JPS61275710A - Distributed index anamorphic plane microlens and its manufacture - Google Patents

Distributed index anamorphic plane microlens and its manufacture

Info

Publication number
JPS61275710A
JPS61275710A JP11634785A JP11634785A JPS61275710A JP S61275710 A JPS61275710 A JP S61275710A JP 11634785 A JP11634785 A JP 11634785A JP 11634785 A JP11634785 A JP 11634785A JP S61275710 A JPS61275710 A JP S61275710A
Authority
JP
Japan
Prior art keywords
refractive index
elliptic
semi
substrate
microlens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11634785A
Other languages
Japanese (ja)
Inventor
Hiroyuki Sakai
裕之 坂井
Yoshiyuki Asahara
浅原 慶之
Shigeaki Omi
成明 近江
Shin Nakayama
伸 中山
Yoshitaka Yoneda
嘉隆 米田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP11634785A priority Critical patent/JPS61275710A/en
Priority to US06/868,696 priority patent/US4805997A/en
Publication of JPS61275710A publication Critical patent/JPS61275710A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To collimate an elliptic beam emitted by a semiconductor laser and to facilitate the manufacture of a lens by forming a semi-elliptic distributed index area which has a long and a short axis on the surface of a transparent substrate in the transparent substrate. CONSTITUTION:The semi-elliptic distributed index area 8 formed in the plate type transparent substrate 7 has its refractive index distribution formed so that the refractive index is highest in the center of the semi-elliptic body and decreases with the radius. The optical axis 9 is on a straight line running in the center of the elliptic hemisphere at right angles to the substrate and the focal length of the distributed index area is longer in the long-axis direction (X than in the short-axis direction (Y). This microlens has the semi-elliptic distributed index area formed by fitting a mask which has an elliptic aperture part in a predetermined shape on the surface of a plate glass body and then performing an ion exchange between ions which provides a high refractive index and alkali ions in the glass body through the aperture part.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は光通信等の微小光学系に利用できるマイクロ
レンズに関するもので、特に基板表面上に長軸および短
軸を有する半楕円体状の屈折率分布領域を透明基板内に
形成させた屈折率分布型アナモルフィック平板マイクロ
レンズおよびその製造法に関するものである。
Detailed Description of the Invention [Field of Industrial Application] This invention relates to a microlens that can be used in micro-optical systems such as optical communication, and in particular, it relates to a microlens that is semi-ellipsoidal and has a major axis and a minor axis on the surface of a substrate. The present invention relates to a gradient index type anamorphic flat plate microlens in which a gradient index region is formed in a transparent substrate, and a method for manufacturing the same.

[従来の技術] 屈折率分布型平板マイクロレンズは、第4図に示すよう
に透明な板状基板1内にレンズ効果をもつ数個の屈折率
分布領域2を有し、入射光を符号3のように集光させる
ものである。このレンズは両面が平面であるため、一般
的な球面や非球面レンズに比べて加工が容易であり、し
かも一枚の基板内に多数のレンズ効果をもつ領域を一度
に作製することができる等の利点がある。このような屈
折率分布型平板マイクロレンズとして屈折率分布領域が
半球状のものや半円柱状のものが考案されている。
[Prior Art] As shown in FIG. 4, a refractive index distribution type flat plate microlens has several refractive index distribution regions 2 having a lens effect in a transparent plate-like substrate 1. It focuses light like this. Because both sides of this lens are flat, it is easier to process than general spherical or aspherical lenses, and it is also possible to create regions with multiple lens effects on one substrate at the same time. There are advantages. As such a gradient index flat plate microlens, one in which the refractive index distribution region is hemispherical or semi-cylindrical has been devised.

一方、光通信における光学系の光源として半導体レーザ
ーを用いることが多いが半導体レーザー4から放射され
るビーム6には、第5A、第5B図の平面および側面図
に示すように非点隔差lが存在し、また放射角が活性層
5に垂直な方向と平行な方向とでは拡がり角が異なるた
め、楕円状のビームとなる。このようなビームをコリメ
ートする光学レンズ系としては、半球状の屈折率分布領
域を有する平板マイクロレンズは最適とはいえない。
On the other hand, although a semiconductor laser is often used as a light source in an optical system in optical communication, the beam 6 emitted from the semiconductor laser 4 has an astigmatic difference l as shown in the plan and side views of FIGS. 5A and 5B. Since the radiation angle is different between the direction perpendicular to the active layer 5 and the direction parallel to it, the beam becomes an elliptical beam. As an optical lens system for collimating such a beam, a flat plate microlens having a hemispherical refractive index distribution region is not optimal.

