JPS61283018A - Thin film magnetic head - Google Patents

Thin film magnetic head

Info

Publication number
JPS61283018A
JPS61283018A JP12244285A JP12244285A JPS61283018A JP S61283018 A JPS61283018 A JP S61283018A JP 12244285 A JP12244285 A JP 12244285A JP 12244285 A JP12244285 A JP 12244285A JP S61283018 A JPS61283018 A JP S61283018A
Authority
JP
Japan
Prior art keywords
magnetic
thin film
spacer
sliding surface
nonmagnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12244285A
Other languages
Japanese (ja)
Inventor
Sachiko Nanaumi
七海 祥子
Masakatsu Saito
正勝 斎藤
Seiji Kishimoto
清治 岸本
Mitsuo Abe
阿部 光雄
Isao Oshima
大島 勲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12244285A priority Critical patent/JPS61283018A/en
Publication of JPS61283018A publication Critical patent/JPS61283018A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To make gap depth highly accurate and to prevent the magnetic characteristic of a magnetic film from deteriorating by removing some parts of a magnetic thin film and a nonmagnetic spacer so as to form a recessed part including a coil window and forming a ridge line at the sliding surface side of the recessed part in parallel with a tape sliding surface. CONSTITUTION:The magnetic thin films 2a and 2b are installed on a nonmagnetic substrate 1 trough the nonmagnetic spacer 3, and some parts of the thin film 2 and the spacer 3 are removed in a recessed shape 6 by means of etching to form the coil window 4. The ridge line at the side of the tape sliding surface of the recessed part 6 is machined so that said line can be approximately in parallel with the tape sliding surface and can cut the spacer 3. As a result, the recessed part is removed and formed by etching, and therefore the gap depth can be extremely accurate. Moreover, since a thermomechanical load is not applied to the thin film 2, the magnetic characteristic will not deteriorate.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、磁性薄膜でもって磁気コアを構成し、巻線を
施こした薄膜巻線型磁気ヘッドを得るに好適な磁気ヘッ
ド基体に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a magnetic head substrate suitable for obtaining a thin-film wire-wound magnetic head in which a magnetic core is formed of a magnetic thin film and winding is performed.

〔発明の背景〕[Background of the invention]

近年、記録密度の向上をはかる上から、磁気ヘッドの機
械的精度をより高めることが必要と゛なり、このために
、磁性薄膜でもって磁気コアを構成した磁気ヘッドが大
いに注目されている。
In recent years, in order to improve recording density, it has become necessary to further improve the mechanical precision of magnetic heads, and for this reason, magnetic heads whose magnetic cores are composed of magnetic thin films have attracted much attention.

かかる磁気ヘッドは、従来、非磁性基板上に磁性薄膜を
所定層積層して磁気コア半体を得、かかる磁気コア半体
を2個非磁性スペーサを介して突合わせボンディングし
て形成されるものであって、この非磁性スペーサが磁気
ギャップを構成する。しかし、この磁気ヘッドは、1度
に多数生産することができないし、また、機械的なボン
ディング作業が必要であって、突き合わせボンディング
を精度よく行なうことは非常。
Conventionally, such a magnetic head is formed by laminating a predetermined layer of magnetic thin films on a non-magnetic substrate to obtain a magnetic core half, and then butt-bonding two such magnetic core halves with a non-magnetic spacer interposed therebetween. This nonmagnetic spacer constitutes a magnetic gap. However, these magnetic heads cannot be produced in large numbers at one time, and mechanical bonding is required, making it extremely difficult to perform butt bonding with high precision.

に困難であり1磁気ギヤツプのギャップ長やトラック幅
の寸法精度を高めることができず、量産性、歩留りの点
で問題がありた。
It was difficult to improve the dimensional accuracy of the gap length and track width of one magnetic gap, which caused problems in terms of mass production and yield.

