JPS61270818A - Liquid phase epitaxial growth equipment - Google Patents

Abstract

PURPOSE:To reduce a melted liquid for crystal and to prevent abnormal liquid phase epitaxial growth by providing a lid which is horizontally movable to open or close an upper chamber for an aperture provided in an equipment. CONSTITUTION:The first and the second sliders 6, 7 of a liquid phase epitaxial growth equipment are installed at a required position, a substrate 9 is placed in a middle chamber 3 and a melted liquid 8 for crystal is put in an upper chamber 2. The aperture 15 of a sliding lid 16 is provided at the center of the upper chamber 2 and the upper chamber 2 is opened. If a board 1 itself is moved in this state, the overflow of the liquid 8 is prevented by the distance between the liquid 8 and the board 1. The board 1 is moved in a furnace in the open state and the temperature of the liquid 8 is raised. Then, the liquid 8 is exposed in a carrier gas through the aperture 15 and the liquid 8 is reduced by the gas. Later, the lid 16 is moved to the direction shown by an arrow, the aperture 15 is slid from the board 1 and epitaxial growth is carried out in the state that the liquid 8 in the chamber 2 is closed tightly.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a liquid phase epitaxial growth apparatus.

[Conventional technology]

Mass production using liquid phase epitaxial growth is an important technology for semiconductor devices using lotus compound semiconductors. This mass production technology is especially important for solar cells with large element sizes.

Figure 3 is a plan view showing the configuration of a conventional liquid phase epitaxial growth apparatus used for such applications, and Figure 4 is a
There is a cross-sectional view taken along the -W line. In the figure (1) is the upper chamber (2), middle chamber (31) and lower chamber (31) in the boat body.
It consists of the three-stage structure of 4). (5) is a drawer container for storing the crystal melt (8) inserted into the lower chamber (4), and (6) is the upper chamber (2) and the middle chamber (3). (7) is a second slider that partitions the middle chamber (3) and the lower chamber (4), (8) is a crystal melt, and (9) is a liquid phase epitaxial growth. αQ is the opening of the first slider (6) for dropping the crystal melt (3) in the upper chamber (2) by 31K to the middle chamber; (6) is the opening of the first slider (6); (3) The opening of the second slider (7) for dropping the crystal melt (8 mm) into the lower chamber (4), (6) is the opening of the first slider (6) in the direction of the arrow shown. , an L-shaped plate that moves the second slider (7) with a time delay when the boat (1) is moved in the furnace V
(C) is a lid that suppresses evaporation from the crystal melt (8) and prevents the crystal melt (8) from spilling when the boat (1) is moved; (B) is a screw that fixes the lid (to); be.

Next, the operation will be explained.

In a conventional liquid phase epitaxial growth apparatus, the boat (1) is placed in the furnace in the state shown in Figure 4.
1 is heated in the furnace during transfer, but in order to prevent vapor pressure high substances contained in the crystal melt (8) from evaporating during the temperature rise, screw α→ M( J3 is fixed.

In nine-liquid phase epitaxial growth using a boat (1), when the crystal melt (8) reaches a predetermined temperature in the furnace, the slider (6) of the PJl is moved in the direction of the arrow shown in the figure to move from the opening hole to the upper chamber (2). ) The crystal melt (8) is injected into the entire middle chamber +31 K to immerse the substrate (9) ft. When the growth furnace is slowly cooled in this state, liquid phase epitaxial growth is performed on the substrate (9).

After the liquid phase epitaxial growth is completed, the first slider (6
) is further moved in the direction of the arrow shown in the figure, and the L-shaped plate (2) is used to fully move the second slider (7) to flow the crystal melt (8) through the opening (b) from the middle chamber (31゛ to the lower chamber). Room (4)
It is stored in a drawer container (5) that is housed in a container.

