JP4710619B2 - Method for producing tin-plated steel strip and tin-plating cell - Google Patents

Method for producing tin-plated steel strip and tin-plating cell Download PDF

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JP4710619B2
JP4710619B2 JP2006005961A JP2006005961A JP4710619B2 JP 4710619 B2 JP4710619 B2 JP 4710619B2 JP 2006005961 A JP2006005961 A JP 2006005961A JP 2006005961 A JP2006005961 A JP 2006005961A JP 4710619 B2 JP4710619 B2 JP 4710619B2
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steel strip
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JP2007186756A (en
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健太郎 鈴木
文男 青木
慶 結城
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JFE Steel Corp
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Description

本発明は、錫めっき鋼帯の製造方法と錫めっきセルに関し、特に、水平型のめっきセルを用いて、被めっき鋼帯に連続的に錫めっきを施す錫めっき鋼帯の製造方法と、その製造に用いる水平型の錫めっきセルに関するものである。   The present invention relates to a method for producing a tin-plated steel strip and a tin-plating cell, and in particular, a method for producing a tin-plated steel strip for continuously tin-plating a steel strip to be plated using a horizontal plating cell, and its The present invention relates to a horizontal tin plating cell used for manufacturing.

電気錫めっき設備には、大別して、縦型めっきセルを用いる縦型めっき設備と、水平型めっきセルを用いる水平型めっき設備の2種類がある。さらに、水平型めっきセルを用いる電気錫めっき設備は、めっき液の種類によって、pHが3〜4の塩化第一錫浴(ハロゲン浴)、pHが1以下のアルカノールスルホン酸浴(ASA浴)、同じくpHが1以下のメタンスルホン酸浴(MSA浴)などに分けられる。いずれの設備も、通常、めっき部が3段構造となっており、下の2段には水平型のめっきセルが水平方向に複数配置され、最上段にはドラッグアウト槽と水洗装置が配置されている。   There are roughly two types of electrotin plating equipment: vertical plating equipment using a vertical plating cell and horizontal plating equipment using a horizontal plating cell. Furthermore, the electrotin plating equipment using a horizontal plating cell has a stannous chloride bath (halogen bath) having a pH of 3 to 4, depending on the type of plating solution, an alkanol sulfonic acid bath (ASA bath) having a pH of 1 or less, Similarly, it is divided into a methanesulfonic acid bath (MSA bath) having a pH of 1 or less. Each facility usually has a three-stage plating section, with a plurality of horizontal plating cells arranged horizontally in the lower two stages, and a drag-out tank and a water washing device arranged in the uppermost stage. ing.

上記水平型のめっきセルを用いて錫めっき鋼帯を製造する場合には、設備の入側で、脱脂、酸洗して活性化した鋼帯を、まず、最下段の水平型めっきセル列に搬送して鋼帯の下側の面のみに錫めっきを施し、次に、鋼帯の向きを180°変えて反対方向から中段の水平型めっきセル列に搬送して鋼帯の下側の面、すなわち最下段では上側であった面のみに錫めっきを施し、次いで、さらに鋼帯の向きを180°変えて最上段のドラッグアウト槽、水洗槽に搬送して洗浄し、その後、必要に応じてリフロー処理し、化学処理して錫めっき製品とする。   When manufacturing a tin-plated steel strip using the above horizontal plating cell, the steel strip activated by degreasing, pickling and activating at the entry side of the equipment is first placed in the horizontal plating cell row at the bottom. Transport and apply tin plating only to the lower surface of the steel strip, then change the direction of the steel strip by 180 ° and transport it from the opposite direction to the middle horizontal plating cell row to transport the lower surface of the steel strip In other words, tin plating is applied only to the upper surface at the bottom, and then the direction of the steel strip is further changed by 180 ° to be transported to the top dragout tank and washing tank for cleaning, and then as necessary. Reflow treatment and chemical treatment to produce a tin-plated product.

