63, foreign matter getting caught, or due to corrosion and wear.

(2)電8i65の溶解あるいは異物かみこみによる電
極65の交換。
(2) Replacing the electrode 65 due to melting of the electrode 8i65 or getting stuck with foreign matter.

(3)めっき液66の劣化あるいは成分異常によるめっ
き液66の交換、 これらの場合に、いずれも電気めっきラインを長時間停
止して交換しなければならない、近年の生産性向上への
要求と相まって、この問題はますます重要視されてきて
いる。
(3) Replacement of the plating solution 66 due to deterioration or abnormality of the plating solution 66.In these cases, the electroplating line must be stopped for a long time to replace the solution, coupled with the recent demand for improved productivity. , this issue is becoming increasingly important.

更には、自動車業界を中心として表面処理鋼板の多様化
が求められており、同一表面処理ラインでの多品種の表
面処理鋼板の製造技術が必要となってきている0例をと
って言えば、連続電気亜鉛めっきはめっき金属が亜鉛単
体のものの外に、亜鉛と鉄、亜鉛とニッケル等、亜鉛以
外の金属を含んだものがある。
Furthermore, there is a demand for diversification of surface-treated steel sheets, mainly in the automobile industry, and as an example, there is a need for manufacturing technology for a wide variety of surface-treated steel sheets on the same surface treatment line. Continuous electrolytic galvanizing includes not only zinc alone, but also zinc and iron, zinc and nickel, and other metals other than zinc.

これら各種のめっきは、それぞれの尋類専用のめっき液
を用いなければめっき不能である。さらに異種のめっき
液が少量でも混入するとそのめっき品質は損なわれ、製
品価値が著しく低下する。
These various types of plating cannot be performed unless a plating solution dedicated to each type of plating is used. Furthermore, if even a small amount of a different type of plating solution is mixed in, the plating quality will be impaired and the product value will be significantly reduced.

従って同一のめっきラインで異耳のめっきをおこなう場
合は、めっきの桂類を交換する時、めっき槽内のめっき
液も完全に交換する必要がある。
Therefore, when plating different types of plating on the same plating line, it is necessary to completely replace the plating solution in the plating tank when replacing the plating parts.

電気めっき!lt置をiJ!統電気亜鉛めっきラインに
採用した例を第5図に示す0図中51のペイオフリール
に挿入されたストリップコイルは4!モどされ、52の
ンヤーで先端をカットされ、53の溶接機で先行してい
るストリップとta接され接続される。溶接後のストリ
ップは54のルーパを通過する。このルーパ54は先行
、76行のストリップを接続するために必要な時間中、
中央セクションのストリップの処理9155.55′、
56゜57.58内を通過しているストリップを停止さ
せないためにストリップを蓄積するための装置である。
Electroplating! iJ the lt position! Figure 5 shows an example of the system adopted in an electrogalvanizing line.The number of strip coils inserted into payoff reel 51 in figure 0 is 4! The strip is modulated, the tip is cut with a 52 yen, and the leading strip is tagged and connected with a 53 welder. The welded strip passes through 54 loopers. This looper 54 precedes, during the time required to connect the 76 rows of strips.
Treatment of central section strips 9155.55';
This is a device for accumulating strips so as not to stop the strips passing through the 56°57.58.

ルーパを通過したストリップは55.55′の脱脂、酸
洗、リンズ等のめっき前処理装置を通過し、56.57
の電気めっき装置で電気めっきされ、58のリンズ等の
めっき後処理装置で処理され電気亜鉛めっき鋼板となる
。その後、出側ルーパ54′を通過し、所定の寸法に出
側シャー52′−でカットされ、テンションリール59
に巻取られ製品となる。
The strip that has passed through the looper passes through plating pretreatment equipment such as degreasing, pickling, and rinsing at 55.55', and then passes through the plating pretreatment equipment at 56.57
The steel sheet is electroplated using an electroplating device such as No. 58, and then processed using a post-plating treatment device such as Linz No. 58 to become an electrogalvanized steel sheet. After that, it passes through the exit looper 54', is cut to a predetermined size by the exit shear 52', and is reeled into the tension reel 59.
The product is wound up into a product.

