JPS6129049A - Cathode-ray tube of electrostatic deflection type - Google Patents

Cathode-ray tube of electrostatic deflection type

Info

Publication number
JPS6129049A
JPS6129049A JP14758484A JP14758484A JPS6129049A JP S6129049 A JPS6129049 A JP S6129049A JP 14758484 A JP14758484 A JP 14758484A JP 14758484 A JP14758484 A JP 14758484A JP S6129049 A JPS6129049 A JP S6129049A
Authority
JP
Japan
Prior art keywords
electrode
deflection
anode
ray tube
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14758484A
Other languages
Japanese (ja)
Inventor
Hiroyoshi Tokizawa
鴇沢 大喜
Takashi Katsuma
敬 勝間
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP14758484A priority Critical patent/JPS6129049A/en
Publication of JPS6129049A publication Critical patent/JPS6129049A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/70Arrangements for deflecting ray or beam
    • H01J29/72Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines
    • H01J29/74Deflecting by electric fields only

Abstract

PURPOSE:To heighten sensitivity and definition, by providing anti-charging electroconductive coating films on at least the portions of electrically-insulating support bars which face Y-direction deflecting electrodes, to prevent the charging of the support bars to preclude aberration and bright line bending. CONSTITUTION:Electroconductive coating film 20 are provided on the main and side surfaces of the portions of electrically-insulating support bars 19 which face Y-directiondeflecting electrodes 16 and surround the planted portions 161, 162 thereof. One end 201 of each coating film 20 is located near the planted portion of a second anode 15, within such an area that a voltage applied to the second anode and that applied to the Y-direction deflecting electrodes 16 are not hindered. The other end 202 of each coating film 20 is likewise located near the planted portion 171 of an osilation electrode 17. As a result, the form of an electron beam spot hardly undergoes aberration even if there are floating electrons. Furtheremore, the support bars 19 are kept from being electrically charged to distort a converged electron beam. Sensitivity and definition are thus heightened.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は静電偏向形陰極線管に関するものである。[Detailed description of the invention] [Technical field of invention] The present invention relates to an electrostatic deflection type cathode ray tube.

〔発明の技術的背景及びその問題点〕[Technical background of the invention and its problems]

オシロスコープ装置等に使用される静電偏向形陰極線管
(以下CRTと云う)は可能な限り、高輝度、高感度で
実用周波数帯域の広い余裕のあるものが要求されている
Electrostatic deflection cathode ray tubes (hereinafter referred to as CRTs) used in oscilloscope devices and the like are required to have as high brightness, high sensitivity, and a wide practical frequency band as possible.

このためには偏向増幅形のCRTのように最終加速電圧
を」二ばても全長を長くすることなく、高い偏向感度を
得る構造が知られている。
For this purpose, a structure is known that can obtain high deflection sensitivity without increasing the final acceleration voltage or increasing the overall length, such as a deflection amplification type CRT.

高い偏向感度を目的とした構造としては」二連の他車−
加速形のCRTにおいても偏向電極の電子ビームに沿っ
た電極長を長くする構造も簡便で一般的である。
As a structure aimed at high deflection sensitivity, "double other vehicles"
Even in acceleration type CRTs, a structure in which the length of the deflection electrode along the electron beam is made longer is also simple and common.

次に第3図により従来のCRTの一例に使用される電子
銃を説明する。
Next, an electron gun used in an example of a conventional CRT will be explained with reference to FIG.