[Problem that the invention seeks to solve]

Since the conventional apparatus is constructed as described above, once the crystal melt (8) is contained in the upper chamber (2) K, it is used as a carrier gas H2 until after the liquid phase epitaxial growth is completed.
Since it is not exposed to gas, there is a drawback that if the crystal melt (8) is easily oxidized, liquid phase epitaxial growth is performed in an oxidized state without being reduced by H2 gas.

The present invention has been made in view of the above points, and an object thereof is to provide a liquid phase epitaxial growth apparatus that can prevent epitaxial growth due to oxidized crystal melt.

[Rounding method to solve problems]

The liquid phase epitaxial growth apparatus according to the present invention is equipped with a sliding lid that has an opening and is movable from side to side to open or close the upper chamber, so that crystal melt can be reduced. It is.

[For production]

In this invention, the slider-type lid prevents the crystal melt from spilling due to the movement of the boat, and the crystal melt is reduced by the opening of the lid before liquid phase epitaxial growth, and the lid closes during liquid phase epitaxial growth. By sealing the crystal melt, evaporation from the crystal melt is prevented.

〔Example〕

Hereinafter, one embodiment of the present invention will be explained with reference to the drawings. FIG. 1 is a plan view showing the configuration of a liquid phase epitaxial growth apparatus according to an embodiment of the present invention, and FIG.
3 and 4! The same symbols as in Figure I4 indicate the same parts. In the figure, (g) is a lid that can be moved from side to side and has an opening (to).

Next, the operation will be explained.

1st slider (6), gp; 2nd slider (7)
The board (9) is placed in the middle chamber (31,
The crystal melt (8) is placed in the upper chamber (2), and the movable sliding lid (to) is placed so that the fully open hole (to) is in the middle, leaving the upper chamber (2) open. . In this state, (1) Even if it moves by t, it will not spill because there is a distance between the crystal melt (8) and the opening (to). Move the upper chamber (2) (1) into the furnace with it fully open and raise the temperature of the crystal melt (8).

The crystal melt (8) is a carrier gas through the opening (to)! ! 2 The crystalline melt (8), which had been oxidized due to exposure to δ, is reduced by +7 the town gas. After this, move the lid (T) in the direction of the arrow shown in the figure, so that the opening (T) is aligned with the boat (
1) Crystal melt (8) in the upper chamber (2) shifted from the main body
Liquid phase epitaxial growth is performed in a sealed state. The subsequent operation is the same as that of the conventional device. In this example device, a lid (g) with an opening (to) that can be moved from side to side is provided. (8) is prevented from spilling, and the openings prevent the crystal melt (8) from being reduced by H2 gas and prevent the crystal melt (8) from being oxidized. Liquid phase epitaxial growth is eliminated.

〔Effect of the invention〕

As described above, according to the liquid phase epitaxial growth apparatus according to the present invention, since the sliding lid having openings and being movable from side to side is provided, the oxidized crystal melt (8) is reduced and the abnormal liquid phase is reduced. It has the effect of preventing epitaxial growth.

[Brief explanation of the drawing]

FIG. 1 is a plan view showing the configuration of a liquid phase epitaxial growth apparatus according to an embodiment of the present invention, and FIG.
3 is a plan view showing the configuration of a conventional liquid phase epitaxial growth apparatus, and FIG. 4 is a sectional view taken along line W-ff in FIG. 3.

Claims (1)

[Claims] 1) An upper chamber for storing the crystal melt of the substance to be crystal grown, a middle chamber for accommodating the substrate to be subjected to liquid phase epitaxial growth, and a drawer into which the crystal melt used for the liquid phase epitaxial growth flows and is stored. A lower chamber for accommodating the container, two panels for partitioning the upper chamber and the middle chamber, and the middle chamber and the lower chamber to enable movement of the crystal melt from top to bottom. 1. A liquid phase epitaxial growth apparatus, comprising: a boat body consisting of a slider; and a sliding lid having an opening and movable from side to side to open or close the upper chamber.