JPS61258388A - Magnetic bubble element - Google Patents

Magnetic bubble element

Info

Publication number
JPS61258388A
JPS61258388A JP60097744A JP9774485A JPS61258388A JP S61258388 A JPS61258388 A JP S61258388A JP 60097744 A JP60097744 A JP 60097744A JP 9774485 A JP9774485 A JP 9774485A JP S61258388 A JPS61258388 A JP S61258388A
Authority
JP
Japan
Prior art keywords
margin
outer corner
length
bubble
transfer path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60097744A
Other languages
Japanese (ja)
Inventor
Teruaki Takeuchi
輝明 竹内
Naoki Kodama
直樹 児玉
Masatoshi Takeshita
正敏 竹下
Takashi Toyooka
孝資 豊岡
Makoto Suzuki
良 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60097744A priority Critical patent/JPS61258388A/en
Publication of JPS61258388A publication Critical patent/JPS61258388A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve bubble transfer characteristics by increasing the bit length of an element opposite to an outer corner compared with the bit length of other elements with a rectilinear transfer line and therefore increasing the distance between the tip of the outer corner and a cusp. CONSTITUTION:The diagram shows the form of a pattern near an outer corner of an ion implanting transfer line of a cell size (4mumX4mum). The length L of an element 7 opposite to an outer corner 4 of a rectilinear transfer line is larger than the length 4mum of other elements. In such a case, the lower limit margin is reduced and the margin width is increased as the length L increases more than 4mum in terms of the bias magnetic field margin for bubble transfer at the outer corner. When the length L is equal to 6mum, said margin is equal to the margin of the rectilinear transfer line. Thus the 13% margin width is obtained.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明はイオン打込みで形成した磁気バブル転送路に係
り、特に良好なバブル転送特性を有する外回りコーナ近
傍の直線転送路の形状に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a magnetic bubble transfer path formed by ion implantation, and particularly to the shape of a straight transfer path near an outer corner having good bubble transfer characteristics.

〔発明の背景〕[Background of the invention]

磁性ガーネット等の磁化容易方向が膜面に垂直であるよ
うな磁性薄膜に存在する円筒状磁区すなわち磁気バブル
を用いて2進情報を記憶する素子が注目されている。特
に、米国特許第3,828,329号に開示されたイオ
ン打込み方式の磁気バブル転送路は高密度化に適するた
め、各所で開発が進められている。
Elements that store binary information using cylindrical magnetic domains, that is, magnetic bubbles, present in a magnetic thin film such as magnetic garnet whose easy magnetization direction is perpendicular to the film surface are attracting attention. In particular, the ion implantation type magnetic bubble transfer path disclosed in U.S. Pat. No. 3,828,329 is suitable for increasing density, and is therefore being developed in various places.

磁気バブル素子の基本構成を第1図に示す、これは、メ
ージャ/マイナループ構成と呼ばれる方式のもので、図
中に1で示したループがマイナループであり、2および
2′で示したラインがメージャラインである。マイナル
ープとメージャラインとの境界には両ループ間のバブル
の移し換えを行うゲートがある。近年、磁気バブル素子
の高密度化に伴い、ゲートの空間的余裕度を確保するた
めに、第1図に示すような折り畳んだマイナループが用
いられるようになった。
The basic configuration of a magnetic bubble element is shown in Figure 1. This is of a type called a major/minor loop configuration, where the loop indicated by 1 is the minor loop, and the lines indicated by 2 and 2' are the major loop. It's a line. At the boundary between the minor loop and the major line, there is a gate that transfers bubbles between the two loops. In recent years, with the increase in the density of magnetic bubble elements, a folded minor loop as shown in FIG. 1 has come to be used in order to ensure the spatial margin of the gate.