即ち、電子銃(1)は、内部に陰極を有する第1格子電
極(2)、第2格子電極(3)、第1陽極(4)、第2
陽極(5)、Y偏向電極(6)、アイソレーション電極
(7)及びX偏向電極(8)からなり、陰極から放出さ
れた電子は第1格子電極(2)の電子ビーム通過孔部か
ら第2格子電極(3)の正電界により加速され、第2格
子電極(13)、第1陽極(4)および第2陽極(5)
から構成される主電子レンズに入射し、径小に集束され
、Y偏向電極(6)、アイソレーション電極(7)及び
X偏向電極(8)を介して図示しない蛍光体スクリーン
上に各種の現象を描き出すようになっている。
That is, the electron gun (1) includes a first grid electrode (2) having a cathode inside, a second grid electrode (3), a first anode (4), and a second grid electrode (3).
Consisting of an anode (5), a Y deflection electrode (6), an isolation electrode (7) and an Accelerated by the positive electric field of the two grid electrodes (3), the second grid electrode (13), the first anode (4) and the second anode (5)
The electrons enter the main electron lens, which is made up of It is designed to depict.

然るに、この構造で、可能な限り高感度で実用周波数帯
域の高いものとするための一手段として偏向電極の電子
ビームに沿った電極長を長くすると、蛍光体スクリーン
上の電子ビームスポットが真円にならなくなる場合、即
ち収差が発生することが多いことを見出した。この原因
を種々実験を行って確めたところ、電子銃を支持する絶
縁支持棒(9)に対する電荷の蓄積が原因であることが
わかった。
However, in order to achieve the highest possible sensitivity and practical frequency band with this structure, by increasing the length of the deflection electrode along the electron beam, the electron beam spot on the phosphor screen becomes a perfect circle. It has been found that when the angle does not change, that is, aberrations often occur. After conducting various experiments to ascertain the cause of this, it was found that the cause was the accumulation of charge on the insulated support rod (9) that supports the electron gun.

即ち、第3図のような電子銃(1)において、電子ビー
ムは、主電子レンズにより集束作用を受け、第2陽極(
5)の図示しない制限孔部を通過後、Y偏向電極(6)
でY軸方向の偏向作用を受け、アイソレーション電極(
7)を通過して伝帳してゆく。
That is, in the electron gun (1) as shown in FIG. 3, the electron beam is focused by the main electron lens, and is focused by the second anode (
After passing through the restriction hole (not shown) in 5), the Y deflection electrode (6)
The isolation electrode (
Pass through 7) and submit the transfer.

また、これら各電極は複数の絶縁支持棒(9)で支持さ
れ、さらにこの絶縁支持棒(9)の表面電位は各電極と
の植設部近傍においては、はぼ各電極電位に近いが、遠
くなる程、隣接電極電圧と距離関係で決まる電位に安定
する傾向を持つ。しかじながら、絶縁支持棒(9)の素
材にもよるが、一般的に高絶縁性の絶縁物の表面上の電
位は汚れ、傷、内部の不純物等により極めて不安定な状
態となりやすい。そしてこの傾向は植設部から離れる程
強くなり、且つ、隣接電極間の電位差が大きい程大  
   ・きくなる。
Furthermore, each of these electrodes is supported by a plurality of insulating support rods (9), and the surface potential of these insulating support rods (9) is close to the potential of each electrode near the part where each electrode is installed. As the distance increases, the potential tends to stabilize at a level determined by the relationship between adjacent electrode voltage and distance. However, although it depends on the material of the insulating support rod (9), in general, the potential on the surface of a highly insulating material tends to become extremely unstable due to dirt, scratches, internal impurities, etc. This tendency becomes stronger as the distance from the implantation site increases, and the greater the potential difference between adjacent electrodes, the greater the tendency.
・I hear it.

従って、高い偏向感度を得るためにY偏向電極−3= (6)を長くすると、このY偏向電極(6)の植設部間
に電位的に不安定な要素を持つ絶縁物露出部(6a)が
できる。
Therefore, in order to obtain high deflection sensitivity, if the Y deflection electrode -3= (6) is lengthened, the insulator exposed part (6a ) can be done.

