JPS6132942A - Electron gun - Google Patents

Electron gun

Info

Publication number
JPS6132942A
JPS6132942A JP15400984A JP15400984A JPS6132942A JP S6132942 A JPS6132942 A JP S6132942A JP 15400984 A JP15400984 A JP 15400984A JP 15400984 A JP15400984 A JP 15400984A JP S6132942 A JPS6132942 A JP S6132942A
Authority
JP
Japan
Prior art keywords
electrode
resistor
grid
support body
electron gun
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15400984A
Other languages
Japanese (ja)
Inventor
Eiji Kanbara
蒲原 英治
Takahiro Hasegawa
隆弘 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP15400984A priority Critical patent/JPS6132942A/en
Publication of JPS6132942A publication Critical patent/JPS6132942A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48Electron guns
    • H01J29/50Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube
    • H01J29/503Three or more guns, the axes of which lay in a common plane
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/82Mounting, supporting, spacing, or insulating electron-optical or ion-optical arrangements

Abstract

PURPOSE:To prevent a resistor from being destroyed by heat by making the thickness of at least one insulating support body thinner than that of the other electrode support body and insulating a fully high resistor in this section. CONSTITUTION:A first electrode support body 2a is thicker than a second electrode support body 2b and fully fixes and holds each electrode. A second electrode support body 2b is thinner than a first electrode support body 2a and gently fixes and holds each electrode. In addition, a thin plate type resistor 3 is mounted on the rear of the second electrode support body 2b and each electrode potential of a third grid 13 and a fourth grid 14 is assigned as the split potential resulting from the resistor 3 of high voltage Eb applied to a convergence electrode 17 and a fifth grid 15. Consequently, the resistor can secure ample surface area. As a result, even if such fully high current that the effect of undesired current like inter-electrode leak current, etc. can be ignored is applied to the resistor, the resistor can be prevented from generating heat and being destroyed.

Description

【発明の詳細な説明】 〔発明の技術分野、〕 本発明は、少なくとも1本、好ましくはそれ以上の電子
ビームを集束するための電子銃の構造に関する。
TECHNICAL FIELD OF THE INVENTION The present invention relates to the structure of an electron gun for focusing at least one, preferably more, electron beam.

〔発明の技術的背景と問題点〕[Technical background and problems of the invention]

陰極線管では少なくとも1本の電子銃を具備しており、
この電″子銃によって所定のターゲット上に電子ビーム
スポットを形成させるものであるが、陰極線管の性能を
決定する極めて重要な因子の1つに上記ターゲット上に
おける電子ビーム径がある。ターゲット上でのスポット
径が小さなもの程望ましいのは当然であるが、このスポ
ット径は電子銃の性能によって決定される。一般に電子
銃は電子ビームを発生させる部分とこの電子ビームを加
速集束さぜる主レンズ部より成り、電子銃の性能を向上
させる有効な手段の1つとして主レンズ部の性能を向上
させることがある。
A cathode ray tube is equipped with at least one electron gun.
This electron gun forms an electron beam spot on a predetermined target, and one of the extremely important factors that determines the performance of a cathode ray tube is the electron beam diameter on the target. It goes without saying that a smaller spot diameter is more desirable, but this spot diameter is determined by the performance of the electron gun.In general, an electron gun consists of a part that generates an electron beam and a main lens that accelerates and focuses the electron beam. One effective means of improving the performance of an electron gun is to improve the performance of the main lens part.

