JPS61287024A - Manufacture of thin film magnetic head - Google Patents

Manufacture of thin film magnetic head

Info

Publication number
JPS61287024A
JPS61287024A JP12867985A JP12867985A JPS61287024A JP S61287024 A JPS61287024 A JP S61287024A JP 12867985 A JP12867985 A JP 12867985A JP 12867985 A JP12867985 A JP 12867985A JP S61287024 A JPS61287024 A JP S61287024A
Authority
JP
Japan
Prior art keywords
magnetic pole
magnetic
layer
width
tip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12867985A
Other languages
Japanese (ja)
Inventor
Mitsuo Inumochi
犬持　光男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP12867985A priority Critical patent/JPS61287024A/en
Publication of JPS61287024A publication Critical patent/JPS61287024A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G11B5/3166—Testing or indicating in relation thereto, e.g. before the fabrication is completed
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • G11B5/313—Disposition of layers
    • G11B5/3133—Disposition of layers including layers not usually being a part of the electromagnetic transducer structure and providing additional features, e.g. for improving heat radiation, reduction of power dissipation, adaptations for measurement or indication of gap depth or other properties of the structure

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To improve the accuracy of polishing for gap depth restriction by forming a magnetic pole front edge having a width different from a magnetic pole width at the top of a magnetic pole tip to the magnetic pole tip of a magnetic substance layer. CONSTITUTION:The magnetic pole front edge 7 provided at a posite side to a connection part 4 of the 1st and 2nd both magnetic substance layers at the magnetic pole tip 5 of the magnetic substance layer is formed wider than the magnetic pole width at a prescribed value of the gap (l) from the front edge of the insulation layer 2 of the magnetic pole tip 5. The magnetic pole is polished while the width of magnetic pole is being observed at the gap restriction polish, the polishment is finished when the width reaches the magnetic pole width of the magnetic pole tip to obtain the magnetic pole tip with a prescribed depth. Thus, gap is obtained with high accuracy and the polish time is reduced.

Description

【発明の詳細な説明】 〔離業上の利用分野〕 この発明は、磁気記録装置において用いられる薄膜磁気
ヘッドの製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Aspects of Application] The present invention relates to a method of manufacturing a thin film magnetic head used in a magnetic recording device.

〔従来の技術〕[Conventional technology]

従来の製法による加工途中の薄膜磁気ヘッドの構造を第
２図に示す。図において、（１）は第２磁性体層、（２
）は絶縁層、（３）はこの絶縁層に周囲を覆われる導体
層で、磁性体層に磁束を発生させるか。FIG. 2 shows the structure of a thin film magnetic head that is currently being processed using a conventional manufacturing method. In the figure, (1) is the second magnetic layer, (2
) is an insulating layer, and (3) is a conductive layer surrounded by this insulating layer, which generates magnetic flux in the magnetic layer.

磁性体層から電圧を誘導されるためのものである。This is for inducing voltage from the magnetic layer.

（４）は第２磁性体層（１）と、絶縁層（２）における
第２磁性体層（１）と反対側にある第１磁性体層との接
続部である。（５）は磁極巾の磁極先端部で加工終了後
媒体に磁気信号を記録、再生するものである。（６）は
磁性体層の磁極先端部（５１における両磁性体層の接続
部（４）と反対側に形成された磁極前縁部である。(4) is a connection portion between the second magnetic layer (1) and the first magnetic layer on the opposite side of the insulating layer (2) to the second magnetic layer (1). (5) is for recording and reproducing magnetic signals on the medium after processing at the tip of the magnetic pole having the width of the magnetic pole. (6) is the magnetic pole tip of the magnetic layer (the leading edge of the magnetic pole formed on the side opposite to the connecting portion (4) of both magnetic layers in 51).

なお、ｌはギャップ深さ、Ｔはトラック幅に相当する磁
極中、Ａ−Ｂ線は切断研磨面である。In addition, l is the gap depth, T is the magnetic pole corresponding to the track width, and the A-B line is the cut and polished surface.

次に従来の薄膜磁気ヘッドの製造方法について順を追っ
て説明する。Next, a method for manufacturing a conventional thin film magnetic head will be explained step by step.

まず基板上に写真製版技術等を用いて１両磁性体層、導
体層（３）及び絶縁層（２）等が成膜される。次に基板
を切断研磨等により所望の形状に加工し。First, a magnetic layer, a conductor layer (3), an insulating layer (2), etc. are formed on a substrate using photolithography or the like. Next, the substrate is processed into the desired shape by cutting, polishing, etc.