この絶縁物露出部(6a)に電子ビームの散乱電子が入
射し荷電することは充分考えられ、この結果、第2陽極
(5)からY偏向電極(6)、アイソレーション電極(
7)を通過しながら集束する電子ビームに不所望な電界
が加わり、蛍光体スクリーンに到達した電子ビームのス
ポットを歪ませた形状、即ち、真円にならない収差を持
つ形状とさせたり、走査輝線を曲げ歪んだ弓形の輝線と
する要因となると考えられる。
It is quite conceivable that the scattered electrons of the electron beam will enter this insulator exposed part (6a) and be charged, and as a result, from the second anode (5) to the Y deflection electrode (6), the isolation electrode (
7) An undesired electric field is added to the electron beam that is focused while passing through the phosphor screen, causing the spot of the electron beam that reaches the phosphor screen to have a distorted shape, that is, a shape that is not a perfect circle and has aberrations, or a scanning bright line. This is thought to be the cause of the curved and distorted arcuate emission line.

〔発明の目的〕[Purpose of the invention]

本発明は、上述した考えを基にしてなされたものであり
、絶縁支持棒への荷電を防止し収差や輝線曲りのない高
感度、高品位のCRTを提供することを目的としている
The present invention has been made based on the above-mentioned idea, and an object of the present invention is to provide a high-sensitivity, high-quality CRT that prevents charging of an insulating support rod and is free from aberrations and curved bright lines.

〔発明の概要〕[Summary of the invention]

即ち、本発明は内面に蛍光体スクリーンが被着形成され
たフェースプレートと、このフェースプレートにファン
ネルを介して接合されたネックからなる外囲器のネック
内に陰極、第1格子電極、第2格子電極、第1陽極、第
2陽極、Y偏向電極、アイソレーション電極、X偏向電
極が順に絶縁支持棒に植設された電子銃が装着されてな
る静電偏向形陰極線管において、電子ビーム通過領域に
沿った絶縁支持棒の少なくともY偏向電極に対設する位
置に絶縁支持棒への荷電を防止し得る導電性被覆が設け
られてなることを特徴とする静電偏向形陰極線管であり
、導電性被膜が第2陽極、Y偏向電極、アイソレーショ
ン電極のいずれかと同電位になされていること、導電被
膜がY偏向電極と同電位の場合には、このY偏向電極と
2ケ所以上で導接されてなることを実施態様としている
That is, in the present invention, a cathode, a first grid electrode, and a second grid electrode are disposed within the neck of an envelope consisting of a face plate having a phosphor screen adhered to the inner surface and a neck connected to the face plate via a funnel. In an electrostatic deflection type cathode ray tube, an electron gun is attached, in which a grid electrode, a first anode, a second anode, a Y deflection electrode, an isolation electrode, and an X deflection electrode are implanted in order on an insulated support rod. An electrostatic deflection type cathode ray tube characterized in that a conductive coating capable of preventing charging of the insulated support rod is provided at least at a position opposite to the Y deflection electrode of the insulated support rod along the region, The conductive film must be at the same potential as the second anode, the Y deflection electrode, or the isolation electrode. If the conductive film is at the same potential as the Y deflection electrode, it must be conductive at two or more places with the Y deflection electrode. An embodiment of the invention is that they are in contact with each other.

〔発明の実施例〕[Embodiments of the invention]

次に、第1図及び第2図により本発明の一実施例を説明
する。
Next, one embodiment of the present invention will be described with reference to FIGS. 1 and 2.