前記水平型の錫めっきセルは、図1に示した概略断面図のように、めっき槽1と、そのめっき槽の、鋼帯Sの進行方向の前後(即ち、入出側)に配設された通電ロール2とバックアックロール3のロール対とから構成されている。めっき槽1は、表面にゴムライニングが施されており、その内部には、めっき液4が満たされ、該めっき液4は循環されている。また、めっき槽1の内部には、金属錫からなる錫アノード(可溶性陽極)5が、コイル長手方向に長さを揃えてカーボン製あるいはチタンクラッド製のアノードベッド(通電支持台)6の上に並べて置かれている。アノードベッド6は、アノードがめっき時に次第に溶解しても、鋼帯Sとアノード5との間が常に25〜30mmの一定距離を保つよう、上面が板幅方向に勾配を有するよう設置されている。使用済みのアノード5は、板幅方向に押されて取り出され、他方の端からは、新しいアノードが供給される。   As shown in the schematic cross-sectional view shown in FIG. 1, the horizontal type tin plating cell is disposed on the plating tank 1 and on the front and rear sides of the steel strip S (that is, on the entry / exit side) of the plating tank. It consists of a pair of rolls of an energizing roll 2 and a back-up roll 3. The plating tank 1 has a rubber lining on the surface, and the inside thereof is filled with a plating solution 4, and the plating solution 4 is circulated. Inside the plating tank 1, a tin anode (soluble anode) 5 made of metallic tin is placed on a carbon or titanium clad anode bed (conducting support base) 6 with a uniform length in the longitudinal direction of the coil. They are placed side by side. The anode bed 6 is installed so that the upper surface has a gradient in the plate width direction so that a constant distance of 25 to 30 mm is always maintained between the steel strip S and the anode 5 even if the anode is gradually melted during plating. . The used anode 5 is pushed out in the plate width direction and taken out, and a new anode is supplied from the other end.

この水平型のめっきセルを用いた錫めっきは、以下のようにして行われる。めっき設備の入側で脱脂、酸洗された鋼帯Sは、通電ロール2およびバックアップロール3によりガイドされて、めっき槽1に搬入される(図1では、右から左側方向に)。めっき槽1内には、めっき液4が満たされており、鋼帯Sがめっきセルを通過する間、前記めっき液4が鋼帯Sの下面と常時接触するよう液面が管理されている。一方、錫アノード5および通電ロール2の間には、直流電源7および導体8を介して通電されており、金属錫からなる可溶性の錫アノードから錫を溶出させると共に、カソード(陰極)となる鋼帯Sの下面に金属錫を析出させることで錫めっきが行われる。   Tin plating using this horizontal plating cell is performed as follows. The steel strip S degreased and pickled on the entry side of the plating facility is guided by the energizing roll 2 and the backup roll 3 and carried into the plating tank 1 (from right to left in FIG. 1). The plating tank 1 is filled with a plating solution 4, and the liquid level is controlled so that the plating solution 4 is always in contact with the lower surface of the steel strip S while the steel strip S passes through the plating cell. On the other hand, the tin anode 5 and the energizing roll 2 are energized through a direct current power source 7 and a conductor 8, and steel is eluted from a soluble tin anode made of metallic tin and becomes a cathode (cathode). Tin plating is performed by depositing metallic tin on the lower surface of the band S.

