JPS61222043A - Substrate for spin coating - Google Patents

Substrate for spin coating

Info

Publication number
JPS61222043A
JPS61222043A JP6182785A JP6182785A JPS61222043A JP S61222043 A JPS61222043 A JP S61222043A JP 6182785 A JP6182785 A JP 6182785A JP 6182785 A JP6182785 A JP 6182785A JP S61222043 A JPS61222043 A JP S61222043A
Authority
JP
Japan
Prior art keywords
substrate
spin coating
coating
resist
center hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6182785A
Other languages
Japanese (ja)
Inventor
Kiyoaki Suzuki
鈴木 清昭
Chikatoshi Satou
佐藤 周逸
Osamu Sasaki
修 佐々木
Yoshinori Fujimori
藤森 良経
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP6182785A priority Critical patent/JPS61222043A/en
Publication of JPS61222043A publication Critical patent/JPS61222043A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent the generation of a coating stain by forming a curved part having >=1mm radius of curvature to the edge of the inside circumferential surface of the central hole of a substrate and the surface of the substrate. CONSTITUTION:The curved part 3 having >=1mm radius of curvature is formed to the edge of the central hole 2 of the substrate 1 for spin coating and the surface of the substrate. The excess resist near the central part of the dropped resist is thereby quickly dropped through the central hole and the remaining of the resist at the edge is obviated. The splashing of the residual resist and the consequent generation of the coating stain are obviated and therefore a good disk having no deterioration of the SN ratio is obtd.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は、レジストを回転塗布する回転塗布用基体の形
状に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to the shape of a spin coating substrate for spin coating a resist.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

近年、ディジタルオーディオディスク、ビデオディスク
、ドキエ゛メントファイルディスク等の情報メモリディ
スクがさかんに開発されている。これらの情報メモリデ
ィスクは、マスタ原盤を作成するマスタリングプロセス
及びプラスチックディスクを作成するりブリケージ曹ン
プ四セスにより形成される。前者のプロセスはガラス基
板等よりなる回転塗布用基体の研磨、洗浄、密着剤層の
形成、レジストの塗布、ベーキング、レーザによる信号
の記録、現像、そして電鋳用電極の形成さらに電鋳によ
るスタンパの製作よシなっている。
In recent years, information memory disks such as digital audio disks, video disks, and document file disks have been actively developed. These information memory discs are formed by a mastering process to create a master disc and a re-creation process to create a plastic disc. The former process involves polishing and cleaning a substrate for spin coating, such as a glass substrate, forming an adhesive layer, applying resist, baking, recording a signal with a laser, developing, forming an electrode for electroforming, and then forming a stamper by electroforming. The production is getting better.

また後者は、前記マスタリングプロセスによシ製作され
たスタンパを用いて2P成形法或いは射出成形法等によ
りプラスチックディスクを多数複製する工程からなって
いる。
The latter consists of a step of making a large number of copies of a plastic disk by a 2P molding method, an injection molding method, or the like using the stamper produced by the mastering process.

このような工程のうちレジスト塗布の工程では、ガラス
基板等よりなる回転塗布用基体の回転の中心孔付近の塗
布面にレジストを適貴簡下し、回転塗布(スピンコード
)を行なっている。しかしながら従来の基体では、第4
図の模擬断面図に示したように中心孔の内周面と基体表
面との境界部分がなめらかにつながっていない。そのた
めに滴下してひろがったレジストが回転塗布時に中心孔
の内周面と基体表面との境界部分に残留し、それらが回
転中遠心力によって飛散して半固化状態のレジスト塗布
面上に落下し、そのレジスト塗布面上にレジスト膜厚の
不均一な箇所(以下、塗布シミと称する)を生じる。こ
のような塗布シミが生じるとビットの形成による信号の
記録の際にそのピットの長さや深さが一様でなくなるた
め、入力信号が忠実に記録できなくなり、またS/Nも
低下してしまうなどの情報メモリディスクにとって重大
な問題点を有していた。
Among these steps, in the resist coating step, a resist is appropriately placed on the coating surface of a spin coating substrate made of a glass substrate or the like near the center hole of rotation, and spin coating (spin code) is performed. However, in the conventional substrate, the fourth
As shown in the simulated cross-sectional view in the figure, the boundary between the inner circumferential surface of the center hole and the surface of the base body is not smoothly connected. For this reason, the dripped and spread resist remains on the boundary between the inner circumferential surface of the center hole and the substrate surface during spin coating, and is scattered by centrifugal force during rotation and falls onto the semi-solidified resist coating surface. , spots with uneven resist film thickness (hereinafter referred to as coating spots) occur on the resist coating surface. If such coating stains occur, the length and depth of the pits will not be uniform when recording signals by forming bits, making it impossible to faithfully record input signals and reducing S/N. There were serious problems with information memory disks such as.