磁気媒体と組み合わせ、信号の記録、再生を行なうが、
この加工において磁気ヘッドの性能を左右するギャップ
深さくｌ）規制の為の研磨が重要な工程になる。従来の
製法において、このギャップ深さくＪ）の規制は、顕微
鏡でパターン上部より磁極先端部（５）の絶縁層（２）
の端面と研磨面との寸法を観察しながら研磨を行なって
いた。It is used in combination with magnetic media to record and reproduce signals.
In this process, polishing to regulate the gap depth, which affects the performance of the magnetic head, is an important step. In the conventional manufacturing method, the gap depth (J) can be controlled by checking the insulating layer (2) of the magnetic pole tip (5) from the top of the pattern using a microscope.
Polishing was carried out while observing the dimensions of the end face and polished surface.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかしながら、この方法では１μｍ前後の精度を測定す
るのは不可能に近く、ギャップ深さが一定せず特性が不
均一になシ、また作業時間もかな夛かかるという問題点
があった。However, with this method, it is almost impossible to measure with an accuracy of around 1 μm, and there are problems in that the gap depth is not constant, the characteristics are non-uniform, and it takes a long time to work.

この発明は上記のような問題点を解消するためになされ
たもので、ギャップ深さのバラクｔをなくしヘッドの特
性を向上させ、又作業時間の短縮を図ることを目的とし
ている。This invention has been made to solve the above-mentioned problems, and aims to eliminate variation t in the gap depth, improve the characteristics of the head, and shorten the working time.

〔問題点を解決するための手段〕[Means for solving problems]

基板に第１磁性体層、絶縁層、この絶縁層に周、囲を覆
われる導体層、及び一端が上記第１磁性体層と接続し他
端が第１磁性体層と共に磁極山の磁極先端部を形成する
第２磁性体層を積層するものにおいて、上記磁性体層の
磁極先端部における上記陶磁性体層が接続する側と反対
側に上記磁極山とは異なる巾の磁極前＃１部を形成して
おき、これを研磨して消失させて磁極先端部を形成する
ようにしたものである。A substrate includes a first magnetic layer, an insulating layer, a conductor layer surrounded by the insulating layer, and one end connected to the first magnetic layer and the other end together with the first magnetic layer at the magnetic pole tip of the magnetic pole mountain. A magnetic pole front #1 portion having a width different from that of the magnetic pole mountain on the side opposite to the side to which the ceramic layer connects at the magnetic pole tip portion of the magnetic layer. is formed in advance and then polished to disappear to form the tip of the magnetic pole.

〔作用〕[Effect]

この発明においては、磁性体層の磁極先端部における陶
磁性体層が接続する側と反対側に、上記磁極先端部の磁
極山とは異なる巾の磁極前縁部を形成しているので、ギ
ャップ深さ規制研磨時に研磨面より磁極山を観察しなが
ら研磨し、ｖ＆磁極先端部磁極山になり九時点で研磨を
終了することができ、ギャップ深さ規制研磨の精度が良
くなる。In this invention, a magnetic pole leading edge portion having a width different from that of the magnetic pole peak of the magnetic pole tip portion is formed on the side opposite to the side to which the ceramic layer connects at the magnetic pole tip portion of the magnetic layer. During depth control polishing, polishing is performed while observing the magnetic pole peaks from the polishing surface, and the polishing can be completed at the 9th point when the magnetic pole peaks are formed at the tip of the magnetic pole, improving the accuracy of gap depth control polishing.

〔実施例〕〔Example〕

第１図はこの発明の一実施例を説明するための上面図で
０図において（７）は磁性体層の磁極先端部（５）にお
ける第１．第２の陶磁性体層の接続部（４）と反対側に
設けられた磁極前線部で、磁極先端部（５）の絶縁層（
２）前縁からのギャップ深さＵ）が所定の値のところで
その磁極山よりも巾広に形成されている。FIG. 1 is a top view for explaining one embodiment of the present invention, and in FIG. 0, (7) is the first. The insulating layer (
2) The gap depth U) from the leading edge is formed to be wider than the magnetic pole peak at a predetermined value.

このように、磁極前縁部（７）を磁極先端部（５）の磁
極巾工〕市広に形成しているので、ギャップ深さ規制研
磨時に研磨面より磁極山を観察しながら研磨し、磁極先
端部の磁極山になった時点で研磨作業を終了し、所定ギ
ャップ深さの磁極先端Ｓｔ得る。In this way, since the leading edge of the magnetic pole (7) is formed to be wider than the magnetic pole width of the tip of the magnetic pole (5), polishing is performed while observing the magnetic pole peak from the polishing surface during gap depth regulation polishing. The polishing operation is finished when the magnetic pole tip reaches a magnetic pole peak, and a magnetic pole tip St with a predetermined gap depth is obtained.

なお、上記実施例では磁極前縁部の形状を台形で磁極山
より巾広としたが、ａｌ磁極先端部５）の巾と異なる巾
であればどんな形状でも良く、中挟でも良い。In the above embodiment, the shape of the front edge of the magnetic pole is trapezoidal and wider than the magnetic pole mountain, but it may be of any shape as long as it has a width different from the width of the Al magnetic pole tip 5), or may be sandwiched.