前記主レンズ部の多くは静電レンズで、開孔を有する複
数個の電極を同軸上に配置し所定の電位を印加すること
によって形成される。この様な静電レンズは電極構成の
違いによりいくつかの種類があるが、基本的には電極開
孔径を大きくし大口径レンズを形成させるか、電極間距
離を長くして緩やかな電位変化とし長焦点レンズを形成
させることによってレンズ性能を向上させ得る。しかし
、陰極線管用電子銃は一般に細いガラス円筒内に封入さ
れて使用されるため、まず電極の開孔即ちレンズ口径が
物理的に制限され、次いで電極間に形成される集束電界
が他の電界の影響を受けない様にするために電極間距離
が制限される。特にカラー受像管の如く複数本の電子銃
を一列に並べて使用する場合には電子銃間隔Sgが小さ
なもの程複数本ビームを集中させ易いし傷内電力的にも
有利である。従って電極の開孔はさらに小さくせざるを
得ない。そこで実用的に、前記電極間距離を長くする方
法が、主レンズ部にパイポテンシャル形レンズを有する
カラー受像管用電子銃について、特公昭55−4867
4号公報に示されている。
Most of the main lens parts are electrostatic lenses, which are formed by arranging a plurality of electrodes having openings coaxially and applying a predetermined potential. There are several types of such electrostatic lenses depending on the electrode configuration, but basically they are made by increasing the electrode aperture diameter to form a large-diameter lens, or by increasing the distance between the electrodes to achieve a gradual potential change. Lens performance can be improved by forming a long focal length lens. However, since electron guns for cathode ray tubes are generally used enclosed in a thin glass cylinder, the aperture of the electrodes, that is, the diameter of the lens, is physically limited, and then the focused electric field formed between the electrodes is The distance between the electrodes is limited to avoid being affected. Particularly when a plurality of electron guns are used in a line, such as in a color picture tube, the smaller the electron gun spacing Sg is, the easier it is to concentrate the plurality of beams, and it is also advantageous in terms of power in the wound. Therefore, the openings in the electrodes have to be made even smaller. Therefore, a practical method for increasing the distance between the electrodes was proposed in Japanese Patent Publication No. 55-4867 for an electron gun for color picture tubes having a pi-potential type lens in the main lens section.
This is shown in Publication No. 4.

この特公昭55−48674号に示されている電子銃は
、同じ開孔を有する第1.第2の2個の電極とこの間に
第1.第2電極と同じ開孔を有する複数個の電極を一定
の間隔に配置し、これらの複数個の電極の傍に小さな抵
抗体を設置し、第1.第2の電極電位の抵抗分割電位と
してこれら複数個の電位を供給し、これ(:よって第1
電極から第2電極まで緩やかな電位変化を達成して、単
純に第1電極と第2電極間距離を長くしたレンズと同等
の高性能レンズを得ようとするものである。しかしこの
様な電子銃では、電極間のリーク電流や電極への電子ビ
ーム衝撃による電流等の不所望な電流が抵抗体を流れ所
定の電極電位が変化してしまうので、所定の分割電位を
得るために抵抗体を流れる電流を十分大キくシておく必
要がある。しかし乍ら電流を大きくすると抵抗体による
消費電力が大きくなり抵抗体は発熱破壊してしまう。こ
れを防ぐためには抵抗体の表面積を十分大きくして輻射
熱により抵抗体の発熱を抑えねばならないが、上記電子
銃では複数個の電極の傍に配置する抵抗体が小さすぎる
ため十分な表面積を確保することはできない− 〔発明の目的〕 本発明の目的は上述した点にかんがみ、電子銃の電極電
位を供給するための抵抗体を十分な大きさとし熱破壊を
おこさない実用性に富んだ電子銃を提供することにある
The electron gun shown in Japanese Patent Publication No. 55-48674 has a first gun having the same aperture. between the second two electrodes and the first. A plurality of electrodes having the same openings as the second electrode are arranged at regular intervals, a small resistor is installed near these plurality of electrodes, and the first. These plural potentials are supplied as resistance division potentials of the second electrode potential, and this (: therefore, the first
The objective is to achieve a gentle potential change from the electrode to the second electrode and obtain a high-performance lens equivalent to a lens in which the distance between the first electrode and the second electrode is simply increased. However, in such an electron gun, undesirable currents such as leakage current between the electrodes and current due to electron beam impact on the electrodes flow through the resistor and change the predetermined electrode potential, so it is difficult to obtain the predetermined divided potential. Therefore, it is necessary to make the current flowing through the resistor sufficiently large. However, if the current is increased, the power consumption by the resistor increases, causing the resistor to heat up and break down. In order to prevent this, the surface area of the resistor must be made sufficiently large to suppress the heat generated by the resistor due to radiant heat. However, in the electron gun mentioned above, the resistor placed near the multiple electrodes is too small, so it is necessary to ensure a sufficient surface area. - [Object of the Invention] In view of the above-mentioned points, the object of the present invention is to provide a highly practical electron gun that does not cause thermal breakdown by having a resistor of sufficient size for supplying the electrode potential of the electron gun. Our goal is to provide the following.

