JPS61292891A - High frequency heater - Google Patents

High frequency heater

Info

Publication number
JPS61292891A
JPS61292891A JP13467085A JP13467085A JPS61292891A JP S61292891 A JPS61292891 A JP S61292891A JP 13467085 A JP13467085 A JP 13467085A JP 13467085 A JP13467085 A JP 13467085A JP S61292891 A JPS61292891 A JP S61292891A
Authority
JP
Japan
Prior art keywords
excitation
waveguide
opening
microwaves
rotating waveguide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13467085A
Other languages
Japanese (ja)
Inventor
五十嵐 隆次
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP13467085A priority Critical patent/JPS61292891A/en
Publication of JPS61292891A publication Critical patent/JPS61292891A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔発明の技術分野〕 この発明は高周波加熱装置にかかり、特に加熱空白に回
転導波管を設けた高周波加熱装置の改善に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a high-frequency heating device, and more particularly to an improvement in a high-frequency heating device in which a rotating waveguide is provided in a heating space.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

電子レンジ(高周波加熱装置)にあっては、加熱室内に
回転導波管を設置し、回転導波管から、加熱室内にマイ
クロ波(高周波)を照射して、調理物を効果的に加熱す
るようにしたものがある。
In a microwave oven (high-frequency heating device), a rotating waveguide is installed inside the heating chamber, and the rotating waveguide irradiates microwaves (high-frequency waves) into the heating chamber to effectively heat the food being cooked. There is something like this.

こうしたマイクロ波の照射技術には、従来、第6図およ
び第7図に示すようなものが用いられていた。すなわち
、アルミ板など金属板から器状に形成するとともに、底
壁に励振開口aを設けた回転導波管すを採用し、これを
加熱Nc内の上部側に配してマグネトロンd(発振装置
)から発振されるマイクロ波を受けることができるよう
にする他、回転導波管すを加熱9−cの外部に配したモ
ータ(駆動源)eに連結した構造が用いられ、回転導波
管すと共に回転する励S開口aからマイクロ波を加熱室
C内へ照射していた。なお、fはマグネトロンdから発
振されたマイクロ波を回転導波管lに導くための導波管
を示す。
Conventionally, such microwave irradiation techniques as shown in FIGS. 6 and 7 have been used. That is, a rotating waveguide is formed into a container shape from a metal plate such as an aluminum plate, and has an excitation opening a in the bottom wall, and this is placed on the upper side of the heating Nc to generate a magnetron d (oscillation device). ), a structure is used in which the rotating waveguide is connected to a motor (drive source) e placed outside the heating 9-c, and the rotating waveguide Microwaves were irradiated into the heating chamber C from the excitation S aperture a, which rotated as the heating chamber moved. Note that f indicates a waveguide for guiding the microwave oscillated from the magnetron d to the rotating waveguide l.

ところが、こうした底壁の励振開口fからマイクロ波を
照射する技術は、マイクロ波の照射方向が主に下方方向
(直下)となるために、調理物Q(被加熱物)の上部に
対する照射が周囲部に比べ強い。このため、加熱むらが
生じる問題がある。
However, with this technique of irradiating microwaves from the excitation opening f in the bottom wall, the irradiation direction of the microwaves is mainly downward (directly below). Stronger than the rest. For this reason, there is a problem of uneven heating.

特に、大形の調理物0のとき、また調理物Qを加熱室C
内の隅の方へ配置したときなどでは、照射の不均一が大
きく現われるために、大なる加熱むらが生じる不具合を
もつ。
In particular, when there is a large cooking object 0, or when the cooking object Q is in the heating chamber C.
When placed toward the inner corner, the non-uniformity of irradiation appears greatly, resulting in a problem of large uneven heating.

〔発明の目的〕[Purpose of the invention]

この発明はこのような問題点に着目してなされたもので
、その目的とするところは、被加熱物に対し均一に高周
波を照射することができる高周波加熱装置を提供するこ
とにある。
The present invention was made in view of these problems, and its purpose is to provide a high-frequency heating device that can uniformly irradiate a heated object with high-frequency waves.