第5図に示すめっきラインでは、前述のような異種のめ
っき液による多ネh類めっきを行う際に。
In the plating line shown in FIG. 5, when performing multi-layer plating using different types of plating solutions as described above.

めっき装置56.57内のめっき液を交換する必要があ
る。この交換作業は、前回使用のめっき液を排出し、め
っき装置内を十分洗浄した後、今回使用のめっき液を給
液することとなり、長時間ラインを停止しなければなら
ない。
It is necessary to replace the plating solution in the plating devices 56 and 57. This replacement work involves draining the previously used plating solution, thoroughly cleaning the inside of the plating equipment, and then supplying the currently used plating solution, which requires the line to be stopped for a long time.

(yA+月の目的〉 本発明の目的は、′M!、続電気めっきライン内に複数
個のめっき槽列を独立した複数のめつき系統としてもつ
ことにより、これまで述へてきた電気めっき装置等の交
換時の長期間のライン停止問題を解決し、稼動率の向上
、品質の安定を可能とした連続電気めっきラインを提供
しようとするにある。
(Objective of yA + Month) The object of the present invention is to provide the electroplating apparatus described above by having a plurality of plating bath rows as a plurality of independent plating systems in a continuous electroplating line. The purpose is to provide a continuous electroplating line that solves the problem of long-term line stoppages during replacement, improves operating rates, and stabilizes quality.

〈発明の構rJt> 本発明はめっき前処理装置と、複数めっき用電気めっき
装置と、めっき用電気めっき装置の横に並置した交換用
電気めっき装置と、少なくとも前記めっき用電気めっき
装置をはさんで設こした対をなす被めっき材テンン、ン
装こと、前記めっき用電気めっき装置にめっき液を循環
供給するめっき液配管系と、めっき後処理装置とを有す
る連続電気めっきラインにおいて、iiJ記めっき用T
F、気めっき装置および交換用電気めっき装置は、交換
l1lfには+iil記被めっき材テンション装置によ
り緊張させられた被めっき材を境にして分離可能で。
<Structure of the Invention> The present invention includes a plating pretreatment device, an electroplating device for multiple plating, a replacement electroplating device juxtaposed next to the electroplating device for plating, and at least the electroplating device for plating. In a continuous electroplating line having a pair of plating materials installed in T for plating
F. The pneumatic plating device and the replacement electroplating device can be separated at the time of replacement l1lf, with the material to be plated being tensioned by the material tensioning device described in +iii.

めっき用電気めっき装置の交換時には、少なくとも一個
のめっき用電気めっき装置は動作させつつ、交換のため
分離されためっき用電気めっき装乙をめっきラインから
除き、交換用の電気めっき装置をめっきラインに入れる
ようシフトでき。
When replacing electroplating equipment, remove the separated electroplating equipment from the plating line for replacement while leaving at least one electroplating equipment in operation, and place the replacement electroplating equipment in the plating line. You can shift to put it in.

めっきラインに入れられた交換用1′[t%めっき装置
を被めっき材テンション装置による被めっき材の緊張を
解除しつつ、被めっき材にめっきを行えるよう接合可能
に構成したことを特徴とする連続電気めっきラインを提
供するものである。
The replacement 1' [t% plating device installed in the plating line is configured so that it can be joined to the plating material so that it can be plated while releasing the tension on the plating material caused by the plating material tension device. It provides a continuous electroplating line.

以下、本発明の411或を詳鹿に説明する。Hereinafter, 411 of the present invention will be explained in detail.

本発明の連続電気めっきラインを第1図ないし第4図に
示す好適実施例を用いて、詳細に説明する。
The continuous electroplating line of the present invention will be explained in detail using preferred embodiments shown in FIGS. 1 to 4.

