JPS61271052A - Film forming device - Google Patents

Film forming device

Info

Publication number
JPS61271052A
JPS61271052A JP60112067A JP11206785A JPS61271052A JP S61271052 A JPS61271052 A JP S61271052A JP 60112067 A JP60112067 A JP 60112067A JP 11206785 A JP11206785 A JP 11206785A JP S61271052 A JPS61271052 A JP S61271052A
Authority
JP
Japan
Prior art keywords
substrate
water
film
liq
water surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60112067A
Other languages
Japanese (ja)
Inventor
Toshihiko Miyazaki
俊彦 宮崎
Kunihiro Sakai
酒井 邦裕
Yoshinori Tomita
佳紀 富田
Hiroyuki Sugata
裕之 菅田
Hiroshi Matsuda
宏 松田
Yukio Nishimura
征生 西村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60112067A priority Critical patent/JPS61271052A/en
Publication of JPS61271052A publication Critical patent/JPS61271052A/en
Priority to US07/157,146 priority patent/US4840821A/en
Pending legal-status Critical Current

Links

Landscapes

  • Optical Integrated Circuits (AREA)
  • Coating Apparatus (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Abstract

PURPOSE:To deposit smoothly a monomolecular film on a substrate and to prevent an adverse effect of vibration by providing a device for regulating the quantity of a liq. and for charging and discharging the liq. into and from a water vessel. CONSTITUTION:With respect to a device for forming a film on a substrate in the fields of semiconductor techniques, optical techniques, etc., a device 14 for regulating the quantity of liq. and for charging and discharging liq. into and from a water vessel 1 is provided. When a liq. such as water and chloroform and carbon tetrachloride having higher sp.gr. and insoluble in water are charged and discharged into and from the water vessel 1 through the liq. quantity regulating device 14, the water level 3 in the water vessel 1 is moved upward and downward. Consequently, the transfer of a group of film forming molecules is carried out by moving the water surface 3 not the substrate 7 upward and downward and the substrate 7 can be fixed at a specified position. Accordingly, an adverse effect due to the mechanical vibration caused by the upward and downward movement of the substrate 7 is prevented.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、例えば半導体技術分野並びに光学技術分野等
において、デバイスの主要な構成要素となる有機薄膜の
成膜方法に関し、特に、有機物質の単分子層を液面上に
形成し、この単分子層を基板に移しとることにより、該
基板上に単分子膜又はその累積膜を形成させる成膜装置
に関する。
Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a method for forming an organic thin film that is a main component of a device, for example in the semiconductor technology field and the optical technology field. The present invention relates to a film forming apparatus that forms a monomolecular layer on a liquid surface and transfers the monomolecular layer onto a substrate to form a monomolecular film or a cumulative film thereof on the substrate.

[従来の技術] 従来、半導体技術分野並びに光学技術分野における素材
利用は、もっばら比較的取扱いが容易な無機物を対象に
して進められて来た。
[Prior Art] Conventionally, the use of materials in the semiconductor technology field and the optical technology field has mainly focused on inorganic materials that are relatively easy to handle.

しかしながら、最近の有機化学分野の技術進歩は目覚ま
しく、無機物を凌ぐ新しい機能素材として、論理素子、
メモリー素子、光電変換素子等の集積回路デバイスや、
マイクロレンズ・アレイ、光導波路等の光学デバイスの
機能を荷う部分(主として薄膜部分)の一部又は全部を
従来の無機薄膜に代えて、有機薄膜で構成しようとする
提案がなされている。
However, recent technological advances in the field of organic chemistry have been remarkable, and logic elements,
Integrated circuit devices such as memory elements and photoelectric conversion elements,
There have been proposals to construct part or all of the functional parts (mainly thin film parts) of optical devices such as microlens arrays and optical waveguides with organic thin films instead of conventional inorganic thin films.