〔発明の概要〕[Summary of the invention]

すなわち、この発明は回転導波管の周壁に、底壁に設け
た励振開口とは別に第2の励振開口を設けることにより
、照射方向を多方向にして、被加熱物に高周波を直接照
射すると同時に、加熱空壁面の反射(分散)を使って照
射されにくい被加熱物の部位へ高周波を照射するように
して、あらゆる方向から被加熱物へ高周波を照射できる
ようにすることにある。
That is, this invention provides a second excitation opening in the peripheral wall of the rotating waveguide, separate from the excitation opening provided in the bottom wall, so that the irradiation direction can be made multidirectional, and the object to be heated can be directly irradiated with high frequency waves. At the same time, it is possible to irradiate the object with high frequency waves from all directions by using reflection (dispersion) of the heated wall surface to irradiate high frequency waves to parts of the object that are difficult to irradiate.

〔発明の実施例〕[Embodiments of the invention]

以下、この発明を第1図ないし第3図に示す一実施例に
もとづいて説明する。第1図はこの発明を適用した高周
波加熱装置、たとえば電子レンジを示し、1は本体、2
はその本体1内に配設された加熱室、3はその加熱室2
の上部壁に設けた励振用の開口、4は、一端側にマグネ
トロン5を連結した導波管である。そして、加熱室2の
上部壁に導波管4が設置される他、導波管4の出口側が
開口3に連通接続され、マグネトロン5から発振される
マイクロ波(高周波)を加熱室2へ供給することができ
るようにしている。
The present invention will be explained below based on an embodiment shown in FIGS. 1 to 3. FIG. 1 shows a high-frequency heating device, such as a microwave oven, to which the present invention is applied, and 1 is a main body, 2
3 is the heating chamber arranged in the main body 1, and 3 is the heating chamber 2.
An excitation opening 4 provided in the upper wall of the waveguide is a waveguide with a magnetron 5 connected to one end thereof. A waveguide 4 is installed on the upper wall of the heating chamber 2, and the outlet side of the waveguide 4 is connected to the opening 3 to supply microwaves (high frequency) oscillated from the magnetron 5 to the heating chamber 2. I'm trying to be able to do that.

一方、6は回転導波管である。そして、回転導波管6の
構造が第3図に示されている。ここで、回転導波管6に
ついて説明すれば、7は導波管本体である。導波管本体
7は、アルミ板などの導電性材料あるいは樹脂成形を使
って、たとえば長方形の開口をもつ器状に構成される。
On the other hand, 6 is a rotating waveguide. The structure of the rotating waveguide 6 is shown in FIG. Here, if the rotating waveguide 6 is explained, 7 is a waveguide main body. The waveguide body 7 is made of a conductive material such as an aluminum plate or molded with resin, and is configured in the shape of a vessel with a rectangular opening, for example.

なお、樹脂成形の場合は表面に金属メッキが施される。In addition, in the case of resin molding, metal plating is applied to the surface.

そして、この導波管本体7の底壁上、中心から一端側へ
偏心した位置に固定用の孔8が設けられている他、これ
と反対側の他端側に、長方形状の励振開口9が幅方向に
沿って設けられている。また回転導波管6の上記励振開
口9と隣接する二壁の周壁部分7a、7bには、長方形
状に形成された第2の励振開口10がそれぞれ設けられ
ている。これら2つの第2の励振開口10.10は、上
記底壁に設けた励振開口9に隣接してそれぞれ配置され
、1か所から異なる3方向へマイクロ波を出射すること
ができるようにしている。そして、この回転導波管6は
、開口部が上記開口3に臨むよう加熱室2内の上部側に
配置され、開口3から出射されるマイクロ波を受けるこ
とができるようにしている。
A fixing hole 8 is provided on the bottom wall of the waveguide body 7 at a position eccentric from the center toward one end, and a rectangular excitation opening 9 is provided at the other end opposite to this. are provided along the width direction. Further, second excitation openings 10 each having a rectangular shape are provided in the peripheral wall portions 7a and 7b of the two walls adjacent to the excitation opening 9 of the rotating waveguide 6. These two second excitation openings 10.10 are arranged adjacent to the excitation opening 9 provided in the bottom wall, so that microwaves can be emitted from one location in three different directions. . The rotating waveguide 6 is arranged at the upper side of the heating chamber 2 so that its opening faces the opening 3, so that it can receive the microwaves emitted from the opening 3.

