JPS6142796B2 - - Google Patents
Info
- Publication number
- JPS6142796B2 JPS6142796B2 JP2024783A JP2024783A JPS6142796B2 JP S6142796 B2 JPS6142796 B2 JP S6142796B2 JP 2024783 A JP2024783 A JP 2024783A JP 2024783 A JP2024783 A JP 2024783A JP S6142796 B2 JPS6142796 B2 JP S6142796B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- stainless steel
- mol
- ions
- hydrochloric acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 32
- 229910001220 stainless steel Inorganic materials 0.000 claims description 26
- 239000010935 stainless steel Substances 0.000 claims description 25
- 238000005868 electrolysis reaction Methods 0.000 claims description 8
- 229910001429 cobalt ion Inorganic materials 0.000 claims description 6
- 229910001449 indium ion Inorganic materials 0.000 claims description 6
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims description 5
- 229910001432 tin ion Inorganic materials 0.000 claims description 5
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 238000002203 pretreatment Methods 0.000 claims description 3
- 238000007747 plating Methods 0.000 description 35
- 239000000463 material Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 230000004913 activation Effects 0.000 description 7
- 239000010931 gold Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000005238 degreasing Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- 229910052703 rhodium Inorganic materials 0.000 description 3
- 239000010948 rhodium Substances 0.000 description 3
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- 229910001245 Sb alloy Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- -1 chlorine ions Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- BZOVBIIWPDQIHF-UHFFFAOYSA-N 3-hydroxy-2-methylbenzenesulfonic acid Chemical compound CC1=C(O)C=CC=C1S(O)(=O)=O BZOVBIIWPDQIHF-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910000963 austenitic stainless steel Inorganic materials 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013527 degreasing agent Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 235000021110 pickles Nutrition 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- LFAGQMCIGQNPJG-UHFFFAOYSA-N silver cyanide Chemical compound [Ag+].N#[C-] LFAGQMCIGQNPJG-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024783A JPS59145795A (ja) | 1983-02-09 | 1983-02-09 | 被メツキステンレス鋼の前処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024783A JPS59145795A (ja) | 1983-02-09 | 1983-02-09 | 被メツキステンレス鋼の前処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59145795A JPS59145795A (ja) | 1984-08-21 |
| JPS6142796B2 true JPS6142796B2 (enrdf_load_stackoverflow) | 1986-09-24 |
Family
ID=12021860
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024783A Granted JPS59145795A (ja) | 1983-02-09 | 1983-02-09 | 被メツキステンレス鋼の前処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59145795A (enrdf_load_stackoverflow) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011216921A (ja) * | 2002-12-27 | 2011-10-27 | Kyushu Hitachi Maxell Ltd | 半導体装置および半導体装置の製造方法 |
| JP2013042187A (ja) * | 2012-11-29 | 2013-02-28 | Hitachi Maxell Ltd | 半導体装置 |
| JP2013058816A (ja) * | 2012-12-28 | 2013-03-28 | Hitachi Maxell Ltd | 半導体装置用の中間部品および半導体装置用の中間部品の製造方法 |
| JP2013168686A (ja) * | 2013-06-03 | 2013-08-29 | Hitachi Maxell Ltd | 半導体装置および半導体装置の製造方法 |
| JP2015233166A (ja) * | 2015-10-01 | 2015-12-24 | 日立マクセル株式会社 | 半導体装置および半導体装置の製造方法 |
| JP2017005261A (ja) * | 2016-08-22 | 2017-01-05 | 日立マクセル株式会社 | 半導体装置および半導体装置の製造方法 |
| JP2017118131A (ja) * | 2017-02-13 | 2017-06-29 | 日立マクセル株式会社 | 半導体装置用中間部品およびその製造方法、並びに半導体装置およびその製造方法 |
| JP2017195414A (ja) * | 2017-07-20 | 2017-10-26 | 日立マクセル株式会社 | 半導体装置および半導体装置の製造方法 |
| JP2018029214A (ja) * | 2017-11-24 | 2018-02-22 | マクセルホールディングス株式会社 | 半導体装置および半導体装置の製造方法 |
| JP2018160707A (ja) * | 2018-07-23 | 2018-10-11 | マクセルホールディングス株式会社 | 半導体装置および半導体装置の製造方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2692284B1 (fr) * | 1992-06-12 | 1995-06-30 | Ugine Sa | Tole revetue et procede de fabrication de cette tole. |
-
1983
- 1983-02-09 JP JP2024783A patent/JPS59145795A/ja active Granted
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011216921A (ja) * | 2002-12-27 | 2011-10-27 | Kyushu Hitachi Maxell Ltd | 半導体装置および半導体装置の製造方法 |
| JP2013042187A (ja) * | 2012-11-29 | 2013-02-28 | Hitachi Maxell Ltd | 半導体装置 |
| JP2013058816A (ja) * | 2012-12-28 | 2013-03-28 | Hitachi Maxell Ltd | 半導体装置用の中間部品および半導体装置用の中間部品の製造方法 |
| JP2013168686A (ja) * | 2013-06-03 | 2013-08-29 | Hitachi Maxell Ltd | 半導体装置および半導体装置の製造方法 |
| JP2015233166A (ja) * | 2015-10-01 | 2015-12-24 | 日立マクセル株式会社 | 半導体装置および半導体装置の製造方法 |
| JP2017005261A (ja) * | 2016-08-22 | 2017-01-05 | 日立マクセル株式会社 | 半導体装置および半導体装置の製造方法 |
| JP2017118131A (ja) * | 2017-02-13 | 2017-06-29 | 日立マクセル株式会社 | 半導体装置用中間部品およびその製造方法、並びに半導体装置およびその製造方法 |
| JP2017195414A (ja) * | 2017-07-20 | 2017-10-26 | 日立マクセル株式会社 | 半導体装置および半導体装置の製造方法 |
| JP2018029214A (ja) * | 2017-11-24 | 2018-02-22 | マクセルホールディングス株式会社 | 半導体装置および半導体装置の製造方法 |
| JP2018160707A (ja) * | 2018-07-23 | 2018-10-11 | マクセルホールディングス株式会社 | 半導体装置および半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59145795A (ja) | 1984-08-21 |
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