このようなデバイスの主要な構成要素である有機薄膜は
単分子累積法を用いて作製される。単分子累積法(別名
ラングミュア・プロジェット法、LB法)とは、親水基
・疎水基をもった分子の親木性、疎水性を利用して秩序
よく水の上に展開して中分子膜を形成した後、これを基
板表面に移しとる方法で、基板上に単分子膜あるいは単
分子を積層した単分子累積膜(これらをLB膜という)
の形成が可能である。
Organic thin films, which are the main components of such devices, are fabricated using single-molecule accumulation methods. The single molecule accumulation method (also known as the Langmuir-Prodgett method, LB method) is a method that utilizes the phyllophilicity and hydrophobicity of molecules with hydrophilic and hydrophobic groups to spread them on water in an orderly manner to form a medium molecule film. A monomolecular film or a monomolecular cumulative film in which monomolecules are laminated on a substrate (these are called LB films) is created by forming a monolayer and then transferring it to the substrate surface.
It is possible to form

従来この種の装置は、第2図に示すように浅くて広い角
型の水槽1の内側に枠2が水平に水面3を仕切るように
置かれている。枠2は二次元シリンダとして機能し、枠
2の内側には方形の浮子4が浮かべられ、浮子4の幅は
枠2の内寸より僅かに狭く造ってあり、二次元ピストン
として左右に滑らかに移動できるようになっている。浮
子4を左右に移動させるためにワイヤー5を介して浮子
4はモーターなどを利用した巻き取り装置6と結ばれて
いる。
Conventionally, this type of device is placed inside a shallow and wide rectangular aquarium 1 with a frame 2 horizontally partitioning a water surface 3, as shown in FIG. The frame 2 functions as a two-dimensional cylinder, and a rectangular float 4 is floated inside the frame 2, and the width of the float 4 is made slightly narrower than the inner dimension of the frame 2, so that it can move smoothly from side to side as a two-dimensional piston. It is possible to move. In order to move the float 4 from side to side, the float 4 is connected to a winding device 6 using a motor or the like via a wire 5.

単分子膜の形成の際には、膜の構成物質をベンゼン、ク
ロロホルム等の揮発性溶媒に溶かし、水面3上に滴下す
る。溶媒が揮発した後には、二次元系の挙動を示す単分
子膜が水面3上に残される0分子の面密度が低い時は、
二次元気体の気体膜と呼ばれる。浮子4を右方向へ移動
させることで単分子が展開する水面3の広がりを縮めて
面密度を増加させて行くと、分子間の相互作用が強まり
、二次元液体の液体膜を経て、二次元固体膜へと変化す
る。この固体膜になると分子の配列配向はきれいにそろ
い、半導体等を構成する材料に要求される高度の秩序性
及び均一な超薄膜性を持つにいたる。
When forming a monomolecular film, the constituent substances of the film are dissolved in a volatile solvent such as benzene or chloroform, and the solution is dropped onto the water surface 3. After the solvent evaporates, a monomolecular film exhibiting the behavior of a two-dimensional system is left on the water surface 3. When the areal density of 0 molecules is low,
It is called a gas film of secondary gas. By moving the float 4 to the right, the expanse of the water surface 3 on which single molecules expand is reduced and the surface density is increased. As a result, interactions between molecules become stronger, and two-dimensional liquids pass through a liquid film of two-dimensional liquid. Transforms into a solid film. When this solid film is formed, the molecules are arranged and oriented in a neat manner, resulting in a high degree of order and uniform ultra-thin film properties required for materials constituting semiconductors and the like.

単分子膜を水面3上から基板7表面上に移し取る方法と
して、水面31:、の申分F膜に累積操作に好適な一定
の表面圧を保持しながら、基板ホルダー8に取付けた基
板7を垂直方向9に上下することにより中分子−膜を移
しとる垂直浸漬法がある。この方法では、Em3図(a
)のように浸漬時だけ単分子−膜10が付着するX型、
第3図(b)のように浸漬時にも引きLげ時にも単分子
−膜lOが付着するY型、第3図(C)のように引き毛
げ時のみ中介p[10が付着するZ型の3種類がある。
As a method of transferring the monomolecular film from the water surface 3 onto the substrate 7 surface, the substrate 7 is attached to the substrate holder 8 while maintaining a constant surface pressure suitable for cumulative operation on the water surface 31:. There is a vertical immersion method in which middle molecules and membranes are transferred by moving the membrane up and down in the vertical direction 9. In this method, Em3 diagram (a
), where the monomolecular film 10 is attached only during immersion,
As shown in FIG. 3(b), the monomolecular membrane 1O is attached both during immersion and during pulling, the Y type, and as shown in FIG. 3(C), the intermediate p[10 is attached only during pulling. There are three types of molds.