他方、11は導波管4の上部壁の外面に、開口3の直上
に位置して設置されたモータである。このモータ11の
シャフト11aの先端は導波管4を通じて開口3の真下
まで延出している。そして、シャフト11aの先端に第
2図に示すように上記回転導波管6の孔8が固定ねじ1
2を使って固定され、モータ社告を駆動源として回転導
波管6を偏心回転させることができるようにしている。
On the other hand, 11 is a motor installed on the outer surface of the upper wall of the waveguide 4, located directly above the opening 3. The tip of the shaft 11a of this motor 11 extends through the waveguide 4 to just below the opening 3. As shown in FIG.
2, and the rotating waveguide 6 can be eccentrically rotated using a motor as a driving source.

もちろん、回転導波管6の開口部は開口3の全体を許容
できる大きさになっている他、8第2の励振開口10.
10はマイクロ波が出やすい大きさに定められている。
Of course, the opening of the rotating waveguide 6 is large enough to accommodate the entire opening 3, as well as the second excitation opening 10.
10 is determined to be a size that allows microwaves to be easily emitted.

なお、第1図おいて、13は回転導波管6の周囲を覆う
ように設けた、回転導波管6を保護するための、電波透
過性に優れる材料、たとえば耐熱プラスチック、耐熱樹
脂等から構成された仕切板である。
In FIG. 1, reference numeral 13 is made of a material having excellent radio wave transparency, such as heat-resistant plastic, heat-resistant resin, etc., which is provided to cover the rotating waveguide 6 and protect the rotating waveguide 6. This is a structured partition plate.

つぎに、このように構成された電子レンジの作用につい
て説明する。今、加熱室2内に調理物〈被加熱物)14
を収容し、図示しない電子レンジの操作部を操作する。
Next, the operation of the microwave oven configured as described above will be explained. Now, there are 14 things to be cooked (things to be heated) in the heating chamber 2.
and operates the operating section of the microwave oven (not shown).

これにより、マグネトロン5およびモータ11が作動す
る。そして、マグネトロン5からマイクロ波が発振され
、導波管4゜開口3を通じて回転する回転導波管6に導
かれて、加熱室2内へマイクロ波が照射される。
This causes the magnetron 5 and motor 11 to operate. Then, microwaves are oscillated from the magnetron 5, guided through the waveguide 4° opening 3 to the rotating rotating waveguide 6, and irradiated into the heating chamber 2.

ここで、従来、調理物14に対しマイクロ波が一様に照
射されないために加熱むらが生じることが指摘されるが
、この発明によると加熱むらを解消することができる。
Here, it has been pointed out that conventionally, heating unevenness occurs because microwaves are not uniformly irradiated onto the food 14 to be cooked, but according to the present invention, heating unevenness can be eliminated.