第1図は、本発明の電気めっき?C装置部分ライン構r
It図であり、独立したAおよびB系統のめっき槽を有
し、電気めっき装置の交換時には、いずれか一方を動作
させつつ、他方の交換を行うよう構成されている。従っ
て、めっき装置の交換時にも電気めっきラインが停止す
ることはない、第2図、第3図および第4図は、第1図
めっき処理を行う電気めっき装置の独立したAおよびB
系統の部分拡大図である。現在、Al 、A2.Bl、
B2.はめつきラインに組み込まれためっき槽群であり
、Al  ’、A2  ’、B、’、B2 ’は交換用
のめっき槽群である。交換に際しては、A1 ′、A2
  ’あるいはB1 ゛、B2  ’をめっき操作を停
止しているA、、A2あるいはBl。
Figure 1 shows the electroplating of the present invention? C equipment part line structure
This is an It diagram, and has independent A and B systems of plating tanks, and is configured so that when replacing the electroplating apparatus, one of them is operated while the other is replaced. Therefore, the electroplating line will not be stopped even when the plating equipment is replaced.
It is a partially enlarged view of the system. Currently, Al, A2. Bl,
B2. This is a plating tank group built into the plating line, and Al', A2', B,', and B2' are replacement plating tank groups. When replacing, A1', A2
'or B1 ', B2' A, A2 or Bl which has stopped the plating operation.

B2 と交換する。Exchange with B2.

:1S2V!Jにおいて、21はストリップ、22は給
7rL用コンダクタ−ロール、23はパ7クア、プσ−
ル、24はめっ、!l+槽、25は電極、26はめっき
液供給ポンプ、27はめっき液循環タンクである。また
2Bはめっき液供給用の配管であり1図示していないが
排出用配管が−A備されていることは当然である。電極
25とコンダクタ−ロール22の間に電位差を生じさセ
ると、ストリップ21と電極25の間にめっき液を介し
て電流が流れストリップ21のめっき液に接している側
の表面にめっき処理がほどこされる。めっき処理は第5
図に示す連続電気めっきラインでは、56.57に本発
明の電気めっき装置が組込まれる。
:1S2V! In J, 21 is a strip, 22 is a conductor roll for supply 7rL, 23 is a 7rL conductor roll, and 23 is a 7rL conductor roll.
Le, 24 is me! 25 is an electrode, 26 is a plating solution supply pump, and 27 is a plating solution circulation tank. Furthermore, 2B is a plating solution supply pipe, and although it is not shown in the figure, it is a matter of course that a discharge pipe -A is also provided. When a potential difference is created between the electrode 25 and the conductor roll 22, a current flows between the strip 21 and the electrode 25 through the plating solution, and the surface of the strip 21 in contact with the plating solution is plated. It will be applied. Plating treatment is the fifth step.
In the continuous electroplating line shown in the figure, the electroplating apparatus of the present invention is installed at 56 and 57.

従来例では、 (1)定期取替(コノダクターロール、陽極、めっき液
etc ) (2)突発取替(コンダクタ−ロール、陽極。
In the conventional example, (1) Periodic replacement (conductor roll, anode, plating solution, etc.) (2) Sudden replacement (conductor roll, anode, etc.)

めつき液@te ) 及び、  (3)94Nめっきへの切換時に洗浄装置付
のめっき槽でも4時間以上、洗浄IItnなしのめつき
禮では12時間以上ものめつきライン停止が必要であっ
た。
(3) When switching to 94N plating, it was necessary to stop the plating line for more than 4 hours even in a plating bath with a cleaning device, and for more than 12 hours in plating without cleaning IItn.

本発明の2fl統?lt%めっきラインでは、上記の(
+)、  (2)、  (3)の場合においても、ライ
ンを停+1:することなく、各作業を実施することが可
能であり、ライン稼動率が飛LW的に上がる。
2fl series of the present invention? In the lt% plating line, the above (
Even in the cases of +), (2), and (3), it is possible to carry out each work without stopping the line, and the line operating rate increases dramatically.

本発明の連続電気めっきラインの動作原理を第1図ない
し第4図を用いて定期取替の部分を代表例として説明す
る。
The operating principle of the continuous electroplating line of the present invention will be explained with reference to FIGS. 1 to 4, taking the periodic replacement portion as a representative example.

第1図に示すめっき処理状態から、定期数基を実施する
場合、めっき処理装置をA群(AI 、A2・・・)、
B群(B+  、B2・・・)と分けて配応し1通常、
定畠状態ではどちらか一群のみを使用している0例えば
AHKを使用しており、今人群が定期取替時期に達した
と仮定する。
From the plating processing state shown in Fig. 1, if several units are to be used regularly, the plating processing equipment should be group A (AI, A2...),
It is divided into group B (B+, B2...) and 1 usually,
In the stable state, only one of the groups is used, for example AHK, and it is assumed that the current group has reached the periodic replacement period.

