JPS61211370A - Thin-film electrically conductive composition - Google Patents

Thin-film electrically conductive composition

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Publication number
JPS61211370A
JPS61211370A JP60052690A JP5269085A JPS61211370A JP S61211370 A JPS61211370 A JP S61211370A JP 60052690 A JP60052690 A JP 60052690A JP 5269085 A JP5269085 A JP 5269085A JP S61211370 A JPS61211370 A JP S61211370A
Authority
JP
Japan
Prior art keywords
organic polymer
thin film
complex
thin
org
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60052690A
Other languages
Japanese (ja)
Other versions
JPS6238386B2 (en
Inventor
Seizo Miyata
清蔵 宮田
Miki Asayama
浅山 幹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Priority to JP60052690A priority Critical patent/JPS61211370A/en
Publication of JPS61211370A publication Critical patent/JPS61211370A/en
Publication of JPS6238386B2 publication Critical patent/JPS6238386B2/ja
Granted legal-status Critical Current

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Abstract

PURPOSE:To provide a thin-film electrically conductive compsn. which contains metals which are independent of each other and uniformly and finely dispersed therein, exhibits electrical conductivity by the addition of a small quantity of a complex and is suitable for use as an antistatic membrane, by heat-treating an org. polymer compsn. contg. an organometal complex. CONSTITUTION:An org. polymer (e.g. polystyrene, polyvinyl chloride or polymethyl methacrylate) soluble in solvent and an organometallic complex [e.g. di-mu-chlorobis(eta-2-methylallyl)dipalladium complex] are uniformly dissolved in a solvent (e.g. hexane or methyl alcohol). The solvent is then removed by coating or spraying to form a thin-film org. polymer compsn. contg. the organometal complex. The compsn. is heat-treated at 50-400 deg.C to obtain a thin-film electrically conductive org. polymer compsn. having a thickness of 20mu or less and contg. metals which are independent of each other and uniformly and finely dispersed therein.

Description

【発明の詳細な説明】 本発明は、金属が互い、に独立し、且つ均一に微細分散
した有機重合体薄膜導電性組成物に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an organic polymer thin film conductive composition in which metals are independently and uniformly finely dispersed.

従来より、金属を分散した有機重合体導電性組成物は、
有機重合体に金属充填物同志が何等かの接触点を有する
ように多量に添加し導電性を付与している。
Traditionally, organic polymer conductive compositions with metal dispersed in them are
A large amount is added to the organic polymer so that the metal fillers have some contact points with each other to impart electrical conductivity.

従って、金属充填物が粒子の場合、有機重合体組成物が
導電性を示すようになるには多量の金属粒子を添加する
必要があり、この為有機重合体導電性組成物の成形性、
透明性及び各種物性等の低下を来している。
Therefore, when the metal filler is a particle, it is necessary to add a large amount of metal particles in order for the organic polymer composition to exhibit conductivity, and this reduces the moldability of the organic polymer conductive composition.
This results in a decrease in transparency and various physical properties.

又、金属充填物が繊維或いはフレーク状の場合、その添
加量は金属粒子に比しかなり低減されるが、有機重合体
導電性組成物の成形時における繊維或いはフレークの配
向、切断等により、導電性に方向性が現れたりして均一
な物性を有する成形品を得る事が困難である。
Furthermore, when the metal filler is in the form of fibers or flakes, the amount added is considerably lower than that of metal particles, but due to the orientation, cutting, etc. of the fibers or flakes during molding of the organic polymer conductive composition, the conductivity It is difficult to obtain molded products with uniform physical properties due to directional properties.

一方、特開昭57−202333号公報に開示されてい
るように、有機重合体中に金属充填物を互いに独立して
分散させると当然絶縁体となり誘電体としての用途が出
て来る。
On the other hand, as disclosed in Japanese Patent Application Laid-Open No. 57-202333, when metal fillers are dispersed independently of each other in an organic polymer, the polymer naturally becomes an insulator and can be used as a dielectric.