即ち、電子銃(11)は、内部に陰極を有する第1格子
電極(12)、第2格子電極(13)、第1陽極(]4
)、第2陽極(15)、Y偏向電極(16)、アイソレ
ーション電極(17)及びX偏向電極(18)が絶縁支
持棒(I9)にそれぞれ植設部を介して植設されて構成
されている。これ迄は従来の電子銃とほぼ同一構造であ
るが、本実施例においてはX偏向電極(16)の植設部
(+61)(1,62)を含み絶縁支持棒(19)のX
偏向電極(16)に対設する面と側面に導電性被膜(2
0)が設けられていることを特徴としている。この導電
性被膜(20)の一端部(20+)は第2電極(15)
に印加される電極とX偏向電極(16)に印加される電
圧を妨げない範囲で第2陽極(15)の植設部に近接し
て設けられている。また他端部(202)も同様にアイ
ソレーション電極(17)の植設部(171)に近接し
て設けられている。
That is, the electron gun (11) includes a first grid electrode (12) having a cathode inside, a second grid electrode (13), and a first anode (4).
), second anode (15), Y deflection electrode (16), isolation electrode (17) and ing. Up to this point, the structure is almost the same as that of the conventional electron gun, but in this embodiment, the X deflection electrode (16) includes the implanted part (+61) (1, 62), and the X of the insulating support rod (19).
A conductive coating (2
0) is provided. One end (20+) of this conductive coating (20) is connected to the second electrode (15).
The second anode (15) is provided close to the implanted portion of the second anode (15) within a range that does not interfere with the voltage applied to the electrode and the X deflection electrode (16). Further, the other end (202) is similarly provided close to the implanted part (171) of the isolation electrode (17).

この電子銃(11)は蛍光体スクリーン(21)が被着
形成されたフェースプレートにファンネル(23)を介
して接合されたネック(24)内に装着される。
This electron gun (11) is mounted in a neck (24) that is joined via a funnel (23) to a face plate on which a phosphor screen (21) is adhered.

この構造の(、RTにおいては、陰極から放出された電
子は第1格子電極(I2)の電子ビーム通過孔部から第
2格子電極(13)の正電界により加速され、第2格子
電極、第1陽極(14)および第2陽極(15)から構
成される主電子レンズに入射し、径小に集束されて電子
ビーム通過孔部(15+ )からX偏向電極(16)、
アイソレーション電極(17)及びX偏向電極(18)
を介して蛍光体スクリーン(21)上に各種の現象を描
き出すようになっている。
In this structure (RT), electrons emitted from the cathode are accelerated by the positive electric field of the second grid electrode (13) from the electron beam passage hole of the first grid electrode (I2), The electron beam enters the main lens consisting of the first anode (14) and the second anode (15), is focused into a small diameter, and is sent from the electron beam passage hole (15+) to the X deflection electrode (16),
Isolation electrode (17) and X deflection electrode (18)
Various phenomena are depicted on a phosphor screen (21) through the phosphor screen (21).

電子銃をこの様な構造にすることにより、電子ビームに
収差を与える第2陽極(15)と、X偏向電極(16)
間及びX偏向電極(16)とアイソレーション電極(1
7)間などからの浮遊電子があったとしてもX偏向電極
(16)に対設する絶縁支持棒(19)の表面」二の電
位は導電性被膜(20)により、第2陽極(15)近傍
からアイソレーション電極(17)まで均一となるので
、電子ビームスポット形状に収差を与えることが極めて
少なくなる。
By structuring the electron gun in this way, the second anode (15) which gives an aberration to the electron beam and the X deflection electrode (16)
Between and X deflection electrode (16) and isolation electrode (1
7) Even if there are floating electrons from between the surfaces of the insulating support rod (19) opposite to the Since the electron beam spot is uniform from the vicinity to the isolation electrode (17), aberrations in the shape of the electron beam spot are extremely reduced.

この場合、X偏向電極(16)はある幅を持っている。In this case, the X deflection electrode (16) has a certain width.