[発明が解決しようとする問題点] この楕円の拡がりをもつ光を円形平行光にコリメートす
る方法としてはカマボッ形レンズを直交させて組み合せ
る光学系が考えられるが、この光学系を用いて円形平行
光を得ようとするレンズの曲率、肉厚との関係で複雑と
なり、レンズの製作も含めて極めて作りにくいレンズと
なる。例えば、半円柱状の屈折率分布領域を有する平板
マイクロレンズを用いる場合には、特公昭58−106
503号公報に記載されているように、開口数N、A、
の異なるレンズを互いに直交させて重ね合せる必要があ
る。
[Problems to be Solved by the Invention] As a method of collimating light with an elliptical spread into circular parallel light, an optical system in which Kamabok shaped lenses are orthogonally combined is considered. This becomes complicated due to the curvature and wall thickness of the lens used to obtain parallel light, making the lens extremely difficult to manufacture. For example, when using a flat plate microlens having a semi-cylindrical refractive index distribution region,
As described in Publication No. 503, the numerical apertures N, A,
It is necessary to superimpose different lenses so that they are orthogonal to each other.

この発明は、半導体レーザーから放射される楕円ビーム
のコリメート等に利用できる屈折率分布型アナモルフィ
ック平板マイクロレンズ及びその製造法を提供すること
を目的としている。
An object of the present invention is to provide a gradient index anamorphic flat plate microlens that can be used for collimating an elliptical beam emitted from a semiconductor laser, and a method for manufacturing the same.

[問題点を解決するための手段] 半導体レーザー等のように非点隔差の存在する光をコリ
メートするためには、光軸と垂直な各方向によって焦点
距離が異なるレンズが必、要となる。
[Means for Solving the Problems] In order to collimate light with astigmatism such as a semiconductor laser, a lens having a different focal length in each direction perpendicular to the optical axis is required.

この発明は、そのような性質を有する平板マイクロレン
ズ、すなわち基板表面上に長軸と短軸を有する半楕円体
状の屈折率分布領域を透明基板内に形成されていること
を特徴とする屈折率分布型アナモルフィック平板マイク
ロレンズに関するものである。
The present invention relates to a flat plate microlens having such properties, that is, a refraction device characterized in that a semi-ellipsoidal refractive index distribution region having a major axis and a minor axis is formed within a transparent substrate on the substrate surface. This invention relates to a rate distribution type anamorphic flat microlens.

このレンズは第1A〜第1C図に示すように板状の透明
基板7内に、半楕円体状の屈折率分布領域8を有し、そ
の屈折率分布は第2図に示すように半楕円体の中心部が
最も高く、径が増すにつれて低下している。第2図中符
号10は、yおよび2方向の屈折率分布曲線、符号11
はX方向の屈折率分布曲線を示している。光軸は基板と
垂直な方向に楕円半球の中心を通る直線上にあるが、屈
折率分布はこの光軸に対して回転対称ではないため、光
軸と垂直な面内においては方向によって焦点距離が貢な
る。すなわち、屈折率分布領域の長軸方向(X方向)の
焦点距離は短軸方向(y方向)のそれに比べて長くなる
という特徴を有している。
As shown in FIGS. 1A to 1C, this lens has a semiellipsoidal refractive index distribution region 8 in a plate-shaped transparent substrate 7, and the refractive index distribution is semiellipsoidal as shown in FIG. It is highest in the center of the body and decreases as the diameter increases. In FIG. 2, reference numeral 10 indicates a refractive index distribution curve in the y and two directions, and reference numeral 11
indicates a refractive index distribution curve in the X direction. The optical axis lies on a straight line passing through the center of the elliptical hemisphere in a direction perpendicular to the substrate, but the refractive index distribution is not rotationally symmetrical with respect to this optical axis, so the focal length varies depending on the direction in the plane perpendicular to the optical axis. is a tribute. That is, the focal length of the refractive index distribution region in the major axis direction (X direction) is longer than that in the minor axis direction (y direction).