本発明者らは、有機金属錯体を含む有機重合体組成物を
加熱処理する事により、金属が互いに独立し、且つ均一
に微細分散した有機重合体薄膜組成物が得られ、該薄膜
組成物が意外にも導電性を示す事を見出し本発明を完成
した。
The present inventors have discovered that by heat-treating an organic polymer composition containing an organometallic complex, an organic polymer thin film composition in which metals are mutually independent and uniformly finely dispersed can be obtained; Surprisingly, they discovered that it exhibits electrical conductivity and completed the present invention.

本発明者らは、これらの現象を次のように邂釈している
The present inventors interpret these phenomena as follows.

即ち、有機金属錯体を有機重合体中に均一に溶解後、該
有機金属錯体を熱分解する事により生成した金属が互い
に独立し、且つ均一に微細分散した有機重合体薄膜組成
物は、有機重合体のガラス転移点近傍の温度以下では導
電率の変化がない事より、金属原子間で電子のトンネル
ホッピングが起こり導電性が発現したものと考えられる
That is, an organic polymer thin film composition in which metals produced by uniformly dissolving an organometallic complex in an organic polymer and then thermally decomposing the organometallic complex are independent of each other and uniformly finely dispersed, Since there is no change in electrical conductivity below the temperature near the glass transition point of coalescence, it is thought that tunnel hopping of electrons occurs between metal atoms and electrical conductivity is developed.

更に、本発明の有機重合体薄膜導電性組成物の導電率は
、有機重合体のガラス転移点近傍で可逆的且つ不連続な
値を示す事も判明した。
Furthermore, it has been found that the conductivity of the organic polymer thin film conductive composition of the present invention exhibits reversible and discontinuous values near the glass transition point of the organic polymer.

本発明の金属が互いに独立し、且つ均一に微細分散した
有機重合体薄膜導電性組成物は、有機金属錯体と有機重
合体とを含む均一溶液を調製し、溶媒を除去する事によ
り有機金属錯体を含む有機重合体薄膜組成物とした後、
該組成物を加熱処理する事により製造する事が出来る。
The organic polymer thin film conductive composition of the present invention in which metals are mutually independent and uniformly finely dispersed can be obtained by preparing a homogeneous solution containing an organometallic complex and an organic polymer, and removing the solvent. After forming an organic polymer thin film composition containing
It can be manufactured by heat-treating the composition.

以下、本発明について詳細に説明する。The present invention will be explained in detail below.

本発明に使用される有機金属錯体は、溶媒に対し溶解性
を示し、且つ加熱により金属を遊離するものが選ばれ、
一般式M、L、(mは1〜4、nは2〜12までの整数
)で示される。
The organometallic complex used in the present invention is selected from one that exhibits solubility in a solvent and releases metal upon heating,
It is represented by the general formula M, L, (m is an integer from 1 to 4, and n is an integer from 2 to 12).

金属Mは周期率表IVa 、Vs −、VIA 、■4
、■及び■、族の各金属であり、チタン、ジルコニウム
、バナジウム、クロム、モリブデン、タングステン、マ
ンガン、レニウム、鉄、コバルト、ニッケル、ルテニウ
ム、オスミウム、ロジウム、パラジウム、イリジウム、
白金、銅、銀及び金等が好ましい。
Metal M is on the periodic table IVa, Vs -, VIA, ■4
, ■ and ■, each metal of group titanium, zirconium, vanadium, chromium, molybdenum, tungsten, manganese, rhenium, iron, cobalt, nickel, ruthenium, osmium, rhodium, palladium, iridium,
Platinum, copper, silver, gold, etc. are preferred.

配位子しは、−例を示すならば第三級ホスフィ゛ン、第
三級ホスファイト、−酸化炭素、直鎖或いは環状オレフ
ィン、共役オレフィン、アリール化合物、有機シアノ化
合物、有機イソニトリル化合物及び有°機メルカプト化
合物並びにアルキル基、ビニル基、アリル基、エチリジ
ン基及びアシル基を有する化合物等の一種以上の組合せ
より選ぶ事が出来、更にはハロゲン、酸素、水素、窒素
等の原子でも良い。
Ligands include, for example, tertiary phosphines, tertiary phosphites, carbon oxides, linear or cyclic olefins, conjugated olefins, aryl compounds, organic cyano compounds, organic isonitrile compounds, and It can be selected from combinations of one or more of mercapto compounds and compounds having alkyl groups, vinyl groups, allyl groups, ethyridine groups, and acyl groups, and may also be atoms such as halogen, oxygen, hydrogen, and nitrogen.