ところで、図1に示したような水平型のめっきセルを用いて電気錫めっきを行う場合には、図2に示すように、鋼帯の進行に伴って、鋼帯の下面に接するめっき液が鋼帯と一緒に移動するとともに、鋼帯の上面にも廻り込んで液被りを起こし、めっき槽の下流側に位置する出側の通電ロールの前面に大きな液溜まりを形成する。その結果、非めっき面である鋼帯の上面にも金属錫が析出して、エッジ部のオーバーコーティングを引き起こすという問題がある。また、このエッジオーバーコーティングは、錫めっきにおける電流効率の低下や、錫原単位の低下を招くだけでなく、錫めっきした鋼帯をコイルに巻き取った際に、ビルドアップを引き起こすという問題もある。   By the way, when electrotin plating is performed using a horizontal type plating cell as shown in FIG. 1, as shown in FIG. 2, as the steel strip advances, the plating solution in contact with the lower surface of the steel strip is changed. While moving together with the steel strip, it also moves around the upper surface of the steel strip to cause liquid covering, and forms a large liquid pool on the front surface of the current-carrying roll on the downstream side of the plating tank. As a result, there is a problem that metal tin is deposited on the upper surface of the steel strip, which is a non-plated surface, and causes overcoating of the edge portion. In addition, this edge overcoating not only causes a decrease in current efficiency in tin plating and a reduction in tin basic unit, but also causes a build-up when a tin-plated steel strip is wound around a coil. .

さらに、前記鋼帯の進行に伴うめっき液の流れは、めっき槽下流におけるめっき液の集中をもたらしてスムーズな液流れを阻害するため、めっき液の滞留を引き起こす。めっき液が滞留すると、その部分の液温が上昇し、めっき液中に含まれる光沢剤の許容範囲を超える結果、リフロー後の錫めっき面表面が光沢不良を起こすという問題もある。   Furthermore, the flow of the plating solution accompanying the progress of the steel strip causes the concentration of the plating solution downstream of the plating tank and hinders the smooth liquid flow, thereby causing the plating solution to stay. When the plating solution stays, the temperature of the solution rises and exceeds the allowable range of the brightener contained in the plating solution. As a result, there is a problem that the surface of the tin-plated surface after reflow causes a gloss failure.

このような問題に対する対策として、例えば、特許文献1には、通電ロールの上流側に、鋼帯を挟んでロール対を設置し、液被りを防止する技術が開示されている。
特開2005−307250号公報
As a countermeasure against such a problem, for example, Patent Document 1 discloses a technique for preventing liquid covering by installing a roll pair with a steel strip sandwiched upstream of an energizing roll.
JP-A-2005-307250

前記特許文献1の技術は、出側の通電ロール前面での鋼帯上面への液被りを抑制する点で、非めっき面への金属錫の析出を低減するのに、それなりの効果を発揮する。しかし、単に液被りを抑制するだけでは、非めっき面への金属錫の析出や、めっき液の滞留に起因する表面品質の劣化を完全に防止するには程遠いのが実情であった。   The technique of the said patent document 1 exhibits a moderate effect in reducing the precipitation of metallic tin to a non-plating surface at the point which suppresses the liquid covering to the steel strip upper surface in the electricity supply roll front surface of an exit side. . However, the actual situation is that it is far from simply preventing the deposition of metallic tin on the non-plated surface and the deterioration of the surface quality due to the retention of the plating solution simply by suppressing the liquid covering.

そこで、本発明の目的は、エッジオーバーコーティングを防止すると共に、表面品質にも優れる錫めっき鋼帯の製造方法と、その製造に用いる水平型錫めっきセルを提供することにある。   Therefore, an object of the present invention is to provide a method for producing a tin-plated steel strip that prevents edge overcoating and is excellent in surface quality, and a horizontal tin-plating cell used for the production.

発明者らは、従来技術が抱える前記問題点を解決するために鋭意検討を重ねた。その結果、水平型錫めっきセルにおいて、めっき槽の出側にめっき液排出口を設けて、鋼帯の進行に伴って移動してくるめっき液を排出してやれば、めっき液の流れもスムーズとなり、通電ロール前面の液溜まりを解消できると共に、めっき液の滞留も解消され、ひいては、非めっき面への金属錫の析出や表面品質の劣化を効果的に抑制できることを見出し、本発明を完成させた。   The inventors have intensively studied in order to solve the above-described problems of the prior art. As a result, in the horizontal tin plating cell, if the plating solution discharge port is provided on the outlet side of the plating tank and the plating solution moving with the progress of the steel strip is discharged, the flow of the plating solution will be smooth. The liquid pool on the front surface of the energizing roll can be eliminated, and the retention of the plating solution is also eliminated. As a result, it has been found that the deposition of metallic tin on the non-plated surface and the deterioration of the surface quality can be effectively suppressed, and the present invention has been completed. .