・あらかじめ、 Al ’ 、 A2 ’・・・の位置
にメンテナンス済の予備のめっき処理装置A+ ′、A
z ′・・・を置いておく0次にAJTへのめつき液の
供給を停止し、B群で通常のめっきを行う1次いで、A
DのA、、A2・・・のめつき槽をめっきラインから除
き、A、’、A2’・・・のめつき欅をAI。
・In advance, maintenance-completed spare plating processing equipment A+ ′, A is installed at the positions Al ′, A2 ′, etc.
z ′... is placed. 0 Next, stop supplying the plating solution to AJT and perform normal plating in group B. 1 Next, A
Remove the plating tanks A, A2... of D from the plating line, and AI the plating zelkova of A, ', A2'...

A2・・・の位置に入れ交換する。Insert it in position A2... and replace it.

第3a図および第3b図には、それぞれ通常のめっき時
およびめっき?tm交換時を示す、めっき槽の交換は、
ストリップ31を境にして、ストリップ31の上方のめ
っき装置部分とストリップ31の下方の下方めっき装置
部分とにストリップ31から敲れる方向に分離して行う
、第3図には水平型のiw気めっき装置を代表例として
示し、下方めっき装置部分は、バックアップロール33
、下部めっき槽34および下電極35でストリップ31
より上方に移動され、」三方めっきJAIi!を部分は
、通電ロール32.上部めっき槽34′ および」二重
l4i35′でストリップ31より下方に移動される。
Figures 3a and 3b show normal plating and plating, respectively. The replacement of the plating tank, which indicates when to replace the tm, is as follows:
Horizontal IW plating is carried out in a direction extending from the strip 31, separated by the strip 31 into a plating device section above the strip 31 and a lower plating device section below the strip 31. The device is shown as a representative example, and the lower plating device part is a backup roll 33.
, strip 31 with lower plating tank 34 and lower electrode 35
Moved further upwards, "Three-way plating JAIi! The part is the energizing roll 32. The upper plating bath 34' and the double l4i 35' are moved below the strip 31.

このような上方および下方めっき装に部分をストリップ
31から分離する時には、ストリップ31に第4a図に
示すロール群41.42.43で張力をかけつつ行うの
が良い、なお、めっき装置は水平型のものに限られず、
第6b図および第6C図に示す縦型およびラジアル型の
ものについても同様に適用され、ストリップを境にして
同じ側にあるめっき装置部分をストリップから離れる方
向にシフトして交換を行う。
When separating such upper and lower plated portions from the strip 31, it is preferable to do so while applying tension to the strip 31 with rolls 41, 42, 43 shown in FIG. 4a. Not limited to those of
The same applies to the vertical type and radial type shown in FIGS. 6b and 6C, in which parts of the plating apparatus on the same side of the strip are shifted in a direction away from the strip for replacement.

また、動作中の上方および下方めつぎ装置部分をめっき
ライン外に搬出し、交換用の上方および下方めっき装′
a部分をめっきラインに搬入する稼動装置ζは従来既知
の任意のものを用いることができる。
In addition, the upper and lower plating equipment parts that are in operation are transported out of the plating line, and replacement upper and lower plating equipment are installed.
Any conventionally known operating device ζ can be used for carrying the portion a into the plating line.

第3b図の状態のままめっき装置をライン直角方向に平
行移動することによりめっき装置をライン外へ搬出する
ことができる(第4b図参照)。
By moving the plating apparatus in parallel in the direction perpendicular to the line while maintaining the state shown in FIG. 3b, the plating apparatus can be carried out of the line (see FIG. 4b).

全く逆の方法で交換用のめっき槽AI′、A2”・・・
がライン内ヘセ、トできる。(第4b図参照)。
Replacement plating tanks AI', A2"...
However, it is possible to move inside the line. (See Figure 4b).

