JPS6120910A - Optical coupler and its production - Google Patents

Optical coupler and its production

Info

Publication number
JPS6120910A
JPS6120910A JP14271184A JP14271184A JPS6120910A JP S6120910 A JPS6120910 A JP S6120910A JP 14271184 A JP14271184 A JP 14271184A JP 14271184 A JP14271184 A JP 14271184A JP S6120910 A JPS6120910 A JP S6120910A
Authority
JP
Japan
Prior art keywords
plate
axis
optical
lithium niobate
optical waveguide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14271184A
Other languages
Japanese (ja)
Inventor
Kazuhisa Yamamoto
和久 山本
Tetsuo Taniuchi
哲夫 谷内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP14271184A priority Critical patent/JPS6120910A/en
Publication of JPS6120910A publication Critical patent/JPS6120910A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/42Coupling light guides with opto-electronic elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/26Optical coupling means
    • G02B6/30Optical coupling means for use between fibre and thin-film device

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Coupling Of Light Guides (AREA)

Abstract

PURPOSE:To obtain an efficient optical coupler by allowing the light to be incident on and be discharged from a smoothly worked plane of cleavage of a lithium niobate Z plate (a substrate having a surface cut vertically to the Z axis) where an optical waveguide is formed. CONSTITUTION:An optical waveguide 2 is formed by Ti thermal diffusion on a lithium niobate Z plate (a substrate having a surface cut vertically to the Z axis) 1 so that an angle theta to the Y axis is 57 deg., and this Z plate 1 is treated with a mixed liquid of a fluoric acid and a nitric acid (=2:1) at about 110 deg.C for about 5min to form an end part 6 of a (01.2) face 5 into a shape curved with a certain curvature. A semiconductor laser 7 is approximated to this end part 6 to make the light incident on it, and about 60% high coupling efficiency is the reflection loss is not taken into consideration. In another method, the optical waveguide 2 is produced on the lithium niobate Z plate 1 by ion exchange in a benzoic acid, and a single mode optical fiber 8 has the optical axis aligned to the end part 6, which is obtained by cleaving the plate 1 along the (01.2) face and etching it, and is coupled to the end part 6 to obtain 60% coupling efficiency; and thus, direct coupling is performed easily without lenses.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は情報処理分野あるいは光通信、光応用計測制御
分野に便用される光導波路とレーザおよびファイバの結
合を可能にする光結゛合器および光結合器の製造方法に
関するものである。゛従来例の構成とその問題点 従来ニオブ酸リチウム上に光導波路を設け、光スィッチ
、光変調器、第2高調波発生素子などが構成されている
。この場合ニオブ酸リチウムX板(X軸と垂直に切断し
た面を持つ基板)やY@Y軸と垂直に切断した面を持つ
基板)に光導波路を形成したものでは拡散またはイオン
変換によシ光導波路を形成する際、導波路形状が横方向
に広がってしまうという欠点があった。これを避けるた
め、深さ方向に導波路形成が各易なニオブ酸リチウム2
板(Z軸と垂直に切断した面を持つ基板)が数多く用い
られてきた。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an optical coupler and an optical coupler that enable the coupling of an optical waveguide, a laser, and a fiber, which are conveniently used in the information processing field, optical communication, and optical applied measurement and control field. The present invention relates to a method for manufacturing an optical coupler.゛Structure of conventional example and its problems Conventionally, an optical waveguide is provided on lithium niobate, and an optical switch, an optical modulator, a second harmonic generation element, etc. are configured. In this case, if the optical waveguide is formed on a lithium niobate X plate (a substrate with a surface cut perpendicular to the When forming an optical waveguide, there is a drawback that the shape of the waveguide expands in the lateral direction. In order to avoid this, lithium niobate2, which is easy to form a waveguide in the depth direction,
Many plates (substrates with a surface cut perpendicular to the Z axis) have been used.

上記の光導波路に光を入射および出射する方法として用
いられているものにプリズムカップラーによる方法、グ
レーティングカップ2−による方法、端面研磨による方
法がある。このうちプリズムカップラーによる方法は三
次元導波路に対して入射が困難なうえ、基板上にプリズ
ムを密着させねばならず素子全体が大きくなるなど数多
くの実用上困難な点を有していた。またグレーティング
カッグラ−による方法については作製が困難であるため
結合効率が低いものしか得られていないという現状であ
る。現時点で最も広く用いられているのが端面研磨によ
る方法である。
Methods used for making light enter and exit the optical waveguide include a method using a prism coupler, a method using a grating cup 2-, and a method using end face polishing. Among these methods, the method using a prism coupler has many practical difficulties, such as the difficulty of making the light incident on a three-dimensional waveguide, and the fact that the prism must be brought into close contact with the substrate, which increases the size of the entire device. In addition, the method using a grating kaglar is difficult to manufacture, so that only a method with a low coupling efficiency can be obtained. At present, the most widely used method is edge polishing.