すなわち、この発明によると、底壁の励振開口9の他に
、回転導波管6の周壁に第2の励振開口10.10を設
けている。このことは、回転導波管6に導かれたマイク
ロ波は励振開口9と第2の励振開口10.10とへ分れ
る。そして、そのうちの底壁側の励振開口9へ至るマイ
クロ波は、第1図および第2図のAで示すように下方方
向く真下側)へ出射されて、主に調理物14の上部へ直
接照射される。一方、第2の励振開口10.10へ至る
マイクロ波は、第1図および第2図の8で示すように加
熱室2の周側壁へ出射されるとともに、周側壁で反射(
分散)されて主に直接照射では照射しにくい調理物14
の周囲部などの部位に照射される。しかるに、調理物1
4の上部2周囲部共、均一にマイクロ波が照射されるこ
とになる。
That is, according to the invention, in addition to the excitation opening 9 in the bottom wall, a second excitation opening 10.10 is provided in the peripheral wall of the rotating waveguide 6. This means that the microwave guided into the rotating waveguide 6 is divided into the excitation aperture 9 and the second excitation aperture 10.10. The microwaves that reach the excitation opening 9 on the bottom wall side are emitted downward (directly below) as shown by A in FIGS. irradiated. On the other hand, the microwaves reaching the second excitation opening 10.10 are emitted to the peripheral side wall of the heating chamber 2, as shown by 8 in FIGS. 1 and 2, and are also reflected by the peripheral side wall (
Dispersed) and difficult to irradiate with direct irradiation14
The area around the body is irradiated. However, cooking item 1
Microwaves are uniformly irradiated to both the upper and the surrounding areas of 4.

しかも、反射(分散)したマイクロ波は加熱室2の周囲
のランダムな方向から照射されるから、大形の調理物1
4であっても、また加熱室2の隅の方へ調理物14を配
置したときでも全体に均一に照射することになる。この
ことにより、調理物14はどの部分でも均一にマイクロ
波が照射されることがわかる。したがって、加熱むらの
ない加熱を行なうことができる。しかも、第2の励振開
口10.10の採用で、マイクロ波が出る面積が従来の
ものに比べ大きくなってマイクロ波が出射しやすくなる
から、その分、加熱効率の向上を図ることができる利点
をもち、加熱調理に要する時間を短縮することができる
効果をもたらす。
Moreover, since the reflected (dispersed) microwaves are irradiated from random directions around the heating chamber 2,
4, even when the food 14 is placed toward the corner of the heating chamber 2, the entire area will be uniformly irradiated. This shows that all parts of the food 14 are uniformly irradiated with microwaves. Therefore, heating can be performed without uneven heating. Moreover, by adopting the second excitation aperture 10.10, the area from which the microwaves are emitted is larger than that of the conventional one, making it easier for the microwaves to be emitted, so the heating efficiency can be improved accordingly. This has the effect of shortening the time required for cooking.

なお、この発明は上述した一実施例に限定されるもので
はなく、第4図および第5図に示す他の実施例のように
してもよい。
Note that the present invention is not limited to the above-mentioned embodiment, and other embodiments shown in FIGS. 4 and 5 may be used.

すなわち、第2の実施例は回転導波管6を保護する仕切
板13に、たとえば金属板からなる反射板20を設けて
、励振開口9(あるいは第2の励振開口10)から出射
されるマイクロ波を反射板2oで反射させるとともに、
加熱室2の周壁からの反射波を再度反射させて、一層効
果的にマイクロ波を分散させるようにしたものである。
That is, in the second embodiment, a reflection plate 20 made of, for example, a metal plate is provided on the partition plate 13 that protects the rotating waveguide 6, and the microscopic light emitted from the excitation aperture 9 (or the second excitation aperture 10) is While reflecting the waves with the reflecting plate 2o,
The reflected waves from the peripheral wall of the heating chamber 2 are reflected again to disperse the microwaves more effectively.

詳しくは、反射板20は電界の強い場所、たとえば底壁
の励振開口9の軌跡上と対応する仕切板13の内底面の
一部分に設けられ、この位置で励振開口9から出射され
るマイクロ波を反射(分散)させる他、加熱室2の周壁
からの反射波を再度反射(分散)させるようにしている
。こうした電波の反射は下方方向のマイクロ波ばかりか
、加熱室ることができる利点をもつ。もちろん、電波を
反射する反射板20は1個に限らず、複数個でもよいこ
とはいうまでもない。
Specifically, the reflector plate 20 is provided in a place where the electric field is strong, for example, in a part of the inner bottom surface of the partition plate 13 corresponding to the locus of the excitation aperture 9 on the bottom wall, and at this position, it reflects the microwaves emitted from the excitation aperture 9. In addition to being reflected (dispersed), the reflected waves from the peripheral wall of the heating chamber 2 are also reflected (dispersed) again. This kind of reflection of radio waves has the advantage that it can be used not only for downward direction of microwaves but also for heating chambers. Of course, the number of reflectors 20 that reflect radio waves is not limited to one, and it goes without saying that a plurality of reflectors may be used.

