JPS61261233A - Sealing low-melting glass composition - Google Patents

Sealing low-melting glass composition

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Publication number
JPS61261233A
JPS61261233A JP10560485A JP10560485A JPS61261233A JP S61261233 A JPS61261233 A JP S61261233A JP 10560485 A JP10560485 A JP 10560485A JP 10560485 A JP10560485 A JP 10560485A JP S61261233 A JPS61261233 A JP S61261233A
Authority
JP
Japan
Prior art keywords
melting point
weight
glass
low melting
low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10560485A
Other languages
Japanese (ja)
Inventor
Tadayoshi Murakami
村上 忠禧
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP10560485A priority Critical patent/JPS61261233A/en
Publication of JPS61261233A publication Critical patent/JPS61261233A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:A sealing low-melting glass composition, obtained by mixing low- melting glass powder prepared by combining two kinds of amorphous glass groups having different transition temperatures with a low-expansion filler and capable of sealing alumina packages for IC at a relatively low temperature. CONSTITUTION:A sealing low-melting glass composition obtained by combining (A) an amorphous glass group having <=260 deg.C transition temperature with (B) an amorphous glass group having 260-290 deg.C transition temperature to prepare low-melting glass powder and mixing the resultant low-melting glass powder with a low-expansion filler, e.g. cordierite or zircon. Preferably, th component (A) is a composition consisting of 40-50wt% PbO, 10-12wt% B2O3, 2-3wt% SiO2, 1-3wt% Bi2O3, 5-10wt% PbF2 and 15-35wt% Tl2O, and the component (B) is composition consisting of 80-85wt% PbO, 5-7wt% B2O3, 1-3wt% SiO2, 2-5wt% Bi2O3, 0-7wt% PbF2, etc.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、低融点ガラス粉末および低膨脹フィラーから
なる封着用低融点ガラス組成物に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a low melting point glass composition for sealing comprising a low melting point glass powder and a low expansion filler.

とくにIC用アルミナパッケージを400℃以下の温度
で封着することができる封着用低融、α〃テラス成物に
関する。
In particular, the present invention relates to a low-melting, α-terrace composition for sealing that can seal alumina packages for ICs at temperatures below 400°C.

[従来の技術] 従来のIC用アルミナパッケージを封着するための封着
用組成物は、通常1種類の低融点ガラスに低膨脹フィラ
ーを添加する方法によって製造されている。
[Prior Art] Conventional sealing compositions for sealing alumina packages for ICs are usually produced by adding a low expansion filler to one type of low melting point glass.

また、IC用アルミナパック−7をtt着する封着用組
成物に関しで、多くの特許出願がなされている。
Furthermore, many patent applications have been filed regarding sealing compositions for bonding Alumina Pack-7 for ICs.

とくに最近のものとして、特公昭59−45620号公
報、特公昭59−45619号公報などに開示されてい
るごときpbo、B201.5iOz、ZnO,^12
0.およびPb)’。
Particularly recent ones include pbo, B201.5iOz, ZnO,^12 as disclosed in Japanese Patent Publication No. 59-45620, Japanese Patent Publication No. 59-45619, etc.
0. and Pb)'.

からなる組成物で、封51@度が440〜450℃のガ
ラス組成物や、特開昭58−161943号公報に開示
されているごとき必須成分としてpbo、B2O3,2
nO1SiO□、v206、CuOが含まれ、^1zo
s、P2O2,5n02、Litu、Na、0などが添
加された組成のもので、転移温度が288〜310℃、
封着温度が390〜430℃のガラス組成物、さらには
特公昭5フ一48495号公報に開示されているごとき
、PbO2B205、ZnO1SiOz、^120.お
よびGeO□からなる封着温度が480℃以下のガラス
組成物などがあげられる。これら公報に記載されている
ガラス組成物の成分は、いずれもPbO−B、O,iが
主体であるが、このほか種々の成分を添加することによ
り、アルミナパッケージを封着する封着用組成物ガラス
組成物として開発されたものである。
A glass composition having a sealing temperature of 440 to 450°C, or a glass composition containing pbo, B2O3,2 as essential components as disclosed in JP-A-58-161943.
Contains nO1SiO□, v206, CuO, ^1zo
s, P2O2, 5n02, Litu, Na, 0, etc., with a transition temperature of 288-310℃,
A glass composition having a sealing temperature of 390 to 430°C, and further, PbO2B205, ZnO1SiOz, ^120. and a glass composition having a sealing temperature of 480° C. or lower, which is made of GeO□. The components of the glass compositions described in these publications are mainly PbO-B, O, and i, but various other components can be added to create a sealing composition for sealing an alumina package. It was developed as a glass composition.