〔発明の概要〕[Summary of the invention]

本発明は、電子銃の各電極を支持するための複数本の電
極支持体のうち少なくとも1本の絶縁支持体の厚さを他
の電極支持体の厚さより薄くしてこの部分に十分に大き
な抵抗体を挿入することによって上記目的を達成するも
のである。
In the present invention, the thickness of at least one insulating support of a plurality of electrode supports for supporting each electrode of an electron gun is made thinner than the thickness of the other electrode supports to provide a sufficiently large thickness for this part. The above object is achieved by inserting a resistor.

〔発明の実施例〕[Embodiments of the invention]

以下図面を参照しつつ本発明の詳細な説明する。 The present invention will be described in detail below with reference to the drawings.

第1図は本発明を実施したカラー受像管用電子銃の一例
であり、IJ2図は第1図において人−A線から電子銃
下部を見た図であり、gP18図は第1図に用いられて
いる抵抗体の要部の断面図である。
Fig. 1 is an example of an electron gun for a color picture tube embodying the present invention, Fig. IJ2 is a view of the lower part of the electron gun from line A-A in Fig. FIG.

第1図及び第2図において、電子銃(1)は後述する複
数個の電極とこれを支える2本の電極支持体(2a)t
 (2b)および少なくとも1つの電極電位を供給する
ための抵抗体(3)を有する。前記複数個の電極は赤、
緑、青各色の螢光体層を射突する8本の電子ビーム(4
)を発生するための8個のヒータ(5)を内装する一列
配設された陰極(6)と、この8個の陰極に対する位置
にそれぞれ所定の電子ビーム通過孔部が穿設され一体化
構造(ユニタイズ構造)を有する第1グリッドαυ、第
2グリツドαの、第8グリツド(13,第4グリツド(
14)、第5グリツドa埠およびコンバーゼンス電極(
I7)から成りそれぞれこの順序で前記2本の電極支持
体(2a)、 (2b)に植設固定支持されている。前
記第1グリツドaυと第2グリツドαりは近接配置され
た平板状電極でるり、第8グリツドα騰は第2グリツド
αシに近接配置された2個のカップ状電極(28a)、
 (28b)より成り、第4グリツドIはill 8グ
リツド峙から所定距離離れて配置された2個のカップ状
電極(24m)、 (24b)より成り、第5グリツド
住9は第4グリツドa4から所定距離離れて配置された
2個のカップ状電極(25a)。
In FIGS. 1 and 2, an electron gun (1) includes a plurality of electrodes (described later) and two electrode supports (2a) that support the electrodes.
(2b) and a resistor (3) for supplying at least one electrode potential. the plurality of electrodes are red;
Eight electron beams (4
It has an integrated structure with cathodes (6) arranged in a row containing eight heaters (5) for generating ) and predetermined electron beam passage holes bored at positions relative to these eight cathodes. (unitized structure) of the first grid αυ, second grid α, eighth grid (13, fourth grid (
14), 5th grid a-bar and convergence electrode (
I7), which are implanted and fixedly supported in this order on the two electrode supports (2a) and (2b), respectively. The first grid a and the second grid α are plate-shaped electrodes arranged close to each other, and the eighth grid α is composed of two cup-shaped electrodes (28a) arranged close to the second grid α.
(28b), the fourth grid I consists of two cup-shaped electrodes (24m), (24b) arranged at a predetermined distance from the illumination grid 8, and the fifth grid 9 consists of the fourth grid A4. Two cup-shaped electrodes (25a) placed a predetermined distance apart.