このようなマイナループでは、外回りコーナ4と直線転
送路3とが対向する部分が存在する1両者の対向する部
分を詳細に示したものが第2図である。図のように、外
回りコーナには通常、直線転送路の1ビツトの要素と同
じ形状のほぼ円形のバタンか用いられている。その場合
、外回りコーすを回ったバブルが対向する直線転送路の
カスプに飛び移る誤動作が生じやすい。このため、第3
図に示すように、バブルが外回りコーナを転送する場合
のバイアスマージンは直線転送路のそれより狭い。実用
素子では回転磁界500e程度で十分なバイアスマージ
ンを有する必要があるが、この外回りコーナのバイアス
マージンの幅は、直線転送路のそれの273であり7%
しかない。
In such a minor loop, there is a portion where the outer corner 4 and the linear transfer path 3 face each other, and FIG. 2 shows in detail the portion where the two face each other. As shown in the figure, a generally circular button having the same shape as the 1-bit element of the linear transfer path is usually used at the outer corner. In that case, a malfunction is likely to occur in which the bubble that has traveled around the outer course jumps to the cusp of the opposing straight transfer path. For this reason, the third
As shown in the figure, the bias margin when the bubble transfers around the outer corner is narrower than that of the straight transfer path. In practical devices, it is necessary to have a sufficient bias margin with a rotating magnetic field of about 500 e, but the width of the bias margin at this outer corner is 273, which is 7%, of that of the straight transfer path.
There is no other choice.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、外回りコーナのバブル転送マージンが
十分に広い磁気バブル素子を提供することにある。
An object of the present invention is to provide a magnetic bubble element with a sufficiently wide bubble transfer margin at the outer corner.

〔発明の概要〕[Summary of the invention]

第4図は、第2図に示す外回りコーナ・直線転送路間の
距離Qとバブル転送マージンとの関係を示したものであ
る。セルサイズ4μmX4μmの転送路において、2は
通常的4μmである。この場合のバイアス磁界マージン
は回転磁界H,=5000で前述の如く7%しかない。
FIG. 4 shows the relationship between the distance Q between the outer corner and the straight transfer path shown in FIG. 2 and the bubble transfer margin. In a transfer path with a cell size of 4 μm×4 μm, 2 is typically 4 μm. In this case, the bias magnetic field margin is only 7% at a rotating magnetic field H,=5000, as described above.

しかし、Qを増加するとマージン幅は拡がり、悲=8μ
mではマージン幅は13%となる。これは、外回りコー
ナの先端A部と直線転送路のカスプBとの距離が増加し
、バブルがAからBへ飛び移りにくくなったためである
However, as Q increases, the margin width widens, and = 8μ
In m, the margin width is 13%. This is because the distance between the tip A of the outer corner and the cusp B of the straight transfer path has increased, making it difficult for bubbles to jump from A to B.

以上の結果から明らかなように、外回りコーナの先端と
、対向する直線転送路のカスプとの距離を増加すること
により、バイアス磁界マージンの下限を下降させ(良好
にし)、広いマージンを得ることができる。
As is clear from the above results, by increasing the distance between the tip of the outer corner and the cusp of the opposing linear transfer path, the lower limit of the bias magnetic field margin can be lowered (improved) and a wider margin can be obtained. can.

本発明は、直線転送路における、外回りコーナに対向す
る要素のビット長を他の要素のビット長より長くするこ
とにより、外回りコーナの先端と問題のカスプとの距離
を増加させ、良好なバブル転送特性を得るものである。
The present invention improves bubble transfer by increasing the distance between the tip of the outer corner and the cusp in question by making the bit length of the element facing the outer corner longer than the bit length of other elements in the straight transfer path. It is something that acquires characteristics.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の一実施例を第5図により説明する。この
図は、セルサイズ4μmX4μmのイオン打込み転送路
における外回りコーナ近傍のバタン形状を示したもので
ある。直線転送路における、外回りコーナ4に対向する
要素7の長さLが、他の要素の長さく4μm)より長く
なっている。このようなバタン形状を用いた場合の外回
りコーナのバブル転送のバイアス磁界マージンを第6図
に示す。Lを4μmから増加するのに伴い、マージン下
限が下降してマージン幅は拡がる。Lが6μmになると
マージンは直線転送路のそれに一致し、13%のマージ
ン幅が得られた。
An embodiment of the present invention will be described below with reference to FIG. This figure shows the shape of a button near the outer corner of an ion implantation transfer path with a cell size of 4 μm×4 μm. The length L of the element 7 facing the outer corner 4 in the straight transfer path is longer than the length of the other elements (4 μm). FIG. 6 shows the bias magnetic field margin for bubble transfer at the outer corner when such a batten shape is used. As L increases from 4 μm, the lower limit of the margin decreases and the margin width increases. When L was 6 μm, the margin matched that of a straight transfer path, and a margin width of 13% was obtained.

