JPS6142833U - Wafer holder for semiconductor manufacturing equipment - Google Patents

Wafer holder for semiconductor manufacturing equipment

Info

Publication number
JPS6142833U
JPS6142833U JP12659384U JP12659384U JPS6142833U JP S6142833 U JPS6142833 U JP S6142833U JP 12659384 U JP12659384 U JP 12659384U JP 12659384 U JP12659384 U JP 12659384U JP S6142833 U JPS6142833 U JP S6142833U
Authority
JP
Japan
Prior art keywords
manufacturing equipment
semiconductor manufacturing
wafer holder
support
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12659384U
Other languages
Japanese (ja)
Inventor
浩二 北島
直樹 加藤
Original Assignee
株式会社東芝
株式会社徳田製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社東芝, 株式会社徳田製作所 filed Critical 株式会社東芝
Priority to JP12659384U priority Critical patent/JPS6142833U/en
Publication of JPS6142833U publication Critical patent/JPS6142833U/en
Pending legal-status Critical Current

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案の一実施例に係るウエハ保持具の斜視図
、第２図は第１図の保持具の正面図、第３図乃至第５図
はそれぞれ従来のウエハ保持具の斜視図である。 ３１・・・保持具本体、３２〜３５・・・支持棒、３６
・・・溝、３７１，３７２〜４１，４１。 ・・・支持脚、Ａ・・・水平面、Ｂ・・・傾斜面。FIG. 1 is a perspective view of a wafer holder according to an embodiment of the present invention, FIG. 2 is a front view of the holder shown in FIG. 1, and FIGS. 3 to 5 are perspective views of conventional wafer holders. It is. 31... Holder main body, 32-35... Support rod, 36
...Groove, 371,372-41,41. ...Support leg, A...Horizontal surface, B...Slope surface.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体製造装置の横型反応炉に用いられ、半導体ウエハ
を所定の位置に保持するウエハ保持具に於いて、保持具
本体と、この保持具本体を支える複数の支持脚と、これ
ら支持脚の各底面部に設けられた水平面と、この水平面
部に連続して前記支持脚の各外側側面部に設けられた傾
斜面とを具備したことを特徴とする半導体製造装置用ウ
エハ保持具。A wafer holder that is used in a horizontal reactor of a semiconductor manufacturing equipment and holds a semiconductor wafer in a predetermined position includes a holder body, a plurality of support legs that support the holder body, and the bottom surface of each of these support legs. 1. A wafer holder for semiconductor manufacturing equipment, comprising: a horizontal surface provided on the support leg; and an inclined surface continuous with the horizontal surface provided on each outer side surface of the support leg.
JP12659384U 1984-08-21 1984-08-21 Wafer holder for semiconductor manufacturing equipment Pending JPS6142833U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12659384U JPS6142833U (en) 1984-08-21 1984-08-21 Wafer holder for semiconductor manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12659384U JPS6142833U (en) 1984-08-21 1984-08-21 Wafer holder for semiconductor manufacturing equipment

Publications (1)

Publication Number Publication Date
JPS6142833U true JPS6142833U (en) 1986-03-19

Family

ID=30685268

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12659384U Pending JPS6142833U (en) 1984-08-21 1984-08-21 Wafer holder for semiconductor manufacturing equipment

Country Status (1)

Country Link
JP (1) JPS6142833U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02104630U (en) * 1988-11-25 1990-08-20

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5213778A (en) * 1975-07-23 1977-02-02 Toshiba Corp Plasma-etching method
JPS58125617A (en) * 1982-12-13 1983-07-26 Fujitsu Ltd Preparation of quartz tool

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5213778A (en) * 1975-07-23 1977-02-02 Toshiba Corp Plasma-etching method
JPS58125617A (en) * 1982-12-13 1983-07-26 Fujitsu Ltd Preparation of quartz tool

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02104630U (en) * 1988-11-25 1990-08-20

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