なお、反射板20の設置にあたり、反射板2(4)熱の
影響を受けて仕切板13が溶解等をきたすことが懸念さ
れるが、反射板20の設置には第5図に示すような、仕
切板13の内底面にリブ21・・・を突設し、このリブ
21・・・上に反射板20を配して、リブ21・・・に
溶着するといった、反射板20と仕切板13との間に断
熱空間22を設けた設置構造が採用され、これで熱影響
を抑制して先の問題を防止している。但し、23は溶着
部を、Xは断熱空間22となる反射板20と仕切板13
との隙間をそれぞれ示す。
In addition, when installing the reflector plate 20, there is a concern that the partition plate 13 may melt due to the influence of the heat of the reflector plate 2 (4). , the ribs 21 are protruded from the inner bottom surface of the partition plate 13, the reflector 20 is arranged on the ribs 21, and the reflector 20 and the partition plate are welded to the ribs 21. An installation structure is adopted in which a heat insulating space 22 is provided between the heat shield and the heat shield 13, thereby suppressing the influence of heat and preventing the above problem. However, 23 is the welded part, and
The gaps between the two are shown respectively.

なお、いずれの実施例共、角形の励振開口を用いたが、
その形状には限定されるものではなく、他の形状を用い
てもよい。
In addition, although a rectangular excitation aperture was used in all of the examples,
The shape is not limited, and other shapes may be used.

〔発明の効果〕〔Effect of the invention〕

以上説明したようにこの発明によれば、照射方向が多方
向となり、被加熱物に高周波を直接照射すると同時に、
加熱室壁面の反射(分散)を使って直接照射されにくい
被加熱物の部位へ高周波を照射することができるように
なる。つまり、あらゆる方向から被加熱物へ高周波を照
射できるようにようになる。
As explained above, according to the present invention, the irradiation direction is multidirectional, and at the same time, the object to be heated is directly irradiated with high frequency waves.
By using reflection (dispersion) on the heating chamber wall surface, it becomes possible to irradiate high frequency waves to parts of the object to be heated that are difficult to directly irradiate. In other words, it becomes possible to irradiate the object to be heated with high frequency waves from all directions.

この結果、被加熱物に対し均一に高周波を照射すること
ができ、加熱むらなく加熱することができる。しかも、
励振開口の面積が大きくなる分、マイクロ波が出射しや
すくなるので、その分、加熱効率の向上を図ることがで
き、加熱に要する時間を短縮することができる利点をも
つ。
As a result, the object to be heated can be uniformly irradiated with high frequency waves, and the object can be heated evenly. Moreover,
As the area of the excitation aperture increases, it becomes easier for microwaves to be emitted, which has the advantage of improving heating efficiency and shortening the time required for heating.

【図面の簡単な説明】[Brief explanation of drawings]

第1図ないし第3図はこの発明の一実施例を示し、第1
図は高周波加熱装置を示す正断面図、第2図はその回転
導波管廻りを拡大して示す正断面図、第3図は回転導波
管を示す斜視図、第4図および第5図はこの発明の他の
実施例を示し、第4図は回転導波管廻りの構造を示す斜
視図、第5図はその仕切板に設けた反射板の設置構造を
示す断面図、第6図は従来の回転導波管を採用した高周
波加熱装置を示す正断面図、第7図はその回転導波管廻
りを拡大して示す正断面図である。 2・・・加熱室、5・・・マグネトロン、6・・・回転
導波管、9・・・励振開口、10・・・第2の励振開口
。 出願人代理人 弁理士 鈴江武彦 第1図 第2図 第3図 第4図 第5図 第6図 り 第7図
Figures 1 to 3 show one embodiment of the present invention.
The figure is a front sectional view showing the high-frequency heating device, Figure 2 is a front sectional view showing an enlarged view around the rotating waveguide, Figure 3 is a perspective view showing the rotating waveguide, and Figures 4 and 5. 4 shows another embodiment of the present invention, FIG. 4 is a perspective view showing the structure around the rotating waveguide, FIG. 5 is a sectional view showing the installation structure of the reflecting plate provided on the partition plate, and FIG. 6 7 is a front sectional view showing a high frequency heating device employing a conventional rotating waveguide, and FIG. 7 is an enlarged front sectional view showing the area around the rotating waveguide. 2... Heating chamber, 5... Magnetron, 6... Rotating waveguide, 9... Excitation opening, 10... Second excitation opening. Applicant's Representative Patent Attorney Takehiko Suzue Figure 1 Figure 2 Figure 3 Figure 4 Figure 5 Figure 6 Figure 7