すなわち、本発明は、可溶性の錫アノードとめっき液を備えるめっき槽と、該めっき槽の入側と出側のそれぞれに配設され、被めっき鋼帯を連続的に搬送する通電ロールとバックアップロールのロール対とからなる水平型めっきセルを用いて、前記錫アノードと被めっき鋼帯との間に通電して錫めっき鋼帯を製造する方法において、前記めっき槽の出側にめっき液排出口を設けたメタンスルホン酸浴の水平型錫めっきセルを用いることを特徴とする錫めっき鋼帯の製造方法である。 That is, the present invention relates to a plating tank having a soluble tin anode and a plating solution, and an energizing roll and a backup roll that are arranged on each of the inlet side and the outlet side of the plating tank and continuously convey the steel strip to be plated. In a method for producing a tin-plated steel strip by energizing between the tin anode and the steel strip to be plated using a horizontal tin plating cell comprising a pair of rolls, a plating solution is discharged on the outlet side of the plating tank. A method for producing a tin-plated steel strip characterized by using a horizontal tin-plating cell of a methanesulfonic acid bath provided with an outlet.

また、本発明は、可溶性の錫アノードとめっき液を備えるめっき槽と、該めっき槽の入側と出側のそれぞれに配設され、被めっき鋼帯を連続的に搬送する通電ロールとバックアップロールのロール対とからなる水平型めっきセルにおいて、前記めっき槽の出側にめっき液排出口を設けてなることを特徴とするメタンスルホン酸浴の水平型錫めっきセルである。 The present invention also provides a plating tank having a soluble tin anode and a plating solution, and an energizing roll and a backup roll that are disposed on each of the entry side and the exit side of the plating tank and continuously convey the steel strip to be plated. A horizontal tin plating cell for a methanesulfonic acid bath , wherein a plating solution discharge port is provided on the outlet side of the plating tank.

本発明によれば、水平型錫めっきセルにおけるめっき槽中のめっき液の流れをスムーズにし、通電ロール前面における液溜まりとめっき槽下流側のめっき液の滞留を解消することができるので、非めっき面への金属錫の析出を大幅に低減できると共に、表面品質の向上を図ることができる。また、非めっき面への金属錫の析出低減により、錫めっきにおける電流効率の向上、錫原単位の低減を図ることができる。   According to the present invention, since the flow of the plating solution in the plating tank in the horizontal tin plating cell can be made smooth, the liquid pool on the front surface of the energizing roll and the stay of the plating solution on the downstream side of the plating tank can be eliminated. Precipitation of metallic tin on the surface can be greatly reduced, and surface quality can be improved. In addition, by reducing the deposition of metallic tin on the non-plated surface, it is possible to improve the current efficiency in tin plating and reduce the tin basic unit.

発明者らは、従来技術における非めっき表面への金属錫の析出およびめっき液の滞留の原因とその防止策について検討した。その結果、前記2つの問題は、いずれも、めっき処理中に、鋼帯の進行に伴って起こるめっき液の下流方向への流れに起因しており、したがって、このめっき液の流れを制御すればよいことに想到した。   The inventors examined the cause of metal tin deposition on the non-plated surface and the stagnation of the plating solution and the preventive measures thereof in the prior art. As a result, both of the two problems are caused by the downstream flow of the plating solution that occurs as the steel strip progresses during the plating process. Therefore, if the flow of the plating solution is controlled, I came up with a good thing.