(25b)より成り、コンバーゼンス電極aηは第5グ
リツドα場に溶接固定した1個のカップ状電極(27a
)より成る。また前記2本の電極支持体(2a)、 (
2b)のうち第1の電極支持体(2m)は第2の電極支
持体(2b)より厚く各電極を十分に固定保持していて
、第2の電極支持体(2b)は第1の電極支持体(2a
)より薄く各電極を軽く固定保持している。また第2の
電極支持体(2b)の背屈には薄い板状の抵抗体(3)
が取付けられている。前記コンバーゼンス電極Q7)に
は図示しない陽極端子に印加される約25群の陽極高電
圧E、を加えるバルブスペーサQ8が取付けられている
。この様な電子銃(1)は細いガラ−1,5霧の間隔が
設けである。ネックal下部にはステムピン(イ)が設
けられていてこのステムピン(イ)は電子銃(1)を固
定支持すると共にコンバーゼンス電極住η、第5グリッ
ドa9以外の各グリッド電位をステムピン(1)を通し
て外部より供給できる様になっている。前記抵抗体(3
)の一端はコンバーゼンス電極a7)に接続子GOを介
して接続固定されていて他端は接続子(51)にてステ
ムピン側に接続固定されていて外部にて可変抵抗(52
)に接続されている。
(25b), and the convergence electrode aη is one cup-shaped electrode (27a) fixed by welding to the fifth grid α field.
). In addition, the two electrode supports (2a), (
2b), the first electrode support (2m) is thicker than the second electrode support (2b) and holds each electrode sufficiently fixed, and the second electrode support (2b) is thicker than the second electrode support (2b), and the second electrode support (2b) Support (2a
) It is thinner and each electrode is lightly fixed and held. In addition, a thin plate-shaped resistor (3) is attached to the dorsiflexion of the second electrode support (2b).
is installed. A valve spacer Q8 is attached to the convergence electrode Q7) for applying about 25 groups of anode high voltages E to an anode terminal (not shown). Such an electron gun (1) is provided with a narrow gap of 1.5 mists. A stem pin (A) is provided at the bottom of the neck al, and this stem pin (A) fixedly supports the electron gun (1) and also transmits each grid potential other than the convergence electrode η and the fifth grid a9 through the stem pin (1). It can be supplied from outside. The resistor (3
) is connected and fixed to the convergence electrode a7) via a connector GO, and the other end is connected and fixed to the stem pin side by a connector (51), and is connected to a variable resistor (52) externally.
)It is connected to the.

また抵抗体(3)の中間部の適当な2点には端子(5B
)。
In addition, terminals (5B
).

(54)が設けられていてそれぞれ接続子(56) 、
 <57)を介して第4グリッドI、第8グリツドa3
にそれぞれ接続している。従って電気的には第4因の如
くなり第8グリツドα軌第4グリツド(1〜の各電極電
位はコンバーゼンス電極α7)、 第5グリツドa9に
印加される高電圧E、の抵抗体(3)による分割電位と
して与えられることになる。
(54) are provided, and the connectors (56),
4th grid I, 8th grid a3 via <57)
are connected to each. Therefore, electrically, the fourth factor is the resistor (3) of the high voltage E applied to the 8th grid α locus, the 4th grid (each electrode potential from 1 to the convergence electrode α7), and the 5th grid a9. It is given as a divided potential by .

以上の電極構成において各電極電位は例えば以下の様に
なる。陰極(6)は約150vのカットオフ電圧に保た
れこれにそれぞれ変調信号が加えられる。
In the above electrode configuration, each electrode potential is, for example, as follows. The cathode (6) is kept at a cut-off voltage of approximately 150v, to which a respective modulation signal is applied.

