JPS61288360A - Analysis and display method for surface condition - Google Patents

Analysis and display method for surface condition

Info

Publication number
JPS61288360A
JPS61288360A JP60129242A JP12924285A JPS61288360A JP S61288360 A JPS61288360 A JP S61288360A JP 60129242 A JP60129242 A JP 60129242A JP 12924285 A JP12924285 A JP 12924285A JP S61288360 A JPS61288360 A JP S61288360A
Authority
JP
Japan
Prior art keywords
dimensionally
defects
display
roughness
depth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60129242A
Other languages
Japanese (ja)
Inventor
Fujimitsu Masuyama
不二光 増山
Takashi Oguro
大黒 貴
Kazuo Hiromatsu
広松 一男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP60129242A priority Critical patent/JPS61288360A/en
Publication of JPS61288360A publication Critical patent/JPS61288360A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To display the coarseness, defects and the like broadly within a viewfield of the naked eye, by detecting the surface condition of a mechanical part or the like with a scanning type electron microscope, and display two- dimensionally by separating in a specific quantity after memorizing plurally and continuously the resultant signals. CONSTITUTION:Electron beams 2a from a scanning type electron microscope are radiated over a sample 3 such as a mechanical part, and numerous analyzing points 4 are scanned two-dimensionally. Then the secondary electron beams 2b responding to the analyzing points 4 are detected by a detector 5, memorized in a computer 7 through a control unit 6, and this process is carried out on all analyzing points 4 continuously. After that, the size or the depth of each recessed and projecting point over the surface of the sample 3, obtained from the memorized values, is displayed on the display device 8, by separating in a specific quantity, in specific marks or colors two-dimensionally. Therefore, the coarseness or defects can be displayed broadly within the viewfield of the naked eye, and can be used effectively for detecting nondistructive defects and the like.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、顕微鏡視野での物質表面の凹凸又は表面に開
口した欠陥の大きさ及び深さを定量的に肉眼的視野で2
次元的に広域表示する表面状態の分析表示方法に関する
Detailed Description of the Invention [Industrial Application Field] The present invention quantitatively measures the size and depth of irregularities on the surface of a material in a microscopic field or defects opened in the surface in a macroscopic field.
This invention relates to a surface state analysis and display method that displays a dimensional wide area.

〔従来技術と問題点〕[Prior art and problems]

機械部品の表面は、その粗度又は欠陥の有無によって性
質が大きく左右される。
The properties of the surfaces of mechanical parts are largely influenced by their roughness or the presence or absence of defects.

従来よシ表面の粗度を測定表示する方法としては、粗さ
計で一次元的に粗度を測定し1表示する方法が知られて
いる。しかしながら、かかる方法では顕微鏡的視野での
測定、表示が難しい。しかも、粗度に応じての段階的表
示及び二次元的な表示が難しい。
As a conventional method for measuring and displaying the roughness of a surface, a method is known in which the roughness is measured one-dimensionally using a roughness meter and displayed in one display. However, with this method, it is difficult to measure and display in a microscopic field. Moreover, it is difficult to perform stepwise display and two-dimensional display according to the roughness.

また、走査電子顕微鏡により表面の粗度を2次電子像と
して表示することによって凹凸を立体的に観察する方法
も知られている。しかしながら、かかる方法では顕微鏡
的視野での微小部分に限られ、肉眼的視野1例えば数襲
四方以上の大きさの面積を広域観察することができない
A method is also known in which surface roughness is displayed as a secondary electron image using a scanning electron microscope to three-dimensionally observe unevenness. However, such a method is limited to a minute part in a microscopic field of view, and cannot observe a wide area of a macroscopic field of view, for example, an area larger than several squares.

しかも1表面の欠陥深さ又は大きさを段階的に表示する
ことができない。
Moreover, it is not possible to display the defect depth or size of one surface step by step.