また1対のX偏向電極(16)間同志の入口間隙は電子
ビームの利用率を勘案して可能な限り狭く、またX偏向
電極(16)間の静電容量を減らすため、X偏向電極(
16)の入口側の幅を可能な限り狭くしている。このよ
うにすることにより、第2陽極(15)からX偏向電極
(16)の入口近傍との間に外部からの不所望な電界が
侵入し易くなるので、X偏向電極(16)に沿った絶縁
支持棒(19)上に荷電現象が発生した場合、この荷電
現象は集束電子ビームに歪をあたえるが、この歪を導電
性被膜(20)で防止するようになっている。
In addition, the entrance gap between the pair of X-deflection electrodes (16) is as narrow as possible considering the utilization rate of the electron beam, and in order to reduce the capacitance between the X-deflection electrodes (16),
16) The width on the inlet side is made as narrow as possible. By doing this, it becomes easier for undesired external electric fields to enter between the second anode (15) and the vicinity of the entrance of the X-deflection electrode (16). When a charging phenomenon occurs on the insulating support rod (19), this charging phenomenon gives distortion to the focused electron beam, but this distortion is prevented by the conductive coating (20).

この導電性被膜(20)としては、カーボン、銀、また
はその他の金属粉を混入した導電性塗料を電子銃組立後
に塗布して形成するか、予め絶縁支持棒にモリブデンな
どを蒸着や焼結等でメタライズされたものを使用する。
This conductive film (20) can be formed by applying a conductive paint mixed with carbon, silver, or other metal powder after assembling the electron gun, or by depositing molybdenum or the like on an insulating support rod in advance by vapor deposition or sintering. Use a metalized one.

また、この導電性被膜(20)は植設部(161)(1
6□)すべてに電気的接続がなされることが、電位安定
化に効果がある。なぜならば、導電性被膜(20)の表
面抵抗が高い場合には、その抵抗分のため散乱電子の荷
電分の放電時定数が長くなり、その間、一時的に収差が
現われることがある。これを防止するには植設部(16
+)(1,6□)とを接続し、その抵抗分を軽減させる
必要がある。別な見方からすれば、=8= 植設部(16,)(16□)と導電性被膜(20)と接
続することにより植設部(161)(162)の凹凸部
での接続不具合発生が有っても導電性被膜(20)が全
く開放状態とならずに済み、信頼性の向」二にも役立つ
ことになる。
Further, this conductive coating (20) is attached to the implanted portion (161) (1
6□) Making electrical connections to everything is effective in stabilizing the potential. This is because when the surface resistance of the conductive film (20) is high, the discharge time constant for the charge of scattered electrons becomes longer due to the resistance, and during that time, aberrations may appear temporarily. To prevent this, the implanted part (16
+)(1,6□) to reduce the resistance. From a different point of view, =8= Connecting the implanted portion (16,) (16□) with the conductive coating (20) causes a connection failure at the uneven portion of the implanted portion (161) (162). Even if there is a problem, the conductive film (20) will not be in an open state at all, which will also help improve reliability.

また、導電性被膜(20)は製造」二の困難性はあるが
、アイソレーション電極(17)や第2陽極(15)に
導接させ、X偏向電極(16)の植設部(+61)(+
62)を逃げるように設ける構造も考えられるし、電子
銃(11)としての機能を妨げない範囲の高抵抗の導電
性被膜で第2陽極(15)の植設部(15+)からアイ
ソレーション電極(17)の植設部(17+)まで設け
てもよいし、第2陽極(15)、アイソレーション電極
(17)のいずれかと同電位にしてもよい。
In addition, although the conductive coating (20) is difficult to manufacture, it is possible to connect it to the isolation electrode (17) and the second anode (15), and the (+
62) may be provided in such a way that it escapes, or an isolation electrode may be formed from the implanted part (15+) of the second anode (15) using a conductive coating with a high resistance within a range that does not interfere with the function of the electron gun (11). (17) may be provided up to the implanted portion (17+), or may be set to the same potential as either the second anode (15) or the isolation electrode (17).

前述した実施例では絶縁支持棒が1対の場合の単−加速
形のCRTを示したが、これに限定されるものではなく
、4本の絶縁支持棒を使用したり、後段加速形の如きX
偏向電極(18)の蛍光面側にシールドメツシュ電極な
どを配設したCRTにもそのまま適用することができる
し、X偏向電極(16)の植設部を更に増加して導電性
被膜(20)の電位の平均化を計ることも可能である。
In the above-mentioned embodiment, a single-acceleration type CRT with one pair of insulating support rods was shown, but the present invention is not limited to this. X
It can be applied as is to a CRT in which a shield mesh electrode or the like is arranged on the phosphor screen side of the deflection electrode (18), or by further increasing the implanted part of the X deflection electrode (16) ) It is also possible to measure the average of the potentials.