これに対し、第4図に示すように、非磁性基板1上に、
磁気ギャップを形成する非磁性スペーサ3を挟んで磁性
薄M 2a、 24が平面上に設けられ、これら磁性薄
膜2a、 2.1)にまたがって巻線窓4が設けられ1
この巻線窓4を介して巻線5を施こすようにした磁気ヘ
ッドが提案されている。
On the other hand, as shown in FIG. 4, on the nonmagnetic substrate 1,
Magnetic thin films 2a, 24 are provided on a plane with a non-magnetic spacer 3 forming a magnetic gap interposed therebetween, and a winding window 4 is provided straddling these magnetic thin films 2a, 2.1).
A magnetic head in which the winding 5 is applied through the winding window 4 has been proposed.

かかる磁気ヘッドにおいては、トラック幅がここれら磁
性薄膜2a、 :26の膜厚によって規定され。
In such a magnetic head, the track width is defined by the thickness of the magnetic thin films 2a, 26.

また、ギャップ長も非磁性スペーサ3の膜厚によって規
定されるから、これら膜厚を制御することにより、非常
に高い精度でトラック幅やギャップ長を設定することが
できる。
Furthermore, since the gap length is also defined by the thickness of the nonmagnetic spacer 3, by controlling these thicknesses, the track width and gap length can be set with very high precision.

ところで、かかる磁気ヘッドにおいては、磁性薄膜に巻
線5を施こすための巻線窓4が必要であり1このために
1上記磁性薄膜2α、2Jによって囲まれた孔が形成さ
れ、さらに、この孔に連なって非磁性基板1に貫通孔が
形成されている。この巻線窓4の形成方法としては、在
来種々の方法が知られているが、特公昭58−5061
9号公報などに示されるように、平坦な非磁性基板上に
磁性薄膜を形成した後に、超音波加工などの機械加工に
より磁性薄膜と非磁性基板とを貫通して形成するという
方法が、有効な加工方法として知られている。
Incidentally, such a magnetic head requires a winding window 4 for winding the magnetic thin film 5, and for this purpose a hole surrounded by the magnetic thin films 2α and 2J is formed. A through hole is formed in the non-magnetic substrate 1 so as to be continuous with the hole. Various methods are conventionally known for forming the winding window 4, but Japanese Patent Publication No. 58-5061
As shown in Publication No. 9, etc., an effective method is to form a magnetic thin film on a flat non-magnetic substrate and then use machining such as ultrasonic processing to penetrate the magnetic thin film and the non-magnetic substrate. It is known as a processing method.

しかしながら、この方法は、機械加工によって巻線窓を
穿設するため、ギャップデプス精度が悪く磁性薄膜の磁
気特性の劣化も免がれないという欠点がある。すなわち
、磁性薄膜に穴をあける1つの方法として、超音波加工
による方法があるが・これは、数10μmの砥粒と超音
波ホーンとで磁性薄膜を破壊しながら穴をあけるもので
、本質的に磁性薄膜の磁気特性を劣化させるし、また、
チッピングが生じてきれいな形状の穴が得られずギャッ
プデプス精度が悪くなる〇 一方、他の方法としてレーザビーム加工やイオンビーム
加工による方法があるが、この方法は加熱して孔を開け
るものであり、このために、磁気ヘッドの最も重要な磁
気ギャップ部分の磁性薄膜の磁気特性が加熱によって劣
化する。特に、磁性薄膜としてアモルファス磁性体を用
いた場合、この加熱による磁気特性の劣化は著しく、こ
の方法は全く利用することができない。
However, since the winding window is formed by machining, this method has the disadvantage that the gap depth accuracy is poor and the magnetic properties of the magnetic thin film are inevitably deteriorated. In other words, one method of making holes in a magnetic thin film is by ultrasonic machining.This method uses abrasive grains of several tens of micrometers and an ultrasonic horn to destroy the magnetic thin film while making the hole, which is essentially will deteriorate the magnetic properties of the magnetic thin film, and
Chipping occurs, making it impossible to obtain well-shaped holes and reducing gap depth accuracy.On the other hand, there are other methods such as laser beam machining and ion beam machining, but these methods do not drill holes by heating. As a result, the magnetic properties of the magnetic thin film in the most important magnetic gap portion of the magnetic head deteriorate due to heating. In particular, when an amorphous magnetic material is used as the magnetic thin film, the magnetic properties deteriorate significantly due to this heating, and this method cannot be used at all.