本発明は1表面の粗度又は表面に開口した欠陥を顕微鏡
的視野で分析し、それを多数個、連続して集積し、肉眼
的視野で°広域的に表示し得る表面状態の分析表示方法
を提供しようとするものである。
The present invention is a surface condition analysis and display method that analyzes the roughness of a surface or defects with openings in the surface under a microscopic field, accumulates a large number of them in succession, and displays them over a wide area under a macroscopic view. This is what we are trying to provide.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は5表面の粗度又は表面に開口した欠陥を粗度又
は欠陥の、深さとして定量的に分析表示する方法におい
て、走査型電子顕微鏡によシ前記表面の顕微鏡的凹凸を
2次電子像の信号としてその凹凸の位置及び大きさを多
数個、二次元的に連続して検出し、該信号を記憶装置に
記憶させた後、凹凸の大きさ又は深さを一定量に区分し
て各区分に対応させた特定の記号もしくは色を用いて肉
眼的な視野で二次元的に広域表示することを特徴どする
ものである。
The present invention provides a method for quantitatively analyzing and displaying the roughness of a surface or a defect opening in the surface as the roughness or the depth of the defect. A large number of positions and sizes of the unevenness are continuously detected two-dimensionally as image signals, the signals are stored in a storage device, and then the size or depth of the unevenness is divided into fixed amounts. It is characterized by displaying a wide area two-dimensionally with the naked eye using specific symbols or colors that correspond to each category.

〔作用〕[Effect]

上述した本発明方法によれば、表面の粗度又は表面に開
口した欠陥を走査型電子顕微鏡により顕微鏡的視野で検
出し、それを多数個、連続的に記憶装置に記憶集積する
ことによって、前記粗度又は欠陥を肉眼的視野で広域的
に表示できる。
According to the method of the present invention described above, surface roughness or defects with openings on the surface are detected in a microscopic field using a scanning electron microscope, and a large number of defects are continuously stored and accumulated in a storage device. Roughness or defects can be displayed over a wide area with a macroscopic view.

〔発明の実施例〕[Embodiments of the invention]

以下1本発明の実施例を第1図を参照して説明する。 An embodiment of the present invention will be described below with reference to FIG.

まず、走査型電子顕微鏡の電子発生器1よシミ子ビーム
2aを収束させて試料3表面に照射する。この材料3は
、数Lo11四方の面積を有するが、その表面に多数個
の分析点(約100μm四方)4があシ、電子ビーム2
aは図示しない試料駆動装置による試料3のXY方向へ
の動作によって、多数個の分析点4を2次元的に移動す
る。但し、1個の分析点4において電子ビーム2aは該
分析点4の微小面積を走査し、2次電子線2bを発生す
る。この2次電子線2bは、2次電子検出器5で検出さ
れ、制御装置6を介して、更に該2次電子像を基にした
情報は電算機7に記憶される。次いで、電算機7に記憶
された情報は凹凸の大きさ又は深さを一定量に区分して
ディスプレイ装置8に出力され、該ディスプレイ装置8
で種々の形態の記号、色等の肉眼的視野で二次元的に広
域表示する。
First, the electron generator 1 of the scanning electron microscope converges the smear beam 2a and irradiates it onto the surface of the sample 3. This material 3 has an area of several Lo11 squares, but there are many analysis points (approximately 100 μm square) 4 on its surface, and electron beams 2
A moves a large number of analysis points 4 two-dimensionally by moving the sample 3 in the X and Y directions by a sample drive device (not shown). However, at one analysis point 4, the electron beam 2a scans a minute area of the analysis point 4 and generates a secondary electron beam 2b. This secondary electron beam 2b is detected by a secondary electron detector 5, and information based on the secondary electron image is stored in a computer 7 via a control device 6. Next, the information stored in the computer 7 is outputted to the display device 8 by dividing the size or depth of the unevenness into a certain amount.
Displays various forms of symbols, colors, etc. in a two-dimensional, wide-area manner with the naked eye.

しかして1本発明方法によれば次のような操作によシ従
来の観察法では得られなかった情報が定量的に入手でき
た。
According to the method of the present invention, information that could not be obtained using conventional observation methods could be quantitatively obtained through the following operations.