本発明に使用される重合体は溶媒に可溶な重合体である
必要があり、−例を示すとポリスチレン、ポリアミド、
ポリカーボネート、ポリサルホン、ポリエーテルサルホ
ン、ポリメチルメタクリレート、ポリ塩化ビニール、ポ
リ弗化ビニリデン及びABS樹脂等の熱可塑性樹脂、ジ
アリルフタレート樹脂、不飽和ポリエステル樹脂、フェ
ノール樹脂、エポキシ樹脂及びポリイミド樹脂等の未硬
化熱硬化性樹脂、更にはシリコーン樹脂、ポリウレタン
樹脂及びスチレンブタジェンゴム等のゴム状未加硫樹脂
等が挙げられる。
The polymer used in the present invention must be soluble in the solvent - examples include polystyrene, polyamide,
Thermoplastic resins such as polycarbonate, polysulfone, polyethersulfone, polymethyl methacrylate, polyvinyl chloride, polyvinylidene fluoride and ABS resins, diallyl phthalate resins, unsaturated polyester resins, phenolic resins, epoxy resins and polyimide resins. Examples include cured thermosetting resins, as well as rubber-like unvulcanized resins such as silicone resins, polyurethane resins, and styrene-butadiene rubber.

本発明の有機金属錯体及び有機重合体の溶解に使用され
る溶媒は、有機金属錯体と有機重合体を安定に且つ均一
に溶解するものであれば良い。
The solvent used for dissolving the organometallic complex and organic polymer of the present invention may be any solvent as long as it can stably and uniformly dissolve the organometallic complex and organic polymer.

例えば、ヘキサン、シクロヘキサン、ベンゼン、トルエ
ン、キシレン、メチルアルコール、エチルアルコール、
イソプロピルアルコール、エチルエーテル、ジオキサン
、酢酸エチル、クロロホルム、四塩化炭素、ジクロロエ
タン、トリクロロエタン、アセトン、メチルエチルケト
ン、ピリジン、アセト、ニトリル、ジメチルホルムアミ
ド、ジメチルスルホキシド等が挙げられ、これらは単独
又は2種以上を混合して使用する事も出来る。
For example, hexane, cyclohexane, benzene, toluene, xylene, methyl alcohol, ethyl alcohol,
Examples include isopropyl alcohol, ethyl ether, dioxane, ethyl acetate, chloroform, carbon tetrachloride, dichloroethane, trichloroethane, acetone, methyl ethyl ketone, pyridine, acetate, nitrile, dimethylformamide, dimethyl sulfoxide, etc., which may be used alone or in combination of two or more. It can also be used as

有機金属錯体と有機重合体とを含む均一溶液は、有機金
属錯体と有機重合体を適当な溶媒に溶解したり、有機金
属錯体溶液と有機重合体溶液を均一に混合したりして調
製する事が出来る。
A homogeneous solution containing an organometallic complex and an organic polymer can be prepared by dissolving the organometallic complex and organic polymer in an appropriate solvent or uniformly mixing the organometallic complex solution and the organic polymer solution. I can do it.

該均一溶液の調製は、通常有機金属錯体の分解があまり
進行しない温度で行う事が好ましい。
Preparation of the homogeneous solution is usually preferably carried out at a temperature at which decomposition of the organometallic complex does not proceed much.

又、使用目的に応じ他の安定剤、可塑剤及び着色剤等の
添加物も任意に添加する事が出来る。
In addition, other additives such as stabilizers, plasticizers, and colorants can be optionally added depending on the purpose of use.