また、低膨脹フィラーは、封着用低融点ガラス組成物の
熱膨張率をアルミナパッケージの熱膨張率と合わせかつ
、封着用低融点ガラス組成物の耐熱衝撃強度を高めるた
めに、たとえばコープイライト、クルコン、β−ユーク
リプタイト、チタン酸鉛、ウィレマイトなどを複合し、
低融点ガラスに添加して用いられている。
In addition, the low expansion filler is used, for example, in order to match the thermal expansion coefficient of the low melting point glass composition for sealing with that of the alumina package and to increase the thermal shock resistance strength of the low melting point glass composition for sealing. , β-eucryptite, lead titanate, willemite, etc.
It is used by adding it to low melting point glass.

[発明が解決しようとする問題点1 従米使用されている封着用組成物を構成する低融点ガラ
スの転移温度は300〜320℃の範囲のものが多く、
シたがってアルミナパッケージの封着温度は420〜4
80℃の範囲で行われているが、アルミナパフケークの
封着温度にもっとも関係があるのは低融点ガラスの転移
温度であり、アルミナパッケージの封着温度が低いもの
ほどアルミナパッケージに搭載されるIC素子の信頼性
が高くなるので、さらに低温で封着できる低融点ガラス
組成物の開発が望まれて−する。
[Problem to be solved by the invention 1 The transition temperature of the low melting point glass constituting the sealing composition currently used is often in the range of 300 to 320°C;
Therefore, the sealing temperature of the alumina package is 420~4
Although it is carried out within a range of 80℃, the most related to the sealing temperature of the alumina puff cake is the transition temperature of the low melting point glass, and the lower the sealing temperature of the alumina package, the more it will be mounted on the alumina package. Since the reliability of IC elements is increased, it is desired to develop a low melting point glass composition that can be sealed at a lower temperature.

また、一般に低融点ガラスの転移温度は、低融点ガラス
を構t、する成分によって異なろが、転移温度が260
℃以下の低融点ガラスをうるためには、酸化タリウムな
どの比較的高価な原料を用いる必要があるばあいもあり
、封着温度が低くても、実用的ではないことがある。
In general, the transition temperature of low melting point glass is 260°C, although it varies depending on the components that make up the low melting point glass.
In order to obtain a glass with a low melting point below .degree. C., it may be necessary to use relatively expensive raw materials such as thallium oxide, and even if the sealing temperature is low, it may not be practical.

一方、転移温度が260℃をこえ290℃以下の低融点
ガラスは、比較的安価な原料を用いてえられるが、この
低融点ガラスを用いた封着用組成物の封着温度は、40
0℃近辺であり、従来のものとほとんど差異がない。
On the other hand, a low melting point glass with a transition temperature of over 260°C and below 290°C can be obtained using relatively inexpensive raw materials, but the sealing temperature of a sealing composition using this low melting point glass is 40°C.
The temperature is around 0°C, and there is almost no difference from the conventional one.

本発明は、従来の封着用組成物よりもさらに低い温度で
アルミナパッケージを封着することができる封着用低融
点ガラス組成物を提供することを目的とするものである
An object of the present invention is to provide a low-melting glass composition for sealing that can seal an alumina package at a lower temperature than conventional sealing compositions.

E問題を解決するための手段] 本発明は、転移温度が260℃以下の非晶体ガラス群と
、260℃をこえ、290℃以下の非晶体ガラス群とを
組合わせた低融点ガラス粉末および低膨脹フィラーから
なることを特徴とする封着用低融点ガラス組成物に関す
る。さらに詳しくは、転移温度が260℃以下の非晶体
ガラス群と、転移温度が260℃をこえ、290℃以下
の非晶体ガラス群とを組合わせた低融点ガラス粉末に、
従来公知の低膨脹フィラーを添加して封着温度が、40
0℃以下でアルミナパッケージを封着することができる
!を着用低融点ガラス組成物に関する。
Means for Solving Problem E] The present invention provides low melting point glass powder and low The present invention relates to a low melting point glass composition for sealing characterized by comprising an expanded filler. More specifically, a low melting point glass powder that is a combination of an amorphous glass group with a transition temperature of 260°C or lower and an amorphous glass group with a transition temperature of over 260°C and 290°C or lower,
By adding a conventionally known low expansion filler, the sealing temperature can be increased to 40
Alumina packages can be sealed at temperatures below 0℃! Regarding wear low melting point glass compositions.