第2図は、高温でクリープ損傷を受けたステンレス鋼の
金属組織を光学顕微鏡で観察したものである。この金属
組織は、母相11と粒界12とからなシ、母相11及び
粒界12には夫夫析出物13及び粒界析出物14が観察
され、しかも粒界析出物14に接して微細空孔15がみ
られた。そこで1本発明方法により第2図の金属組織の
微細空孔15のみを2次電子像の凹凸から一定の深さ以
上の凹部として検出し、表示した。その結果、第3因に
示すように平滑面16の中に微小空孔が一定の深さ以上
の像17として表示できた。この像17は、概ね前記第
2図図示の光学顕微鏡組織で観察された微小空孔15と
よく対応しているが、光学顕微鏡で観察した空孔として
対応した像11jaの他に本発明方法で新たに得られた
像18bが観察された。
FIG. 2 is an optical microscope observation of the metal structure of stainless steel that has suffered creep damage at high temperatures. This metal structure consists of a parent phase 11 and grain boundaries 12, and a precipitate 13 and a grain boundary precipitate 14 are observed in the parent phase 11 and grain boundaries 12, and moreover, in contact with the grain boundary precipitate 14, Micropores 15 were observed. Therefore, by the method of the present invention, only the micropores 15 in the metal structure shown in FIG. 2 were detected from the unevenness of the secondary electron image as recesses of a certain depth or more and displayed. As a result, as shown in the third factor, micropores could be displayed in the smooth surface 16 as an image 17 of a certain depth or more. This image 17 generally corresponds well to the micropores 15 observed with the optical microscope structure shown in FIG. A newly obtained image 18b was observed.

従って、本発明によれば従来の観察法で得られない情報
が定量的に入手できる。
Therefore, according to the present invention, information that cannot be obtained by conventional observation methods can be quantitatively obtained.

〔発明の効果〕〔Effect of the invention〕

以上詳述した如く5本発明によれば表面の粗度又は表面
に開口した欠陥を顕微鏡的視野で分析し、それを多数個
、連続的に集積し、肉眼的視野で広域的に表示でき5機
械部品の表面粗度分析1機械部品の微小欠陥検出、非破
壊的欠陥検出等に有効に応用し得る表面状態の分析表示
方法を提供できる。
As detailed above,5 according to the present invention, it is possible to analyze surface roughness or defects with openings in the surface with a microscopic field of view, accumulate a large number of them continuously, and display them over a wide area with a macroscopic field of view5. Surface roughness analysis of mechanical parts 1 It is possible to provide a surface condition analysis and display method that can be effectively applied to micro defect detection, non-destructive defect detection, etc. of mechanical parts.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例における表面状態の分析表示に
用いられる装置を示す概略図、第2図は高温でクリープ
損傷を受けたステンレス鋼の金属組織を光学顕微鏡で観
察した図、第3図は、同金属組織の微細空孔を本発明方
法にょ)分析1表示した図である。 1・・・電子発生器、2m・・・電子ビーム、2b・・
・2次電子線、3・・・試料、4・・・分析点、5・・
・2次電子検出器、7・・・計算機% 8・・・ディス
プレイ装置、11・・・母相、12・・・粒界、15・
・・微細空孔。 17 、18 a 、 18 b −−−像。 出願人復代理人 弁理士  鈴 江 武 彦第1vl
Fig. 1 is a schematic diagram showing an apparatus used for analyzing and displaying surface conditions in an embodiment of the present invention, Fig. 2 is an optical microscope observation of the metal structure of stainless steel that has suffered creep damage at high temperatures, and Fig. 3 The figure shows micropores in the same metal structure analyzed using the method of the present invention. 1...Electron generator, 2m...Electron beam, 2b...
・Secondary electron beam, 3...sample, 4...analysis point, 5...
・Secondary electron detector, 7...Computer% 8...Display device, 11...Material phase, 12...Grain boundary, 15.
...Minute pores. 17, 18a, 18b---image. Applicant Sub-Agent Patent Attorney Takehiko Suzue 1st vl

Claims (1)

