JPS6142321A - シランガス処理装置 - Google Patents

シランガス処理装置

Info

Publication number
JPS6142321A
JPS6142321A JP59164738A JP16473884A JPS6142321A JP S6142321 A JPS6142321 A JP S6142321A JP 59164738 A JP59164738 A JP 59164738A JP 16473884 A JP16473884 A JP 16473884A JP S6142321 A JPS6142321 A JP S6142321A
Authority
JP
Japan
Prior art keywords
gas
casing
cylindrical filter
introduction pipe
silane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59164738A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0331085B2 (OSRAM
Inventor
Fujio Noguchi
野口　富士男
Toshiro Kato
敏郎 加藤
Koji Nagai
永井　幸二
Isao Motohori
勲 本堀
Yoshihiro Ueda
植田　美洋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON METSUSHIYU ENG KK
Sony Corp
Original Assignee
NIPPON METSUSHIYU ENG KK
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON METSUSHIYU ENG KK, Sony Corp filed Critical NIPPON METSUSHIYU ENG KK
Priority to JP59164738A priority Critical patent/JPS6142321A/ja
Publication of JPS6142321A publication Critical patent/JPS6142321A/ja
Publication of JPH0331085B2 publication Critical patent/JPH0331085B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)
JP59164738A 1984-08-06 1984-08-06 シランガス処理装置 Granted JPS6142321A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59164738A JPS6142321A (ja) 1984-08-06 1984-08-06 シランガス処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59164738A JPS6142321A (ja) 1984-08-06 1984-08-06 シランガス処理装置

Publications (2)

Publication Number Publication Date
JPS6142321A true JPS6142321A (ja) 1986-02-28
JPH0331085B2 JPH0331085B2 (OSRAM) 1991-05-02

Family

ID=15798962

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59164738A Granted JPS6142321A (ja) 1984-08-06 1984-08-06 シランガス処理装置

Country Status (1)

Country Link
JP (1) JPS6142321A (OSRAM)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61115129U (OSRAM) * 1984-12-28 1986-07-21
US6638343B1 (en) 1998-12-01 2003-10-28 Ebara Corporation Exhaust gas treating device
US6969250B1 (en) 1998-12-01 2005-11-29 Ebara Corporation Exhaust gas treating device
JP2013039521A (ja) * 2011-08-15 2013-02-28 Taiyo Nippon Sanso Corp ガス処理方法、ガス処理装置、微粉末の形成方法及び微粉末形成装置
CN112915748A (zh) * 2021-02-03 2021-06-08 湖州加怡新市热电有限公司 一种烟气脱硫系统

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49119869U (OSRAM) * 1973-02-12 1974-10-14
JPS5312777A (en) * 1976-07-22 1978-02-04 Sony Corp Centrifugal gas washing and separation apparatus
JPS54101675U (OSRAM) * 1977-12-28 1979-07-18
JPS5657423A (en) * 1979-10-16 1981-05-19 Matsushita Electric Industrial Co Ltd Central cleaner
JPS5658515A (en) * 1979-10-17 1981-05-21 Hitachi Ltd Dust collecting apparatus
JPS5684619A (en) * 1979-12-12 1981-07-10 Seitetsu Kagaku Co Ltd Nonpolluting method of gas for semiconductor
JPS5794323A (en) * 1980-12-03 1982-06-11 Stanley Electric Co Ltd Treating method for waste gas of cvd apparatus

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49119869U (OSRAM) * 1973-02-12 1974-10-14
JPS5312777A (en) * 1976-07-22 1978-02-04 Sony Corp Centrifugal gas washing and separation apparatus
JPS54101675U (OSRAM) * 1977-12-28 1979-07-18
JPS5657423A (en) * 1979-10-16 1981-05-19 Matsushita Electric Industrial Co Ltd Central cleaner
JPS5658515A (en) * 1979-10-17 1981-05-21 Hitachi Ltd Dust collecting apparatus
JPS5684619A (en) * 1979-12-12 1981-07-10 Seitetsu Kagaku Co Ltd Nonpolluting method of gas for semiconductor
JPS5794323A (en) * 1980-12-03 1982-06-11 Stanley Electric Co Ltd Treating method for waste gas of cvd apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61115129U (OSRAM) * 1984-12-28 1986-07-21
US6638343B1 (en) 1998-12-01 2003-10-28 Ebara Corporation Exhaust gas treating device
US6969250B1 (en) 1998-12-01 2005-11-29 Ebara Corporation Exhaust gas treating device
JP2013039521A (ja) * 2011-08-15 2013-02-28 Taiyo Nippon Sanso Corp ガス処理方法、ガス処理装置、微粉末の形成方法及び微粉末形成装置
CN112915748A (zh) * 2021-02-03 2021-06-08 湖州加怡新市热电有限公司 一种烟气脱硫系统

Also Published As

Publication number Publication date
JPH0331085B2 (OSRAM) 1991-05-02

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