以下端面Meについて図面を用いて説明する。The end surface Me will be explained below using the drawings.

第1図はニオブ酸リチウムの端面研磨について説明を行
うための断面図である。1はニオブ酸リチウム基板、2
は光導波路、3は光学研磨された端面である。ニオブ酸
リチウム基板1の光導波路2が形成されている面に同図
(a)に示すように同材質のやとい1′を密着させて光
学研磨を行うのであるが、第1図(b)に示されるよう
にやとい1′の密着が悪いと面ダレ4を生じ結合効率が
低下する。また第1図(C)K示されるように光導波路
2に端面3が垂直でなければ結合効率が低下する。以上
のように端面研磨による方法は難しいうえに光学研磨を
行うため手間と時間がかかるなど数多くの問題点をゼし
ている。
FIG. 1 is a sectional view for explaining end face polishing of lithium niobate. 1 is a lithium niobate substrate, 2
is an optical waveguide, and 3 is an optically polished end face. As shown in FIG. 1(a), optical polishing is performed by bringing a Yato 1' made of the same material into close contact with the surface of the lithium niobate substrate 1 on which the optical waveguide 2 is formed, and as shown in FIG. 1(b). As shown in FIG. 2, if the adhesion of the Yato 1' is poor, surface sag 4 will occur and the coupling efficiency will decrease. Further, as shown in FIG. 1C, if the end face 3 is not perpendicular to the optical waveguide 2, the coupling efficiency will decrease. As described above, the method of polishing the end face is difficult and has many problems, such as being laborious and time-consuming because it involves optical polishing.

これに対してInk、GaAsなどを用いた元素子で襞
間が用いられておシ、ニオブ酸リチウムでもX板に関し
ては劈開面(01,2)よシ光入射の報告が得られてい
る(1.P、Kaminow and etc、J、A
pplPhys 51(8)August 1980 
F4379〜4384)。
On the other hand, it has been reported that light is incident from the cleavage plane (01, 2) on the X plate in element elements made of Ink, GaAs, etc., where folds are used, and in the case of lithium niobate ( 1. P, Kaminow and etc, J, A
pplPhys 51(8) August 1980
F4379-4384).

第2図は前記報告によるニオブ酸リチウムの襞間面、即
ち(01,2)面と各軸の関係を示した斜視図および断
面図である。ニオブ酸リチウムは三方晶系に属する結晶
で軸としてはa1ja2$a3と光学軸と呼ばれるC軸
を持つ。このうちa1軸をX軸。
FIG. 2 is a perspective view and a sectional view showing the relationship between the interfold plane, that is, the (01,2) plane, and each axis of lithium niobate according to the above report. Lithium niobate is a crystal belonging to the trigonal system and has axes a1ja2$a3 and a C axis called the optical axis. Of these, the a1 axis is the X axis.

C軸をZ軸、そしてC軸を中心にal  軸から90゜
回転させた軸をY軸としている。第2図(a)よシ劈開
面である( o 1.2)面6は第2図0))における
ニオブ酸リチウムZ板1ではY軸との角度θが57度と
なるため光導波路2への光入射が不可能である。
The C axis is the Z axis, and the axis rotated 90 degrees from the al axis around the C axis is the Y axis. In the lithium niobate Z plate 1 in the cleavage plane (o 1.2) plane 6 as shown in FIG. 2(a), the angle θ with the Y axis is 57 degrees, so the optical waveguide 2 It is impossible for light to enter.

発明の目的 本発明の目的は上記の欠点を除去しニオブ酸リチウム光
導波路への光結合を簡単にしかも高効率で実現する光結
合器およびその製造方法を提供することにある。
OBJECTS OF THE INVENTION An object of the present invention is to provide an optical coupler and a method for manufacturing the same, which eliminates the above-mentioned drawbacks and realizes optical coupling to a lithium niobate optical waveguide simply and with high efficiency.

発明の構成 本発明の光結合器は、光導波路が形成されたニオブ酸り
゛チウムZ板のなめらかに加工された襞間面より光の入
射および出射を行う構−成となる。
DESCRIPTION OF THE INVENTION The optical coupler of the present invention has a structure in which light enters and exits from smoothly processed interfold surfaces of a niobate Z plate on which an optical waveguide is formed.