[実施例] 本発明において転移温度が260℃以下の非晶体ガラス
群および260℃をこえ、290℃以下の非晶体ガラス
群から低融点がう六岨處物が製造される。
[Example] In the present invention, a low-melting-point molten glass is produced from an amorphous glass group with a transition temperature of 260°C or lower and an amorphous glass group with a transition temperature above 260°C and 290°C or lower.

前記転移温度(/7ブスの粘度が1011−ボイズにな
る温度)が260℃以下の低融点ガラスをうるためには
、PbO40−50重量%、BIo、 10〜121i
fi%、51021〜3重量%、Bi2O,1〜31!
量%、PbFz5〜101ij1%、Tl2O15〜3
5重量%からなる組成物であることが好ましい。
In order to obtain a low melting point glass whose transition temperature (the temperature at which the viscosity of /7 bus becomes 1011-voids) is 260°C or less, PbO40-50% by weight, BIo, 10-121i
fi%, 51021-3% by weight, Bi2O, 1-31!
Amount %, PbFz5~101ij1%, Tl2O15~3
Preferably, the composition comprises 5% by weight.

前記、PbOは低融点ガラスの主成分で転移温度を低下
させるのに必要な成分であるが、前記低融点ガラス中の
割合が50重量%をこえると結晶化しやすくなり、40
重量%未満では転移温度が260℃をこえ、結晶化しや
すくなる傾向にある。
As mentioned above, PbO is the main component of the low melting point glass and is a necessary component to lower the transition temperature, but if the proportion in the low melting point glass exceeds 50% by weight, it tends to crystallize.
If it is less than % by weight, the transition temperature will exceed 260°C, and crystallization will tend to occur.

B20.はガラスを易溶性にし、かつ結晶化を防ぐ成分
であるが、上記低融J:t、ガラス中の割合が12重量
%をこえると転移温度が280℃をこえ、10重量%未
満では結晶化しやすくなる傾向にある。
B20. is a component that makes glass easily soluble and prevents crystallization; however, if the proportion of low-melting J:t in the glass exceeds 12% by weight, the transition temperature will exceed 280°C, and if it is less than 10% by weight, it will not crystallize. It tends to become easier.

SiO□はガラスの耐水性を向上させ、ガラスを墨溶性
にする成分であるが、上記低融、αガラス中の割合が3
重量%をこえると転移温度は260℃をこえ、1aX%
未満ではガラスの耐水性がわるくなる。
SiO□ is a component that improves the water resistance of glass and makes it ink-soluble.
The transition temperature exceeds 260°C when it exceeds 1aX% by weight.
If it is less than that, the water resistance of the glass will deteriorate.

BizO3は〃2大の転移温度を低下させる成分である
が、上記低融点ガラス中の割合が3重量%をこえるとガ
ラスが結晶化しやすくなり、i′重量%未満では添加さ
せた効果が小さく転移温度が260℃をこえる傾向にあ
る。
BizO3 is one of the two components that lowers the transition temperature, but if its proportion in the low melting point glass exceeds 3% by weight, the glass tends to crystallize, and if it is less than i'% by weight, the effect of adding it is small and the transition temperature decreases. Temperatures tend to exceed 260°C.

PbF、はガラスを易溶性とし、転移温度を低下させる
成分であるが、上記低融点ガラス中の割合が10重1%
をこえるとガラスが結晶化しやすくなり、5重量%未満
ではガラスの転移温度が260℃をこえる傾向にある。
PbF is a component that makes glass easily soluble and lowers the transition temperature, and its proportion in the above low melting point glass is 10% by weight.
If the content is less than 5% by weight, the transition temperature of the glass tends to exceed 260°C.

Tl2Oはガラスの転移温度をもっとも低下させる成分
であり、上記低融点ガラス中の割合が35重量%をこえ
るとガラスの耐水性がわるくなり、また15重量%未満
ではガラスの転移温度が260℃をこえる傾向にある。
Tl2O is the component that lowers the transition temperature of glass the most, and if its proportion in the low melting point glass exceeds 35% by weight, the water resistance of the glass will deteriorate, and if it is less than 15% by weight, the transition temperature of the glass will drop to 260°C. There is a tendency to increase.