以上のように、巻線窓を形成するための従来の方法は、
磁気ヘッドの製造や特性に悪影響を及ぼし、実用的では
なかった。
As mentioned above, the conventional method for forming a winding window is
This adversely affected the manufacturing and characteristics of the magnetic head, making it impractical.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、上記従来技術の欠点な除き、ギャップ
デプス精度を高くでき、かつ、該磁性薄膜の磁気特性の
劣化を伴なうことなく容易に巻線窓を形成することがで
きる薄膜磁気ヘッドを提供するにある。
An object of the present invention is to provide a thin film magnetic film that can improve gap depth accuracy and easily form a winding window without deteriorating the magnetic properties of the magnetic thin film, while eliminating the drawbacks of the prior art described above. It is in providing the head.

〔発明の概要〕[Summary of the invention]

この目的を達成するために、本発明は、巻線窓が形成さ
れる部分の周囲の磁性薄膜および非磁性スペーサを除去
して凹部を形成し、該四囲のテープ摺動面側の稜線がテ
ープ摺動面と略平行になるようにした点に特徴がある。
In order to achieve this object, the present invention removes the magnetic thin film and non-magnetic spacer around the part where the winding window is formed to form a recess, and the ridgeline on the tape sliding surface side of the four surroundings is The feature is that it is made to be approximately parallel to the sliding surface.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の実施例を図面について説明する。 Embodiments of the present invention will be described below with reference to the drawings.

第1図は本発明による薄膜磁気ヘッドの一実施例を示す
斜視図であって、6は凹部であり、第4図に対応する部
分には同一符号を付けである。この第1図に示すように
、巻線窓4の周囲には磁性薄膜2α、24と非磁性スペ
ーサ3とが除去されたへ角形状の凹部6が形成されてい
る。
FIG. 1 is a perspective view showing an embodiment of a thin film magnetic head according to the present invention, where 6 is a recessed portion, and parts corresponding to those in FIG. 4 are given the same reference numerals. As shown in FIG. 1, a helical-shaped recess 6 is formed around the winding window 4 from which the magnetic thin films 2α, 24 and the nonmagnetic spacer 3 have been removed.

この凹部6は、後述するように、非磁性基板1に磁性薄
膜2CL、 24および非磁性スペーサ3を形成した後
、フォトリゾグラフィなどによるエツチングによりてこ
れら磁性膜M 2a、 2bおよび非磁性スペーサ3の
一部を除去したもので、凹部6のテープ摺動面側の稜線
は、テープ摺動面とほぼ平行なうインで非磁性スペーサ
32切断するような形状に加工されている。
As will be described later, the recess 6 is formed by forming the magnetic thin films 2CL, 24 and the nonmagnetic spacer 3 on the nonmagnetic substrate 1, and then etching these magnetic films M2a, 2b and the nonmagnetic spacer 3 by photolithography or the like. The ridgeline of the recess 6 on the tape sliding surface side is processed into a shape that cuts the nonmagnetic spacer 32 at an in-line that is substantially parallel to the tape sliding surface.

次に、第2図を汚いてこの実施例の製造方法について説
明する。なお、同図は第1図のA −Allに沿う断面
図として示し、第1図に対応する部分に同一符号を付け
である。
Next, the manufacturing method of this embodiment of the dirty lever shown in FIG. 2 will be explained. Note that this figure is shown as a sectional view along A-All in FIG. 1, and parts corresponding to those in FIG. 1 are given the same reference numerals.

まず、第2図(cL)に示すように、裏面に非貫通孔1
αを形成した非磁性基板1の表側全面に、蒸着1スパツ
タなどによって磁性膜2を形成する。
First, as shown in Fig. 2 (cL), there is a non-through hole 1 on the back side.
A magnetic film 2 is formed on the entire surface of the non-magnetic substrate 1 on which α has been formed by vapor deposition 1 sputtering or the like.

前記非貫通孔1aは、後で加工される巻I!窓と対応す
る部分にエツチングなどによりて形成される。
The non-through hole 1a is formed in the volume I! which will be processed later. It is formed by etching etc. on the part corresponding to the window.