このようにして調製した有機金属錯体と有機重合体とを
含む均一溶液を使用し、コーティング法、キャスチング
法、スプレー法、スピナー法及びディッピング法等によ
り成膜し、溶媒を除去する事により有機金属錯体を含む
有機重合体薄膜組成物が得られる。
Using the homogeneous solution containing the organometallic complex and organic polymer prepared in this way, a film is formed by a coating method, a casting method, a spray method, a spinner method, a dipping method, etc., and the organometallic complex is formed by removing the solvent. An organic polymer thin film composition containing the complex is obtained.

この有機金属錯体を含む有機重合体薄膜組成物を有機金
属錯体の熱分解が充分進行する温度に加熱する事により
、金属が互いに独立し、且つ均一に微細分散した有機重
合体薄膜導電性組成物を得る事が出来る。
By heating the organic polymer thin film composition containing this organometallic complex to a temperature at which the thermal decomposition of the organometallic complex sufficiently proceeds, an organic polymer thin film conductive composition in which the metals are mutually independent and uniformly finely dispersed is obtained. can be obtained.

該有機金属錯体の熱分解温度は、金属の遊離反応が進行
する温度が選ばれる。一般に50〜400℃、通常10
0〜250℃の温度が採用されるが、重合体の熱分解が
進行しない温度が選ばれる。
The thermal decomposition temperature of the organometallic complex is selected to be a temperature at which the metal release reaction proceeds. Generally 50-400℃, usually 10
Temperatures from 0 to 250° C. are employed, and the temperature is selected so that thermal decomposition of the polymer does not proceed.

有機重合体薄膜導電性組成物中の金属含有量は、0.0
01〜40体積%の範囲が有効であり、特に0.002
〜5体積%が好ましい。
The metal content in the organic polymer thin film conductive composition is 0.0
A range of 0.01 to 40% by volume is effective, especially 0.002
~5% by volume is preferred.

又、この場合、透明な有機重合体薄膜導電性組成物が得
られる特徴を有する。
Moreover, this case has the characteristic that a transparent organic polymer thin film conductive composition can be obtained.

更に、金属含有量が0.001体積%未満では導電性が
小さく、40体積%を越えると賦形性に乏しくなる。
Further, if the metal content is less than 0.001% by volume, the conductivity will be low, and if it exceeds 40% by volume, the shapeability will be poor.

本発明の有機重合体薄膜導電性組成物の膜厚は、0.1
〜20μであり、好ましくは1〜10μである。
The film thickness of the organic polymer thin film conductive composition of the present invention is 0.1
-20μ, preferably 1-10μ.

0゜1g未満の場合、ピンホール等の発生により均一な
薄膜の製造が困難となり、一方20μを越えると薄膜組
成物は大きな抵抗値を持ち誘電性を示すようになる。
If it is less than 0.1 g, it will be difficult to produce a uniform thin film due to the occurrence of pinholes, etc., while if it exceeds 20 μ, the thin film composition will have a large resistance value and exhibit dielectric properties.

本発明の有機重合体薄膜導電性組成物の用途としては、
帯電防止膜(クリーンルームの壁や床)、液晶用透明電
極、ICパッケージ等、ガラス転移点における導電率の
変化を利用したスイッチング素子等が挙げられる。
Applications of the organic polymer thin film conductive composition of the present invention include:
Examples include antistatic films (walls and floors of clean rooms), transparent electrodes for liquid crystals, IC packages, and switching elements that utilize changes in conductivity at the glass transition point.

更に、本発明の有機重合体薄膜導電性組成物は、例えば
金属の存在下重合性有機単量体をプラズマ重合して製造
する事も出来る。
Furthermore, the organic polymer thin film conductive composition of the present invention can also be produced, for example, by plasma polymerizing a polymerizable organic monomer in the presence of a metal.

以下に、本発明を実施例を挙げて説明するが、本発明は
これらに限定されるものではない。
The present invention will be described below with reference to Examples, but the present invention is not limited thereto.