第2グリツドaυは接地電位が、第2グリツドaりは約
700vが印加され第5グリツド(L!19とコンバー
ゼンス電極(17)は約25KVが印加される。第8グ
リツドa線は約7.OKV、第4グリツドα4は約16
KVが抵抗体(3)による約25Kvの分割電位として
印加される。このような電極構成とすることにより焦点
距離の長いレンズが形成され電子光学的倍率と球面収差
を減少させることができレンズ性能は著るしく向上する
ことはよく知られていることである。
The ground potential is applied to the second grid aυ, about 700 V is applied to the second grid a, and about 25 KV is applied to the fifth grid (L!19 and convergence electrode (17)). OKV, 4th grid α4 is approximately 16
KV is applied as a divided potential of about 25 Kv by the resistor (3). It is well known that by adopting such an electrode configuration, a lens with a long focal length can be formed, electro-optical magnification and spherical aberration can be reduced, and lens performance can be significantly improved.

このとき抵抗体(3)は約1000MΩであり、従って
抵抗体(3ンを流れる電流は25μ人となり抵抗体によ
る消費電力は約625 mWa t tとなる。このと
き抵抗体(3)が発熱破壊しないためには、実験による
と少なくとも1000−以上の表面積の放熱板が必要で
ある。前述の如く電子銃は細いガラス円筒のネック0に
封入されているので特公昭55−48674号公報に示
されている様な短い抵抗体では上記表面積を得ることは
難しい。そこで板状の十分長い抵抗体を使用したいが通
常の電子銃ではネック内にその余裕はない。従って本発
明の如く複数の電極支持体のうち少なくとも1本を薄く
シ、このようにしてできた空間部に抵抗体を配置するこ
とによって十分長い抵抗体を使用することができるよう
になり、抵抗体(又は放熱板)は十分な表面積を確保す
ることができる株になる。従って抵抗体に電極間リーク
電流等の他の不所望な電流の影響を無視できる様な十分
な大きな電流を流すようにしても抵抗体が発熱破壊する
ことはなくなる。
At this time, the resistance of the resistor (3) is approximately 1000 MΩ, so the current flowing through the resistor (3) is 25μ, and the power consumption by the resistor is approximately 625 mWatt.At this time, the resistor (3) is destroyed due to heat generation. According to experiments, in order to avoid this, a heat sink with a surface area of at least 1000 mm is required.As mentioned above, the electron gun is enclosed in the neck 0 of a thin glass cylinder. It is difficult to obtain the above surface area with a short resistor such as the one shown in the figure.Therefore, it is desirable to use a sufficiently long plate-like resistor, but there is no room for it in the neck of a normal electron gun. By making at least one of the resistors thin and placing the resistor in the space created in this way, a sufficiently long resistor can be used, and the resistor (or heat sink) can be This makes it possible to secure a sufficient surface area.Therefore, even if a large enough current is applied to the resistor so that the effects of other undesirable currents such as leakage current between electrodes can be ignored, the resistor will heat up and break down. That will no longer be the case.

第2図は第1図においてA−A線からステムピン側を見
た図で第5グリツドaωのカップ状電極(25b)には
8個の電子ビーム通過孔(85a)、 (85b)。
FIG. 2 is a view taken from line AA in FIG. 1 to the stem pin side, and the cup-shaped electrode (25b) of the fifth grid aω has eight electron beam passing holes (85a) and (85b).

(85e)が設けられていて、第1の電極支持体(2a
)は第2の電極支持体(2b)より厚く第5グリツド(
へ)の電極(25b)の第1のストラップC31)が埋
め込まれている。また第2の電極支持体(2b)は第1
の電極支持体(2a)より薄く第5グリツド(19の電
極(25b)の第2のストラップ0々が埋め込まれてい
る。
(85e), and the first electrode support (2a
) is thicker than the second electrode support (2b) and the fifth grid (
The first strap C31) of the electrode (25b) is embedded. In addition, the second electrode support (2b)
The second straps of the fifth grid (19 electrodes (25b)) are embedded thinner than the electrode support (2a).