また本発明の光結合器の製造方法は、光導波路が形成さ
れたニオブ酸リチウムz板の襞間面で襞間を行い、さら
にエツチングを施すこととなる。
Further, in the method of manufacturing an optical coupler of the present invention, the interfold surface of the lithium niobate Z plate on which the optical waveguide is formed is interfolded, and then etched.

また本発明の光結合器およびその製造方法は勇・開面と
して(01,2)面を使用した構成となる。
Further, the optical coupler and the method for manufacturing the same according to the present invention have a configuration in which the (01,2) plane is used as the open and open planes.

実施例の説明 本発明の実施例を以下図面を用いて説明する。Description of examples Embodiments of the present invention will be described below with reference to the drawings.

第3図は本発明による光結合器の製造方法の実施例を示
す斜視図である。第3図(a)で1はニオブ酸リチウム
Z板、2はTi  を熱拡散して−Z面上に作製した光
導波路である。またこの光導波路2はY軸方向に作製さ
れており幅8μm、深さ2μmである。5は(01,2
)面で襞間によ多形成されておりY軸との角度θは67
度である。次にフッ硝酸混液(フッ酸:硝酸=2:1)
を110℃程度に加熱したものに上記ニオブ酸リチウム
2板1を6分根度浸しエツチングを行った。以上のよう
に製造を行った結果第3図Φンの口・−うK (01’
、2)面5の端部6が一定の曲率で湾曲した形状ものが
得られた。
FIG. 3 is a perspective view showing an embodiment of the method for manufacturing an optical coupler according to the present invention. In FIG. 3(a), 1 is a lithium niobate Z plate, and 2 is an optical waveguide fabricated on the -Z plane by thermally diffusing Ti. Further, this optical waveguide 2 is fabricated in the Y-axis direction and has a width of 8 μm and a depth of 2 μm. 5 is (01,2
) surface is formed between the folds, and the angle θ with the Y axis is 67
degree. Next, a hydrofluoric acid mixture (hydrofluoric acid: nitric acid = 2:1)
The above-mentioned lithium niobate 2 plate 1 was immersed for 6 minutes in a solution heated to about 110° C. for etching. The result of manufacturing as described above is shown in Figure 3.
, 2) A shape in which the end portion 6 of the surface 5 was curved with a constant curvature was obtained.

第4図は上記製造された光結合器と半導体レーザを結合
させた場合の構成図である。ニオブ酸リチウムZ板1上
に形成された光導波路2の(01,2)面5の球状とな
った端部6に半導体レーザ7を近接させ光を入射した。
FIG. 4 is a configuration diagram when the optical coupler manufactured above and a semiconductor laser are coupled. A semiconductor laser 7 was brought close to the spherical end 6 of the (01,2) plane 5 of the optical waveguide 2 formed on the lithium niobate Z plate 1, and light was incident thereon.

結合効率は反射損を除くと60%であった。このように
半導体レーザと光導波路の結合においてレンズを心安と
せずしかも高効率で結合が可能となる。
The coupling efficiency was 60% excluding reflection loss. In this way, the semiconductor laser and the optical waveguide can be coupled with high efficiency without using a lens.

第6図は本発明による光結合器の他の実施例と元ファイ
バとの結合を示す構成図である。ニオブ酸リチウム1上
に光導波路2を安息香酸中でイオン変換を行い作製した
。光導波路2は幅6μm深さ3μmで、伝搬方向はy軸
方向である。上記光導波路を(01,2)面で襞間しエ
ツチングを行い球状となった端部6を得た。これにコア
径6μmのシングルモード光ファイバ8を光軸合せして
結合させた。また端部6には反射防止膜が施しである。
FIG. 6 is a block diagram showing the coupling between another embodiment of the optical coupler according to the present invention and the original fiber. An optical waveguide 2 was fabricated on lithium niobate 1 by performing ion conversion in benzoic acid. The optical waveguide 2 has a width of 6 μm and a depth of 3 μm, and the propagation direction is the y-axis direction. The optical waveguide was folded and etched on the (01,2) plane to obtain a spherical end 6. A single mode optical fiber 8 having a core diameter of 6 μm was coupled to this with its optical axis aligned. Further, the end portion 6 is coated with an anti-reflection coating.

実験の結果80%の結合効率を得た。As a result of the experiment, a binding efficiency of 80% was obtained.