実施例1 ジ−μmクロロ−ビス(η−2−メチルアリル)ニパラ
ジウム(n)錯体を、ポリカーボネート(三菱瓦斯化学
KK製、ニーピロンS−2000)2.5gをクロロホ
ルム40 m lに溶解した溶液に加え、ポリカーボネ
ートに対しパラジウム金属として各々0.1重量%、1
重量%及び10重量%の溶液を調製した。
Example 1 Di-μm chloro-bis(η-2-methylallyl)nipalladium(n) complex was added to a solution of 2.5 g of polycarbonate (Nipilon S-2000, manufactured by Mitsubishi Gas Chemical KK) dissolved in 40 ml of chloroform. In addition, 0.1% by weight and 1% by weight of palladium metal, respectively, based on polycarbonate.
% and 10% by weight solutions were prepared.

これらの溶液に、金を蒸着したガラス板を浸漬し一定速
度で引き上げ成膜した。次に60℃で24時間乾燥後、
200℃で加熱処理を行いパラジウム金属を遊離させた
。このガラス板上に生成したパラジウム金属含有ポリカ
ーボネート薄膜組成物の膜厚は約6μで、パラジウム金
属含有量は、各々約0.01体積%、0.1体積%及び
1体積%であった。
A glass plate coated with gold was immersed in these solutions and pulled up at a constant speed to form a film. Next, after drying at 60°C for 24 hours,
A heat treatment was performed at 200°C to liberate palladium metal. The thickness of the palladium metal-containing polycarbonate thin film composition produced on this glass plate was about 6 μm, and the palladium metal contents were about 0.01% by volume, 0.1% by volume, and 1% by volume, respectively.

次に、このパラジウム金属含有ポリカーボネート薄膜組
成物の上面に金を蒸着し電極を形成した後、膜の両面間
で導電率(室温)を測定した。その結果を表1に示した
Next, gold was deposited on the top surface of this palladium metal-containing polycarbonate thin film composition to form an electrode, and then the electrical conductivity (at room temperature) was measured between both surfaces of the film. The results are shown in Table 1.

又、パラジウム金属含有量が1重量%(約0゜1体積%
)のポリカーボネート薄膜組成物の導電率の温度変化は
、図1に示すようにポリカーボネートのガラス転移点近
傍で変化した。
In addition, the palladium metal content is 1% by weight (approximately 0.1% by volume).
) The conductivity of the polycarbonate thin film composition changed with temperature near the glass transition point of the polycarbonate, as shown in FIG.

実施例2 実施例1と同様にして、ポリカーボネート(三菱瓦斯化
学KK製、ニーピロンS−2000)に対し、ダニμm
クロロ−ビス(η−2−メチlレアリル)ニパラジウム
(If)錯体をパラジウム金属として1重量%含有する
クロロホルム溶液を調製した。この溶液に金を蒸着した
ガラス板を浸漬し一定速度で引き上げる操作を繰返し、
パラジウム金属含有量が1重量%(約0.1体積%)で
膜厚が各々約6μ、10μ、12μ、25μ、39μ及
び44μのポリカーボネート薄膜組成物を作製後、導電
率(室温)を測定した。
Example 2 In the same manner as in Example 1, polycarbonate (manufactured by Mitsubishi Gas Chemical KK, Kneepilon S-2000) was treated with mites μm.
A chloroform solution containing 1% by weight of chloro-bis(η-2-methylrealyl)nipalladium (If) complex as palladium metal was prepared. A glass plate coated with gold is dipped in this solution and pulled up at a constant speed repeatedly.
After preparing polycarbonate thin film compositions with a palladium metal content of 1% by weight (approximately 0.1% by volume) and film thicknesses of approximately 6μ, 10μ, 12μ, 25μ, 39μ, and 44μ, respectively, the conductivity (room temperature) was measured. .

導電率は、図2に示すように膜厚が20μを越えると小
さくなった。
As shown in FIG. 2, the conductivity decreased when the film thickness exceeded 20 μm.