前記の低融点ガラスをうるための原料としてたとえぽ5
津製薬(株)製の鉛丹、硼酸、珪石粉、酸化ビスマス、
弗化鉛、酸化第1タリウムなどを用いる。これらの原料
を所定の組成になるように調合し、たとえば白金ルツボ
などに入れて約800〜1000℃で30〜60分間溶
融したのち、冷却し、たとえばアルミナ質のボールミル
などで10μl以下に粉砕する。
As a raw material for obtaining the above-mentioned low melting point glass, use analogy 5.
Red lead, boric acid, silica powder, bismuth oxide manufactured by Tsu Pharmaceutical Co., Ltd.
Use lead fluoride, thallium oxide, etc. These raw materials are mixed to have a predetermined composition, placed in a platinum crucible, for example, and melted at approximately 800 to 1000°C for 30 to 60 minutes, cooled, and ground to 10 μl or less using, for example, an alumina ball mill. .

つぎにこのガラス粉末をたとえば理学型a(株)製の熱
分析装置を用い、「ファインセラミックハンドブック」
浜野健wai!!、昭和59年朝倉書店発社、644真
に記載された方法に準じ、このガラス粉末の転移温度お
よび熱変形温度を測定する。
Next, this glass powder is analyzed using a thermal analyzer manufactured by Rigakusha Type A Co., Ltd.
Ken Hamano wai! ! The transition temperature and heat distortion temperature of this glass powder are measured according to the method described in 644, published by Asakura Shoten in 1980.

また転移温度が260℃をこえ、290℃以下の低融点
ガラスをうるためには、pbo so〜85重1%、B
tos 5〜7m!量%25ift 1〜3重量%、B
i、0゜3〜5重量%、PbF、 0〜7重量%25b
Js、0〜4重1%、AlF30〜2!lj1%、T1
.O0〜3重量%からなる組成物であることが好出しい
In addition, in order to obtain a low melting point glass with a transition temperature exceeding 260°C and below 290°C, pbo so ~ 85% by weight, B
tos 5~7m! Amount% 25ift 1-3% by weight, B
i, 0°3-5% by weight, PbF, 0-7% by weight 25b
Js, 0-4 weight 1%, AlF30-2! lj1%, T1
.. Preferably, the composition consists of 0 to 3% by weight of O.

前記PbOは非晶体低融点ガラスの主成分で転移温度を
低下させるのに必要な成分であるが、上記低融、αガラ
ス中の割合が85重量%をこえると結晶化しやすくなり
、80重量%未満では転移温度が290℃をこえる傾向
にあり、従って封着温度も400℃以上となり、従来の
低融点ガラスとほとんどかわr、なくなる。
The above PbO is the main component of the amorphous low melting point glass and is a necessary component to lower the transition temperature, but if the proportion in the above low melting α glass exceeds 85% by weight, it tends to crystallize, If the temperature is less than 290°C, the transition temperature tends to exceed 290°C, and therefore the sealing temperature becomes 400°C or higher, which is almost the same as conventional low melting point glass.

B、島は、ガラスを易溶性にし、かつ結晶化を防ぐ成分
であるが、上記低融点ガラス中の割合が71!1%をこ
えると転移温度が290℃をこえ25重量%未満では結
晶化しやすくなる傾向にある。
B. Islands are components that make glass easily soluble and prevent crystallization, but if the proportion in the low melting point glass exceeds 71!1%, the transition temperature will exceed 290 ° C., and if it is less than 25% by weight, it will not crystallize. It tends to become easier.

5in2はガラスの耐水性を向上させ、ガラスを易溶性
にする成分であるが、上記低融点ガラス中の割合が3m
11%をこえると転移温度は290’Cをこえ、1重量
%未満ではガラスの耐水性がわるくなる傾向にある。
5in2 is a component that improves the water resistance of glass and makes it easily soluble, but the proportion in the above low melting point glass is 3m
When it exceeds 11%, the transition temperature exceeds 290'C, and when it is less than 1% by weight, the water resistance of the glass tends to deteriorate.

BizO,はガラスの転移温度を低下させる成分である
が、上記低融点ガラス中の割合が5重量%をこえるとガ
ラスが結晶化しゃすくなる傾向にあり、3重量%未満で
は転移温度を低下させる効果はない。
BizO is a component that lowers the transition temperature of glass, but if its proportion in the low melting point glass exceeds 5% by weight, the glass tends to crystallize easily, and if it is less than 3% by weight, it lowers the transition temperature. It has no effect.