これらの作又を同時に行い、かつこの間は、第4a図に
示すロール群41.42で適当な張力を保ちつつB群で
めっき作業が相続されている。
These operations are carried out simultaneously, and during this time, the plating operation is continued in group B while maintaining appropriate tension in roll groups 41 and 42 shown in FIG. 4a.

以上の説IJIは上記(1)の定期取替を例に示したが
、 (2〕の突発取替、(3)の異粁めっき切換時も同
様の方法で可能である。
The above theory of IJI was given as an example of periodic replacement (1) above, but the same method can also be used for (2) sudden replacement and (3) change of different plating.

ただ(3)の場合について若干っけ加えると、異稲めっ
きの場合は極少蚤のめっき液の混合も許されないため、
第4b図に示す様に、めっき液タンク44.44′、 
2Ja環ポンプ45.45’ 、管路46.46′、コ
ネクタ47.47′などを含めためっき液供給配管系統
をめっき液の種類毎に独立に設ける必要がある。
However, to add a little more detail to case (3), in the case of different rice plating, mixing of the plating solution with a very small amount of fleas is not allowed.
As shown in Figure 4b, plating solution tanks 44, 44',
A plating solution supply piping system including a 2Ja ring pump 45, 45', a pipe line 46, 46', a connector 47, 47', etc. must be provided independently for each type of plating solution.

(実 施 例) 厚さ0.81巾10100Oのストリップを用いて、第
3図に示すような水平型のめっきVC,iにより211
続電気亜鉛めっきを行った。Anとして6槽のめっき浴
、B群として4槽のめっき浴を用いた。
(Example) Using a strip with a thickness of 0.81 mm and a width of 10100 mm, horizontal plating VC,i as shown in FIG.
Next, electrogalvanizing was performed. Six plating baths were used as An, and four plating baths were used as Group B.

A群を用いて50時間めっき後、A群へのめっき液供給
を停止し、B群にてめっきを続行しつつ前述したように
してA群のめっき槽をA′群のめっき樽と交換した。交
換に必要な時間は、A群へのめっき液供給を停止してか
ら、再びA′群へのめっき液供給が定常状態になるまで
5分間であり、従来、少なくとも4時間以上必要であっ
たことに比べて、作業能率が非常に高まり、ライン稼l
JJ率が飛躍的に上昇した。
After plating for 50 hours using Group A, the plating solution supply to Group A was stopped, and while plating continued with Group B, the plating tank of Group A was replaced with the plating barrel of Group A' as described above. . The time required for replacement is 5 minutes after stopping the plating solution supply to group A until the plating solution supply to group A' reaches a steady state again, whereas conventionally it required at least 4 hours. Compared to this, work efficiency has been greatly improved and line efficiency has increased.
The JJ rate has increased dramatically.

しかも、このめっき装置交換中、めっさラインはB群の
めっき装置によって連続して続けられるのでストリップ
走行を中断させる必要がなく1作業効率が非常にあがる
とともに長尺のストリップめっきにおいても品質が一定
に保たれる。
Moreover, while the plating equipment is being replaced, the plating line is continued continuously by the plating equipment of group B, so there is no need to interrupt the strip running, greatly increasing work efficiency and improving quality even when plating long strips. remains constant.

また、同じストリップを用いて、亜鉛単味のめっきを行
った後、亜鉛−ニッケル合金めっきを同じラインにおい
てラインを止めることなく行うことができた。
Furthermore, after single zinc plating was performed using the same strip, zinc-nickel alloy plating could be performed on the same line without stopping the line.

