JPS61288360A - Analysis and display method for surface condition - Google Patents
Analysis and display method for surface conditionInfo
- Publication number
- JPS61288360A JPS61288360A JP60129242A JP12924285A JPS61288360A JP S61288360 A JPS61288360 A JP S61288360A JP 60129242 A JP60129242 A JP 60129242A JP 12924285 A JP12924285 A JP 12924285A JP S61288360 A JPS61288360 A JP S61288360A
- Authority
- JP
- Japan
- Prior art keywords
- dimensionally
- defects
- display
- roughness
- depth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、顕微鏡視野での物質表面の凹凸又は表面に開
口した欠陥の大きさ及び深さを定量的に肉眼的視野で2
次元的に広域表示する表面状態の分析表示方法に関する
。Detailed Description of the Invention [Industrial Application Field] The present invention quantitatively measures the size and depth of irregularities on the surface of a material in a microscopic field or defects opened in the surface in a macroscopic field.
This invention relates to a surface state analysis and display method that displays a dimensional wide area.
機械部品の表面は、その粗度又は欠陥の有無によって性
質が大きく左右される。The properties of the surfaces of mechanical parts are largely influenced by their roughness or the presence or absence of defects.
従来よシ表面の粗度を測定表示する方法としては、粗さ
計で一次元的に粗度を測定し1表示する方法が知られて
いる。しかしながら、かかる方法では顕微鏡的視野での
測定、表示が難しい。しかも、粗度に応じての段階的表
示及び二次元的な表示が難しい。As a conventional method for measuring and displaying the roughness of a surface, a method is known in which the roughness is measured one-dimensionally using a roughness meter and displayed in one display. However, with this method, it is difficult to measure and display in a microscopic field. Moreover, it is difficult to perform stepwise display and two-dimensional display according to the roughness.
また、走査電子顕微鏡により表面の粗度を2次電子像と
して表示することによって凹凸を立体的に観察する方法
も知られている。しかしながら、かかる方法では顕微鏡
的視野での微小部分に限られ、肉眼的視野1例えば数襲
四方以上の大きさの面積を広域観察することができない
。A method is also known in which surface roughness is displayed as a secondary electron image using a scanning electron microscope to three-dimensionally observe unevenness. However, such a method is limited to a minute part in a microscopic field of view, and cannot observe a wide area of a macroscopic field of view, for example, an area larger than several squares.
しかも1表面の欠陥深さ又は大きさを段階的に表示する
ことができない。Moreover, it is not possible to display the defect depth or size of one surface step by step.
本発明は1表面の粗度又は表面に開口した欠陥を顕微鏡
的視野で分析し、それを多数個、連続して集積し、肉眼
的視野で°広域的に表示し得る表面状態の分析表示方法
を提供しようとするものである。The present invention is a surface condition analysis and display method that analyzes the roughness of a surface or defects with openings in the surface under a microscopic field, accumulates a large number of them in succession, and displays them over a wide area under a macroscopic view. This is what we are trying to provide.
本発明は5表面の粗度又は表面に開口した欠陥を粗度又
は欠陥の、深さとして定量的に分析表示する方法におい
て、走査型電子顕微鏡によシ前記表面の顕微鏡的凹凸を
2次電子像の信号としてその凹凸の位置及び大きさを多
数個、二次元的に連続して検出し、該信号を記憶装置に
記憶させた後、凹凸の大きさ又は深さを一定量に区分し
て各区分に対応させた特定の記号もしくは色を用いて肉
眼的な視野で二次元的に広域表示することを特徴どする
ものである。The present invention provides a method for quantitatively analyzing and displaying the roughness of a surface or a defect opening in the surface as the roughness or the depth of the defect. A large number of positions and sizes of the unevenness are continuously detected two-dimensionally as image signals, the signals are stored in a storage device, and then the size or depth of the unevenness is divided into fixed amounts. It is characterized by displaying a wide area two-dimensionally with the naked eye using specific symbols or colors that correspond to each category.