従来の水平型錫めっきセルにおけるめっき槽内の液の流れを、図2中に黒矢印で示した。従来セルでは、めっき液は、めっき槽の入側の底部から供給され、めっき槽内を循環しためっき液は、めっき槽の入側上部から溢れ出させて排出していた。一方、めっき中は、前記めっき液の流れとは別の、鋼帯の進行に伴って起こるめっき液の流れが発生し、その流れが直接、出側通電ロールの前面に当たっていた。しかも、めっき槽の出側には、めっき液の排出口がないため、通電ロールの前面に大きな液溜まりが発生すると共に、めっき液の液面の上昇を引き起こして、非めっき面(鋼帯上面)への液被りを助長していた。さらに、めっき槽の出側に移動しためっき液は、行き場がないため、めっき槽の出側で滞留を起こし、めっき液の温度上昇を引き起こしていたものと推定された。   The flow of the liquid in the plating tank in the conventional horizontal tin plating cell is indicated by black arrows in FIG. In the conventional cell, the plating solution is supplied from the bottom on the entry side of the plating tank, and the plating solution that circulates in the plating tank overflows from the entry side upper portion of the plating tank and is discharged. On the other hand, during plating, a flow of the plating solution that occurs with the progress of the steel strip, which is different from the flow of the plating solution, occurred, and the flow directly hit the front surface of the delivery-side energizing roll. Moreover, since there is no discharge port for the plating solution on the outlet side of the plating tank, a large liquid pool is generated on the front surface of the energizing roll, and the liquid level of the plating solution is increased. ). Furthermore, since the plating solution moved to the outlet side of the plating tank had no place to go, it was estimated that the plating solution stayed on the outlet side of the plating tank and caused an increase in the temperature of the plating solution.

そこで、発明者らは、めっきセルの構造を改造し、めっき槽の出側に、めっき液を排出するための排出口を設けることに想到し、本発明を完成させた。   Therefore, the inventors conceived of modifying the structure of the plating cell and providing a discharge port for discharging the plating solution on the outlet side of the plating tank, thereby completing the present invention.

図3は、本発明のめっきセルの一例を示したもので、鋼帯の進行に伴ってめっき液が集中するめっきセルの下流側(出側)部分を改造し、めっき液を排出するためのめっき液排出口9を新たに設置したものである。また、図中には、このめっき液排出口9の設置によって変化しためっき液の流れを黒矢印で示した。これから、従来のめっきセルでは、出側の通電ロールに達しためっき液が大きな液溜まりを形成していたが、本発明のめっきセルでは、通電ロールの直前に設置されためっき液排出口からめっき液が排出される結果、出側通電ロールの直前に形成される液溜まりは、非常に小さなものとなる。さらに、液溜まりが小さくなったことに伴い、めっき槽の液面も低下するため、鋼帯の上面に形成される液被りも減少するという効果も得られる。しかも、めっき液排出口からめっき液が排出される結果、めっき槽下流に発生していためっき液の滞留もなくなり、めっき槽内のめっき液の温度も均一化する。   FIG. 3 shows an example of the plating cell according to the present invention, which is for modifying the downstream side (exit side) of the plating cell where the plating solution concentrates as the steel strip progresses, and for discharging the plating solution. A plating solution discharge port 9 is newly installed. Further, in the figure, the flow of the plating solution changed by the installation of the plating solution discharge port 9 is indicated by a black arrow. From this, in the conventional plating cell, the plating solution that reached the outlet energizing roll formed a large liquid pool, but in the plating cell of the present invention, plating was performed from the plating solution discharge port installed immediately before the energizing roll. As a result of discharging the liquid, the liquid pool formed immediately before the outlet-side energizing roll becomes very small. Furthermore, since the liquid level of the plating tank is lowered as the liquid pool is reduced, an effect of reducing the liquid covering formed on the upper surface of the steel strip is also obtained. In addition, as a result of the plating solution being discharged from the plating solution discharge port, the retention of the plating solution generated downstream of the plating bath is eliminated, and the temperature of the plating solution in the plating bath is also made uniform.