PbF2はガラスの転移温度を低下させる成分であり、
上記低融点ガラス中の割合が7重量%をこえるとガラス
が結晶化しやすくなる傾向にあるので、好ましくない。
PbF2 is a component that lowers the transition temperature of glass,
If the proportion in the low melting point glass exceeds 7% by weight, the glass tends to crystallize easily, which is not preferable.

sb、o、はガラスの転移温度を低下させる成分であり
、上記低融点ガラス中の割合が4重量%をこえるとガラ
スが結晶化しやすくなる傾向にあるので、好ましくない
sb, o, are components that lower the transition temperature of glass, and if their proportion in the low melting point glass exceeds 4% by weight, the glass tends to crystallize, which is not preferred.

AffiF、はガラスの転移温度を低下させる成分であ
り、上記低融点ガラス中の割合が2重量%をこえるとガ
ラスが結晶化しやすくなる傾向にあるので、好ましくな
い。
AffiF is a component that lowers the transition temperature of glass, and if its proportion in the low melting point glass exceeds 2% by weight, the glass tends to crystallize, which is not preferred.

Tffi、0はガラスの転移温度を低下させる成分であ
り、上記低融点ガラス中の割合が3重量%をこえても転
移温度の低い非晶体ガラスかえられるが、コストが高く
なり、好ましくない。
Tffi,0 is a component that lowers the transition temperature of glass, and even if its proportion in the low melting point glass exceeds 3% by weight, it can be replaced with an amorphous glass with a low transition temperature, but this is not preferred because it increases the cost.

前記の低融点ガラスをうるための原料は、転移温度が2
60℃以下の低融点ガラスをうるための原料のほか、た
とえば5津製薬(株)製の二酸化アンチモン、弗化アル
ミニウムを用いる。
The raw material for obtaining the above-mentioned low melting point glass has a transition temperature of 2.
In addition to the raw materials for obtaining a low melting point glass of 60° C. or lower, antimony dioxide and aluminum fluoride manufactured by Gotsu Pharmaceutical Co., Ltd., for example, are used.

前記の低融点ガラスをうるための調合方法お工び転移温
度、熱変形温度の測定方法は、前記転移温度が260℃
以下の低融点ガラスをうるための方法に準じて行なう。
The preparation method for obtaining the above-mentioned low melting point glass and the method for measuring the transition temperature and heat distortion temperature are as follows:
It is carried out according to the method for obtaining low melting point glass below.

つぎに転移温度が260℃以下の低融点ガラス(以下、
1群という)と転移温度が260℃をこえ、290℃以
下の低融点ガラス(以下、■群という)を所定の比率で
調合して低融点ガラス組成物がえられるが、低融点ガラ
ス組成物中の1群と■群の比率は、1群が20〜50重
量%、■群が50〜80重量%の範囲で用いられる。低
融点ガラス組成物中の1群が占める比率が201!量%
未満(■群が80!!量%をこえる)では■群の低融点
ガラスの効果が大きく、封着用組成物として用いたばあ
い、■群をそのまま用いたばあいと比べて封着温度がか
わらない、*た低融点ガラス組成物において1群の占め
る割合が50重量%をこえる(■群が50重量%未満)
ばあい、封着用組成物の封着温度が低くなり、1群の影
響が大きくなるが、コストが高くなり、あまり実用的で
はない。
Next, low melting point glass with a transition temperature of 260°C or less (hereinafter referred to as
A low melting point glass composition can be obtained by blending a low melting point glass (hereinafter referred to as group 1) with a transition temperature of over 260°C and below 290°C (hereinafter referred to as group Ⅰ) in a predetermined ratio. The ratio of group 1 to group 2 is 20 to 50% by weight for group 1 and 50 to 80% by weight for group 2. The ratio of group 1 in the low melting point glass composition is 201! amount%
When the glass is less than 80% (the amount of the ■ group exceeds 80!!), the effect of the low melting point glass of the ■ group is large, and when it is used as a sealing composition, the sealing temperature is lower than when the ■ group is used as it is. In the low melting point glass composition with no change, the proportion of the 1st group exceeds 50% by weight (the ■ group is less than 50% by weight)
In this case, the sealing temperature of the sealing composition becomes low and the influence of the first group increases, but the cost increases and is not very practical.