この発明における屈折率分布型アナモルフィック平板マ
イクロレンズの製造法どして、ガラスのイオン交換を用
いる方法がある。すなわち、板状ガラス体の表面に予め
定められた形状の楕円状開口部を有するマスクを付けた
後、該開口部を通して高屈折率を生ずるイオンとガラス
体内のアルカリイオンとのイオン交換を行なうことによ
り、当該ガラス体内に半楕円体状の屈折率分布領域を形
成するものである。
As a method for manufacturing the gradient index type anamorphic flat microlens according to the present invention, there is a method using ion exchange of glass. That is, after attaching a mask having an elliptical opening with a predetermined shape to the surface of a plate glass body, ion exchange between ions that produce a high refractive index and alkali ions in the glass body is performed through the opening. This forms a semi-ellipsoidal refractive index distribution region within the glass body.

まず、第3図に示すように、ガラス基板12の表面に楕
円状の開口部14を有し、かつイオンに対して不透性の
マスク13を看ける。マスク材料としてはスパッターあ
るいは真空蒸着によるチタン膜等を用いることができる
。また開口部の長径及び短径は目的とするレンズの特性
及びイオン交換条件によって選択しなければならない。
First, as shown in FIG. 3, a mask 13 which has an elliptical opening 14 on the surface of a glass substrate 12 and is impermeable to ions can be seen. As the mask material, a titanium film or the like formed by sputtering or vacuum evaporation can be used. Further, the major axis and minor axis of the opening must be selected depending on the characteristics of the intended lens and the ion exchange conditions.

次に当該ガラス基板を銀やタリウム等の高屈折率を生ず
るイオンを含む溶融塩に浸漬してガラス基板内のに+や
Na+等のアルカリイオンと、溶融塩中の高屈折率を生
ずるイオンとのイオン交換を楕円状のマスク開口部を通
して行なう。このイオン交換によって該ガラス基板内に
第1A〜第1C図に示寸ような半楕円体状の屈折率分布
領域8が形成される。
Next, the glass substrate is immersed in a molten salt containing ions such as silver and thallium that produce a high refractive index, so that alkali ions such as Ni+ and Na+ in the glass substrate and ions that produce a high refractive index in the molten salt are removed. The ion exchange takes place through an elliptical mask opening. By this ion exchange, a semi-ellipsoidal refractive index distribution region 8 as shown in FIGS. 1A to 1C is formed in the glass substrate.

イオン交換後は、マスク13を除きガラス表面を研磨す
ることにより、屈折率分布型アナモルフィック平板マイ
クロレンズを作製することができる。
After ion exchange, by removing the mask 13 and polishing the glass surface, a gradient index type anamorphic flat plate microlens can be manufactured.

[実施例1 厚さ5n+mの板状に研磨加工したTiF6と称する光
学ガラス(重量%でP206 47.9%、N820 
 19.8% 、K2 0 7.7%  、Af203
3.7%、T i Q215.11%、その他1.6%
)にマスク材料としてチタン膜を1.3μmの厚さに付
けた後、フォトリソグラフィーの手法を用いて長径20
0μm、短径100μmの楕円状間口部を形成した。こ
れを重R%t’AgNO340% 、KNO360%の
溶融塩中に350℃で70hr浸漬し、イオン交換を行
った。イオン交換侵、チタンマスクを除去し、基板表面
を再び研磨することにより基板衣4゜面での長径1.2
9111 、短径1.17augおよび深さ0.57 
mmの半楕円体状の屈折率分布領域を右する屈折率分布
型アナモルフィック平板マイクロレンズを得た。このレ
ンズの焦点距離は長径方向と短径方向とでは異なり、そ
れぞれ2.47amおよび2、04+amであった。
[Example 1 Optical glass called TiF6 polished into a plate shape with a thickness of 5n+m (P206 47.9%, N820 in weight%)
19.8%, K20 7.7%, Af203
3.7%, T i Q215.11%, other 1.6%
) was coated with a titanium film with a thickness of 1.3 μm as a mask material, and then the major diameter was 20 μm using photolithography.
An elliptical frontage portion with a width of 0 μm and a short axis of 100 μm was formed. This was immersed in a molten salt of 40% heavy R% t'AgNO3 and 60% KNO3 at 350°C for 70 hours to perform ion exchange. By removing the ion exchange attack, removing the titanium mask, and polishing the substrate surface again, the major diameter of the substrate surface at 4° was reduced to 1.2.
9111, minor axis 1.17aug and depth 0.57
A refractive index gradient type anamorphic flat plate microlens having a semi-ellipsoidal refractive index distribution region of mm was obtained. The focal lengths of this lens were different in the major axis direction and the minor axis direction, and were 2.47 am and 2.04+ am, respectively.