〔発明の目的〕[Purpose of the invention]

本発明は、このような問題点に対してなされたもので、
従来レジストをスピンコードにより塗布する際に発生し
ていた塗布シミを防止できる回転塗布用基体を提供する
ことを目的とする。
The present invention has been made to solve these problems.
It is an object of the present invention to provide a spin coating substrate that can prevent coating stains that occur when conventionally coating resist with a spin cord.

〔発明の概要〕[Summary of the invention]

本発明は、レジストを回転塗布する際に回転の中心とな
る中心孔を有した情報メモリディスクマスタ原盤作製に
用いる回転塗布用基体において、前記回転塗布用基体の
塗布表面と前記中心孔の内周面とがl1m11以上の曲
率半径で連続的につながっていることを特徴としている
。すなわち本発明に係る回転塗布用基体は、その基体表
面と中心孔の内周面とがなめらかにつながっているため
に滴下されたレジストのうち中心部付近の余分なレジス
トがすみやかに中心孔を通って落下する。このため中心
孔の内周面と基体表面との境界付近に余分なレジストが
残留することもなく、よって従来のようにこれらが飛散
して塗布シミを発生することもない。その具体的な形状
の一例を第1図及び第2図の模擬断面図に示す。
The present invention provides a spin-coating base used for producing an information memory disk master master having a center hole that serves as the center of rotation when spin-coating a resist, the coating surface of the spin-coating base and the inner periphery of the center hole. It is characterized in that the surfaces are continuously connected with a radius of curvature of l1m11 or more. In other words, in the spin coating substrate according to the present invention, the surface of the substrate and the inner peripheral surface of the center hole are smoothly connected, so that the excess resist near the center of the dropped resist quickly passes through the center hole. and fall. Therefore, no excess resist remains in the vicinity of the boundary between the inner peripheral surface of the center hole and the surface of the substrate, and therefore, there is no possibility that this resist will scatter and cause coating stains as in the prior art. An example of its specific shape is shown in the simulated sectional views of FIGS. 1 and 2.

どちらも図の上方よシレジスト液が滴下され回転塗布さ
れる。ここで用いられるレジストの濃度はl cp〜1
0000 cp程度のものが用いられる。
In both cases, the resist solution is dropped above the figure and applied by spinning. The concentration of the resist used here is l cp~1
0000 cp is used.

本発明に係る回転塗布用基体の基体表面と中心孔の内周
面とを結ぶ曲率半径の大きさは1mm以上を要する。こ
の理由は、第3図の特性図をみれば明らかである。
The radius of curvature connecting the base surface of the spin coating base according to the present invention and the inner peripheral surface of the center hole must be 1 mm or more. The reason for this becomes clear from the characteristic diagram shown in FIG.

本発明者らは、外径350m、中心孔径2゜■、厚さ6
■のガラス製基板よシなる基体を作製し、その基体表面
と中心孔の内周面とを第1図の模擬断面図に示したよう
な形状で曲率半径を0.1 mから10露まで種々変更
して連続させ、これに回転塗布を行なった場合の塗布シ
ミの発生状況を調べた。その結果を表わしたのが第3図
である。この図かられかるとおり曲率半径が小さい場合
塗布シミが多く発生しており、これが1鱈以上になると
#1とんど発生しなくなる。また、この曲率半径の上限
は用いる回転塗布用基体の厚さ、大きさ、記録像(の大
きさ等によりて適宜定めれば良く、その形状も第1図に
示した基体表面から中心孔の内周面へつながる形状の他
に、第2図に示したよう゛に基体表面からさらに基体裏
面へ中心孔の内周面整経てなめらかにつながる形状を有
していても良い。そして用いる曲率半径の大きさも複数
値の異なった大きさを用いてつなげても良い。
The present inventors have an outer diameter of 350 m, a center hole diameter of 2°, and a thickness of 6 mm.
A base body such as the glass substrate described in (2) is prepared, and the base surface and the inner peripheral surface of the center hole are shaped as shown in the simulated cross-sectional view of Figure 1, and the radius of curvature is from 0.1 m to 10 mm. The occurrence of coating stains was investigated when various modifications were made and spin coating was performed on the coatings. Figure 3 shows the results. As can be seen from this figure, when the radius of curvature is small, many coating stains occur, and when the number of stains exceeds 1, #1 almost no stains occur. In addition, the upper limit of this radius of curvature may be appropriately determined depending on the thickness, size, and size of the recording image of the spin coating substrate used, and its shape can also be determined from the center hole from the substrate surface shown in Figure 1. In addition to the shape that connects to the inner circumferential surface, it may have a shape that smoothly connects the inner circumferential surface of the center hole from the surface of the base to the back surface of the base as shown in FIG. It is also possible to connect multiple values using different sizes.