次に、第21N(4)に示すように、フォトリゾグラフ
イ技術(エツチング)またはダイサ、バイトなどの機械
加工により、上記磁性膜2の不要部分を除き、一方の磁
性薄膜2cLを形成する。
Next, as shown in No. 21N (4), one of the magnetic thin films 2cL is formed by removing unnecessary portions of the magnetic film 2 by photolithography (etching) or machining using a dicer, cutting tool, or the like.

さらに、その上に蒸着やスパッタなどによって非磁性ス
ペーサ3を形成しく第2図(Q) ) 、さらにまた、
その上に先の磁性膜2と同様の方法で磁性膜ダを形成す
る(第2図(、t) ’)。゛次いで、エツチングや機
械加工のラッピング、ダイサ、バイトなどにより、少な
くとも磁性薄膜2aが露出するまで非磁性スペーサ6を
磁性薄膜2aの不要部分な除き、他方の磁性薄膜24を
形成する(第21N(、))。その後、非磁性基板1.
)表面が露出Tる程度に、エツチングなどにより、磁性
薄膜2a、24および非磁性スペーサ3の一部を除去し
、第3図(ト)に示すように)非貫通孔1cLの対向部
分に非貫通孔1αより太き目の凹部6を形成する。
Furthermore, a non-magnetic spacer 3 is formed thereon by vapor deposition or sputtering (see FIG. 2(Q)), and furthermore,
A magnetic film is formed thereon in the same manner as the magnetic film 2 described above (FIG. 2(, t)').゛Next, the non-magnetic spacer 6 is removed from unnecessary parts of the magnetic thin film 2a by etching, machining, lapping, dicing, cutting, etc. until at least the magnetic thin film 2a is exposed, and the other magnetic thin film 24 is formed (21N (21N)). ,)). After that, the non-magnetic substrate 1.
) Remove a portion of the magnetic thin films 2a, 24 and the non-magnetic spacer 3 by etching or the like to such an extent that the surfaces are exposed, and as shown in FIG. A recess 6 is formed that is thicker than the through hole 1α.

そして、ダイサなどで各チップ毎に切断し、イオンエツ
チング、レーザビーム加工、ケミカルエツチングなどに
より、凹部6底面の非磁性基板1を四部6より小さい径
で穴あけすると、先の非貫通孔1αは貫通孔となって巻
線窓4が形成される(第2図(d )。
Then, each chip is cut with a dicer, etc., and a hole is made in the non-magnetic substrate 1 at the bottom of the concave part 6 with a diameter smaller than that of the four parts 6 by ion etching, laser beam processing, chemical etching, etc., and the previous non-through hole 1α is passed through. A winding window 4 is formed as a hole (FIG. 2(d)).

この一実施例にあっては、ギャップデプスを決定する四
部6の稜部が、テープ摺動面と平行なうインで非磁性ス
ペーサ3を切断しており、しかも、この凹部6はエツチ
ングなどにより磁性薄膜2cL、 24および非磁性ス
ペーサ3の一部を除去して形成されるため、ギャップデ
プスの精度を極めて高いものにできる。また、磁性薄膜
2α、2善に機械的、熱的な負荷をかけることなく凹部
6を巻S窓4とを形成することができるため、磁性薄膜
2eL、 24の磁性特性が劣化することはなく、巻線
室4の穴径を従来方法に比べて小さくできるため、磁路
の短縮、チップサイズの縮小化に対応できる。
In this embodiment, the ridges of the four parts 6 that determine the gap depth cut the non-magnetic spacer 3 at an in-line parallel to the tape sliding surface, and the recesses 6 are made magnetic by etching or the like. Since it is formed by removing a portion of the thin films 2cL and 24 and the nonmagnetic spacer 3, the accuracy of the gap depth can be made extremely high. Furthermore, since the recess 6 can be wound and the S window 4 formed without applying mechanical or thermal loads to the magnetic thin films 2α, 2, the magnetic properties of the magnetic thin films 2eL, 24 will not deteriorate. Since the hole diameter of the winding chamber 4 can be made smaller than in the conventional method, it is possible to shorten the magnetic path and reduce the chip size.