[発明の効果] 上述のように本発明は、半楕円体状の屈折率分布領域を
もつアナモルフィック平板マイクロレンズとしたもので
あるから、半導体レーザーから放射される楕円ビームの
コリメート等に利用することができる。また、本発明の
マイクロレンズは板状ガラス体の表面に予め定められた
形状の楕円状開口部を有するマスクを付けた後、該開口
部を有して高屈折率を生ずるイオンと、ガラス体内のア
ルカリイオンとのイオン交換を行なうことにより得られ
るので、上記のごとき半楕円体状の屈折率分布領域を有
する平板マイクロレンズを容易に製造することかできる
[Effects of the Invention] As described above, the present invention is an anamorphic flat plate microlens having a semi-ellipsoidal refractive index distribution region, so it can be used for collimating an elliptical beam emitted from a semiconductor laser, etc. can do. In addition, in the microlens of the present invention, a mask having an elliptical opening with a predetermined shape is attached to the surface of a plate-like glass body, and then ions having the opening that produce a high refractive index and ions inside the glass body are attached. Since it is obtained by ion exchange with alkali ions, a flat microlens having a semi-ellipsoidal refractive index distribution region as described above can be easily manufactured.

【図面の簡単な説明】[Brief explanation of the drawing]

第1A図〜第1C図は本発明における屈折率分布型アナ
モルフィック平板マイクロレンズの平面図、正面図およ
び側面図、第2図は同ルンズの屈折率分布曲線、第3図
は本発明屈折率分布型アナモルフィック平板マイクロレ
ンズの製造法に適用されるマスクを付けたガラス基板の
一例を示す斜視図、第4図は一般的な平板マイクロレン
ズを説明する斜視図、第5A図および第5B図は半導体
レーザーの平面図および側面図である。 7・・・ガラス基板、8・・・屈折率分布領域、9・・
・光軸、10・・・yおよび2方向の屈折率分布曲線、
11・・・X方向の屈折率分布曲線、12・・・ガラス
基板、13・・・マスク、14・・・マスク開口部。 出 願 人  ホーヤ 株式会社 代  理  人     朝 倉 正 幸第1A図  
    第1C図 第旧図      第2図 yeZ
1A to 1C are a plan view, a front view, and a side view of a gradient index type anamorphic flat plate microlens according to the present invention, FIG. 2 is a refractive index distribution curve of the lens, and FIG. FIG. 4 is a perspective view showing an example of a glass substrate with a mask applied to the manufacturing method of a rate distribution type anamorphic flat plate microlens, FIG. 4 is a perspective view illustrating a general flat plate microlens, FIGS. Figure 5B is a plan view and a side view of the semiconductor laser. 7...Glass substrate, 8...Refractive index distribution area, 9...
- Optical axis, 10... refractive index distribution curve in y and two directions,
11... Refractive index distribution curve in the X direction, 12... Glass substrate, 13... Mask, 14... Mask opening. Applicant Hoya Co., Ltd. Agent Masayuki Asakura Figure 1A
Figure 1C Old figure Figure 2 yeZ

Claims (1)