なお本実施例では襞間面として(01,2)面を用いた
がY軸に対して2o度〜70度の範囲で劈開される面で
あれば良い。またエツチング液、エツチング温度、エツ
チング時間は本詳細な説明中に示されたものに限ること
はない。
In this embodiment, the (01,2) plane is used as the interfold plane, but any plane that is cleaved at an angle of 20 degrees to 70 degrees with respect to the Y axis may be used. Furthermore, the etching solution, etching temperature, and etching time are not limited to those shown in this detailed description.

見開の効果 以上本発明によると簡単に高効率の光結合器が製造でき
る。またレンズを用いず直接ファイバ。
As described above, according to the present invention, a highly efficient optical coupler can be manufactured easily. Also, direct fiber without using a lens.

半導体レーザと結合できる。Can be combined with semiconductor laser.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)〜(C)は従来のニオブ酸リチウムの端面
研磨について説明を行うための要部概略断面図、第2図
(a) 、 (b)はニオブ酸リチウムの劈開面である
(01.2)面と各軸の関係を示した斜視図および断面
図、第3図(a) 、 (b)は本発明による光結合器
の製造方法の実施例を示す斜視図、第4図は本発明の実
施例の光結合器と半導体レーザを結合させた場合の構成
斜視図、第5図は本発明による光結合器の他の実施例と
光ファイバとの結合を示す構成斜視図である。 1・・・・・・ニオブ酸リチウム、2・・・・・・光導
波路、5・・・・・・(01,2)面、6・・・・・・
端部、7・・・・・・半導体レーザ、8・・・・・・光
7フイバ。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名へ1
図 第2図 第3図 (幻 第4図 第5図
Figures 1 (a) to (C) are schematic cross-sectional views of main parts to explain conventional edge polishing of lithium niobate, and Figures 2 (a) and (b) are cleavage planes of lithium niobate. (01.2) A perspective view and a sectional view showing the relationship between the plane and each axis, FIGS. 3(a) and 3(b) are perspective views showing an embodiment of the method for manufacturing an optical coupler according to the present invention, The figure is a perspective view of a structure in which an optical coupler according to an embodiment of the present invention is coupled with a semiconductor laser, and FIG. 5 is a perspective view of a structure in which another embodiment of an optical coupler according to the present invention is coupled with an optical fiber. It is. 1... Lithium niobate, 2... Optical waveguide, 5... (01,2) plane, 6...
End portion, 7... Semiconductor laser, 8... Optical 7 fiber. Name of agent: Patent attorney Toshio Nakao and 1 other person 1
Figure 2 Figure 3 (Phantom Figure 4 Figure 5

Claims (2)

【特許請求の範囲】[Claims] (1)光導波路が形成されたニオブ酸リチウムZ板のな
めらかに加工された劈開面より光の入射および出射を行
うことを特徴とする光結合器。
(1) An optical coupler characterized in that light enters and exits from a smoothly processed cleavage surface of a lithium niobate Z plate on which an optical waveguide is formed.
(2)光導波路が形成されたニオブ酸リチウムZ板の劈
開面で劈開を行い、さらにエッチングを施すことにより
前記劈開面端部をなめらかに加工することを特徴とする
光結合器の製造方法。
(2) A method for manufacturing an optical coupler, characterized in that the cleavage plane of a lithium niobate Z plate on which an optical waveguide is formed is cleaved, and the edges of the cleavage plane are smoothed by etching.
JP14271184A 1984-07-10 1984-07-10 Optical coupler and its production Pending JPS6120910A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14271184A JPS6120910A (en) 1984-07-10 1984-07-10 Optical coupler and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14271184A JPS6120910A (en) 1984-07-10 1984-07-10 Optical coupler and its production

Publications (1)

Publication Number Publication Date
JPS6120910A true JPS6120910A (en) 1986-01-29

Family

ID=15321792

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14271184A Pending JPS6120910A (en) 1984-07-10 1984-07-10 Optical coupler and its production

Country Status (1)

Country Link
JP (1) JPS6120910A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01291204A (en) * 1988-05-18 1989-11-22 Furukawa Electric Co Ltd:The Method of connecting waveguide
US6276050B1 (en) 1998-07-20 2001-08-21 Emhart Inc. Riveting system and process for forming a riveted joint

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01291204A (en) * 1988-05-18 1989-11-22 Furukawa Electric Co Ltd:The Method of connecting waveguide
US6276050B1 (en) 1998-07-20 2001-08-21 Emhart Inc. Riveting system and process for forming a riveted joint

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