その結果、本発明のめっきセルを用いて錫めっき鋼帯を製造した場合には、非めっき面への金属錫の析出が減少して、エッジオーバーコーティングによる不良が低減するだけでなく、めっき液の温度上昇による光沢不良も低減することができる。さらに、非めっき面への金属錫の析出が減少する結果、めっき原料である錫の原単位向上や、電流効率の向上を達成することができる。また、本発明のめっきセルを用いた場合には、通電ロール前面における液溜まりを抑制し、通電ロールへの金属錫の析出を防止することができるので、通電ロール表面に析出した金属錫の剥離による錫粉付着や押疵等の表面欠陥による不良の軽減にも効果がある。   As a result, when the tin-plated steel strip is manufactured using the plating cell of the present invention, the deposition of metallic tin on the non-plated surface is reduced, not only the defects due to edge overcoating are reduced, but also the plating solution Gloss defects due to temperature rise can also be reduced. Furthermore, as a result of the decrease in the deposition of metallic tin on the non-plated surface, it is possible to achieve an improvement in the basic unit of tin as a plating raw material and an improvement in current efficiency. In addition, when the plating cell of the present invention is used, it is possible to suppress the accumulation of liquid on the front surface of the energizing roll and to prevent the deposition of metallic tin on the energizing roll. It is also effective in reducing defects caused by surface defects such as adhesion of tin powder and squeezing.

なお、本発明のめっき槽に設置するめっき液排出口は、めっき槽出側で鋼帯が通過しない板幅方向の両端部の、板幅方向中心に対して対称となる位置に設けることが好ましい。このめっき液排出口は、めっき液の排出量を調整できるよう、開口面積を調整できるものであることが好ましい。さらに、このめっき槽のめっき液排出口の液流れ上流側には、遮蔽ダム(堰)を設けることが好ましい。このダムによって鋼帯の進行に伴うめっき液の流れを遮蔽することができると共に、液被りを抑制する効果が高まり、通電ロールへの金属錫の析出を効果的に防止することができる。図4は、遮蔽ダムを設けた本発明の他のめっきセルの例を示したものである。   In addition, it is preferable to provide the plating solution discharge port installed in the plating tank of the present invention at positions symmetrical with respect to the center in the plate width direction at both ends in the plate width direction where the steel strip does not pass on the plating tank exit side. . It is preferable that this plating solution discharge port can adjust the opening area so that the discharge amount of the plating solution can be adjusted. Furthermore, it is preferable to provide a shielding dam (weir) on the upstream side of the plating solution outlet of the plating tank. This dam can block the flow of the plating solution accompanying the progress of the steel strip, increase the effect of suppressing the liquid covering, and can effectively prevent the precipitation of metallic tin on the energizing roll. FIG. 4 shows an example of another plating cell of the present invention provided with a shielding dam.

また、本発明の錫めっき槽は、水平型錫めっきセルを用いる電気めっき設備であれば、めっき槽の種類によらず、いずれにも適用することができるが、メタンスルホン酸浴を用いためっき設備に適用することが好ましい。というのは、メタンスルホン酸浴はpHが低く、鋼帯からのFeの溶出が起こり易いので、液被り抑制効果がある本発明のめっきセルは、Fe濃度の上昇を抑える効果が大きいからである。   Moreover, the tin plating tank of the present invention can be applied to any electroplating equipment that uses a horizontal tin plating cell, regardless of the type of plating tank, but plating using a methanesulfonic acid bath It is preferable to apply to equipment. This is because the methanesulfonic acid bath has a low pH and the elution of Fe from the steel strip is likely to occur, so that the plating cell of the present invention having a liquid covering suppression effect has a large effect of suppressing an increase in Fe concentration. .