〔発明の効果〕〔Effect of the invention〕

以上のように、この発明によれば基板に第１ａｌ性体層
、絶縁層、この絶縁層に周囲を覆われる導体層、及び一
端が上記第１磁性体層と接続し他端が第１磁性体層と共
に磁極山の磁極先端部を形成する第２磁性体ＮＪを積層
するものにお−て、上記磁性体層の磁極先端部における
上記陶磁性体層が接続する側と反対側に上記磁極山とは
異なる巾の磁極前縁部を形成しておき、これを研磨して
消失させて磁極先端部を形成するようにしたので、磁極
山の変化をギャップ深さ規制研磨時の目印にすることが
できるため、ギャップ深さｔ−精度良く得ることか出来
ると共に、研磨作業時間も短縮することができる薄膜磁
気ヘッドの製造方法が得られるという効果がある。As described above, according to the present invention, the substrate includes a first aluminum layer, an insulating layer, a conductive layer surrounded by the insulating layer, and one end of which is connected to the first magnetic layer and the other end of which is connected to the first magnetic layer. In a device in which a second magnetic material NJ is laminated together with a body layer to form a magnetic pole tip of a magnetic pole mountain, the magnetic pole is placed on the opposite side of the magnetic pole tip of the magnetic layer to the side to which the ceramic layer connects. The leading edge of the magnetic pole is formed with a width different from that of the peak, and this is removed by polishing to form the tip of the magnetic pole, so the change in the magnetic pole peak can be used as a mark during gap depth regulation polishing. Therefore, it is possible to obtain a method for manufacturing a thin film magnetic head in which the gap depth t can be obtained with high accuracy and the polishing operation time can be shortened.

【図面の簡単な説明】[Brief explanation of drawings]

第１図はこの発明の一実施例によるギャップ深さ規制研
磨前の薄膜磁気ヘッドの形状を示す上面図、第２図は従
来の製法によるギャップ深さ規制研磨前の薄膜磁気ヘッ
ドの形状を示す上面図であ　　。 る。 図に鼾いて、（１）は第２磁性体層、（２）は絶縁層。 （３）は導体層、（４）は接続部、（５）は磁極先端部
、（６）。 （７）は磁極前一部である。 なお０図中同一符号は同−又は相当部分を示す。FIG. 1 is a top view showing the shape of a thin film magnetic head before gap depth control polishing according to an embodiment of the present invention, and FIG. 2 shows the shape of a thin film magnetic head before gap depth control polishing according to a conventional manufacturing method. Top view. Ru. Looking at the figure, (1) is the second magnetic layer, and (2) is the insulating layer. (3) is a conductor layer, (4) is a connection portion, (5) is a magnetic pole tip, and (6). (7) is the front part of the magnetic pole. Note that the same reference numerals in the drawings indicate the same or equivalent parts.

Claims (1)

【特許請求の範囲】[Claims] 基板に第１磁性体層、絶縁層、この絶縁層に周囲を覆わ
れる導体層、及び一端が上記第１磁性体層と接続し他端
が第１磁性体層と共に磁極巾の磁極先端部を形成する第
２磁性体層を積層するものにおいて、上記磁性体層の磁
極先端部における上記両磁性体層が接続する側と反対側
に上記磁極巾とは異なる巾の磁極前縁部を形成しておき
、これを研磨して消失させて磁極先端部を形成するよう
にした薄膜磁気ヘッドの製造方法。A substrate includes a first magnetic layer, an insulating layer, a conductor layer surrounded by the insulating layer, and one end connected to the first magnetic layer and the other end having a magnetic pole tip having a magnetic pole width together with the first magnetic layer. In the one in which the second magnetic layer is laminated, a leading edge portion of the magnetic pole having a width different from the width of the magnetic pole is formed on the side opposite to the side where both the magnetic layers connect at the tip of the magnetic layer of the magnetic layer. A method of manufacturing a thin film magnetic head in which the tip of the magnetic pole is formed by polishing and removing the thin film.
JP12867985A 1985-06-13 1985-06-13 Manufacture of thin film magnetic head Pending JPS61287024A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12867985A JPS61287024A (en) 1985-06-13 1985-06-13 Manufacture of thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12867985A JPS61287024A (en) 1985-06-13 1985-06-13 Manufacture of thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS61287024A true JPS61287024A (en) 1986-12-17

Family

ID=14990757

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12867985A Pending JPS61287024A (en) 1985-06-13 1985-06-13 Manufacture of thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS61287024A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8163186B2 (en) 2004-12-28 2012-04-24 Headway Technologies, Inc. Method of manufacturing magnetic head, and magnetic head sub-structure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8163186B2 (en) 2004-12-28 2012-04-24 Headway Technologies, Inc. Method of manufacturing magnetic head, and magnetic head sub-structure

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