〔発明の効果〕〔Effect of the invention〕

本発明の回転塗布用基体では、基体の塗布表面と中心孔
の内周面とが1m以上の曲率半径でつながっていること
により回転塗布する液状塗布剤の残留もなく、その結果
塗布シミの発生を防ぐことができる。この九め、例えば
情報メモリディスクの作製に本発明の回転塗布用基体を
用いることによりレジストが均一にムラなく塗布できる
ため、従来の塗布シミによるS/Nの劣化がおさえられ
た情報メモリディスクを得ることができる。
In the spin coating substrate of the present invention, since the coating surface of the substrate and the inner circumferential surface of the center hole are connected with a radius of curvature of 1 m or more, there is no residual liquid coating agent for spin coating, resulting in the occurrence of coating stains. can be prevented. Ninthly, for example, by using the spin coating substrate of the present invention in the production of information memory disks, the resist can be coated uniformly and evenly, so that information memory disks can be manufactured with less S/N deterioration caused by conventional coating stains. Obtainable.

〔発明の実施例〕[Embodiments of the invention]

回転塗布用基体として、外径350■、中心孔径20m
、厚さ6tsmのソーダガラスよりなる基板を用意した
。そして基体表面と中心孔の内周面とを曲率半径6■で
連続した形状に加工して第1図に示したような回転塗布
用基体としfc。
As a base for spin coating, outer diameter 350cm, center hole diameter 20m
A substrate made of soda glass with a thickness of 6 tsm was prepared. Then, the surface of the substrate and the inner circumferential surface of the center hole were processed into a continuous shape with a radius of curvature of 6 cm to obtain a substrate for spin coating as shown in FIG. 1 fc.

このような形状の基体を5枚用意し、まず界面活性剤の
水溶液で超音波洗浄後純水で洗浄を行ない、次いでイソ
プロピルアルコールを用いて脱水しフレオンTF(三井
フロロケミカル社裳:商品名)で乾燥した。次に、各々
の基体表面に有機系の密着剤(ヘキサメチルジシラザン
)を塗布し、その上に7オトレジストAZ−1350(
シラプレー社製:商品名)を回転数300 rpmで回
転塗布を行なった。形成されたレジスト膜厚はおよそ9
00Aであった。さらに、これら5枚のレジストを塗布
した基体を80℃で30分間乾燥し九後、塗布面上の塗
布シミの発生数を目視により計数した。この結果塗布シ
ミΩ発生は5枚とも全く認めることができなかった。こ
れに対して比較例として第4図に示したような基体の塗
布表面と中心孔の内周面とが所定の曲率を有した曲面で
つながれていない第4図に示した形状を有する基体を、
本発明の実施例と同一の大きさで5枚用意した。そして
これを上述したのと同様な工程でレジストを塗布した。
Five substrates of this shape were prepared, first ultrasonically cleaned with an aqueous surfactant solution, then purified water, and then dehydrated using isopropyl alcohol to form Freon TF (Mitsui Fluorochemical Co., Ltd.: trade name). It was dried. Next, an organic adhesive (hexamethyldisilazane) is applied to the surface of each substrate, and 7 Otoresist AZ-1350 (
Silapray Co., Ltd. (trade name) was spin-coated at a rotational speed of 300 rpm. The thickness of the formed resist film is approximately 9
It was 00A. Furthermore, these five resist-coated substrates were dried at 80° C. for 30 minutes, and then the number of coating stains on the coated surfaces was visually counted. As a result, no coating stains Ω could be observed on any of the five sheets. On the other hand, as a comparative example, a substrate having the shape shown in FIG. 4 in which the coated surface of the substrate and the inner peripheral surface of the center hole are not connected by a curved surface having a predetermined curvature was used. ,
Five sheets of the same size as the example of the present invention were prepared. Then, a resist was applied to this in the same process as described above.