つぎに上記でえられた低融点jう六組成物に低膨脹フィ
ラーを添加することによりM着用低融点ガラス組成物が
えられる5低!I脹フイラーはえられた低融点ガラス組
成物にアルミナパラケークとの熱膨張を合わせかつ、低
融点ガラス組成物の耐衝撃強度を高めるために低融点ガ
ラス組成物に対して15〜20重量%の比率で用いる。
Next, by adding a low expansion filler to the low melting point composition obtained above, a low melting point glass composition for M wear can be obtained. I filler is 15 to 20% by weight based on the low melting point glass composition in order to match the thermal expansion of the obtained low melting point glass composition with the alumina paracake and to increase the impact strength of the low melting point glass composition. Use the ratio of

低膨脹フィラーは、前記10μm以下のガラス粉末に1
〜10#m程度の低膨脹フィラーをボールミルなどで混
合して用いられる。低膨脹フィラーとしては、たとえば
コープイライト、ジルコン、β−ユークリプタイト、チ
タン酸鉛、ウィレマイトなどが通常用いられる。
The low expansion filler is added to the glass powder with a diameter of 10 μm or less.
A low expansion filler of about 10 #m is mixed in a ball mill or the like. Examples of low-expansion fillers commonly used include copillite, zircon, β-eucryptite, lead titanate, and willemite.

製造例1〜4 1群の低融点ガラスをうるための原料として、5津製薬
(株)の鉛丹、硼酸、珪石粉、酸化ビスマス、弗化鉛、
酸化第1タリウムなどを用いて第1表のllffi例1
〜4の組成になるように調介し、白金ルツボに入れて8
00〜1000℃で30〜60分間溶融したのち、金属
板上に流して冷却し、薄板状のガラスをえた。この薄板
状のガラスをアルミナ質のボールミルなどで10μm以
下に粉砕した。
Production Examples 1 to 4 As raw materials for obtaining the first group of low melting point glasses, red lead, boric acid, silica powder, bismuth oxide, lead fluoride, manufactured by Gotsu Pharmaceutical Co., Ltd.
Ilffi example 1 in Table 1 using thallium oxide etc.
Adjust the composition so that it has a composition of ~4, put it in a platinum crucible, and add
After melting at 00 to 1000°C for 30 to 60 minutes, the mixture was poured onto a metal plate and cooled to obtain a thin plate of glass. This thin glass plate was ground to 10 μm or less using an alumina ball mill or the like.

つぎにこのガラス粉末Loomgを理学電機(株)製の
熱分析装置を用い、10℃/winの昇温速度で、r7
yインセラミックハンドブック」、浜野健也纏集、昭和
59年朝倉書店発行、644真に記載された方法に準じ
、このガラス粉末の転移温度および熱製造例5〜10 ■群の低融点ガラスをうるための原料として、転移温度
が260℃以下の低融点ガラスをうるための原料のほか
、石津製薬(株)製の二酸化アンチモン、弗化アルミニ
ウムを用いた。
Next, this glass powder Loomg was heated to r7 using a thermal analyzer manufactured by Rigaku Denki Co., Ltd. at a heating rate of 10°C/win.
According to the method described in ``Yin Ceramic Handbook'', Kenya Hamano Collection, published by Asakura Shoten in 1981, 644, the transition temperature of this glass powder and thermal production examples 5 to 10 ■ Group low melting point glasses were obtained. In addition to the raw materials for obtaining a low-melting glass having a transition temperature of 260° C. or lower, antimony dioxide and aluminum fluoride manufactured by Ishizu Pharmaceutical Co., Ltd. were used as raw materials for this purpose.

前記の低融点ガラスをうるための調合方法お上り転移温
度、熱変形温度の測定方法は、製造例1〜4で説明した
方法に準じて行ない、その結果を実施例1 1群の低融点ガラスとして第1表の製造例2に記載した
転移温度が258.5℃のガラス粉末40重量−%に対
して、■群の低融点ガラスとして第2表の製造例9に記
載した転移温度が286.5℃のガラス粉末60重1%
の比率で調合した低融点ガラス組成物を作製し、製造例
1〜4に記載した方法に準じて、転移温度を測定した。
Preparation method for obtaining the above-mentioned low melting point glass The measuring method of the transition temperature and heat distortion temperature was carried out according to the method explained in Production Examples 1 to 4, and the results were summarized as Example 1 Group 1 of low melting point glass. As for the glass powder with a transition temperature of 258.5°C described in Production Example 2 in Table 1, 40% by weight, the transition temperature described in Production Example 9 in Table 2 as the low melting point glass of Group ■ is 286% by weight. .5℃ glass powder 60wt 1%
A low melting point glass composition prepared at a ratio of 1 to 1 was prepared, and the transition temperature was measured according to the method described in Production Examples 1 to 4.