第7図は蛇形のイオン打込み転送路を用いた場合の実施
例で、セルサイズは4μm X 3 、5μmである。
FIG. 7 shows an example in which a snake-shaped ion implantation transfer path is used, and the cell size is 4 μm x 3 and 5 μm.

ここでも、外回りコーナ4に対向する直線転送路に要素
7の長さLを他の要素の長さく4μm)より長くした。
Also here, the length L of the element 7 on the straight transfer path facing the outer corner 4 was made longer than the length of the other elements (4 μm).

直線転送路間のギャップが。The gap between the straight transfer paths.

第6図の実施例と同じであるため、Lとバイアス磁界マ
ージンとの関係は第6図とほぼ同様の結果が得られ、L
=6μmの場合のバイアス磁界マージンは13%であっ
た。
Since this is the same as the example shown in FIG. 6, the relationship between L and the bias magnetic field margin is almost the same as that shown in FIG. 6, and L
= 6 μm, the bias magnetic field margin was 13%.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、イオン打込み方式の磁気バブル素子の
外回りコーナのバブル転送のバイアス磁界マージンを1
3%にすることができ、安定な動作を実現できる。
According to the present invention, the bias magnetic field margin for bubble transfer at the outer corner of an ion implantation type magnetic bubble element is set to 1.
3%, and stable operation can be achieved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は磁気バブル素子の構成図、第2図は従来の外回
りコーナ近傍の平面図、第3図、第4図。 第6図はバブル転送マージンを示すグラフ、第5図、第
7図は本発明の一実施例になるバブル素子の外回りコー
ナ近傍の平面図である。
FIG. 1 is a block diagram of a magnetic bubble element, FIG. 2 is a plan view of the vicinity of a conventional outer corner, and FIGS. 3 and 4. FIG. 6 is a graph showing the bubble transfer margin, and FIGS. 5 and 7 are plan views of the vicinity of the outer corner of a bubble element according to an embodiment of the present invention.

Claims (1)

【特許請求の範囲】[Claims] 磁気バブルを保持しうる磁性体にイオンを選択的に打込
んで形成する磁気バブル転送路を有する磁気バブル素子
で、磁気バブル転送方向を180°変える外回りコーナ
と直線転送路とが対向する部分を有する素子において、
直線転送路における、外回りコーナに対向する要素のビ
ット長が、他の要素のビット長より長いことを特徴とす
る磁気バブル素子。
A magnetic bubble element has a magnetic bubble transfer path formed by selectively implanting ions into a magnetic material capable of holding magnetic bubbles, and a portion where an outer corner that changes the direction of magnetic bubble transfer by 180° and a straight transfer path are opposed to each other. In an element having
A magnetic bubble element characterized in that the bit length of an element facing an outer corner in a straight transfer path is longer than the bit length of other elements.
JP60097744A 1985-05-10 1985-05-10 Magnetic bubble element Pending JPS61258388A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60097744A JPS61258388A (en) 1985-05-10 1985-05-10 Magnetic bubble element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60097744A JPS61258388A (en) 1985-05-10 1985-05-10 Magnetic bubble element

Publications (1)

Publication Number Publication Date
JPS61258388A true JPS61258388A (en) 1986-11-15

Family

ID=14200393

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60097744A Pending JPS61258388A (en) 1985-05-10 1985-05-10 Magnetic bubble element

Country Status (1)

Country Link
JP (1) JPS61258388A (en)

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