Claims (2)

【特許請求の範囲】[Claims] (1)加熱室内に、器状に構成される他、底壁に励振開
口が形成された回転導波管を設け、回転導波管と共に回
転する励振開口から前記加熱室内へ高周波を照射するよ
うにした高周波加熱装置において、前記回転導波管の周
壁に第2の励振開口を設けたことを特徴とする高周波加
熱装置。
(1) A rotating waveguide having a vessel-like shape and an excitation opening formed in the bottom wall is provided in the heating chamber, and a high frequency wave is irradiated into the heating chamber from the excitation opening that rotates together with the rotating waveguide. A high-frequency heating device characterized in that a second excitation opening is provided in a peripheral wall of the rotating waveguide.
(2)第2の励振開口は、複数個有ることを特徴とする
特許請求の範囲第1項に記載の高周波加熱装置。
(2) The high-frequency heating device according to claim 1, wherein there is a plurality of second excitation openings.
JP13467085A 1985-06-20 1985-06-20 High frequency heater Pending JPS61292891A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13467085A JPS61292891A (en) 1985-06-20 1985-06-20 High frequency heater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13467085A JPS61292891A (en) 1985-06-20 1985-06-20 High frequency heater

Publications (1)

Publication Number Publication Date
JPS61292891A true JPS61292891A (en) 1986-12-23

Family

ID=15133814

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13467085A Pending JPS61292891A (en) 1985-06-20 1985-06-20 High frequency heater

Country Status (1)

Country Link
JP (1) JPS61292891A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010199009A (en) * 2009-02-27 2010-09-09 Panasonic Corp Microwave heating device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010199009A (en) * 2009-02-27 2010-09-09 Panasonic Corp Microwave heating device

Similar Documents

Publication Publication Date Title
US6614011B2 (en) Microwave oven including antenna for properly propagating microwaves oscillated by magnetron
US6770859B2 (en) Microwave oven
US4568811A (en) High frequency heating unit with rotating waveguide
US4463239A (en) Rotating slot antenna arrangement for microwave oven
EP1680621B1 (en) Microwave oven and radiating structure of microwave in microwave oven
JPH0658552A (en) Microwave oven
JPS63114093A (en) Triangular antenna arrangement for microwave oven
JPS61292891A (en) High frequency heater
CA1262374A (en) High-frequency heating apparatus having a rotating waveguide
JPS61292890A (en) High frequency heater
JPS61294793A (en) High frequency heater
JP5169015B2 (en) Microwave heating device
KR200154602Y1 (en) Microwave dispersion structure for microwave oven
JPS61294791A (en) High frequency heater
US20240049367A1 (en) Cooking appliance
EP2647915B1 (en) Heating cooker
JPH08148273A (en) Microwave oven
JP3246095B2 (en) High frequency heating equipment
KR200154601Y1 (en) Microwave radiation structure for microwave oven
JPS62122090A (en) Radio frequency heater
JPS6147092A (en) High frequency heater
KR100234743B1 (en) Uniform heating apparatus of microwave oven
JPS61294792A (en) High frequency heater
JPS61294795A (en) High frequency heater
KR0156507B1 (en) Waveguide of microwave oven