【特許請求の範囲】[Claims] 表面の粗度又は表面に開口した欠陥を粗度又は欠陥の深
さとして定量的に分析表示する方法において、走査型電
子顕微鏡により前記表面の顕微鏡的凹凸を2次電子像の
信号としてその凹凸の位置及び大きさを多数個、二次元
的に連続して検出し、該信号を記憶装置に記憶させた後
、凹凸の大きさ又は深さを一定量に区分して各区分に対
応させた特定の記号もしくは色を用いて肉眼的な視野で
二次元的に広域表示することを特徴とする表面状態の分
析表示方法。
In a method of quantitatively analyzing and displaying surface roughness or defects opening on the surface as roughness or defect depth, microscopic irregularities on the surface are measured using a scanning electron microscope as a signal of a secondary electron image. After continuously detecting a large number of positions and sizes two-dimensionally and storing the signals in a storage device, the size or depth of the unevenness is divided into a certain amount and identified to correspond to each division. A method for analyzing and displaying surface conditions characterized by displaying a wide area two-dimensionally with the naked eye using symbols or colors.
JP60129242A 1985-06-14 1985-06-14 Analysis and display method for surface condition Pending JPS61288360A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60129242A JPS61288360A (en) 1985-06-14 1985-06-14 Analysis and display method for surface condition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60129242A JPS61288360A (en) 1985-06-14 1985-06-14 Analysis and display method for surface condition

Publications (1)

Publication Number Publication Date
JPS61288360A true JPS61288360A (en) 1986-12-18

Family

ID=15004704

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60129242A Pending JPS61288360A (en) 1985-06-14 1985-06-14 Analysis and display method for surface condition

Country Status (1)

Country Link
JP (1) JPS61288360A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996031897A1 (en) * 1995-04-07 1996-10-10 Hitachi, Ltd. Electron microscope

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59221956A (en) * 1983-05-31 1984-12-13 Toshiba Corp Scanning electron microscope

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59221956A (en) * 1983-05-31 1984-12-13 Toshiba Corp Scanning electron microscope

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996031897A1 (en) * 1995-04-07 1996-10-10 Hitachi, Ltd. Electron microscope

Similar Documents

Publication Publication Date Title
US11187662B2 (en) Device and method for simultaneously inspecting defects of surface and subsurface of optical element
CN110383038B (en) System and method for automated analysis of air samples
DE2952809C2 (en)
JPH03267745A (en) Surface property detecting method
FR2602053A1 (en) DEVICE AND METHOD FOR NON-DESTRUCTIVE TESTING OF A WORKPIECE BY MEASURING THE IMPEDANCE OF CURRENT FOUCAULT
JPH0318708A (en) Method and device for inspecting surface
JPS582980A (en) Automatically optical inspection apparatus and method
CN110231394A (en) The irregular crackle imaging method of nonferromugnetic material based on ac magnetic field
KR20130047691A (en) Method for detecting clusters of biological particles
JP5536805B2 (en) Patterned wafer inspection system using non-vibrating contact potential difference sensor
JP4612585B2 (en) Method for evaluating deformation structure of ferritic steel sheet
JP2000304689A (en) Projection observing method, microorganism inspection method and projection detecting apparatus
Boué-Bigne Simultaneous characterization of elemental segregation and cementite networks in high carbon steel products by spatially-resolved laser-induced breakdown spectroscopy
CN108376656A (en) The lossless detection method of super large crystallite dimension based on two-dimensional x-ray detection technique
JPS61288360A (en) Analysis and display method for surface condition
US5636023A (en) Apparatus for measuring surface shape
JP6196947B2 (en) Plate for detecting flow velocity distribution
CN108169323A (en) A kind of processing method of polymorphic structure workpiece eddy current signal
JPS63223548A (en) Non-destructive inspecting instrument
Jasiński et al. Application of Two Advanced Vision Methods Based on Structural and Surface Analyses to Detect Defects in the Erichsen Cupping Test
JPS63165740A (en) X-ray diffraction apparatus
JPS63139238A (en) Simple one-dimensional scanning x-ray diffraction microscope
JPH03249263A (en) Method for measuring fineness based on image data
JP2001299383A (en) Method for examining microorganism
JPS6162849A (en) Density curve analytical system of automatic multifunctional analyser