なお、第2図の分Eにて、11は親水性部分、12は疎
水性部分である。
In addition, in the part E of FIG. 2, 11 is a hydrophilic part and 12 is a hydrophobic part.

この他に1図示していない別の方法としては、基板の中
分子膜付着面を水面に対してほぼ乎行にして、その基板
をE1動させることにより単分子膜を移しとる水平付着
法がある。
Another method (not shown) is a horizontal adhesion method in which the monomolecular film is transferred by moving the substrate E1 with the medium molecular film adhering surface of the substrate almost parallel to the water surface. be.

[発明が解決しようとする問題点」 上記の従来の方法では、基板を上下動させる装置に、ギ
ヤ付のモータなどが使用されており、このモータなどか
ら生じた振動が基板に伝わり、重分り膜を基板に付着さ
せる際に、付着状態が乱れるという問題点がある。
[Problem to be solved by the invention] In the conventional method described above, a geared motor is used for the device that moves the board up and down, and vibrations generated by this motor are transmitted to the board, causing overlapping. When the film is attached to the substrate, there is a problem in that the state of attachment is disturbed.

本発明は、これらの問題点を解決し、基板に対して単分
子膜が滑らかに付着し、振動の悪影響がない成膜方法を
提供することを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to solve these problems and provide a film forming method in which a monomolecular film can be smoothly attached to a substrate without the adverse effects of vibration.

[問題点を解決するための手段] 上記問題点を解決するために講じられた手段を、本発明
の一実施例に対応する第1図で説明すると、水槽1内に
流体を給排する液体量調整部14を有する成膜装置とす
ることである。
[Means for solving the problems] The means taken to solve the above problems will be explained with reference to FIG. 1, which corresponds to an embodiment of the present invention. The purpose is to provide a film forming apparatus having a quantity adjusting section 14.

本発明で水槽1に給排する液体としては、通常は水であ
るが、例えばクロロホルム、四塩化炭素、等の水に不溶
で水より比重の大きな液体であってもよい。
The liquid supplied to and discharged from the water tank 1 in the present invention is usually water, but it may also be a liquid that is insoluble in water and has a higher specific gravity than water, such as chloroform or carbon tetrachloride.

[作 用] 本発明によれば、水槽1へ液体量調整部14から液体を
給排すると、これによって水槽1内に収容された水の水
面3が上下されることになる。従って、成膜分子群の移
し取りを、基板7ではなく、水面3を上下させることに
よって行うことができ、基板7は一定位置に固定したま
までよく、基板7をE下させるための機械的振動による
悪影響を防止できる。
[Function] According to the present invention, when the liquid is supplied and discharged from the liquid amount adjusting section 14 to the water tank 1, the water level 3 of the water contained in the water tank 1 is raised and lowered thereby. Therefore, the transfer of the film-forming molecules can be carried out by raising and lowering the water surface 3 instead of the substrate 7, and the substrate 7 can remain fixed at a fixed position, and the mechanical It can prevent the negative effects of vibration.

ところで、水面3を上下させる際に多少水面3に乱れを
生じることが予想されるが、水面3が多少乱れてもこの
乱れの振動が固定された基板7にまで伝わることはない
。従って機械的振動が加わった基板7が水面3下へ浸漬
されたときのように、基板7が振動すると同時にこの振
動によって水面3も乱され、基板7の振動と水面3の乱
れの両面から、取得される単分子膜又はその累積膜の配
向性が害されるのが防止される。
Incidentally, it is expected that some turbulence will occur on the water surface 3 when it is raised and lowered, but even if the water surface 3 is slightly disturbed, the vibrations of this turbulence will not be transmitted to the fixed substrate 7. Therefore, as when the substrate 7 to which mechanical vibration has been applied is immersed below the water surface 3, the substrate 7 vibrates and the water surface 3 is also disturbed by the vibration, and from both the vibration of the substrate 7 and the disturbance of the water surface 3, The orientation of the obtained monomolecular film or its cumulative film is prevented from being impaired.