メタンスルホン酸浴の水平型錫めっきセルを最下段に10セル、中段に10セル配列した電気錫めっき設備において、図2に示した従来タイプのめっきセルと、図3および図4に示した本発明のめっき液排出口を有するめっきセルを用いて、錫付着量が1.12/1.12(g/m)の工程材を対象にして、表1に示しためっき条件で錫めっき鋼帯をそれぞれ100コイルと50コイル製造し下記の項目を比較した。
a.エッジオーバーコーティング量:
5コイルに1回の頻度で、めっき鋼帯のエッジ5mm部分の表面錫量をJIS G3303;2002に規定された電解剥離法で、表裏両端の計4箇所に付着した錫の付着量を測定し、従来のめっきセルにおける錫の付着量を1.0とし、本発明セルにおけるエッジオーバーコーティング量を相対比較した。
b.通電ロールへの金属錫析出発生率:
錫めっき設備で、5コイルに1回の頻度で、通電ロールを目視観察し、1セルでも通電ロールに金属錫の析出が確認された場合には、通電ロールへの金属錫析出発生と評価し、従来のめっきセルにおける発生率を1.0とし、本発明セルにおける発生率を相対比較した。
c.めっき槽内のめっき液温度のばらつき:
5コイルに1回の頻度で、任意の1セルにおいて、めっき槽内の3箇所(めっき液流入口、めっき液排出口2箇所)のめっき液の温度を測定し、(最高温度−最低温度)を液温のばらつきとして求めた。
In an electric tin plating facility in which horizontal tin plating cells of a methanesulfonic acid bath are arranged at 10 cells at the bottom and 10 cells at the middle, the conventional type plating cell shown in FIG. 2 and the book shown in FIG. 3 and FIG. Using the plating cell having the plating solution discharge port according to the invention, tin-plated steel is applied under the plating conditions shown in Table 1 for a process material having a tin adhesion amount of 1.12 / 1.12 (g / m 2 ). 100 coils and 50 coils were manufactured for each band, and the following items were compared.
a. Edge overcoating amount:
Measure the amount of tin adhered to the total of four locations on both sides of the front and back using the electrolytic stripping method specified in JIS G3303; The adhesion amount of tin in the conventional plating cell was 1.0, and the edge overcoating amount in the cell of the present invention was relatively compared.
b. Incidence of metal tin deposition on current rolls:
In the tin plating facility, the current-carrying roll is visually observed once every 5 coils, and when metal tin is deposited on the current-carrying roll even in one cell, it is evaluated that metal tin is deposited on the current-carrying roll. The occurrence rate in the conventional plating cell was 1.0, and the occurrence rate in the cell of the present invention was relatively compared.
c. Variation in plating solution temperature in plating tank:
Measure the temperature of the plating solution at three locations in the plating tank (plating solution inlet and plating solution outlet 2 locations) in any one cell at a frequency of once every 5 coils. (Maximum temperature-Minimum temperature) Was determined as a variation in liquid temperature.

前記測定の結果を、表1に併記して示した。表1から、本発明のめっきセルを用いた場合には、従来タイプのめっきセルに比較して、エッジオーバーコーティングの量や、通電ロールへの金属錫析出発生率を大幅に低減できるだけでなく、めっき槽内のめっき液温度の均一化を達成することができる。さらに、本発明のめっきセルを用いた場合には、メタンスルホン酸浴におけるFeの溶出量を、約2割低減できることも、別途行った調査でわかった。   The results of the measurement are shown together in Table 1. From Table 1, when using the plating cell of the present invention, compared to the conventional type of plating cell, not only can the amount of edge overcoating and the occurrence rate of metal tin deposition on the energizing roll be significantly reduced, Uniformity of the plating solution temperature in the plating tank can be achieved. Furthermore, it was also found in a separate investigation that the amount of Fe elution in the methanesulfonic acid bath can be reduced by about 20% when the plating cell of the present invention is used.