このとき第1のストラップ01)と第2のストラップG
擾の長さが異なるように設定されていて、第1のストラ
ップ01は第2のストラップ(至)より長く第1の電極
支持体に強固に植設固定されている。第2の電極支持体
(2b)の背屈には薄板状の抵抗体(3)が配置されて
いる。このような抵抗体は第8図に示す様に薄い平板上
のセラミック基板上(101)に抵抗材料(102)を
塗布し適当な位置に電極端子(10B)を設けこの端子
部を除いて薄くガラス被膜(104)を咄すことにより
製作できる。上記抵抗材としてはパツジウム、ルテニウ
ム系の酸化物等を主体としたものが好適で特に酸化ルテ
ニウムとガラスの混合物が好適である。
At this time, the first strap 01) and the second strap G
The lengths of the straps are set to be different, and the first strap 01 is longer than the second strap 01 and is firmly implanted and fixed to the first electrode support. A thin plate-shaped resistor (3) is placed on the dorsiflexion of the second electrode support (2b). As shown in Fig. 8, such a resistor is made by coating a resistive material (102) on a thin flat ceramic substrate (101), attaching an electrode terminal (10B) at an appropriate position, and making it thin except for this terminal part. It can be manufactured by blowing a glass film (104). As the above-mentioned resistive material, materials mainly composed of oxides of paddium or ruthenium are preferred, and a mixture of ruthenium oxide and glass is particularly preferred.

前記実施例の詳細な仕様は、例えばネック内径的181
111.カップ状電極のY軸方向径約81m%X軸方向
径約1611m%第1のストラップの長さ約2.5tx
s。
Detailed specifications of the above embodiments include, for example, neck inner diameter 181
111. Y-axis diameter of cup-shaped electrode: approx. 81m% X-axis diameter: approx. 1611m% Length of first strap: approx. 2.5tx
s.

第2のストラップの長さ約1.gsm+、ガラスより成
る第1の電極支持体の厚さ約3.5+m、幅約8.51
111、長さ約45 Mll 、同じく第2の電極支持
体の厚さ約2.0■、幅約8.5m、長さ約45闘、抵
抗体の厚さ約1.8m+、幅6.0露、長さ約7011
1111で表面積は約104011111、全抵抗値は
約1000MΩでおる。以上の構成で抵抗体は十分な表
面積をもつことができる様になり且つネック内に設置す
る場所も確保できるので所望の電子銃を得ることができ
る。
The length of the second strap is approximately 1. gsm+, the thickness of the first electrode support made of glass is approximately 3.5+ m, and the width is approximately 8.51 m.
111, length approximately 45 Mll, second electrode support thickness approximately 2.0 mm, width approximately 8.5 m, length approximately 45 mm, resistor thickness approximately 1.8 m+, width 6.0 Dew, length approx. 7011
1111, the surface area is approximately 104011111, and the total resistance value is approximately 1000 MΩ. With the above configuration, the resistor can have a sufficient surface area and a place for installing it in the neck can be secured, so that a desired electron gun can be obtained.

前記実施例では抵抗体としてセラミック基板上に抵抗体
を塗布しているが本発明はセラミック基板を用いる必要
はなくガラス基板であってもいいし絶縁フィルムであっ
てもよいし、また基板自体を抵抗材としてもよい。絶縁
フィルムとしては例えば厚さ50μm乃至250μmの
ポリイミド系フィルム(例え悼商品名カプトン)などが
好適であり、絶縁フィルム上に設置した抵抗材にはさら
にポリイミド系の被膜を施すことができる。この様な絶
縁フィルムを基板とした場合には抵抗体の厚さは極めて
薄いためネック内壁と電子銃のわずかな間隙1ユ配置す
るには非常に好ましい。
In the above embodiment, a resistor is coated on a ceramic substrate as a resistor, but the present invention does not need to use a ceramic substrate, and a glass substrate or an insulating film may be used. It may also be used as a resistance material. As the insulating film, for example, a polyimide film (for example, Kapton) having a thickness of 50 μm to 250 μm is suitable, and the resistive material placed on the insulating film can be further coated with a polyimide film. When such an insulating film is used as a substrate, the thickness of the resistor is extremely thin, so it is very preferable to place the resistor in a small gap between the inner wall of the neck and the electron gun.