この低融点ガラス組成物の転移温度は、1群お上り■群
の転移温度の中間である281.0℃であり、1群およ
び■群の複合効果を示した。その理由については、現在
のと二  ゛ろ明確ではないが、転移温度の低いガラス
がまず溶融し、それが転移温度の高いガラスの溶融を助
長し、低温側に転移温度を移行させる効果によるものと
考えられる。
The transition temperature of this low melting point glass composition was 281.0° C., which was between the transition temperatures of Group 1 and Group II, and showed a combined effect of Group 1 and Group II. The reason for this is not as clear as it is now, but it is due to the effect that glass with a low transition temperature melts first, which promotes the melting of glass with a high transition temperature, shifting the transition temperature to the lower temperature side. it is conceivable that.

つぎにこの低融点ガラス組成物の粉末85重量%に対し
て低膨脹フィラーとして粒径8μlのフープイライト粉
末15′m1%を添加した封着組成物を作製した。
Next, a sealing composition was prepared by adding 15'ml of hoopillite powder with a particle size of 8 μl as a low expansion filler to 85% by weight of the powder of this low melting point glass composition.

つぎにえられた!t’Jt組成物のB着温度を測定し;
、その結果を第3表に示す。
I got it next! Measuring the B deposition temperature of the t'Jt composition;
, the results are shown in Table 3.

なお封着温度は、70−ボタン径を測定することにより
求めた。すなわち封着組成物10.を採取し、直径20
11瀧の円柱状に加圧成形したものを試料とし、各温度
で10分間加熱した。その後70−ボタン径を測定し、
その直径が25,6mm以上に流動する最低温度をもっ
て封着温度とした。
The sealing temperature was determined by measuring the 70-button diameter. That is, sealing composition 10. Take a diameter of 20
Samples were pressure-molded into cylindrical shapes of 11 waterfalls and heated at each temperature for 10 minutes. Then measure the 70-button diameter,
The lowest temperature at which the diameter became 25.6 mm or more was defined as the sealing temperature.

(アルミナパッケージを封着するばあと1には封管組成
物の70−ボタン径が加熱後、直径25.6g+瀧ス上
であることが必要であるといわれている。)更施例2〜
6 第1表の1群の低融点ガラスと#Ik2表の■群の氏融
点ガラスを第3表に示した組成となるように調合して低
融点ガラス組成物を作製し、製造例1〜4に記載した方
法に準じて転移温度を測定した。
(When sealing an alumina package, it is said that the 70-button diameter of the sealing tube composition needs to be 25.6 g in diameter + waterfall after heating.) Additional Example 2~
6 A low melting point glass composition was prepared by blending the low melting point glass of Group 1 in Table 1 and the m.f. melting point glass of Group ■ in Table #Ik2 to have the composition shown in Table 3, and manufacturing examples 1 to 6. The transition temperature was measured according to the method described in 4.

つぎに、この低融点ガラス組成物に低膨脹フィラーとし
て実施例1で用いたコープイライト粉末を第3Rに示し
た組成となるように添加して封着@酸物をえた。
Next, the copillite powder used in Example 1 as a low-expansion filler was added to this low-melting point glass composition so as to have the composition shown in 3R to obtain a sealed @acid.

えられた封着組成物の封着温度を実施例1と同様の方法
で測定した。
The sealing temperature of the obtained sealing composition was measured in the same manner as in Example 1.

その結果を第3表に併記する。The results are also listed in Table 3.

比較例1 91造例2でえちれた低融点ガラスおよび実施例1で用
いたコープイライト粉末を第3表に示した組成となるよ
うに添加して封着組成物をえた。
Comparative Example 1 A sealing composition was obtained by adding the low melting point glass prepared in 91 Preparation Example 2 and the copillite powder used in Example 1 so as to have the composition shown in Table 3.

元られたits組成物の封着温度を実施例1と同様の方
法で測定した。その結果を第3表に併記する。
The sealing temperature of the original ITS composition was measured in the same manner as in Example 1. The results are also listed in Table 3.

比較例2 製造例9でえられた粒径10μlの低融点ガラスおよび
実施例1で用いたコープイライト粉末を第3表に示した
ffi虞となるように添加して粉末組成物をえた。
Comparative Example 2 A powder composition was obtained by adding the low melting point glass with a particle size of 10 μl obtained in Production Example 9 and the copillite powder used in Example 1 so as to achieve the ffi values shown in Table 3.