上述した本発明方法によれば、表面の粗度又は表面に開
口した欠陥を走査型電子顕微鏡により顕微鏡的視野で検
出し、それを多数個、連続的に記憶装置に記憶集積する
ことによって、前記粗度又は欠陥を肉眼的視野で広域的
に表示できる。According to the method of the present invention described above, surface roughness or defects with openings on the surface are detected in a microscopic field using a scanning electron microscope, and a large number of defects are continuously stored and accumulated in a storage device. Roughness or defects can be displayed over a wide area with a macroscopic view.
以下1本発明の実施例を第1図を参照して説明する。 An embodiment of the present invention will be described below with reference to FIG.
まず、走査型電子顕微鏡の電子発生器1よシミ子ビーム
2aを収束させて試料3表面に照射する。この材料3は
、数Lo11四方の面積を有するが、その表面に多数個
の分析点(約100μm四方)4があシ、電子ビーム2
aは図示しない試料駆動装置による試料3のXY方向へ
の動作によって、多数個の分析点4を2次元的に移動す
る。但し、1個の分析点4において電子ビーム2aは該
分析点4の微小面積を走査し、2次電子線2bを発生す
る。この2次電子線2bは、2次電子検出器5で検出さ
れ、制御装置6を介して、更に該2次電子像を基にした
情報は電算機7に記憶される。次いで、電算機7に記憶
された情報は凹凸の大きさ又は深さを一定量に区分して
ディスプレイ装置8に出力され、該ディスプレイ装置8
で種々の形態の記号、色等の肉眼的視野で二次元的に広
域表示する。First, the electron generator 1 of the scanning electron microscope converges the smear beam 2a and irradiates it onto the surface of the sample 3. This material 3 has an area of several Lo11 squares, but there are many analysis points (approximately 100 μm square) 4 on its surface, and electron beams 2
A moves a large number of analysis points 4 two-dimensionally by moving the sample 3 in the X and Y directions by a sample drive device (not shown). However, at one analysis point 4, the electron beam 2a scans a minute area of the analysis point 4 and generates a secondary electron beam 2b. This secondary electron beam 2b is detected by a secondary electron detector 5, and information based on the secondary electron image is stored in a computer 7 via a control device 6. Next, the information stored in the computer 7 is outputted to the display device 8 by dividing the size or depth of the unevenness into a certain amount.
Displays various forms of symbols, colors, etc. in a two-dimensional, wide-area manner with the naked eye.
しかして1本発明方法によれば次のような操作によシ従
来の観察法では得られなかった情報が定量的に入手でき
た。According to the method of the present invention, information that could not be obtained using conventional observation methods could be quantitatively obtained through the following operations.
第2図は、高温でクリープ損傷を受けたステンレス鋼の
金属組織を光学顕微鏡で観察したものである。この金属
組織は、母相11と粒界12とからなシ、母相11及び
粒界12には夫夫析出物13及び粒界析出物14が観察
され、しかも粒界析出物14に接して微細空孔15がみ
られた。そこで1本発明方法により第2図の金属組織の
微細空孔15のみを2次電子像の凹凸から一定の深さ以
上の凹部として検出し、表示した。その結果、第3因に
示すように平滑面16の中に微小空孔が一定の深さ以上
の像17として表示できた。この像17は、概ね前記第
2図図示の光学顕微鏡組織で観察された微小空孔15と
よく対応しているが、光学顕微鏡で観察した空孔として
対応した像11jaの他に本発明方法で新たに得られた
像18bが観察された。FIG. 2 is an optical microscope observation of the metal structure of stainless steel that has suffered creep damage at high temperatures. This metal structure consists of a parent phase 11 and grain boundaries 12, and a precipitate 13 and a grain boundary precipitate 14 are observed in the parent phase 11 and grain boundaries 12, and moreover, in contact with the grain boundary precipitate 14, Micropores 15 were observed. Therefore, by the method of the present invention, only the micropores 15 in the metal structure shown in FIG. 2 were detected from the unevenness of the secondary electron image as recesses of a certain depth or more and displayed. As a result, as shown in the third factor, micropores could be displayed in the smooth surface 16 as an image 17 of a certain depth or more. This image 17 generally corresponds well to the micropores 15 observed with the optical microscope structure shown in FIG. A newly obtained image 18b was observed.
従って、本発明によれば従来の観察法で得られない情報
が定量的に入手できる。Therefore, according to the present invention, information that cannot be obtained by conventional observation methods can be quantitatively obtained.