表1 実施例3 ジ−μmクロロ−ビス(η−2−メチルアリル)ニパラ
ジウムl)錯体を、ポリメチルメタクリレート(東京化
成KK製、試薬1級、重合度7000〜7500)2.
5gをクロロホルム40mlに溶解した溶液に加え、ポ
リメチルメタクリレートに対しパラジウム金属として1
0重量%の溶液を調製した。
Table 1 Example 3 A di-μm chloro-bis(η-2-methylallyl)nipalladium l) complex was prepared using polymethyl methacrylate (manufactured by Tokyo Kasei KK, reagent grade 1, degree of polymerization 7000-7500).
Add 5 g of palladium metal to a solution of 40 ml of chloroform and add 1
A 0% by weight solution was prepared.

次に、実施例1と同様すして、膜厚が約6μでパラジウ
ム金属含有量が10重量%(約1体積%)のポリメチル
メタクリレート薄膜組成物を作製し、熱処理後金電極の
形成を行い導電率(室温)を測定した。その導電率は3
 X 10−’Scm−’であった。
Next, in the same manner as in Example 1, a polymethyl methacrylate thin film composition with a film thickness of about 6 μm and a palladium metal content of 10% by weight (about 1% by volume) was prepared, and after heat treatment, a gold electrode was formed. Electrical conductivity (room temperature) was measured. Its conductivity is 3
X 10-'Scm-'.

尚、パラジウム金属を含有しないポリメチルメタクリレ
ート薄膜の導電率は、lXl0−”S■−1であった。
The conductivity of the polymethyl methacrylate thin film containing no palladium metal was 1X10-''S-1.

又、このパラジウム金属含有ポリメチルメタクリレート
薄膜組成物の導電率の温度変化は、図3に示すようにポ
リメチルメタクリレートのガラス転移点近傍で変化した
Further, the electrical conductivity of this palladium metal-containing polymethyl methacrylate thin film composition changed with temperature near the glass transition point of polymethyl methacrylate, as shown in FIG.

実施例4 実施例1と同様にして、ポリカーボネート(三菱瓦斯化
学KK製、ニーピロンS−2000>に対し、ベンジル
クロロビス(トリフェニルホスフィン)パラジウム(n
)錯体をパラジウム金属として1重量%含有するクロロ
ホルム溶液を調製した。
Example 4 In the same manner as in Example 1, benzylchlorobis(triphenylphosphine)palladium (n
) A chloroform solution containing 1% by weight of the complex as palladium metal was prepared.

次に、実施例1と同様にして、膜厚が約6μでパラジウ
ム金属含有量が1重量%(約0.1体積%)のポリカー
ボネート薄膜組成物を作製し、180℃で熱処理を行い
金電極を形成後導電率(室温)を測定した。導電率は1
 、 7 X 10−70−7S’であった。
Next, in the same manner as in Example 1, a polycarbonate thin film composition having a film thickness of approximately 6 μm and a palladium metal content of 1% by weight (approximately 0.1% by volume) was prepared, and heat treated at 180°C to form a gold electrode. After forming, the conductivity (room temperature) was measured. conductivity is 1
, 7 X 10-70-7S'.

尚、パラジウム金属を含有しないポリカーボネート薄膜
の導電率は、I X 10−0−1hSe’であった。
Incidentally, the electrical conductivity of the polycarbonate thin film containing no palladium metal was I x 10-0-1hSe'.

実施例5 実施例1と同様にして、ポリカーボネート(三菱瓦斯化
学KK製、ニーピロンS−2000)に対し、ジ−8−
クロローテトラカルボニルニロジウム(1)錯体をロジ
ウム金属として1重量%含有するクロロホルム溶液を調
製した。
Example 5 In the same manner as in Example 1, G-8-
A chloroform solution containing 1% by weight of chlorotetracarbonylnirhodium (1) complex as rhodium metal was prepared.

次に、実施例1と同様にして、膜厚が約6μでロジウム
金属含有量が1重量%(約0.1体積%)のポリカーボ
ネート薄膜組成物を作製し、200℃で熱処理を行い金
電極を形成後導電率(室温)を測定した。導電率は3.
 5 X I Q−’3cm−’であった。
Next, in the same manner as in Example 1, a polycarbonate thin film composition having a film thickness of approximately 6 μm and a rhodium metal content of 1% by weight (approximately 0.1% by volume) was prepared, and heat treated at 200°C to form a gold electrode. After forming, the conductivity (room temperature) was measured. The conductivity is 3.
5XIQ-'3cm-'.