本発明の実施例と同様に80℃で30分間乾燥した後、
へ1すり目視により塗布シミの発生数を計数したところ
、それぞれの塗布面上に5〜10箇所の塗布シミの発生
が認められた。
After drying at 80°C for 30 minutes in the same manner as in the examples of the present invention,
When the number of coating stains was counted by visual inspection, 5 to 10 coating stains were observed on each coated surface.

また、これらの本発明に係る回転塗布用基体を用いて作
製した光ディスク及び従来の基体を用いて作製した光デ
ィスクにそれぞれ同様な信号を記録し再生を行なったと
ころ、従来の光子】スフは本発明に係る光ディスクに比
べて顕著なS/Nの劣化が認められた。
In addition, when similar signals were recorded and reproduced on an optical disk manufactured using the spin coating substrate according to the present invention and an optical disk manufactured using a conventional substrate, it was found that the conventional photon film was not the same as that of the present invention. Significant S/N deterioration was observed compared to the optical disc according to the above.

【図面の簡単な説明】[Brief explanation of drawings]

第1図及び第2図は本発明に係る回転塗布用基体の一例
を表わした模擬断面図、 第3図は基板の塗布表面と中心孔の内周面とを結ぶ面の
曲率半径と発生する塗布シミの数との関係を表わし九特
性図、 第4図は従来の回転塗布用基体の形状を表わした模擬断
面図である。 1.4  ・・・・・・ 基板 2.5 ・・・・・・ 中心孔 3   ・・・・・・ 曲率をもたせた部分代理人弁理
士  則  近  憲  佑(ほか1名) 第2図
1 and 2 are simulated cross-sectional views showing an example of a spin coating substrate according to the present invention, and FIG. 3 shows the radius of curvature of the surface connecting the coating surface of the substrate and the inner peripheral surface of the center hole. 9 is a characteristic diagram showing the relationship with the number of coating stains. FIG. 4 is a simulated sectional view showing the shape of a conventional spin coating substrate. 1.4 ・・・・・・ Substrate 2.5 ・・・・・・ Center hole 3 ・・・・・・ Partial representative patent attorney with curvature Kensuke Chika (and 1 other person) Figure 2

Claims (2)

【特許請求の範囲】[Claims] (1)レジストを回転塗布する際に回転の中心となる中
心孔を有した情報メモリディスクのマスタ原盤作製に用
いる回転塗布用基体において、 前記中心孔の中心線を含む面で切断した前 記回転塗布用基体の断面の、前記中心孔の内周面に対応
する縁部とそれに続く前記回転塗布用基体の塗布表面に
対応する縁部とが、1mm以上の曲率半径をもって連続
していることを特徴とする回転塗布用基体。
(1) In a spin coating substrate used for producing a master master of an information memory disk, which has a center hole that serves as the center of rotation when applying resist by spin coating, the spin coating is cut along a plane that includes the center line of the center hole. The edge of the cross-section of the base for spin coating, which corresponds to the inner circumferential surface of the center hole, and the subsequent edge of the base for spin coating, which corresponds to the coating surface, are continuous with a radius of curvature of 1 mm or more. Substrate for spin coating.
(2)ガラスよりなることを特徴とした特許請求の範囲
第1項記載の回転塗布用基体。
(2) The spin coating substrate according to claim 1, which is made of glass.
JP6182785A 1985-03-28 1985-03-28 Substrate for spin coating Pending JPS61222043A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6182785A JPS61222043A (en) 1985-03-28 1985-03-28 Substrate for spin coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6182785A JPS61222043A (en) 1985-03-28 1985-03-28 Substrate for spin coating

Publications (1)

Publication Number Publication Date
JPS61222043A true JPS61222043A (en) 1986-10-02

Family

ID=13182312

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6182785A Pending JPS61222043A (en) 1985-03-28 1985-03-28 Substrate for spin coating

Country Status (1)

Country Link
JP (1) JPS61222043A (en)

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