また前記実施例では抵抗体を1本の連続したものとして
いるが本発明はこれに限らず複数本に分割した抵抗体と
してもよいことは言う迄もない。
Further, in the above embodiment, the resistor is one continuous resistor, but the present invention is not limited to this, and it goes without saying that the resistor may be divided into a plurality of resistors.

さらに前記実施例では2本の電極支持体を使用した電子
銃について述べているが本発明はこれに限らず8本又は
4本等複数本の電極支持体を使用した電子銃についても
本発明は適用できる。
Furthermore, although the above embodiment describes an electron gun using two electrode supports, the present invention is not limited to this, and the present invention also applies to an electron gun using multiple electrode supports, such as eight or four electrode supports. Applicable.

前記実施例の主レンズ部では第3グリツド、第4グリツ
ド、第5グリツド、第6グリツドから成るパイポテンシ
ャル形レンズを示しているが本発明はこれに限らず対向
する2つの電極から成るパイポテンシャル形レンズの一
方の電位を抵抗分割により供給してもいいし、その他ユ
ニポテンシャル形レンズやジオドラポテンシャル形レン
ズ、ベリオデイツクボテンクヤル形レンズ、トライポテ
ンシャル形レンズやその他の電子レンズの電極電位を抵
抗分割によって供給するものであれば本発明は適用でき
る。
Although the main lens portion of the above embodiment shows a pi-potential type lens consisting of a third grid, a fourth grid, a fifth grid, and a sixth grid, the present invention is not limited to this. The potential of one side of the shaped lens can be supplied by resistor division, or the electrode potential of other unipotential lenses, geodora potential lenses, Beriodikbotenkull lenses, tripotential lenses, and other electron lenses can be supplied. The present invention is applicable as long as it is supplied by resistance division.

また前記実施例では三本の電子銃を横方向−列に一体化
した構造となっているが本発明はこれに限らず、正三角
形状に三本の電子銃を配置した構造のものやその信条数
本の電子銃を配置したものや或いは一本の電子銃構造の
ものでも本発明が適用できることは言う迄もない。
Further, in the above embodiment, the three electron guns are integrated in a row in the horizontal direction, but the present invention is not limited to this, and the present invention is not limited to this. It goes without saying that the present invention can be applied to a structure in which several electron guns are arranged or a single electron gun structure.

〔発明の効果〕〔Effect of the invention〕

以上の如く本発明によれば静電レンズにより主レンズ部
を形成する電子銃であって少なくとも1つの電極電位を
相対的に高位の電位の抵抗分割電位として供給する電子
銃において、電子銃の各電極を固定保持するための複数
本の電極支持体のうち少なくとも1本の電極支持体を他
の電極支持体より薄くして抵抗体の設置場所を設けるこ
とにより抵抗体(又は放熱板)の表面積を十分大きくす
ることができるので抵抗体には電極間リーラ電流などの
不所望な電流を無視できる程度の大きな電流を流しても
抵抗体は発熱破壊することはなく、実用性に富んだ電子
銃を提供できる。
As described above, according to the present invention, in an electron gun in which the main lens portion is formed by an electrostatic lens, and in which at least one electrode potential is supplied as a resistance-divided potential of a relatively high potential, each of the electron guns The surface area of the resistor (or heat sink) is reduced by making at least one of the plurality of electrode supports for fixing and holding the electrode thinner than the other electrode supports to provide a place for installing the resistor. can be made sufficiently large, so even if a large current is passed through the resistor so that undesired currents such as interelectrode reeler current can be ignored, the resistor will not heat up and break down, making it a highly practical electron gun. can be provided.