以上詳述した如く5本発明によれば表面の粗度又は表面
に開口した欠陥を顕微鏡的視野で分析し、それを多数個
、連続的に集積し、肉眼的視野で広域的に表示でき5機
械部品の表面粗度分析1機械部品の微小欠陥検出、非破
壊的欠陥検出等に有効に応用し得る表面状態の分析表示
方法を提供できる。As detailed above,5 according to the present invention, it is possible to analyze surface roughness or defects with openings in the surface with a microscopic field of view, accumulate a large number of them continuously, and display them over a wide area with a macroscopic field of view5. Surface roughness analysis of mechanical parts 1 It is possible to provide a surface condition analysis and display method that can be effectively applied to micro defect detection, non-destructive defect detection, etc. of mechanical parts.
第1図は本発明の実施例における表面状態の分析表示に
用いられる装置を示す概略図、第2図は高温でクリープ
損傷を受けたステンレス鋼の金属組織を光学顕微鏡で観
察した図、第3図は、同金属組織の微細空孔を本発明方
法にょ)分析1表示した図である。
1・・・電子発生器、2m・・・電子ビーム、2b・・
・2次電子線、3・・・試料、4・・・分析点、5・・
・2次電子検出器、7・・・計算機% 8・・・ディス
プレイ装置、11・・・母相、12・・・粒界、15・
・・微細空孔。
17 、18 a 、 18 b −−−像。
出願人復代理人 弁理士 鈴 江 武 彦第1vlFig. 1 is a schematic diagram showing an apparatus used for analyzing and displaying surface conditions in an embodiment of the present invention, Fig. 2 is an optical microscope observation of the metal structure of stainless steel that has suffered creep damage at high temperatures, and Fig. 3 The figure shows micropores in the same metal structure analyzed using the method of the present invention. 1...Electron generator, 2m...Electron beam, 2b...
・Secondary electron beam, 3...sample, 4...analysis point, 5...
・Secondary electron detector, 7...Computer% 8...Display device, 11...Material phase, 12...Grain boundary, 15.
...Minute pores. 17, 18a, 18b---image. Applicant Sub-Agent Patent Attorney Takehiko Suzue 1st vl
Claims (1)
さとして定量的に分析表示する方法において、走査型電
子顕微鏡により前記表面の顕微鏡的凹凸を2次電子像の
信号としてその凹凸の位置及び大きさを多数個、二次元
的に連続して検出し、該信号を記憶装置に記憶させた後
、凹凸の大きさ又は深さを一定量に区分して各区分に対
応させた特定の記号もしくは色を用いて肉眼的な視野で
二次元的に広域表示することを特徴とする表面状態の分
析表示方法。In a method of quantitatively analyzing and displaying surface roughness or defects opening on the surface as roughness or defect depth, microscopic irregularities on the surface are measured using a scanning electron microscope as a signal of a secondary electron image. After continuously detecting a large number of positions and sizes two-dimensionally and storing the signals in a storage device, the size or depth of the unevenness is divided into a certain amount and identified to correspond to each division. A method for analyzing and displaying surface conditions characterized by displaying a wide area two-dimensionally with the naked eye using symbols or colors.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60129242A JPS61288360A (en) | 1985-06-14 | 1985-06-14 | Analysis and display method for surface condition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60129242A JPS61288360A (en) | 1985-06-14 | 1985-06-14 | Analysis and display method for surface condition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61288360A true JPS61288360A (en) | 1986-12-18 |
Family
ID=15004704
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60129242A Pending JPS61288360A (en) | 1985-06-14 | 1985-06-14 | Analysis and display method for surface condition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61288360A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996031897A1 (en) * | 1995-04-07 | 1996-10-10 | Hitachi, Ltd. | Electron microscope |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59221956A (en) * | 1983-05-31 | 1984-12-13 | Toshiba Corp | Scanning electron microscope |
-
1985
- 1985-06-14 JP JP60129242A patent/JPS61288360A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59221956A (en) * | 1983-05-31 | 1984-12-13 | Toshiba Corp | Scanning electron microscope |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996031897A1 (en) * | 1995-04-07 | 1996-10-10 | Hitachi, Ltd. | Electron microscope |
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