(発明の効果〉 本発明の連続めっき装置によれば、被めっき材を中断す
ることなくめっき装置を交換することができるので、ロ
ーラーへの異物かみこみ、ローラー、電極等の腐食摩耗
、めっき液の成分異常等のトラブル時に、めっきライン
を止めずに迅速に(6分間)でめっき装置を交換するこ
とができる。また、定期的なめっき装置の交換が必要な
場合にも、めっきラインを止めずに、きわめて短時間で
めっき装置を交換することができる。さらシこ、異種め
っきへの切換も可能なので、一つのめっきラインにおい
て製品の必要に応じてラインを]):めることなくめっ
きの種類をかえることができる。このように1本発明に
よればめつき作業の効率を臨界的にあげ、しかも品質の
一定しためつき製品を得ることができる。
(Effects of the Invention) According to the continuous plating apparatus of the present invention, the plating apparatus can be replaced without interrupting the plating process, which prevents foreign matter from getting into the rollers, corrosive wear of the rollers, electrodes, etc. In the event of a problem such as a component abnormality, the plating equipment can be quickly replaced (in 6 minutes) without stopping the plating line.Also, if the plating equipment needs to be replaced periodically, the plating line can be stopped. It is possible to replace the plating equipment in an extremely short period of time without having to change the plating equipment.It is also possible to change over to different types of plating, so it is possible to change the line according to the needs of the product in one plating line. You can change the type of As described above, according to the present invention, it is possible to critically improve the efficiency of plating work and to obtain a plating product of constant quality.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明の′B1続めっき装置における部分ラ
イン構成図である。第2図は、第1図に用いるめっきA
置の部分拡大図である。第3a図および第3b図は、そ
れぞれめっき用めっき装置を交換用めっき装置に交換す
る際のめつき装置の分蹟前の状態および分離後の状Iム
を示す線図的断面図である。第4a図は、一方の群のめ
っき装置交換時、他方の群のめっ!!装置でめっきを行
い、一方の群のめっき装置内にあるストリップに張力を
かける状態を説明する図である。第4b図、は特に異種
めっきへの!/]換時における配管系統を説明するため
の図である。第5図は、連続電気めっきラインを示す線
図である。fjSsa図、:J46b図および第6C図
は、従来用いられているそれぞれ水平型、縦型およびラ
ジアル型めっき装置の線図的断面図である。 符号の説明 ?■・・・ストリーIプ、 22・・・給電用コンダクタ−ロール。 23・・・バ、り7ツプロール、  24・・・めっき
槽。 25・・・TL極、  26・・・めっき液供給ポンプ
。 27・・・循環タンク。 28・・・めっき液供給用配管、 31・・・ストリップ。 32・・・コンダクタ−ロール、 33・・・バックアップロール、 34・・・下部めっ!!槽、  34′・・・上部めつ
き禮。 35・・・下電極、 35′・・・上電極、41.42
.43・・・ロール群。 44.44’ ・・・循環タンク。 45.45’ ・・・めっき液配管系ポンプ、46.4
6′・・・管路、 47.47’ ・・・コネクタ。 51・・・ペイオフリール、 52.52′・・・シャー、  53・・・溶接機。 54.54′・・・ルーバ、 55.55′・・・めっき前処理装置、・56.57・
・・111t%めっき装置。 58・・・めっき後処理装置、 59・・・テンションリール、 61・・・ストリップ
。 62・・・通電ロール、 63・・・押えロール、64
・・・めっき槽、  65・・・電極。 66・・・めっき液 FIG、1
FIG. 1 is a partial line configuration diagram of the 'B1 continuous plating apparatus of the present invention. Figure 2 shows plating A used in Figure 1.
FIG. FIGS. 3a and 3b are diagrammatic cross-sectional views showing the state of the plating device before and after separation, respectively, when replacing the plating device with a replacement plating device. Figure 4a shows that when the plating equipment of one group is replaced, the plating equipment of the other group is replaced! ! FIG. 3 is a diagram illustrating a state in which plating is performed in the apparatus and tension is applied to a strip in one group of plating apparatuses. Figure 4b is especially suitable for dissimilar plating! / ] is a diagram for explaining the piping system at the time of replacement. FIG. 5 is a diagram showing a continuous electroplating line. Fig. fjSsa, Fig. J46b and Fig. 6C are diagrammatic cross-sectional views of conventionally used horizontal type, vertical type and radial type plating apparatuses, respectively. Explanation of the sign? ■...Street Ip, 22...Conductor roll for power supply. 23...Ba, Ri7prol, 24...Plating tank. 25...TL pole, 26...Plating solution supply pump. 27...Circulation tank. 28... Plating solution supply piping, 31... Strip. 32... Conductor roll, 33... Backup roll, 34... Lower part! ! Tank, 34'...upper pegs. 35...Lower electrode, 35'...Upper electrode, 41.42
.. 43...Roll group. 44.44'...Circulation tank. 45.45'...Plating solution piping system pump, 46.4
6'...Pipeline, 47.47'...Connector. 51...Payoff reel, 52.52'...Shear, 53...Welding machine. 54.54'... Louver, 55.55'... Plating pre-treatment device, 56.57.
...111t% plating equipment. 58... Plating post-processing device, 59... Tension reel, 61... Strip. 62... Current roll, 63... Presser roll, 64
...Plating tank, 65...Electrode. 66...Plating solution FIG, 1

