JPS6138758U - Electron beam diaphragm - Google Patents
Electron beam diaphragmInfo
- Publication number
- JPS6138758U JPS6138758U JP12427684U JP12427684U JPS6138758U JP S6138758 U JPS6138758 U JP S6138758U JP 12427684 U JP12427684 U JP 12427684U JP 12427684 U JP12427684 U JP 12427684U JP S6138758 U JPS6138758 U JP S6138758U
- Authority
- JP
- Japan
- Prior art keywords
- aperture
- electron beam
- central cylinder
- positioning base
- circumferential surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
図面は本考案の実施例を示すもので、第１図は電子線絞
り装置の縦断面図、第２図は同装置の横断面図、第３図
は位置決め基体の斜視図である。
１・・・電子線絞り装置、８・・・中心円筒、１０・・
・絞り手段、１２・・・絞り孔、１４・・一絞り板部、
１６・・・係合部、１８・・・位置決め基体。The drawings show an embodiment of the present invention; FIG. 1 is a longitudinal cross-sectional view of an electron beam diaphragm device, FIG. 2 is a cross-sectional view of the same device, and FIG. 3 is a perspective view of a positioning base. 1... Electron beam diaphragm device, 8... Center cylinder, 10...
・Aperture means, 12... Aperture hole, 14... One aperture plate part,
16... Engaging portion, 18... Positioning base.
Claims (1)
径方向外方に配置された複数の絞り手段とを備え、これ
らの各絞り手段は前記中心円筒の外周面に当接離間自在
に設けられるとともに、中心に絞り孔が形成された絞り
板部とこの絞り板部、を保持する断面円弧状の保合部と
が形成された位置決め基体を有し、この位置決め基体の
前記係合部の内周面が前起中心円筒の外周面と同径に形
成されていることを特徴とする電子線絞り装置。It comprises a central cylinder arranged on the optical axis of the electron beam and a plurality of aperture means arranged radially outward of this central cylinder, each of these aperture means being able to come into contact with and separate from the outer peripheral surface of the central cylinder. and a positioning base formed with an aperture plate portion having an aperture hole formed in the center and a retaining portion having an arcuate cross section for holding the aperture plate portion, and the engagement portion of the positioning base An electron beam aperture device characterized in that an inner circumferential surface of the part is formed to have the same diameter as an outer circumferential surface of a protrusive center cylinder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12427684U JPS6138758U (en) | 1984-08-13 | 1984-08-13 | Electron beam diaphragm |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12427684U JPS6138758U (en) | 1984-08-13 | 1984-08-13 | Electron beam diaphragm |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6138758U true JPS6138758U (en) | 1986-03-11 |
| JPH0347246Y2 JPH0347246Y2 (en) | 1991-10-08 |
Family
ID=30683003
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12427684U Granted JPS6138758U (en) | 1984-08-13 | 1984-08-13 | Electron beam diaphragm |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6138758U (en) |
-
1984
- 1984-08-13 JP JP12427684U patent/JPS6138758U/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0347246Y2 (en) | 1991-10-08 |
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