第3図は本発明による薄膜磁気ヘッドの他の実施例を示
す平面図であり、第1図に対応する部分には同一符号を
付けである。
FIG. 3 is a plan view showing another embodiment of the thin film magnetic head according to the present invention, and parts corresponding to those in FIG. 1 are given the same reference numerals.

この第3図は本発明を2つの磁気ギャップを有するダブ
ルギャップ磁気ヘッドに適用した実施例を示し、図示せ
ぬ非磁性基板上には、共通コアとなる磁性薄膜2cの両
側に非磁性スペーサ3を介して磁性薄膜2a、 24が
それぞれ形成されており、さらに両巻線窓4.4の周囲
には凹部6’、6’が形成されている。こ(Lらは、先
に説明した第1の実施例と同様の手法によって形成され
る。前記凹部6’、6’は図示破線で示す部分において
、それぞれ非磁性スペーサ3をテープ摺動面とほぼ平行
に切断しており、これにより、ギャップデプスの精度を
向上している。本実施例では、磁気ギャップの近傍で磁
性薄膜2α、24の断面積が減少するように凹部6’、
6’をパターンニングしであるため、磁束の絞り効果が
得られる。
FIG. 3 shows an embodiment in which the present invention is applied to a double-gap magnetic head having two magnetic gaps. On a non-magnetic substrate (not shown), there are non-magnetic spacers 3 on both sides of a magnetic thin film 2c serving as a common core. Magnetic thin films 2a and 24 are respectively formed through the winding windows 4.4, and recesses 6' and 6' are formed around both winding windows 4.4. The recesses 6', 6' are formed by connecting the non-magnetic spacer 3 to the tape sliding surface at the portions indicated by broken lines in the figure. The cuts are made almost in parallel, thereby improving the accuracy of the gap depth.In this embodiment, the recesses 6',
Since 6' is patterned, a magnetic flux constriction effect can be obtained.

なお、上記各実施例では、非磁性基板1の裏面に予め非
貫通孔1e−を形成し・凹部6.6’、 6’の形成後
に非貫通孔1cLに通じる巻線窓42穿設したものにつ
いて説明したが、これに代えて、非磁性基板1の表面に
非貫通孔を形成し、この非貫通孔を7オトレジスト膜な
どで塞いだ後、第2図と同様の工程により磁性薄膜を形
成し、最後に7オトレジスト膜を除去して@線窓を形成
するようにしても良く、その他、表裏両面に非貫通孔を
形成した基磁性基板や、貫通孔を形成した非磁性基板あ
るいは、貫通孔や非貫通孔を形成しない平坦状の非磁性
基板を用いることも可能である。
In each of the above embodiments, the non-through hole 1e- was formed in advance on the back surface of the non-magnetic substrate 1, and the winding window 42 communicating with the non-through hole 1cL was bored after the recesses 6.6' and 6' were formed. However, instead of this, a non-penetrating hole is formed on the surface of the non-magnetic substrate 1, and after the non-penetrating hole is closed with a 7-photoresist film or the like, a magnetic thin film is formed by the same process as shown in FIG. Finally, the photoresist film 7 may be removed to form an @-line window.In addition, a base magnetic substrate with non-through holes formed on both the front and back sides, a non-magnetic substrate with through holes formed, or a through-hole It is also possible to use a flat nonmagnetic substrate without holes or non-through holes.