Claims (1)

【特許請求の範囲】 めっき前処理装置と、複数のめっき用電気 めっき装置と、めっき用電気めっき装置の横に並置した
交換用電気めっき装置と、少なくとも前記めっき用電気
めっき装置をはさんで設置した対をなす被めっき材テン
ション装置と、前記めっき用電気めっき装置にめっき液
を循環供給するめっき液配管系と、めっき後処理装置と
を有する連続電気めっきラインにおいて、前記めっき用
電気めっき装置および交換用電気めっき装置は、交換時
には前記被めっき材テンション装置により緊張させられ
た被めっき材を境にして分離可能で、めっき用電気めっ
き装置の交換時には、少なくとも一個のめっき用電気め
っき装置は動作させつつ、交換のため分離されためっき
用電気めっき装置をめっきラインから除き、交換用の電
気めっき装置をめっきラインに入れるようシフトでき、
めっきラインに入れられた交換用電気めっき装置を被め
っき材テンション装置による被めっき材の緊張を解除し
つつ、被めっき材にめっきを行えるよう接合可能に構成
したことを特徴とする連続電気めっきライン。
[Scope of Claims] A plating pretreatment device, a plurality of electroplating devices for plating, a replacement electroplating device juxtaposed next to the electroplating device for plating, and at least the electroplating device for plating installed in between. A continuous electroplating line having a pair of plating material tension devices, a plating solution piping system that circulates and supplies a plating solution to the plating electroplating device, and a plating post-processing device, the plating device and The replacement electroplating device can be separated at the time of replacement with the material to be plated tensioned by the material tension device, and when the electroplating device for plating is replaced, at least one electroplating device for plating is in operation. The separated plating electroplating equipment can be removed from the plating line for replacement and the replacement electroplating equipment can be shifted into the plating line while
A continuous electroplating line characterized in that a replacement electroplating device placed in the plating line is configured so that it can be joined to the material to be plated while releasing the tension on the material to be plated by a tension device for the material to be plated. .
JP16609784A 1984-08-08 1984-08-08 Continuous electroplating line Granted JPS6144195A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16609784A JPS6144195A (en) 1984-08-08 1984-08-08 Continuous electroplating line

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16609784A JPS6144195A (en) 1984-08-08 1984-08-08 Continuous electroplating line

Publications (2)

Publication Number Publication Date
JPS6144195A true JPS6144195A (en) 1986-03-03
JPS633034B2 JPS633034B2 (en) 1988-01-21

Family

ID=15824943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16609784A Granted JPS6144195A (en) 1984-08-08 1984-08-08 Continuous electroplating line

Country Status (1)

Country Link
JP (1) JPS6144195A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6164896A (en) * 1984-09-06 1986-04-03 Kawasaki Steel Corp New electrolytic treatment device for metallic strip
JP2002105663A (en) * 2000-09-29 2002-04-10 Nisshin Steel Co Ltd Method for preventing pickup of zinc to water cooled roll in electrogalvanizing line

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6164896A (en) * 1984-09-06 1986-04-03 Kawasaki Steel Corp New electrolytic treatment device for metallic strip
JPS633035B2 (en) * 1984-09-06 1988-01-21 Kawasaki Steel Co
JP2002105663A (en) * 2000-09-29 2002-04-10 Nisshin Steel Co Ltd Method for preventing pickup of zinc to water cooled roll in electrogalvanizing line
JP4570113B2 (en) * 2000-09-29 2010-10-27 日新製鋼株式会社 How to prevent zinc pickup on water-cooled rolls in electrogalvanizing line

Also Published As

Publication number Publication date
JPS633034B2 (en) 1988-01-21

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