【特許請求の範囲】 1 基板表面に垂直な方向に光軸を有し、この光軸が基
板表面と交わる点を中心として放射状に屈折率が低下す
る屈折率分布領域を透明基板内に有する平板マイクロレ
ンズにおいて、その透明基板内部の屈折率分布領域の形
状が基板表面上に長軸および短軸を有する半楕円体であ
ることを特徴とする屈折率分布型アナモルフィック平板
マイクロレンズ。 2 板状ガラス体の表面に予め定められた形状の楕円状
開口部を有するマスクを付けた後、これをタリウム、銀
など高屈折率を生ずるイオンを含む溶融塩中に浸漬し、
前記開口部を通してイオン交換を行なうことにより、当
該ガラス体内に前記の高屈折率を生ずるイオンの濃度分
布に起因する楕円半球状の屈折率分布領域を形成するこ
とを特徴とする屈折率分布型アナモルフィック平板マイ
クロレンズの製造法。
[Claims] 1. A flat plate having a refractive index distribution region in a transparent substrate, which has an optical axis in a direction perpendicular to the substrate surface, and whose refractive index decreases radially around the point where the optical axis intersects with the substrate surface. 1. A gradient index anamorphic flat plate microlens, characterized in that the shape of the gradient index region inside the transparent substrate is a semi-ellipsoid having a major axis and a minor axis on the surface of the substrate. 2. After attaching a mask having an elliptical opening of a predetermined shape to the surface of a plate glass body, this is immersed in a molten salt containing ions such as thallium and silver that produce a high refractive index,
A refractive index distribution type analyzer characterized in that an elliptical hemispherical refractive index distribution region is formed in the glass body due to the concentration distribution of ions that produce the high refractive index by performing ion exchange through the opening. Manufacturing method of morphic flat plate microlens.
JP11634785A 1985-05-31 1985-05-31 Distributed index anamorphic plane microlens and its manufacture Pending JPS61275710A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP11634785A JPS61275710A (en) 1985-05-31 1985-05-31 Distributed index anamorphic plane microlens and its manufacture
US06/868,696 US4805997A (en) 1985-05-31 1986-05-30 Gradient refractive index type anamorphic planar microlens and method of producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11634785A JPS61275710A (en) 1985-05-31 1985-05-31 Distributed index anamorphic plane microlens and its manufacture

Publications (1)

Publication Number Publication Date
JPS61275710A true JPS61275710A (en) 1986-12-05

Family

ID=14684699

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11634785A Pending JPS61275710A (en) 1985-05-31 1985-05-31 Distributed index anamorphic plane microlens and its manufacture

Country Status (1)

Country Link
JP (1) JPS61275710A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63274913A (en) * 1987-05-07 1988-11-11 Canon Inc Optical system for luminous flux diameter adjustment
JPS63274901A (en) * 1987-05-07 1988-11-11 Canon Inc Anamorphic distributed index lens
JPH01291130A (en) * 1988-02-02 1989-11-22 Gretag Ag Measuring head for photographic data measuring apparatus
US4948214A (en) * 1989-07-10 1990-08-14 Eastman Kodak Company Step-index light guide and gradient index microlens device for LED imaging

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5753702A (en) * 1980-09-16 1982-03-30 Nippon Sheet Glass Co Ltd Lens body

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5753702A (en) * 1980-09-16 1982-03-30 Nippon Sheet Glass Co Ltd Lens body

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63274913A (en) * 1987-05-07 1988-11-11 Canon Inc Optical system for luminous flux diameter adjustment
JPS63274901A (en) * 1987-05-07 1988-11-11 Canon Inc Anamorphic distributed index lens
JPH01291130A (en) * 1988-02-02 1989-11-22 Gretag Ag Measuring head for photographic data measuring apparatus
US4948214A (en) * 1989-07-10 1990-08-14 Eastman Kodak Company Step-index light guide and gradient index microlens device for LED imaging

Similar Documents

Publication Publication Date Title
US4805997A (en) Gradient refractive index type anamorphic planar microlens and method of producing the same
US4844724A (en) Method of adjusting refractive index distribution lenses
US3724924A (en) Multiple focusing device
JPS61222943A (en) Production of lens of index distribution type
JPS613102A (en) Optical lens and manufacture thereof
US5062688A (en) Flat plate optical element and method for preparing the same
JPS61275710A (en) Distributed index anamorphic plane microlens and its manufacture
US6980717B2 (en) Optical fiber collimator
JPH0996760A (en) Optical device
JPS638239A (en) Production of diverging light-transmission material
JPS58106503A (en) Refractive index distribution type lens barrel and its manufacture
CN113946057A (en) Multimode optical fiber dodging device
JPS58134613A (en) Multifiber connector
JPS60235102A (en) Transmission type light scattering element
JPS61284702A (en) Flat plate microlens and its production
WO2017195691A1 (en) Optical lens and manufacturing method for optical lens
JPS5817407A (en) Lens body and its manufacture
CN219512478U (en) Linear facula laser shaping system
JPS6125106A (en) Distributed index rod lens body and its manufacture
JPH0250101A (en) Lens body
JPS61282813A (en) Correcting method for divergent light
JPH0463362B2 (en)
JPS6194001A (en) Optical element and its production
JPS6283335A (en) Production of microlens array
JPS5999413A (en) Distributed refractive index lens