また、上記実施例では、巻線窓4よりも太き目な凹部6
’、6’、6’を形成した場合について説明したが、こ
の(!!]W)6.i、6’は巻線窓4と同一形状であ
っても良く、その形状も上記実施例に限定されるもので
はない。
Further, in the above embodiment, the recess 6 is thicker than the winding window 4.
We have explained the case where ', 6', 6' are formed, but this (!!)W)6. i, 6' may have the same shape as the winding window 4, and the shape is not limited to the above embodiment.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれば、ギャップデプス
の精度を向上できるばかりでなく1磁気コアを形成した
後の巻線窓の形成作業に際し、磁気薄膜の磁気特性の低
下な回避することができ、上記従来技術の欠点を除いて
優れた機能を有する薄膜磁気ヘッドを提供できる。
As explained above, according to the present invention, it is possible not only to improve the accuracy of the gap depth, but also to avoid deterioration of the magnetic properties of the magnetic thin film when forming the winding window after forming one magnetic core. Therefore, it is possible to provide a thin film magnetic head which has excellent functions except for the drawbacks of the above-mentioned prior art.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明による薄膜磁気ヘッドの一実施例を示す
斜視図・第2図(a)〜(居はその薄膜磁気ヘッドの製
造工程を示す断面図、第3図は本発明にょる薄膜磁気ヘ
ッドの他の実施例を示す平面図、第4図は従来の薄膜磁
気ヘッドの一例を示す斜視図である。 1・・・非磁性基板 1a・・・非貫通孔 2a、2喜、2c・・・磁性薄膜 3・・・非磁性スペーサ 4・・・巻線窓 6、6’、 6’・・・凹部 代理人弁理士  小 川 勝 男 第 1 図 乎 第 2t2I 第 3 図 第 4− 函 牛 、5
FIG. 1 is a perspective view showing an embodiment of a thin film magnetic head according to the present invention, FIGS. 4 is a plan view showing another embodiment of the magnetic head, and FIG. 4 is a perspective view showing an example of a conventional thin film magnetic head. 1...Nonmagnetic substrate 1a...Non-through holes 2a, 2, 2c ...Magnetic thin film 3...Non-magnetic spacer 4...Window window 6, 6', 6'...Katsuo Ogawa, Patent Attorney, Patent Attorney No. 1 Fig. 2t2I Fig. 3 Fig. 4- Hakogyu, 5

Claims (1)

【特許請求の範囲】[Claims] 非磁性スペーサを介して対向する磁性薄膜が非磁性基板
上に設けられ、これら磁性薄膜および非磁性基板を貫通
して巻線窓が設けられた薄膜磁気ヘッドにおいて、前記
磁性薄膜および前記非磁性スペーサの一部を除去して前
記巻線窓を包含する凹部を形成し、該凹部のテープ摺動
面側の稜線がテープ摺動面と略平行になるように構成し
たことを特徴とする薄膜磁気ヘッド。
In a thin film magnetic head in which magnetic thin films facing each other via a nonmagnetic spacer are provided on a nonmagnetic substrate, and a winding window is provided passing through these magnetic thin films and the nonmagnetic substrate, the magnetic thin film and the nonmagnetic spacer are provided. A thin film magnetic material, characterized in that a recessed portion is formed that includes the winding window by removing a portion of the winding window, and the ridgeline of the recessed portion on the tape sliding surface side is substantially parallel to the tape sliding surface. head.
JP12244285A 1985-06-07 1985-06-07 Thin film magnetic head Pending JPS61283018A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12244285A JPS61283018A (en) 1985-06-07 1985-06-07 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12244285A JPS61283018A (en) 1985-06-07 1985-06-07 Thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS61283018A true JPS61283018A (en) 1986-12-13

Family

ID=14835947

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12244285A Pending JPS61283018A (en) 1985-06-07 1985-06-07 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS61283018A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5167062A (en) * 1990-04-13 1992-12-01 Thomson-Csf Method of manufacturing magnetic write/read head and fabrication method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57141008A (en) * 1981-02-23 1982-09-01 Hitachi Ltd Thin film double azimuth magnetic head
JPS57141011A (en) * 1981-02-23 1982-09-01 Hitachi Ltd Thin film magnetic head and its production
JPS6083206A (en) * 1983-10-13 1985-05-11 Canon Inc Manufacture of magnetic head

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57141008A (en) * 1981-02-23 1982-09-01 Hitachi Ltd Thin film double azimuth magnetic head
JPS57141011A (en) * 1981-02-23 1982-09-01 Hitachi Ltd Thin film magnetic head and its production
JPS6083206A (en) * 1983-10-13 1985-05-11 Canon Inc Manufacture of magnetic head

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5167062A (en) * 1990-04-13 1992-12-01 Thomson-Csf Method of manufacturing magnetic write/read head and fabrication method
KR100274098B1 (en) * 1990-04-13 2000-12-15 게네비브 부 탄 Magnetic recording/reproducing head and fabrication process

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