尚1本発明における成膜原理自体は、従来例において説
明したLB法と同様である。
Note that the film forming principle itself in the present invention is the same as the LB method explained in the conventional example.

[実施例] 以下、本発明を、実施例とその図面を参照して詳細に説
明する。
[Examples] Hereinafter, the present invention will be described in detail with reference to Examples and the drawings.

第1図は、本発明を実施した水平付着法による成膜装置
の1例を示す縦断面図である。第1図において、成膜装
置は、浅くて広い水槽1の内部に所望量の水を貯溜し、
その水面3にほぼ上行に、単分子膜を移しとりたい面を
下向きに基板7を基板ホルダー8により保持し、水中に
液体流通口13を設け、その液体流通口13に連結され
た液体量調整部14を水槽1に付設して概略構成されて
いる。
FIG. 1 is a longitudinal sectional view showing an example of a film forming apparatus using a horizontal deposition method in which the present invention is implemented. In FIG. 1, the film forming apparatus stores a desired amount of water inside a shallow and wide water tank 1,
The substrate 7 is held by the substrate holder 8 with the surface to which the monomolecular film is to be transferred facing downward, almost upward on the water surface 3, and a liquid flow port 13 is provided in the water, and a liquid volume adjustment device connected to the liquid flow port 13 is provided. A section 14 is attached to the water tank 1 and is generally configured.

この液体流通口13から水槽1へ放出・吸入される液体
は、水面3へ浮上しないように水よりも比重が充分に大
きく、かつ波動を起こさないように比較的粘性の高いも
のが選定され、液体流通口13も水底近くに配置される
。もちろん、液体として水そのものを使用してもよく、
その場合は上記の配慮を要しない。
The liquid discharged and sucked into the water tank 1 from the liquid flow port 13 is selected to have a specific gravity sufficiently higher than that of water so as not to float to the water surface 3, and a relatively high viscosity so as not to cause wave motion. The liquid flow port 13 is also located near the bottom of the water. Of course, you can also use water itself as the liquid.
In that case, the above consideration is not required.

第1図(a)は、水中に液体が放出されていない状態を
示し、水面3の位置は低く、基板7は水面3に接してい
ない。この状態で、水面3に単分子膜構成物質を滴下し
、表面圧力制御手段(図示せず)により所望の表面圧力
の単分子膜を形成する。ここで、液体流通口13からゆ
っくりと液体を水中に送り込むと、その液体量に相当す
るだけ水面3は上昇するので、第1図(b)のように、
基板7の下面に単分子膜が接し、移しとられる。この場
合、水面3の上昇は非常に滑らかであり、従来のように
振動がないので、移しとられた膜も精緻である。また、
基板の上下動機構が不要であるので、装置がきわめて簡
単になり、かつ基板7の保持が容易なので、大きな寸法
の基板7をf&膜させる水モ付着法の長所を活用するこ
とができる。
FIG. 1(a) shows a state in which no liquid is released into the water, the water surface 3 is at a low position, and the substrate 7 is not in contact with the water surface 3. In this state, a monomolecular film constituent material is dropped onto the water surface 3, and a monomolecular film having a desired surface pressure is formed by a surface pressure control means (not shown). Here, when liquid is slowly fed into the water from the liquid flow port 13, the water level 3 rises by an amount corresponding to the amount of liquid, so as shown in FIG. 1(b),
The monomolecular film comes into contact with the lower surface of the substrate 7 and is transferred. In this case, the rise of the water level 3 is very smooth and there is no vibration as in the conventional case, so the transferred film is also precise. Also,
Since there is no need for a mechanism for moving the substrate up and down, the apparatus becomes extremely simple and the substrate 7 can be easily held, making it possible to utilize the advantages of the water mop adhesion method in which a large-sized substrate 7 is formed into an F& film.