【図面の簡単な説明】[Brief explanation of drawings]

第1−図及び第2図は本発明の(、RTの一実施例を示
す図であり、第1図は一部切欠側面図、第2図は電子銃
の要部を示す斜視図、第3図は従来のCRTに使用され
ている電子銃の説明用側面図である。
1 and 2 are views showing one embodiment of the RT of the present invention, in which FIG. 1 is a partially cutaway side view, FIG. 2 is a perspective view showing the main parts of the electron gun, and FIG. FIG. 3 is an explanatory side view of an electron gun used in a conventional CRT.

Claims (3)

【特許請求の範囲】[Claims] (1)内面に蛍光体スクリーンが被着形成されたフェー
スプレートと、このフェースプレートにファンネルを介
して接合されたネックからなる外囲器の前記ネック内に
陰極、第1格子電極、第2格子電極、第1陽極、第2陽
極、Y偏向電極、アイソレーション電極、X偏向電極が
順に絶縁支持棒に植設された電子銃が少なくとも装着さ
れてなる静電偏向形陰極線管において、前記Y偏向電極
の電子ビーム通過領域に沿った前記絶縁支持棒の少なく
とも前記Y偏向電極に対設する位置に前記絶縁支持棒へ
の荷電を防止し得る導電性被覆が設けられてなることを
特徴とする静電偏向形陰極線管。
(1) A cathode, a first lattice electrode, and a second lattice are placed in the neck of an envelope consisting of a face plate with a phosphor screen adhered to the inner surface and a neck connected to the face plate via a funnel. In an electrostatic deflection cathode ray tube, the electrostatic deflection cathode ray tube is equipped with at least an electron gun in which an electrode, a first anode, a second anode, a Y deflection electrode, an isolation electrode, and an X deflection electrode are implanted in order on an insulated support rod. A conductive coating capable of preventing charging of the insulating support rod is provided at least at a position opposite to the Y deflection electrode of the insulating support rod along the electron beam passing region of the electrode. Electrode deflection type cathode ray tube.
(2)導電性被膜が第2陽極、Y偏向電極、アイソレー
ション電極のいずれかと同電位になされていることを特
徴とする特許請求の範囲第1項記載の静電偏向形陰極線
管。
(2) The electrostatic deflection type cathode ray tube according to claim 1, wherein the conductive film is at the same potential as any of the second anode, the Y deflection electrode, and the isolation electrode.
(3)導電被膜がY偏向電極と同電位であり、かつY偏
向電極の2ケ所以上で導接されてなることを特徴とする
特許請求の範囲第1項記載の静電偏向形陰極線管。
(3) The electrostatic deflection type cathode ray tube according to claim 1, wherein the conductive coating has the same potential as the Y deflection electrode and is electrically connected to the Y deflection electrode at two or more locations.
JP14758484A 1984-07-18 1984-07-18 Cathode-ray tube of electrostatic deflection type Pending JPS6129049A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14758484A JPS6129049A (en) 1984-07-18 1984-07-18 Cathode-ray tube of electrostatic deflection type

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14758484A JPS6129049A (en) 1984-07-18 1984-07-18 Cathode-ray tube of electrostatic deflection type

Publications (1)

Publication Number Publication Date
JPS6129049A true JPS6129049A (en) 1986-02-08

Family

ID=15433650

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14758484A Pending JPS6129049A (en) 1984-07-18 1984-07-18 Cathode-ray tube of electrostatic deflection type

Country Status (1)

Country Link
JP (1) JPS6129049A (en)

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