また電子銃の電極の中高電位をネック下部のステムビン
を介して外部から供給することなくすべて抵抗体による
分割電位によって供給することによってステム部周辺で
の耐圧信頼性が向上するし、また受像管内部の不所望な
スパーク電流を軽減できることから受像管動作回路を保
護することもできる。
In addition, by supplying the medium-high potential of the electron gun's electrodes from the outside through the stem bin at the bottom of the neck, but instead by dividing the potential by a resistor, the reliability of the withstand voltage around the stem is improved, and the internal voltage of the picture tube is improved. It is also possible to protect the picture tube operating circuit by reducing undesirable spark currents.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の電子銃の一実施例を示す概略構成図、
第2図は第1図のA−A線から見た概略断面図、第3図
は第1図に使用されている抵抗体の要部を示す部分切欠
斜視図、第4図は第1図の電子銃の電気的構成を示す回
路図である。 (1)・・・電子銃 (2a)、 (2b)・・・絶縁支持体(3)・・・抵
抗体 (1o1)・・・セラミック基板 (to2)・・・抵抗体 (1Oa)・・・電極端子 (104)・・・ガラス被膜 代理人 弁理士 則 近 憲佑 (ほか1名)第  1
  図 ρ 第  2  図 第  3  図 第  4  図
FIG. 1 is a schematic configuration diagram showing an embodiment of the electron gun of the present invention;
Fig. 2 is a schematic cross-sectional view taken along line A-A in Fig. 1, Fig. 3 is a partially cutaway perspective view showing the main parts of the resistor used in Fig. 1, and Fig. 4 is the same as Fig. 1. FIG. 2 is a circuit diagram showing the electrical configuration of an electron gun. (1)...Electron gun (2a), (2b)...Insulating support (3)...Resistor (1o1)...Ceramic substrate (to2)...Resistor (1Oa)...・Electrode terminal (104)...Glass coating agent Patent attorney Kensuke Chika (and 1 other person) 1st
Figure ρ Figure 2 Figure 3 Figure 4

Claims (1)

【特許請求の範囲】[Claims] 少なくとも電子ビーム発生部とこの電子ビームを所定の
ターゲットに集束させるための複数個の電極から成る主
レンズ部とこれらの電極を支持するための複数本の電極
支持体とこれらの近傍に配置された少なくとも1本の抵
抗体から成る電子銃において、前記複数本の電極支持体
のうち少なくとも1本の電極支持体の厚さは他の電極支
持体の厚さより厚く且つ少なくとも1本の電極支持体の
厚さは他の電極支持体の厚さより薄く、該電極支持体の
近傍に前記抵抗体が配置されていることを特徴とする電
子銃。
A main lens section consisting of at least an electron beam generating section, a plurality of electrodes for focusing the electron beam on a predetermined target, a plurality of electrode supports for supporting these electrodes, and a main lens section disposed near these electrodes. In an electron gun including at least one resistor, at least one of the plurality of electrode supports is thicker than the other electrode supports, and An electron gun characterized in that the resistor is thinner than the thickness of other electrode supports, and the resistor is arranged near the electrode supports.
JP15400984A 1984-07-26 1984-07-26 Electron gun Pending JPS6132942A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15400984A JPS6132942A (en) 1984-07-26 1984-07-26 Electron gun

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15400984A JPS6132942A (en) 1984-07-26 1984-07-26 Electron gun

Publications (1)

Publication Number Publication Date
JPS6132942A true JPS6132942A (en) 1986-02-15

Family

ID=15574911

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15400984A Pending JPS6132942A (en) 1984-07-26 1984-07-26 Electron gun

Country Status (1)

Country Link
JP (1) JPS6132942A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62180856U (en) * 1986-05-09 1987-11-17

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62180856U (en) * 1986-05-09 1987-11-17
JPH0525160Y2 (en) * 1986-05-09 1993-06-25

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