えられたit着組成物の!tM温度を実施例1と同様の
方法で測定した。その結果を第3表に併記する。
The obtained IT clothing composition! The tM temperature was measured in the same manner as in Example 1. The results are also listed in Table 3.

[5&明の効果] 以上説明したように本発明は、1群の低融点ガラスと■
群の低融点ガラスを岨合わせ双方の長所を利用すること
により、アルミナパッケージの封着温度を400℃以下
とすることができるので、経済的に優れたItl用組成
物の低融点ガラスを提供しうるめである。
[Effects of 5 & Bright] As explained above, the present invention has a first group of low melting point glasses and
By utilizing the advantages of both low melting point glasses in the group, the sealing temperature of the alumina package can be lowered to 400°C or less, thereby providing a low melting point glass with an economically superior composition for ITl. It is urume.

また本発明の低融点ガラスは、とくにICパッケージの
封着に適するが、このほかブラウン管を製造する際のパ
ネルガラスと77ンネルガラスの封着にも使用すること
ができる。
Further, the low melting point glass of the present invention is particularly suitable for sealing IC packages, but can also be used for sealing panel glass and 77-nel glass when manufacturing cathode ray tubes.

Claims (3)

【特許請求の範囲】[Claims] (1)転移温度が260℃以下の非晶体ガラス群と、転
移温度が260℃をこえ、290℃以下の非晶体ガラス
群とを組合わせた低融点ガラス粉末および低膨脹フィラ
ーからなることを特徴とする封着用低融点ガラス組成物
(1) It is characterized by consisting of a low melting point glass powder and a low expansion filler, which are a combination of an amorphous glass group with a transition temperature of 260°C or lower and an amorphous glass group with a transition temperature of over 260°C and 290°C or lower. A low melting point glass composition for sealing.
(2)前記転移温度が260℃以下の非晶体ガラス群の
組成が、PbO40〜50重量%、B_2O_310〜
12重量%、SiO_21〜3重量%、Bi_2O_3
1〜3重量%、PbF_25〜10重量%、Tl_2O
15〜35重量%である特許請求の範囲第(1)項記載
の封着用低融点ガラス組成物。
(2) The composition of the amorphous glass group having a transition temperature of 260°C or less is PbO40 to 50% by weight, B_2O_310 to
12% by weight, SiO_21-3% by weight, Bi_2O_3
1-3% by weight, PbF_25-10% by weight, Tl_2O
The low melting point glass composition for sealing according to claim (1), wherein the content is 15 to 35% by weight.
(3)前記転移温度が260℃をこえ、290℃以下の
非非晶体ガラス群の組成がPbO80〜85重量%、B
_2O_35〜7重量%、SiO_21〜3重量%、B
i_2O_33〜5重量%、PbF_20〜7重量%、
Sb_2O_30〜4重量%、AlF_30〜2重量%
、Tl_2O0〜3重量%である特許請求の範囲第(1
)項記載の封着用低融点ガラス組成物。
(3) The composition of the amorphous glass group whose transition temperature exceeds 260°C and is below 290°C is PbO80 to 85% by weight, B
_2O_35-7% by weight, SiO_21-3% by weight, B
i_2O_33-5% by weight, PbF_20-7% by weight,
Sb_2O_30-4% by weight, AlF_30-2% by weight
, Tl_2O0 to 3% by weight
) The low melting point glass composition for sealing as described in item 1.
JP10560485A 1985-05-15 1985-05-15 Sealing low-melting glass composition Pending JPS61261233A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10560485A JPS61261233A (en) 1985-05-15 1985-05-15 Sealing low-melting glass composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10560485A JPS61261233A (en) 1985-05-15 1985-05-15 Sealing low-melting glass composition

Publications (1)

Publication Number Publication Date
JPS61261233A true JPS61261233A (en) 1986-11-19

Family

ID=14412105

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10560485A Pending JPS61261233A (en) 1985-05-15 1985-05-15 Sealing low-melting glass composition

Country Status (1)

Country Link
JP (1) JPS61261233A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0375239A (en) * 1989-08-14 1991-03-29 Nippon Electric Glass Co Ltd Sealing material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0375239A (en) * 1989-08-14 1991-03-29 Nippon Electric Glass Co Ltd Sealing material

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