なお、上記の実施例では、水面3を上昇させるX型JI
Jt膜によって説明したが、基板7を予め垂直に水中に
沈め、水面3を下げるY型成膜も可能である。
In addition, in the above embodiment, the X-type JI that raises the water surface 3
Although the explanation has been made using a Jt film, it is also possible to form a Y-type film in which the substrate 7 is vertically submerged in water in advance to lower the water surface 3.

[発明の効果] 以L、説明したとおり、本発明によれば、液体体積の増
減により水面を上下動させて、水面上の単分子膜を基板
に移しとらせるので、基板の振動はなく、単分子膜が滑
らかに付着して精緻であり、また、基板の上下動機構が
なく、装置が簡単になり、かつ基板の保持が容易なので
、大きな寸法の基板を成膜させることができ、水上付着
法に好適な成膜装置を提供することができる。
[Effects of the Invention] As explained below, according to the present invention, the water surface is moved up and down by increasing and decreasing the liquid volume, and the monomolecular film on the water surface is transferred to the substrate, so there is no vibration of the substrate. The monomolecular film adheres smoothly and is precise, and since there is no vertical movement mechanism for the substrate, the equipment is simple and the substrate is easy to hold, so large substrates can be deposited and A film forming apparatus suitable for the deposition method can be provided.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の1実施例の縦断面図、第2図は従来例
の斜視図、第3図は単分子膜又は累積膜の分子配向の構
造図である。
FIG. 1 is a longitudinal sectional view of one embodiment of the present invention, FIG. 2 is a perspective view of a conventional example, and FIG. 3 is a structural diagram of molecular orientation in a monomolecular film or a cumulative film.

Claims (1)

【特許請求の範囲】[Claims] 1)水槽内に液体を給排する液体量調整部を有すること
を特徴とする成膜装置。
1) A film forming apparatus characterized by having a liquid amount adjusting section for supplying and discharging liquid into a water tank.
JP60112067A 1985-05-27 1985-05-27 Film forming device Pending JPS61271052A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60112067A JPS61271052A (en) 1985-05-27 1985-05-27 Film forming device
US07/157,146 US4840821A (en) 1985-05-27 1988-02-11 Method of and apparatus for forming film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60112067A JPS61271052A (en) 1985-05-27 1985-05-27 Film forming device

Publications (1)

Publication Number Publication Date
JPS61271052A true JPS61271052A (en) 1986-12-01

Family

ID=14577225

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60112067A Pending JPS61271052A (en) 1985-05-27 1985-05-27 Film forming device

Country Status (1)

Country Link
JP (1) JPS61271052A (en)

Similar Documents

Publication Publication Date Title
US4840821A (en) Method of and apparatus for forming film
US5339842A (en) Methods and apparatus for cleaning objects
KR101696951B1 (en) Method of manufacturing an optical display
US6770330B2 (en) Method for producing a continuous, large-area particle film
JPH0626705B2 (en) Method for applying a monolayer on a substrate
US5006374A (en) Method of forming thin organic films
JPS61271052A (en) Film forming device
JPS61271060A (en) Formation of film
JPS61271053A (en) Film forming device
JPS61271051A (en) Film forming device
JP3578481B2 (en) Coating device
JP2007136417A (en) Coating apparatus
JPS61291058A (en) Membrane forming apparatus
JPS60223117A (en) Forming method of monomolecular deposited film
JPH0475065B2 (en)
JPS60193537A (en) Formation of accumulated monomolecular film
JPS60222171A (en) Film forming device
JPS61278374A (en) Preparation of lb membrane
JPS61271048A (en) Film forming device
JPS60209245A (en) Film forming device
JPS60222169A (en) Film forming device
JPS60222173A (en) Film forming device
KR940008575B1 (en) Langmuir trough
JP2005144260A (en) Thin film forming method, manufacturing method of device, manufacturing method of electro-optical device and electronic device
JPS60194517A (en) Forming method of monomolecular laminated film