Figure 0004710619
Figure 0004710619

水平型めっきセルの構造を説明する図である。It is a figure explaining the structure of a horizontal type plating cell. 従来の水平型めっきセルを説明する図である。It is a figure explaining the conventional horizontal type plating cell. 本発明の水平型めっきセルを説明する図である。It is a figure explaining the horizontal type plating cell of the present invention. 本発明の水平型めっきセルの他の例を説明する図である。It is a figure explaining the other example of the horizontal type plating cell of this invention.

符号の説明Explanation of symbols

S:鋼帯
1:めっき槽
2:通電ロール
3:バックアップロール
4:めっき液
5:錫アノード(可溶性陽極)
6:アノードベッド(通電支持台)
7:直流電源
8:導体
9:めっき液排出口
10:遮蔽ダム
S: steel strip 1: plating tank 2: energizing roll 3: backup roll 4: plating solution 5: tin anode (soluble anode)
6: Anode bed (energizing support)
7: DC power supply 8: Conductor 9: Plating solution outlet 10: Shielding dam

Claims (2)

可溶性の錫アノードとめっき液を備えるめっき槽と、該めっき槽の入側と出側のそれぞれに配設され、被めっき鋼帯を連続的に搬送する通電ロールとバックアップロールのロール対とからなる水平型めっきセルを用いて、前記錫アノードと被めっき鋼帯との間に通電して錫めっき鋼帯を製造する方法において、前記めっき槽の出側にめっき液排出口を設けたメタンスルホン酸浴の水平型錫めっきセルを用いることを特徴とする錫めっき鋼帯の製造方法。 A plating tank comprising a soluble tin anode and a plating solution, and a pair of rolls of an energizing roll and a backup roll that are disposed on the entry side and the exit side of the plating tank and continuously convey the steel strip to be plated. In a method for producing a tin-plated steel strip by energizing between the tin anode and the steel strip to be plated using a horizontal tin plating cell, methanesulfone provided with a plating solution outlet on the outlet side of the plating tank A method for producing a tin-plated steel strip, characterized by using an acid bath horizontal tin-plating cell. 可溶性の錫アノードとめっき液を備えるめっき槽と、該めっき槽の入側と出側のそれぞれに配設され、被めっき鋼帯を連続的に搬送する通電ロールとバックアップロールのロール対とからなる水平型めっきセルにおいて、前記めっき槽の出側にめっき液排出口を設けてなることを特徴とするメタンスルホン酸浴の水平型錫めっきセル A plating tank comprising a soluble tin anode and a plating solution, and a pair of rolls of an energizing roll and a backup roll that are disposed on the entry side and the exit side of the plating tank and continuously convey the steel strip to be plated. A horizontal tin plating cell for a methanesulfonic acid bath, characterized in that a plating solution discharge port is provided on the outlet side of the plating tank .
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02153094A (en) * 1988-12-02 1990-06-12 Nippon Steel Corp Production of stock for welded can having superior corrosion resistance and suitability to coating and electric resistance seam welding
JPH02225696A (en) * 1989-02-28 1990-09-07 Kawasaki Steel Corp Plating tank in halide-bath tin electroplating line
JPH08277492A (en) * 1995-04-04 1996-10-22 Nippon Steel Corp Horizontal electroplating device
JP2005307250A (en) * 2004-04-20 2005-11-04 Jfe Steel Kk Method for producing tinned steel strip and horizontal tinning cell

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02153094A (en) * 1988-12-02 1990-06-12 Nippon Steel Corp Production of stock for welded can having superior corrosion resistance and suitability to coating and electric resistance seam welding
JPH02225696A (en) * 1989-02-28 1990-09-07 Kawasaki Steel Corp Plating tank in halide-bath tin electroplating line
JPH08277492A (en) * 1995-04-04 1996-10-22 Nippon Steel Corp Horizontal electroplating device
JP2005307250A (en) * 2004-04-20 2005-11-04 Jfe Steel Kk Method for producing tinned steel strip and horizontal tinning cell

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