尚、パラジウム金属を含有しないポリカーボネート薄膜
の導電率は、I X 10−16Sai−’であった。
Incidentally, the electrical conductivity of the polycarbonate thin film containing no palladium metal was I x 10-16Sai-'.

【図面の簡単な説明】[Brief explanation of the drawing]

図1は、実施例1におけるパラジウム金属含有量が1重
量%(約0.1体積%)のポリカーボネート薄膜組成物
の導電率の温度変化、図2は、実施例2におけるパラジ
ウム金属含有量が1重量%(約0.1体積%)のポリカ
ーボネート薄膜組成物の導電率の膜厚に対する変化及び
図3は、実施例3におけるパラジウム金属含有量が10
重量%(約1体積%)のポリメチルメタクリレート薄膜
組成物の導電率の温度変化を示す。
FIG. 1 shows the temperature change in electrical conductivity of a polycarbonate thin film composition with a palladium metal content of 1% by weight (approximately 0.1% by volume) in Example 1, and FIG. Figure 3 shows the change in electrical conductivity of the polycarbonate thin film composition by weight (approximately 0.1 volume %) with respect to the film thickness.
Figure 3 shows the temperature change in electrical conductivity of a weight percent (approximately 1 volume percent) polymethyl methacrylate thin film composition.

Claims (1)

【特許請求の範囲】 1、互いに独立し、且つ均一に微細分散した金属を含有
する厚さ20μ以下の有機重合体薄膜導電性組成物。 2、有機重合体中の有機金属錯体を加熱処理する事によ
り、互いに独立し、且つ均一に微細分散した金属とする
事を特徴とする特許請求の範囲第1項記載の有機重合体
薄膜導電性組成物。
[Scope of Claims] 1. An organic polymer thin film conductive composition having a thickness of 20 μm or less, containing metals that are mutually independent and uniformly finely dispersed. 2. The conductivity of an organic polymer thin film according to claim 1, characterized in that the organic metal complexes in the organic polymer are heat-treated to form metals that are mutually independent and uniformly finely dispersed. Composition.
JP60052690A 1985-03-15 1985-03-15 Thin-film electrically conductive composition Granted JPS61211370A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60052690A JPS61211370A (en) 1985-03-15 1985-03-15 Thin-film electrically conductive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60052690A JPS61211370A (en) 1985-03-15 1985-03-15 Thin-film electrically conductive composition

Publications (2)

Publication Number Publication Date
JPS61211370A true JPS61211370A (en) 1986-09-19
JPS6238386B2 JPS6238386B2 (en) 1987-08-18

Family

ID=12921882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60052690A Granted JPS61211370A (en) 1985-03-15 1985-03-15 Thin-film electrically conductive composition

Country Status (1)

Country Link
JP (1) JPS61211370A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0637072A2 (en) * 1993-07-26 1995-02-01 AT&T GLOBAL INFORMATION SOLUTIONS INTERNATIONAL INC. Spin-on conductor process for integrated circuits
WO2023102063A1 (en) * 2021-11-30 2023-06-08 L'air Liquide, Societe Anonyme Pourl'etude Et L'exploitation Des Procedes Georges Claude Deposition of noble metal islets or thin films for its use for electrochemical catalysts with improved catalytic activity

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0637072A2 (en) * 1993-07-26 1995-02-01 AT&T GLOBAL INFORMATION SOLUTIONS INTERNATIONAL INC. Spin-on conductor process for integrated circuits
EP0637072A3 (en) * 1993-07-26 1995-05-03 At & T Global Inf Solution Spin-on conductor process for integrated circuits.
WO2023102063A1 (en) * 2021-11-30 2023-06-08 L'air Liquide, Societe Anonyme Pourl'etude Et L'exploitation Des Procedes Georges Claude Deposition of noble metal islets or thin films for its use for electrochemical catalysts with improved catalytic activity

Also Published As

Publication number Publication date
JPS6238386B2 (en) 1987-08-18

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